专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20130130490A1 COMBINATORIAL APPROACH FOR SCREENING OF ALD FILM STACKS 失效
标题翻译： ALD膜片筛选的组合方法
公开(公告)号：US20130130490A1
公开(公告)日：2013-05-23
申请号：US13302730
申请日：2011-11-22
申请人： Albert Lee , Tony P. Chiang , Jason Wright
发明人： Albert Lee , Tony P. Chiang , Jason Wright
IPC分类号： H01L21/28
CPC分类号： H01L21/28562 , C23C16/04 , C23C16/45525 , H01L21/28158 , H01L21/68771 , H01L28/40 , H01L28/60 , H01L45/04 , H01L45/1233 , H01L45/1253 , H01L45/1616
摘要： In some embodiments of the present invention, methods of using one or more small spot showerhead apparatus to deposit materials using CVD, PECVD, ALD, or PEALD on small spots in a site isolated, combinatorial manner are described. The small spot showerheads may be configured within a larger combinatorial showerhead to allow multi-layer film stacks to be deposited in a combinatorial manner.
摘要翻译：在本发明的一些实施例中，描述了使用一个或多个小型喷头装置以局部隔离，组合方式在小斑点上使用CVD，PECVD，ALD或PEALD沉积材料的方法。小型喷头可配置在更大的组合喷淋头内，以允许以组合方式沉积多层胶片堆叠。

2. 发明授权

US08609519B2 Combinatorial approach for screening of ALD film stacks 失效
标题翻译：组合方法用于筛选ALD膜堆叠
公开(公告)号：US08609519B2
公开(公告)日：2013-12-17
申请号：US13302730
申请日：2011-11-22
申请人： Albert Lee , Tony P. Chiang , Jason Wright
发明人： Albert Lee , Tony P. Chiang , Jason Wright
IPC分类号： H01L21/00 , H01L21/31 , H01L21/469 , H01L21/20 , H01L21/205 , H01L21/365
CPC分类号： H01L21/28562 , C23C16/04 , C23C16/45525 , H01L21/28158 , H01L21/68771 , H01L28/40 , H01L28/60 , H01L45/04 , H01L45/1233 , H01L45/1253 , H01L45/1616
摘要： In some embodiments of the present invention, methods of using one or more small spot showerhead apparatus to deposit materials using CVD, PECVD, ALD, or PEALD on small spots in a site isolated, combinatorial manner are described. The small spot showerheads may be configured within a larger combinatorial showerhead to allow multi-layer film stacks to be deposited in a combinatorial manner.
摘要翻译：在本发明的一些实施例中，描述了使用一个或多个小型喷头装置以局部隔离，组合方式在小斑点上使用CVD，PECVD，ALD或PEALD沉积材料的方法。小型喷头可配置在更大的组合喷淋头内，以允许以组合方式沉积多层胶片堆叠。

3. 发明申请

US20130152857A1 Substrate Processing Fluid Delivery System and Method 审中-公开
标题翻译：基板加工流体输送系统和方法
公开(公告)号：US20130152857A1
公开(公告)日：2013-06-20
申请号：US13327597
申请日：2011-12-15
申请人： Jason Wright , Tony P. Chiang
发明人： Jason Wright , Tony P. Chiang
IPC分类号： C23C16/455 , F15D1/00
CPC分类号： C23C16/4482 , Y10T137/0318 , Y10T137/5283
摘要： Embodiments provided herein describe substrate processing fluid delivery systems and methods. The substrate processing fluid delivery systems include a flow regulator. A fluid conduit assembly is coupled to the flow regulator and a processing chamber of a substrate processing apparatus. A plurality of processing fluid containers is coupled to the fluid conduit assembly. A plurality of valves is coupled to the fluid conduit assembly. The plurality of valves are configurable to selectively place each of the plurality of processing fluid containers in fluid communication with only the flow regulator or the processing chamber of the substrate processing apparatus through the fluid conduit assembly.
摘要翻译：本文提供的实施方案描述了基底处理流体递送系统和方法。基板处理流体输送系统包括流量调节器。流体导管组件联接到流量调节器和衬底处理装置的处理室。多个处理流体容器联接到流体导管组件。多个阀联接到流体导管组件。多个阀可配置成选择性地将多个处理流体容器中的每一个通过流体导管组件与基板处理装置的流量调节器或处理室流体连通。

