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    • 1. 发明申请
    • Method of making front electrode of photovoltaic device having etched surface and corresponding photovoltaic device
    • 制造具有蚀刻表面的光电器件的前电极和相应的光伏器件的方法
    • US20100089444A1
    • 2010-04-15
    • US12285890
    • 2008-10-15
    • Scott V. ThomsenYiwei LuAlexey Krasnov
    • Scott V. ThomsenYiwei LuAlexey Krasnov
    • H01L31/00C23C14/00
    • H01L31/1884H01L31/022466H01L31/0236Y02E10/50
    • Certain example embodiments of this invention relate to a photovoltaic (PV) device including an electrode such as a front electrode/contact, and a method of making the same. In certain example embodiments, the front electrode has a textured (e.g., etched) surface that faces the photovoltaic semiconductor film of the PV device. The front electrode has a transparent conductive oxide (TCO) film having first and second layers (continuous or discontinuous) of the same material (e.g., zinc oxide, zinc aluminum oxide, indium-tin-oxide, or tin oxide), where the first TCO layer is sputter-deposited using a ceramic sputtering target(s) and the second TCO layer of the same material is sputter-deposited using a metallic or substantially metallic sputtering target(s). This allows the better quality TCO of the film, deposited more slowly via the ceramic target(s), to be formed using the ceramic target and the lesser quality TCO of the film to be deposited more quickly and cost effectively via the metallic target(s). After the etching, most or all of the better quality ceramic-deposited TCO remains whereas much of the lesser quality metallic-deposited TCO of the film was removed during the etching process.
    • 本发明的某些示例性实施例涉及包括诸如前电极/触点的电极的光伏(PV)装置及其制造方法。 在某些示例性实施例中,前电极具有面向PV器件的光电半导体膜的有纹理(例如蚀刻)的表面。 前电极具有透明导电氧化物(TCO)膜,其具有相同材料(例如氧化锌,氧化锌铝,氧化铟锡或氧化锡)的第一和第二层(连续或不连续),其中第一 使用陶瓷溅射靶溅射沉积TCO层,并且使用金属或基本上金属的溅射靶溅射沉积相同材料的第二TCO层。 这允许通过使用陶瓷靶材形成的通过陶瓷靶材更缓慢地沉积的膜的更好的质量TCO,并且通过金属靶材更快速且成本有效地沉积的膜的质量较差的TCO(s )。 在蚀刻之后,大部分或全部较好质量的陶瓷沉积的TCO保留,而在蚀刻过程中除去较薄质量的金属沉积的TCO。
    • 2. 发明授权
    • Method of making front electrode of photovoltaic device having etched surface and corresponding photovoltaic device
    • 制造具有蚀刻表面的光电器件的前电极和相应的光伏器件的方法
    • US08022291B2
    • 2011-09-20
    • US12285890
    • 2008-10-15
    • Scott V. ThomsenYiwei LuAlexey Krasnov
    • Scott V. ThomsenYiwei LuAlexey Krasnov
    • H01L31/00H01L21/00C23C14/00
    • H01L31/1884H01L31/022466H01L31/0236Y02E10/50
    • Certain example embodiments of this invention relate to a photovoltaic (PV) device including an electrode such as a front electrode/contact, and a method of making the same. In certain example embodiments, the front electrode has a textured (e.g., etched) surface that faces the photovoltaic semiconductor film of the PV device. The front electrode has a transparent conductive oxide (TCO) film having first and second layers (continuous or discontinuous) of the same material (e.g., zinc oxide, zinc aluminum oxide, indium-tin-oxide, or tin oxide), where the first TCO layer is sputter-deposited using a ceramic sputtering target(s) and the second TCO layer of the same material is sputter-deposited using a metallic or substantially metallic sputtering target(s). This allows the better quality TCO of the film, deposited more slowly via the ceramic target(s), to be formed using the ceramic target and the lesser quality TCO of the film to be deposited more quickly and cost effectively via the metallic target(s). After the etching, most or all of the better quality ceramic-deposited TCO remains whereas much of the lesser quality metallic-deposited TCO of the film was removed during the etching process.
    • 本发明的某些示例性实施例涉及包括诸如前电极/触点的电极的光伏(PV)装置及其制造方法。 在某些示例性实施例中,前电极具有面向PV器件的光电半导体膜的有纹理(例如蚀刻)的表面。 前电极具有透明导电氧化物(TCO)膜,其具有相同材料(例如氧化锌,氧化锌铝,氧化铟锡或氧化锡)的第一和第二层(连续或不连续),其中第一 使用陶瓷溅射靶溅射沉积TCO层,并且使用金属或基本上金属的溅射靶溅射沉积相同材料的第二TCO层。 这允许通过使用陶瓷靶材形成的通过陶瓷靶材更缓慢地沉积的膜的更好的TCO,并且通过金属靶材(s)更快速且成本有效地沉积的膜的质量较差的TCO )。 在蚀刻之后,大部分或全部较好质量的陶瓷沉积的TCO保留,而在蚀刻过程中除去较薄质量的金属沉积的TCO。