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1. 发明申请

US20120120379A1 SYSTEM AND METHOD FOR CONTROLLING THE DISTORTION OF A RETICLE 审中-公开
标题翻译：用于控制物品失真的系统和方法
公开(公告)号：US20120120379A1
公开(公告)日：2012-05-17
申请号：US13090183
申请日：2011-04-19
申请人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Hiroki Okuno
发明人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Hiroki Okuno
IPC分类号： G03B27/68
CPC分类号： F28F3/12 , F28D2021/0077 , G03F7/70783 , G03F7/70875
摘要： An apparatus for controlling the distortion of a reticle (28) includes a temperature adjuster (258) and a control system (226). The temperature adjuster (258) includes a plurality of adjuster elements (258E) that individually adjust the temperature of a plurality of regions (28R) of the reticle (28). The control system (226) includes a state observer (250) and a controller (260). The state observer (250) estimates an estimated physical condition (250C) of the reticle (28). The controller (260) controls the adjuster elements (258E) of the temperature adjuster (258) based at least in part on the estimated physical condition (250C).
摘要翻译：用于控制掩模版（28）的变形的装置包括温度调节器（258）和控制系统（226）。温度调节器（258）包括分别调节掩模版（28）的多个区域（28R）的温度的多个调节元件（258E）。控制系统（226）包括状态观察器（250）和控制器（260）。状态观察器（250）估计掩模版（28）的估计的物理条件（250℃）。控制器（260）至少部分地基于估计的身体状况（250C）来控制温度调节器（258）的调节器元件（258E）。

2. 发明申请

US20090033907A1 DEVICES AND METHODS FOR DECREASING RESIDUAL CHUCKING FORCES 审中-公开
标题翻译：减少残肢的装置和方法
公开(公告)号：US20090033907A1
公开(公告)日：2009-02-05
申请号：US12168726
申请日：2008-07-07
申请人： Douglas C. Watson , Christopher S. Margeson , Alton H. Phillips , Hiromitsu Yoshimoto , Noriya Kato
发明人： Douglas C. Watson , Christopher S. Margeson , Alton H. Phillips , Hiromitsu Yoshimoto , Noriya Kato
IPC分类号： G03B27/62
CPC分类号： G03B27/62 , G03F7/707
摘要： Devices and methods are disclosed for holding a reticle or analogous object, particularly a planar object. An exemplary reticle-holding device includes a reticle chuck having a reticle-holding surface on which a reticle is placed to hold the reticle. The device includes at least one ultrasonic transducer (as an exemplary vibration-inducing device) sonically coupled to the reticle to excite, whenever the ultrasonic transducer is being energized, a vibrational mode in the reticle or reticle chuck, or both. The vibration mode is sufficient to reduce an adhesion force holding the reticle to the reticle-holding surface. Sonic coupling can be by direct contact with the transducer or across a gap.
摘要翻译：公开了用于保持掩模版或类似物体，特别是平面物体的装置和方法。示例性的掩模版保持装置包括具有掩模版保持表面的掩模版卡盘，在其上放置掩模版以保持掩模版。每当超声波换能器通电时，该装置包括至少一个超声波换能器（作为示例性的振动诱导装置），其超声波耦合到光罩以激发，在标线片或光罩卡盘或两者中均振动模式。振动模式足以减少将掩模版保持在掩模版保持表面上的粘附力。声波耦合可以通过与换能器或间隙直接接触。

