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1. 发明授权

US09567666B2 Apparatus and method for making sputtered films with reduced stress asymmetry 有权
标题翻译：制备具有减小的应力不对称的溅射膜的装置和方法
公开(公告)号：US09567666B2
公开(公告)日：2017-02-14
申请号：US12318919
申请日：2009-01-12
申请人： Alexey Krasnov , Willem den Boer , R. Glenn Stinson
发明人： Alexey Krasnov , Willem den Boer , R. Glenn Stinson
IPC分类号： C23C14/35 , C23C14/34 , C23C14/54 , H01J37/34
CPC分类号： C23C14/3407 , C23C14/54 , H01J37/3408 , H01J37/3447
摘要： Certain example embodiments of this invention relate to techniques for reducing stress asymmetry in sputtered polycrystalline films. In certain example embodiments, sputtering apparatuses that include one or more substantially vertical, non-conductive shield(s) are provided, with such shield(s) helping to reduce the oblique component of sputter material flux, thereby promoting the growth of more symmetrical crystallites. In certain example embodiments, the difference between the travel direction tensile stress and the cross-coater tensile stress of the sputtered film preferably is less than about 15%, more preferably less than about 10%, and still more preferably less than about 5%.
摘要翻译：本发明的某些示例性实施例涉及用于减少溅射多晶膜中的应力不对称性的技术。在某些示例性实施例中，提供包括一个或多个基本上垂直的非导电屏蔽的溅射装置，其中这种屏蔽件有助于减少溅射材料焊剂的倾斜分量，从而促进更对称的微晶的生长。在某些示例性实施例中，溅射膜的行进方向拉伸应力和交叉涂层机拉伸应力之间的差异优选小于约15％，更优选小于约10％，还更优选小于约5％。

2. 发明申请

US20100175988A1 Apparatus and method for making sputtered films with reduced stress asymmetry 有权
标题翻译：制备具有减小的应力不对称的溅射膜的装置和方法
公开(公告)号：US20100175988A1
公开(公告)日：2010-07-15
申请号：US12318919
申请日：2009-01-12
申请人： Alexey Krasnov , Willem den Boer , R. Glenn Stinson
发明人： Alexey Krasnov , Willem den Boer , R. Glenn Stinson
IPC分类号： C23C14/35
CPC分类号： C23C14/3407 , C23C14/54 , H01J37/3408 , H01J37/3447
摘要： Certain example embodiments of this invention relate to techniques for reducing stress asymmetry in sputtered polycrystalline films. In certain example embodiments, sputtering apparatuses that include one or more substantially vertical, non-conductive shield(s) are provided, with such shield(s) helping to reduce the oblique component of sputter material flux, thereby promoting the growth of more symmetrical crystallites. In certain example embodiments, the difference between the travel direction tensile stress and the cross-coater tensile stress of the sputtered film preferably is less than about 15%, more preferably less than about 10%, and still more preferably less than about 5%.
摘要翻译：本发明的某些示例性实施例涉及用于减少溅射多晶膜中的应力不对称性的技术。在某些示例性实施例中，提供包括一个或多个基本上垂直的非导电屏蔽的溅射装置，其中这种屏蔽件有助于减少溅射材料焊剂的倾斜分量，从而促进更对称的微晶的生长。在某些示例性实施例中，溅射膜的行进方向拉伸应力和交叉涂层机拉伸应力之间的差异优选小于约15％，更优选小于约10％，还更优选小于约5％。

