专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08028399B2 Magnetic write pole fabrication 有权
标题翻译：磁写磁极制造
公开(公告)号：US08028399B2
公开(公告)日：2011-10-04
申请号：US11957481
申请日：2007-12-16
申请人： Amanda Baer , Jeffrey S. Lille , Aron Pentek
发明人： Amanda Baer , Jeffrey S. Lille , Aron Pentek
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3163 , Y10T29/49032 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： Write elements and methods of fabricating magnetic write poles are described. For one method, a vertical mask structure is formed on a magnetic layer in locations of a pole tip and a yoke of a write pole. The vertical mask structure may be formed by coating vertical surfaces of resists with an atomic layer deposition (ALD) process or a similar process. A removal process is then performed around the vertical mask structure to define the pole tip and part of the yoke of the write pole, and the vertical mask structure is removed. A lower portion of the pole tip is them masked while the upper portion of the pole tip and the part of the yoke is exposed. The upper portion of the pole tip and the part of the yoke are then expanded with magnetic material, such as with a plating process.
摘要翻译：描述制造磁性写入极的写入元件和方法。对于一种方法，在写入极的极尖和磁轭的位置的磁性层上形成垂直掩模结构。垂直掩模结构可以通过用原子层沉积（ALD）工艺或类似工艺涂覆抗蚀剂的垂直表面而形成。然后围绕垂直掩模结构执行去除处理以限定磁极尖端和写极的磁轭的一部分，并且去除垂直掩模结构。极尖的下部被掩蔽，而极尖的上部和轭的一部分露出。然后用磁性材料例如电镀工艺使磁极尖端的上部和磁轭的一部分膨胀。

2. 发明申请

US20090154015A1 MAGNETIC WRITE POLE FABRICATION 有权
标题翻译：磁性写字槽制造
公开(公告)号：US20090154015A1
公开(公告)日：2009-06-18
申请号：US11957481
申请日：2007-12-16
申请人： Amanda Baer , Jeffrey S. Lille , Aron Pentek
发明人： Amanda Baer , Jeffrey S. Lille , Aron Pentek
IPC分类号： G11B5/127
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3163 , Y10T29/49032 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： Write elements and methods of fabricating magnetic write poles are described. For one method, a vertical mask structure is formed on a magnetic layer in locations of a pole tip and a yoke of a write pole. The vertical mask structure may be formed by coating vertical surfaces of resists with an atomic layer deposition (ALD) process or a similar process. A removal process is then performed around the vertical mask structure to define the pole tip and part of the yoke of the write pole, and the vertical mask structure is removed. A lower portion of the pole tip is them masked while the upper portion of the pole tip and the part of the yoke is exposed. The upper portion of the pole tip and the part of the yoke are then expanded with magnetic material, such as with a plating process.
摘要翻译：描述制造磁性写入极的写入元件和方法。对于一种方法，在写入极的极尖和磁轭的位置的磁性层上形成垂直掩模结构。垂直掩模结构可以通过用原子层沉积（ALD）工艺或类似工艺涂覆抗蚀剂的垂直表面而形成。然后围绕垂直掩模结构执行去除处理以限定磁极尖端和写极的磁轭的一部分，并且去除垂直掩模结构。极尖的下部被掩蔽，而极尖的上部和轭的一部分露出。然后用磁性材料例如电镀工艺使磁极尖端的上部和磁轭的一部分膨胀。

3. 发明授权

US07563381B2 High milling resistance write pole fabrication method for perpendicular recording 失效
标题翻译：用于垂直记录的高铣削电阻写极制造方法
公开(公告)号：US07563381B2
公开(公告)日：2009-07-21
申请号：US10836867
申请日：2004-04-30
申请人： Amanda Baer , Quang Le , Kim Lee , Aron Pentek , Douglas J. Werner , Sue S. Zhang
发明人： Amanda Baer , Quang Le , Kim Lee , Aron Pentek , Douglas J. Werner , Sue S. Zhang
IPC分类号： G11B5/187
CPC分类号： G11B5/1871 , G11B5/3116 , G11B5/3163 , Y10T29/49021 , Y10T29/49043
摘要： A method for constructing a tapered write pole, the method including the use of a bilayer hard mask.
摘要翻译：一种用于构造锥形写入极的方法，该方法包括使用双层硬掩模。