3. 发明授权

US09304385B2 Exposure method and device manufacturing method including selective deformation of a mask 有权
标题翻译：包括掩模选择性变形的曝光方法和装置制造方法
公开(公告)号：US09304385B2
公开(公告)日：2016-04-05
申请号：US12560760
申请日：2009-09-16
申请人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Yusaku Uehara
发明人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Yusaku Uehara
IPC分类号： G03B27/32 , G03F1/00 , G03F7/20
CPC分类号： G03B27/32 , G03F1/144 , G03F1/50 , G03F7/70783 , G03F7/70875
摘要： An exposure method that uses a substrate (M) held by a holding member (28) to perform exposure processing, comprising a holding process, which holds a prescribed region (AR3) of the substrate as the holding region by means of the holding member, and a deformation process, which selectively deforms one side of the holding region of the substrate held by the holding process with respect to the other side. According to the present invention, a prescribed region of the substrate is held as a holding region by means of a holding member, and one side of the holding region of said held substrate is selectively deformed with respect to the other side, so it is possible to selectively eliminate the nonlinear deformation components attributable to holding of the substrate with respect to one side from among the two sides of the substrate using the holding region as a reference. Since it is possible to put the pattern projected via the substrate into a linearly correctable status, it is possible to reduce warping of the pattern.
摘要翻译：一种使用由保持构件（28）保持的基板（M）进行曝光处理的曝光方法，包括通过保持构件保持基板的规定区域（AR3）作为保持区域的保持工序，以及变形过程，其选择性地使通过保持过程保持的基板的保持区域的一侧相对于另一侧变形。根据本发明，通过保持构件将衬底的规定区域保持为保持区域，并且所述保持衬底的保持区域的一侧相对于另一侧选择性地变形，因此可能以使用保持区域作为基准来选择性地消除归因于基板相对于基板的两侧之间的一侧的保持的非线性变形分量。由于可以将通过基板投射的图案置于线性可校正状态，可以减少图案的翘曲。

4. 发明申请

US20100097588A1 EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, AND MASK 有权
标题翻译：曝光方法，装置制造方法和掩模
公开(公告)号：US20100097588A1
公开(公告)日：2010-04-22
申请号：US12560760
申请日：2009-09-16
申请人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Yusaku Uehara
发明人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Yusaku Uehara
IPC分类号： G03B27/42 , G03B27/32 , G03F1/00
CPC分类号： G03B27/32 , G03F1/144 , G03F1/50 , G03F7/70783 , G03F7/70875
摘要： An exposure method that uses a substrate (M) held by a holding member (28) to perform exposure processing, comprising a holding process, which holds a prescribed region (AR3) of the substrate as the holding region by means of the holding member, and a deformation process, which selectively deforms one side of the holding region of the substrate held by the holding process with respect to the other side. According to the present invention, a prescribed region of the substrate is held as a holding region by means of a holding member, and one side of the holding region of said held substrate is selectively deformed with respect to the other side, so it is possible to selectively eliminate the nonlinear deformation components attributable to holding of the substrate with respect to one side from among the two sides of the substrate using the holding region as a reference. Since it is possible to put the pattern projected via the substrate into a linearly correctable status, it is possible to reduce warping of the pattern.
摘要翻译：一种使用由保持构件（28）保持的基板（M）进行曝光处理的曝光方法，包括通过保持构件保持基板的规定区域（AR3）作为保持区域的保持工序，以及变形过程，其选择性地使通过保持过程保持的基板的保持区域的一侧相对于另一侧变形。根据本发明，通过保持构件将衬底的规定区域保持为保持区域，并且所述保持衬底的保持区域的一侧相对于另一侧选择性地变形，因此可能以使用保持区域作为基准来选择性地消除归因于基板相对于基板的两侧之间的一侧的保持的非线性变形分量。由于可以将通过基板投射的图案置于线性可校正状态，可以减少图案的翘曲。