3. 发明授权

US09499436B2 Light scattering coating for greenhouse applications, and/or coated article including the same 有权
标题翻译：用于温室应用的光散射涂层和/或包括其的涂层制品
公开(公告)号：US09499436B2
公开(公告)日：2016-11-22
申请号：US13064600
申请日：2011-04-01
申请人： Alexey Krasnov , Willem Den Boer , Scott V. Thomsen , Jean-Marc Lemmer
发明人： Alexey Krasnov , Willem Den Boer , Scott V. Thomsen , Jean-Marc Lemmer
IPC分类号： C03C17/34 , C03C15/00 , G02B1/10 , G02B5/02 , A01G9/14 , F24J2/40 , F24J2/50
CPC分类号： G02B1/10 , A01G9/14 , A01G9/1438 , C03C15/00 , C03C17/23 , C03C17/3417 , C03C2218/32 , F24S50/80 , F24S80/52 , G02B1/115 , G02B5/021 , G02B5/0268 , G02B5/0278 , Y02A40/252 , Y10T428/24355
摘要： Certain example embodiments relate to a sunlight-scattering thin-film coating disposed on a substrate for greenhouse applications. The surface morphology of the coating promotes a better and more uniform light distribution. For instance, at least one thin-film layer disposed on a substrate may be textured so as to create surface features on the order of 0.1-5 microns, with the surface features being sized to cause (a) light having a wavelength of greater than or equal to about 800 nm incident thereon to primarily scatter to angles less than 30 degrees relative to a major surface of the substrate and (b) light having a wavelength of less than or equal to about 700 nm incident thereon to primarily scatter to angles greater than 20 degrees relative to the major surface of the substrate. This arrangement may advantageously direct beneficial light towards plant life while directing parasitic light away from the plant life.
摘要翻译：某些示例实施例涉及设置在用于温室应用的基板上的日光散射薄膜涂层。涂层的表面形态促进了更好和更均匀的光分布。例如，设置在基板上的至少一个薄膜层可以被纹理化，以便产生大约0.1-5微米的表面特征，其中表面特征的尺寸使得（a）波长大于或等于大约800nm入射到其上以主要散射到相对于衬底的主表面小于30度的角度，以及（b）入射到其上的波长小于或等于约700nm的光主要散射到更大的角度相对于基材的主表面超过20度。这种布置可以有利地将有利的光引向植物生命，同时将寄生光引导远离植物的寿命。

4. 发明申请

US20090194155A1 Front electrode having etched surface for use in photovoltaic device and method of making same 审中-公开
标题翻译：具有用于光伏器件的蚀刻表面的前电极及其制造方法
公开(公告)号：US20090194155A1
公开(公告)日：2009-08-06
申请号：US12068119
申请日：2008-02-01
申请人： Willem den Boer , Alexey Krasnov , John A. Vanderploeg
发明人： Willem den Boer , Alexey Krasnov , John A. Vanderploeg
IPC分类号： H01L31/00 , C23C14/34
CPC分类号： H01L31/022466 , H01L31/0236 , H01L31/1884 , Y02E10/50
摘要： Certain example embodiments of this invention relate to a photovoltaic (PV) device including an electrode such as a front electrode/contact, and a method of making the same. In certain example embodiments, the front electrode has a textured (e.g., etched) surface that faces the photovoltaic semiconductor film of the PV device. In certain example embodiments, the front electrode is formed on a flat or substantially flat (non-textured) surface of a glass substrate (e.g., via sputtering), and the surface of the front electrode is textured (e.g., via etching). In completing manufacture of the PV device, the etched surface of the front electrode faces the active semiconductor film of the PV device.
摘要翻译：本发明的某些示例性实施例涉及包括诸如前电极/触点的电极的光伏（PV）装置及其制造方法。在某些示例性实施例中，前电极具有面向PV器件的光电半导体膜的有纹理（例如蚀刻）的表面。在某些示例性实施例中，前电极形成在玻璃基板（例如，通过溅射）的平坦或基本上平坦的（非纹理的）表面上，并且前电极的表面是有纹理的（例如通过蚀刻）。在完成PV器件的制造中，前电极的蚀刻表面面对PV器件的有源半导体膜。

5. 发明授权

US09246025B2 Back contact for photovoltaic devices such as copper-indium-diselenide solar cells 有权
标题翻译：光伏器件如铜铟二硒化物太阳能电池的背接触
公开(公告)号：US09246025B2
公开(公告)日：2016-01-26
申请号：US13455232
申请日：2012-04-25
申请人： Alexey Krasnov , Willem den Boer
发明人： Alexey Krasnov , Willem den Boer
IPC分类号： H01L31/0224 , H01L31/0392 , H01L31/0749 , H01L31/18
CPC分类号： H01L31/022425 , H01L31/03923 , H01L31/0749 , Y02E10/541 , Y02P70/521
摘要： A photovoltaic device (e.g., solar cell) includes: a front substrate (e.g., glass substrate); a semiconductor absorber film; a back contact including a first conductive layer of or including copper (Cu) and a second conductive layer of or including molybdenum (Mo); and a rear substrate (e.g., glass substrate). The first conductive layer of or including copper is located between at least the rear substrate and the second conductive layer of or including molybdenum, and wherein the semiconductor absorber film is located between at least the back contact and the front substrate.
摘要翻译：光电器件（例如，太阳能电池）包括：前基板（例如玻璃基板）; 半导体吸收膜; 包括铜（Cu）的第一导电层或包括或包括钼（Mo）的第二导电层的背接触; 和背面基板（例如，玻璃基板）。或包括铜的第一导电层位于至少后基板和包括钼的第二导电层之间，并且其中半导体吸收膜位于至少后接触件和前基板之间。