4. 发明申请

US20070146931A1 Method for fabricating a side shield for a flux guide layer for perpendicular magnetic recording 失效
标题翻译：用于制造用于垂直磁记录的磁通引导层的侧屏蔽的方法
公开(公告)号：US20070146931A1
公开(公告)日：2007-06-28
申请号：US11317917
申请日：2005-12-22
申请人： Amanda Baer , Daniel Bedell , Quang Le , Aron Pentek
发明人： Amanda Baer , Daniel Bedell , Quang Le , Aron Pentek
IPC分类号： G11B5/147
CPC分类号： G11B5/3116 , G11B5/112 , G11B5/1278 , G11B5/3146 , G11B5/3163
摘要： A magnetic head for use in a perpendicular recording system having a novel shield structure that provides exceptional magnetic shielding from extraneous magnetic fields such as from a write coil, shaping layer or return pole of the write head. The shield structure is constructed to have a bottom or leading surface that is generally coplanar with the bottom or leading surface of the shaping layer, but all or a portion of the shield structure is not as thick as the shaping layer so as to have a top surface that does not extend to the same elevation (in a trailing direction) as that of the shaping layer. Making the shields extend to a lower level than the shaping layer improves magnetic performance by reducing flux leakage from the write pole, and also provides manufacturing advantages, such as during the manufacturing of the write pole. These manufacturing advantages include the advantage of having the shields covered with a protective layer of, for example, alumina during the ion milling of the write pole.
摘要翻译：一种用于垂直记录系统的磁头，其具有新的屏蔽结构，其提供例如来自写入磁头的写入线圈，成形层或返回磁极的外部磁场的卓越的磁屏蔽。屏蔽结构被构造成具有与成形层的底部或前表面大致共面的底部或前表面，但是屏蔽结构的全部或一部分不像成形层那样厚，以便具有顶部表面不延伸到与成形层相同的高度（在拖尾方向上）。使屏蔽层延伸到比成形层更低的水平，通过减小来自写入极的磁通泄漏来提高磁性能，并且还提供制造优点，例如在写入磁极的制造期间。这些制造优点包括在写入极的离子铣削期间使屏蔽覆盖有例如氧化铝的保护层的优点。

5. 发明申请

US20080113514A1 Methods for the manufacture of notched trailing shields 失效
标题翻译：开槽后挡板的制造方法
公开(公告)号：US20080113514A1
公开(公告)日：2008-05-15
申请号：US11595654
申请日：2006-11-10
申请人： Amanda Baer , Hung-chin Guthrie , Yimin Hsu , Ming Jiang , Aron Pentek
发明人： Amanda Baer , Hung-chin Guthrie , Yimin Hsu , Ming Jiang , Aron Pentek
IPC分类号： H01L21/311
CPC分类号： G11B5/1278 , G11B5/112 , G11B5/3163 , Y10T29/49032 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： Methods for improving within wafer and wafer to wafer yields during fabrication of notched trailing shield structures are disclosed. Ta/Rh CMP stop layers are deposited prior to planarization and notch formation to ensure a planar surface for trailing shield structures. These stop layers may be blanket deposited or patterened prior to CMP. Patterned stop layers produce the highest yields.
摘要翻译：公开了在制造缺口尾部屏蔽结构期间在晶片和晶片之间改善晶片产量的方法。在平坦化和切口形成之前沉积Ta / Rh CMP停止层以确保用于尾部屏蔽结构的平坦表面。这些停止层可以在CMP之前被铺平或沉积。图案化的停止层产生最高的产量。