5. 发明申请

US20100186942A1 RETICLE ERROR REDUCTION BY COOLING 审中-公开
标题翻译：冷却错误减少
公开(公告)号：US20100186942A1
公开(公告)日：2010-07-29
申请号：US12643932
申请日：2009-12-21
申请人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Noriya Kato , Yusaku Uehara , Leonard Wai Fung Kho
发明人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Noriya Kato , Yusaku Uehara , Leonard Wai Fung Kho
IPC分类号： F25B49/00 , F25B29/00 , F25B21/02 , G03B27/52
CPC分类号： G03B27/52 , F25B21/02 , F28F3/12
摘要： Methods and apparatus for cooling a reticle are disclosed. According to one aspect of the present invention, an apparatus for providing top side cooling to a reticle includes a heat exchanger arrangement and an actuator. The heat exchanger arrangement includes a first surface arranged to facilitate heat transfer between the reticle and the heat exchanger arrangement. The heat transfer provides cooling to at least some portions of the reticle. The actuator positions the first surface of the heat exchanger arrangement at a distance over the reticle.
摘要翻译：公开了用于冷却掩模版的方法和装置。根据本发明的一个方面，一种用于向掩模版提供顶侧冷却的装置包括热交换器装置和致动器。热交换器装置包括布置成便于在标线片和热交换器装置之间传热的第一表面。热传递为掩模版的至少一些部分提供冷却。致动器将热交换器装置的第一表面定位在掩模版上方一段距离处。

6. 发明申请

US20100156198A1 SHIELD LAYER PLUS REFRIGERATED BACKSIDE COOLING FOR PLANAR MOTORS 审中-公开
标题翻译：平板电机的屏蔽层加热后备冷却
公开(公告)号：US20100156198A1
公开(公告)日：2010-06-24
申请号：US12643888
申请日：2009-12-21
申请人： Alexander Cooper , Scott Coakley , Douglas C. Watson , Alton H. Phillips , Gaurav Keswani , Michael B. Binnard
发明人： Alexander Cooper , Scott Coakley , Douglas C. Watson , Alton H. Phillips , Gaurav Keswani , Michael B. Binnard
IPC分类号： H02K9/20 , H02K41/03
CPC分类号： G03F7/70858 , G03F7/70758 , H02K9/19 , H02K9/20 , H02K41/031 , H02K2201/18
摘要： According to one aspect of the present invention, a motor arrangement includes at least one coil, a cover plate, and a shield layer. The at least one coil has a first side and a second side. The cover plate is positioned substantially over the first side of the at least one coil at a distance from the at least one coil. The shield layer is positioned between the first side of the at least one coil and the cover plate, and has a top surface. The top surface contacts the cover plate, and includes a liquid and a gas that form a mixture and cause the top surface to have a substantially constant temperature.
摘要翻译：根据本发明的一个方面，电动机装置包括至少一个线圈，盖板和屏蔽层。该至少一个线圈具有第一侧和第二侧。覆盖板基本上位于距离至少一个线圈一定距离的至少一个线圈的第一侧上方。屏蔽层位于至少一个线圈的第一侧和盖板之间，并具有顶面。顶表面接触盖板，并且包括形成混合物的液体和气体，并使顶表面具有基本恒定的温度。

7. 发明授权

US07477358B2 EUV reticle handling system and method 失效
标题翻译： EUV掩模版处理系统和方法
公开(公告)号：US07477358B2
公开(公告)日：2009-01-13
申请号：US11238237
申请日：2005-09-28
申请人： Alton H. Phillips , Michael R. Sogard , Douglas C. Watson
发明人： Alton H. Phillips , Michael R. Sogard , Douglas C. Watson
IPC分类号： G03B27/62 , B65D85/38
CPC分类号： G03F7/70741
摘要： An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. The enclosure in conjunction with a heater and heat sink provides thermophoretic protection of an enclosed reticle.
摘要翻译：公开了用于保护掩模版的至少一个图案侧和相对侧的外壳。外壳包括第一和第二部分，其在处理，检查，存储和运输期间形成围绕保护的掩模版的外壳。外壳与加热器和散热器一起提供封闭的掩模版的热泳保护。