6. 发明授权

US08809674B2 Back electrode configuration for electroplated CIGS photovoltaic devices and methods of making same 有权
标题翻译：电镀CIGS光伏器件的背面电极配置及其制造方法
公开(公告)号：US08809674B2
公开(公告)日：2014-08-19
申请号：US13455317
申请日：2012-04-25
申请人： Alexey Krasnov , Willem Den Boer
发明人： Alexey Krasnov , Willem Den Boer
IPC分类号： H01L31/18
CPC分类号： H01L31/0322 , H01L21/02422 , H01L21/02491 , H01L21/02505 , H01L21/02568 , H01L21/02614 , H01L21/02628 , H01L31/0749 , Y02E10/541 , Y02P70/521
摘要： A back contact configuration for a CIGS-type photovoltaic device is provided. The back contact configuration includes an interfacial seed layer, made up of one or more layers/sublayers, disposed between a Mo based rear contact/electrode and a CIGS inclusive semiconductor absorber. The interfacial seed layer may be of or include one or more element(s) that make up, or help make up, the CIGS inclusive semiconductor absorber. Various methods and compositions of the interfacial seed layer are disclosed, including a seed layer comprising metallic and/or substantially metallic Cu—In—Ga, CIGS, and/or a stack of alternating layers of or including Cu, In and Ga. Methods for making the back contact configuration, including an interfacial seed layer, are also provided.
摘要翻译：提供了CIGS型光伏器件的背面接触构造。背接触配置包括由一个或多个层/子层组成的界面种子层，其设置在Mo基后接触/电极和含CIGS的半导体吸收体之间。界面种子层可以是或包括构成或帮助构成CIGS的半导体吸收体的一种或多种元素。公开了界面种子层的各种方法和组成，包括包含金属和/或基本上金属的Cu-In-Ga，CIGS和/或交替层或包括Cu，In和Ga的堆叠的种子层。还提供了包括界面种子层的背面接触构造。

7. 发明授权

US08609455B2 Patterned glass cylindrical lens arrays for concentrated photovoltaic systems, and/or methods of making the same 失效
公开(公告)号：US08609455B2
公开(公告)日：2013-12-17
申请号：US12662628
申请日：2010-04-26
申请人： Alexey Krasnov , Willem den Boer
发明人： Alexey Krasnov , Willem den Boer
IPC分类号： H01L21/00 , H01L31/0232 , H01L31/042
CPC分类号： C03B23/22 , C03B13/08 , C03B18/04 , C03B18/14 , C03C17/23 , F24S23/30 , F24S23/31 , H01L31/0232 , H01L31/0543 , H01L31/0547 , H02S40/22 , H02S40/44 , Y02E10/43 , Y02E10/52 , Y02E10/60
摘要： Certain example embodiments of this invention relate to patterned glass that can be used as a cylindrical lens array in a concentrated photovoltaic application, and/or methods of making the same. In certain example embodiments, the lens arrays may be used in combination with strip solar cells and/or single-axis tracking systems. That is, in certain example embodiments, lenses in the lens array may be arranged so as to concentrate incident light onto respective strip solar cells, and the entire assembly may be connected to a single-axis tracking system that is programmed to follow the East-West movement of the sun. A low-iron glass may be used in connection with certain example embodiments. Such techniques may advantageously help to reduce cost per watt related, in part, to the potentially reduced amount of semiconductor material to be used for such example embodiments.