6. 发明授权

US07363698B2 Process for creating a write head by forming a bump after the top pole is formed 失效
标题翻译：用于通过在形成顶极之后形成凸起来产生写入头的过程
公开(公告)号：US07363698B2
公开(公告)日：2008-04-29
申请号：US10956221
申请日：2004-09-30
申请人： Amanda Baer , Hamid Balamane , Daniel Wayne Bedell , Jyh-Shuey Jerry Lo , Vladimir Nikitin , Aron Pentek , Yvette Winton
发明人： Amanda Baer , Hamid Balamane , Daniel Wayne Bedell , Jyh-Shuey Jerry Lo , Vladimir Nikitin , Aron Pentek , Yvette Winton
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/1871 , G11B5/3163 , Y10T29/49021 , Y10T29/49032 , Y10T29/49034 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： Methods for creating a write head by forming a bump after the top pole is formed are provided. In one embodiment, a bottom pole is created out of a first layer. A non-magnetic gap material is applied to the surface of the wafer. A top pole is created out of a second layer. After creating the top pole, a bump is created. The bump is used to protect at least a portion of the first layer while etching to create a stray flux absorber.
摘要翻译：提供了通过在形成顶极之后形成凸块来创建写入头的方法。在一个实施例中，从第一层产生底极。将非磁隙材料施加到晶片的表面。第二层创建顶杆。创建顶极后，会创建一个凸起。凸块用于在蚀刻时保护第一层的至少一部分以产生杂散通量吸收体。

7. 发明申请

US20070258167A1 Perpendicular magnetic write head having a magnetic write pole with a concave trailing edge 有权
标题翻译：具有磁写入磁极的垂直磁性写头具有凹形后缘
公开(公告)号：US20070258167A1
公开(公告)日：2007-11-08
申请号：US11411556
申请日：2006-04-25
申请人： Donald Allen , Amanda Baer , Michael Feldbaum , Hung-Chin Guthrie , Wen-Chien Hsiao , Yimin Hsu , Ming Jiang , Yinshi Liu , Aron Neuhaus , Vladimir Nikitin , Aron Pentek , Katalin Pentek , Yi Zheng
发明人： Donald Allen , Amanda Baer , Michael Feldbaum , Hung-Chin Guthrie , Wen-Chien Hsiao , Yimin Hsu , Ming Jiang , Yinshi Liu , Aron Neuhaus , Vladimir Nikitin , Aron Pentek , Katalin Pentek , Yi Zheng
IPC分类号： G11B5/147
CPC分类号： G11B5/3116 , G11B5/11 , G11B5/1278 , G11B5/1871 , G11B5/3146 , G11B5/315 , G11B5/3163
摘要： A magnetic write head for perpendicular magnetic recording having a write pole with a concave trailing edge. The magnetic write pole can have a trapezoidal shape with first and second laterally opposed sides that are further apart at the trailing edge than at the leading edge. The write head may or may not include a magnetic trailing shield, and if a trailing shield is included it is separated from the trailing edge by a non-magnetic write gap layer. The concave trailing edge improves magnetic performance such as by improving the transition curvature. A method for constructing the write head includes forming a magnetic write pole by forming a mask structure over a deposited write pole material, the mask structure having an alumina hard mask and an image transfer layer such as DURAMIDE®. An alumina fill layer is then deposited and a chemical mechanical polish is performed to open up the image transfer layer. A reactive on etch is performed to remove the image transfer layer and a reactive ion mill or reactive ion etch is performed to remove the alumina hard mask and form a concave surface on the write pole.
摘要翻译：用于垂直磁记录的磁写头，具有带有凹后缘的写极。磁性写入极可以具有梯形形状，其中第一和第二横向相对侧在后缘处比在前缘处更远地分开。写头可以包括或可以不包括磁性后屏蔽，并且如果包括后屏蔽，则其通过非磁性写间隙层与后缘分离。凹形后边缘提高磁性能，例如通过改善转变曲率。构成写入头的方法包括通过在沉积的写入极材料上形成掩模结构来形成磁性写入极，掩模结构具有氧化铝硬掩模和诸如DURAMIDE的图像转移层。然后沉积氧化铝填充层，并执行化学机械抛光以打开图像转印层。执行反应性蚀刻以去除图像转印层，并且执行反应性离子磨或反应离子蚀刻以除去氧化铝硬掩模并在写入极上形成凹面。