8. 发明授权

US06953109B2 Vibration isolator with low lateral stiffness 失效
标题翻译：具有低侧向刚度的隔振器
公开(公告)号：US06953109B2
公开(公告)日：2005-10-11
申请号：US10267489
申请日：2002-10-08
申请人： Douglas C. Watson , Alton H. Phillips
发明人： Douglas C. Watson , Alton H. Phillips
IPC分类号： F16F9/02 , F16F15/023 , F16F7/10
CPC分类号： F16F15/0232 , F16F9/02
摘要： A vibration isolator (200) for isolating a first assembly (202) from vibration from a second assembly (204) includes a housing (206) that is secured to the second assembly (204) and a pendulum assembly (208). The pendulum assembly (208) includes one or more pistons (226) and a connector assembly (224). The piston (226) is coupled to the first assembly (202). The connector assembly (224) couples the piston (226) to the housing (206) and allows the piston (226) to swing laterally relative to the housing (206). The vibration isolator (200) can also include a pendulum support (264) and/or a mover (580) that moves the piston (226) and assists in supporting the load of the first assembly (202).
摘要翻译：用于将第一组件（202）与来自第二组件（204）的振动隔离的隔振器（200）包括固定到第二组件（204）和摆锤组件（208）的壳体（206）。摆锤组件（208）包括一个或多个活塞（226）和连接器组件（224）。活塞（226）联接到第一组件（202）。连接器组件（224）将活塞（226）联接到壳体（206）并允许活塞（226）相对于壳体（206）横向摆动。隔振器（200）还可以包括使活塞（226）移动并有助于支撑第一组件（202）的负载的摆动支撑件（264）和/或移动器（580）。

9. 发明授权

US08794011B2 Method and apparatus for utilizing in-situ measurements techniques in conjunction with thermoelectric chips (TECs) 有权
标题翻译：利用原位测量技术结合热电芯片（TEC）的方法和装置
公开(公告)号：US08794011B2
公开(公告)日：2014-08-05
申请号：US13270522
申请日：2011-10-11
申请人： Alton H. Phillips , Akio Ohta , Douglas C. Watson
发明人： Alton H. Phillips , Akio Ohta , Douglas C. Watson
IPC分类号： F25B21/02
CPC分类号： G01J5/0275 , G01J2005/0077 , G03F7/70875
摘要： According to one aspect of the present invention, an apparatus includes a surface and a first array. The surface emits radiation, and the first array is arranged over the surface and arranged to provide cooling to the surface, the first array including a plurality of TECs. At least a first sensing arrangement is substantially integrated with the first array, wherein the first sensing arrangement is arranged to make a non-contact measurement associated with the surface. The apparatus also includes a controller arranged to obtain the non-contact measurement and to use the non-contact measurement to control the cooling provided by the first array.
摘要翻译：根据本发明的一个方面，一种装置包括表面和第一阵列。表面发射辐射，并且第一阵列布置在表面上并且布置成向表面提供冷却，第一阵列包括多个TEC。至少第一感测装置基本上与第一阵列一体化，其中第一感测装置布置成进行与表面相关联的非接触测量。该装置还包括控制器，其布置成获得非接触式测量并使用非接触测量来控制第一阵列所提供的冷却。

10. 发明授权

US07804583B2 EUV reticle handling system and method 有权
标题翻译： EUV掩模版处理系统和方法
公开(公告)号：US07804583B2
公开(公告)日：2010-09-28
申请号：US12242050
申请日：2008-09-30
申请人： Alton H. Phillips , Michael R. Sogard , Douglas C. Watson
发明人： Alton H. Phillips , Michael R. Sogard , Douglas C. Watson
IPC分类号： G03B27/62 , G03B27/52
CPC分类号： G03F7/70741
摘要： An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. A method for transporting the reticle to an exposure position from a position outside an exposure chamber is disclosed, including a method for use of a load-lock chamber.
摘要翻译：公开了用于保护掩模版的至少一个图案侧和相对侧的外壳。外壳包括第一和第二部分，其在处理，检查，存储和运输期间形成围绕保护的掩模版的外壳。公开了一种用于将掩模版从暴露室外的位置传送到曝光位置的方法，包括使用负载锁定室的方法。

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