8. 发明申请

US20120196133A1 Heat treatable four layer anti-reflection coating 有权
标题翻译：可热处理四层防反射涂层
公开(公告)号：US20120196133A1
公开(公告)日：2012-08-02
申请号：US12929481
申请日：2011-01-27
申请人： David Broadway , Alexey Krasnov , Willem Den Boer
发明人： David Broadway , Alexey Krasnov , Willem Den Boer
IPC分类号： B32B17/06 , B05D5/06
CPC分类号： C09D5/006 , C03C17/3417 , C03C17/3423 , C03C17/3435 , C03C2217/73 , G02B1/115
摘要： A coated article includes a heat treatable (e.g., temperable) antireflection (AR) coating having four layers. The AR coating includes a layer adjacent the glass substrate having an index of refraction substantially matching that of the glass substrate, and having a compressive residual stress. In certain example embodiments, the coating may include the following layers from the glass substrate outwardly: stress-reducing layer/medium index layer/high index layer/low index layer. In certain example embodiments, depending on the chemical and optical properties of the high index layer and the substrate, the stress-reducing layer of the AR coating is selected to cause a net compressive residual stress and thus improve the overall performance of the antireflection coating when the coated article is heat treated.
摘要翻译：涂覆制品包括具有四层的可热处理（例如，可回火）抗反射（AR）涂层。 AR涂层包括与玻璃基板相邻的层，其折射率基本上与玻璃基板的折射率一致，并且具有压缩残余应力。在某些示例性实施例中，涂层可以包括从玻璃基板向外的以下层：应力减小层/介质折射率层/高折射率层/低折射率层。在某些示例性实施例中，根据高折射率层和基底的化学和光学性质，选择AR涂层的应力降低层以产生净压缩残余应力，从而提高抗反射涂层的整体性能，涂层制品进行热处理。

9. 发明申请

US20110094580A1 Photovoltaic device including front electrode having titanium oxide inclusive layer with high refractive index 审中-公开
$Photovoltaic device including front electrode having titanium oxide inclusive layer with high refractive index$
公开(公告)号：US20110094580A1
公开(公告)日：2011-04-28
申请号：US12929147
申请日：2011-01-04
申请人： Yiwei Lu , Willem den Boer , Alexey Krasnov
发明人： Yiwei Lu , Willem den Boer , Alexey Krasnov
IPC分类号： H01L31/0224
CPC分类号： H01L31/03762 , B32B17/10036 , B32B17/10174 , H01L31/022466 , H01L31/022483 , H01L31/0296 , H01L31/048 , Y02E10/548
摘要： Certain example embodiments of this invention relate to an electrode (e.g., front electrode) for use in a photovoltaic device or the like. In certain example embodiments, a transparent conductive oxide (TCO) of the front electrode for use in a photovoltaic device is of or includes titanium oxide doped with one or more of Nb, Zn and/or Al. Additional layers may also be provided in the front electrode in certain example embodiments. It has been found that the use of transparent conductive TiOx(:Nb) or TiZnOx(:Al and/or Nb), in a front electrode of a photovoltaic device, is advantageous in that such materials have a high refractive index (n) and have a higher transparency than conventional titanium suboxide (TiOx). Thus, the use of such materials in the context of a front electrode of a photovoltaic device reduces light reflection due to the high refractive index, and increases transmission into the active semiconductor film due to the higher transmission characteristics thereof, thereby improving the efficiency of the device.

10. 发明授权

US09423533B2 Patterned glass cylindrical lens arrays for concentrated photovoltaic systems, and/or methods of making the same 有权
公开(公告)号：US09423533B2
公开(公告)日：2016-08-23
申请号：US12662624
申请日：2010-04-26
申请人： Alexey Krasnov , Willem den Boer
发明人： Alexey Krasnov , Willem den Boer
IPC分类号： G01C21/02 , G02B3/00 , C03B18/14 , H01L31/052 , H01L31/054 , F24J2/08
CPC分类号： G02B3/0062 , C03B18/14 , F24S23/31 , G02B3/005 , G02B3/0056 , H01L31/0521 , H01L31/0543 , H01L31/0547 , Y02B10/20 , Y02E10/52
摘要： Certain example embodiments of this invention relate to patterned glass that can be used as a cylindrical lens array in a concentrated photovoltaic application, and/or methods of making the same. In certain example embodiments, the lens arrays may be used in combination with strip solar cells and/or single-axis tracking systems. That is, in certain example embodiments, lenses in the lens array may be arranged so as to concentrate incident light onto respective strip solar cells, and the entire assembly may be connected to a single-axis tracking system that is programmed to follow the East-West movement of the sun. A low-iron glass may be used in connection with certain example embodiments. Such techniques may advantageously help to reduce cost per watt related, in part, to the potentially reduced amount of semiconductor material to be used for such example embodiments.

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