4. 发明申请

US20130092084A1 Systems and Methods for Measuring, Monitoring and Controlling Ozone Concentration 有权
标题翻译：测量，监测和控制臭氧浓度的系统和方法
公开(公告)号：US20130092084A1
公开(公告)日：2013-04-18
申请号：US13271449
申请日：2011-10-12
申请人： ShouQian Shao , Jay DeDontney , Jason Wright
发明人： ShouQian Shao , Jay DeDontney , Jason Wright
IPC分类号： G01N7/00 , C23C16/52 , B23P11/00 , C23C16/455
CPC分类号： C23C16/52 , C23C16/45512 , C23C16/45557 , G01N7/00 , Y10T137/0402
摘要： Systems and methods to determine ozone concentration in a gas mixture of ozone and oxygen, based on measurements of a total mass flow and a corresponding change in a chamber pressure accepting the mixture flow, can enable the measurements of ozone concentration at low pressure settings. The ozone concentration determination can be applied to a vacuum processing chamber, enabling precision semiconductor processing.
摘要翻译：基于总质量流量的测量和接受混合物流动的室压力的相应变化来确定臭氧和氧气的混合物中的臭氧浓度的系统和方法可以使得能够在低压设置下测量臭氧浓度。可以将臭氧浓度测定应用于真空处理室，从而实现精密的半导体处理。

5. 发明申请

US20130084337A1 PURE FILAMENTOUS BACTERIOPHAGE AND METHODS OF PRODUCING SAME 审中-公开
标题翻译：纯纤维细菌及其生产方法
公开(公告)号：US20130084337A1
公开(公告)日：2013-04-04
申请号：US13566274
申请日：2012-08-03
申请人： Jason Wright , Antony Hitchcock , Frank Sugar , Tim Davies , Shreekant Adhikari , Nanda Menon , Quentin Florence
发明人： Jason Wright , Antony Hitchcock , Frank Sugar , Tim Davies , Shreekant Adhikari , Nanda Menon , Quentin Florence
IPC分类号： A61K35/76
CPC分类号： A61K35/76 , A61K2035/11 , C12N7/00 , C12N2795/00032 , C12N2795/14151 , Y10S977/773
摘要： The invention relates to compositions of purified filamentous bacteriophage, as well as methods that allow reproducible purification of high concentrations of filamentous bacteriophage.
摘要翻译：本发明涉及纯化的丝状噬菌体的组合物，以及允许可重复纯化高浓度丝状噬菌体的方法。

6. 发明申请

US20120156877A1 Showerhead for Processing Chamber 有权
标题翻译：加工室喷头
公开(公告)号：US20120156877A1
公开(公告)日：2012-06-21
申请号：US12973845
申请日：2010-12-20
申请人： Lipyeow Yap , Jay DeDontney , Shouqian Shao , Jason Wright
发明人： Lipyeow Yap , Jay DeDontney , Shouqian Shao , Jason Wright
IPC分类号： H01L21/302 , B08B7/00 , B05C5/00 , H01L21/31 , B05B7/16 , H01L21/306
CPC分类号： C23C16/45565 , C23C16/4557 , C23C16/45572 , C23C16/45574 , C23C16/5096
摘要： A top assembly for a processing chamber having a back plate and a hub is provided. The back plate has a first portion and a second portion. The first portion is connected to the second portion through a central region of the back plate, wherein a gap is defined between opposing surfaces of the first and second portions outside the central region. The first portion includes an embedded heating element. The hub is affixed to a top surface of the second portion of the back plate over the central region. The hub has a top surface with a plurality of channel openings defined within a central region of the hub and a bottom surface having a central extension with a plurality of channels defined therethrough. The bottom surface includes an annular extension spaced apart from the central extension.
摘要翻译：提供了具有背板和毂的用于处理室的顶部组件。背板具有第一部分和第二部分。第一部分通过背板的中心区域连接到第二部分，其中在中心区域外部的第一和第二部分的相对表面之间限定间隙。第一部分包括嵌入式加热元件。轮毂在中心区域上固定在背板的第二部分的顶表面上。毂具有顶表面，其具有限定在毂的中心区域内的多个通道开口，底面具有中心延伸部，多个通道限定在其中。底表面包括与中心延伸部间隔开的环形延伸部。

7. 发明授权

US08900364B2 High productivity vapor processing system 有权
标题翻译：高效蒸汽处理系统
公开(公告)号：US08900364B2
公开(公告)日：2014-12-02
申请号：US13306508
申请日：2011-11-29
申请人： Jason Wright
发明人： Jason Wright
IPC分类号： C23C16/455 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22
CPC分类号： C23C16/4412 , C23C16/45565
摘要： A processing chamber is provided. The processing chamber includes a lid having a plurality of valves affixed thereto, the plurality of valves operable to enable process gases to flow into the chamber. The chamber includes a bottom portion, where the bottom portion includes a base and side walls extending from the base. A surface of the base is configured to support a substrate. A showerhead is affixed to a bottom surface of the lid. A bottom surface of the showerhead is configured to include a central port for providing process gases into the chamber. The central port is surrounded by an annular pump channel. The annular pump channel is surrounded by an annular purge channel, where a first ridge separates the delivery region and the annular pump channel and a second ridge separates the annular pump channel and the annular purge channel.
摘要翻译：提供处理室。处理室包括具有固定到其上的多个阀的盖，多个阀可操作以使处理气体能够流入室中。该腔室包括底部，底部包括底座和从基座延伸的侧壁。基底的表面构造成支撑基底。淋浴头固定在盖的底面上。喷头的底表面构造成包括用于将工艺气体提供到室中的中心端口。中央港口环绕着一个环形的泵通道。环形泵通道被环形吹扫通道包围，其中第一脊分开输送区域和环形泵通道，第二脊分隔环形泵通道和环形清洗通道。