8. 发明申请

US20050241140A1 High milling resistance write pole fabrication method for perpendicular recording 失效
标题翻译：用于垂直记录的高铣削电阻写极制造方法
公开(公告)号：US20050241140A1
公开(公告)日：2005-11-03
申请号：US10836867
申请日：2004-04-30
申请人： Amanda Baer , Quang Le , Kim Lee , Aron Pentek , Douglas Werner , Sue Zhang
发明人： Amanda Baer , Quang Le , Kim Lee , Aron Pentek , Douglas Werner , Sue Zhang
IPC分类号： G11B5/127 , G11B5/187
CPC分类号： G11B5/1871 , G11B5/3116 , G11B5/3163 , Y10T29/49021 , Y10T29/49043
摘要： A method for constructing a tapered write pole, the method including the use of a bilayer hard mask.
摘要翻译：一种用于构造锥形写入极的方法，该方法包括使用双层硬掩模。

9. 发明授权

US07757380B2 Methods for the manufacture of notched trailing shields 失效
标题翻译：开槽后挡板的制造方法
公开(公告)号：US07757380B2
公开(公告)日：2010-07-20
申请号：US11595654
申请日：2006-11-10
申请人： Amanda Baer , Hung-chin Guthrie , Yimin Hsu , Ming Jiang , Aron Pentek
发明人： Amanda Baer , Hung-chin Guthrie , Yimin Hsu , Ming Jiang , Aron Pentek
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/1278 , G11B5/112 , G11B5/3163 , Y10T29/49032 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： Methods for improving within wafer and wafer to wafer yields during fabrication of notched trailing shield structures are disclosed. Ta/Rh CMP stop layers are deposited prior to planarization and notch formation to ensure a planar surface for trailing shield structures. These stop layers may be blanket deposited or patterned prior to CMP. Patterned stop layers produce the highest yields.
摘要翻译：公开了在制造缺口尾部屏蔽结构期间在晶片和晶片之间改善晶片产量的方法。在平坦化和切口形成之前沉积Ta / Rh CMP停止层以确保用于尾部屏蔽结构的平坦表面。这些停止层可以在CMP之前被毯式沉积或图案化。图案化的停止层产生最高的产量。

10. 发明授权

US07509729B2 Method for making a perpendicular magnetic recording write head 失效
标题翻译：制作垂直磁记录头的方法
公开(公告)号：US07509729B2
公开(公告)日：2009-03-31
申请号：US11380189
申请日：2006-04-25
申请人： Donald G. Allen , Amanda Baer , Michael Feldbaum , Hung-Chin Guthrie , Aron Pentek
发明人： Donald G. Allen , Amanda Baer , Michael Feldbaum , Hung-Chin Guthrie , Aron Pentek
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3163 , G11B5/112 , G11B5/1278 , G11B5/3116 , G11B5/3146 , Y10T29/49021 , Y10T29/49039 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method for making a write pole in a perpendicular magnetic recording write head uses a metal mask to pattern the primary resist and only ion milling during the subsequent patterning steps. A layer of primary resist is deposited over the magnetic write pole material and a metal mask layer is deposited on the primary resist layer. An imaging resist layer is formed on the metal mask layer and lithographically patterned generally in the desired shape of the write pole. Ion milling without a reactive gas is then performed over the imaging resist pattern to pattern the underlying metal mask layer, which is then used as the mask to define the shape of the primary resist pattern. Ion milling with oxygen is then performed over the metal mask pattern to pattern the underlying primary resist. Ion milling without a reactive gas is then performed over the primary resist pattern to form the underlying write pole.
摘要翻译：用于在垂直磁记录写头中制作写极的方法使用金属掩模对主抗蚀剂进行图案化，并且在随后的图案化步骤期间仅使用离子铣削。一层主抗蚀剂沉积在磁写磁极材料上，并且金属掩模层沉积在主抗蚀剂层上。在金属掩模层上形成成像抗蚀剂层，并且通常以写入极的所需形状进行光刻图案化。然后在成像抗蚀剂图案上进行无反应气体的离子研磨以对下面的金属掩模层进行图案化，然后将其用作掩模以限定主抗蚀剂图案的形状。然后在金属掩模图案上进行用氧离子研磨以对下面的主抗蚀剂进行图案化。然后在主抗蚀剂图案上执行没有反应气体的离子研磨以形成下面的写极。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式