8. 发明授权

US08733280B2 Showerhead for processing chamber 有权
标题翻译：处理室用喷头
公开(公告)号：US08733280B2
公开(公告)日：2014-05-27
申请号：US12973845
申请日：2010-12-20
申请人： Lipyeow Yap , Jay DeDontney , Shouqian Shao , Jason Wright
发明人： Lipyeow Yap , Jay DeDontney , Shouqian Shao , Jason Wright
IPC分类号： C23C16/455 , C23C16/505 , H01L21/3065
CPC分类号： C23C16/45565 , C23C16/4557 , C23C16/45572 , C23C16/45574 , C23C16/5096
摘要： A top assembly for a processing chamber having a back plate and a hub is provided. The back plate has a first portion and a second portion. The first portion is connected to the second portion through a central region of the back plate, wherein a gap is defined between opposing surfaces of the first and second portions outside the central region. The first portion includes an embedded heating element. The hub is affixed to a top surface of the second portion of the back plate over the central region. The hub has a top surface with a plurality of channel openings defined within a central region of the hub and a bottom surface having a central extension with a plurality of channels defined therethrough. The bottom surface includes an annular extension spaced apart from the central extension.
摘要翻译：提供了具有背板和毂的用于处理室的顶部组件。背板具有第一部分和第二部分。第一部分通过背板的中心区域连接到第二部分，其中在中心区域外部的第一和第二部分的相对表面之间限定间隙。第一部分包括嵌入式加热元件。轮毂在中心区域上固定在背板的第二部分的顶表面上。毂具有顶表面，其具有限定在毂的中心区域内的多个通道开口，底面具有中心延伸部，多个通道限定在其中。底表面包括与中心延伸部间隔开的环形延伸部。

9. 发明申请

US20130164948A1 METHODS FOR IMPROVING WAFER TEMPERATURE UNIFORMITY 审中-公开
标题翻译：改善温度均匀性的方法
公开(公告)号：US20130164948A1
公开(公告)日：2013-06-27
申请号：US13335261
申请日：2011-12-22
申请人： Martin Romero , Jason Wright
发明人： Martin Romero , Jason Wright
IPC分类号： H01L21/26
CPC分类号： C23C16/45565 , C23C16/46 , C23C16/52 , H01L21/67115
摘要： A method of improving temperature uniformity across a wafer or substrate is provided. The inventors have discovered that thermal radiation reflected from the showerhead injector affects the temperature uniformity across the wafer. Temperature uniformity across the wafer, particularly from the center to edge of the wafer, is improved by controlling the reflected energy from the showerhead. Control of the reflected energy from the showerhead is achieved by a variety of means, including changing the emissivity of the showerhead, creating different zones of emissivity of the showerhead, selectively heating the showerhead, varying the distance between the showerhead and the wafer, and increasing reflectivity of the showerhead in selected regions by employing an ring configured to emit thermal radiation to the showerhead which is then reflected back to the wafer.
摘要翻译：提供了一种改善晶片或衬底温度均匀性的方法。发明人已经发现，从喷头喷射器反射的热辐射影响晶片上的温度均匀性。通过控制来自喷头的反射能量来改善晶片上的温度均匀性，特别是从晶片的中心到边缘的温度均匀性。通过各种手段来控制来自喷头的反射能量，包括改变喷头的发射率，产生喷头的不同发射率区域，选择性地加热喷头，改变喷头和晶片之间的距离，并增加通过使用被配置为向喷头喷射热辐射的环，所述喷头在所选择的区域中的反射率，其然后被反射回到晶片。

10. 发明申请

US20130125818A1 COMBINATORIAL DEPOSITION BASED ON A SPOT APPARATUS 审中-公开
标题翻译：基于SPOT装置的组合沉积
公开(公告)号：US20130125818A1
公开(公告)日：2013-05-23
申请号：US13302097
申请日：2011-11-22
申请人： Jason Wright , Tony Chiang , Chi-I Lang
发明人： Jason Wright , Tony Chiang , Chi-I Lang
IPC分类号： C23C16/455 , C23C16/50
CPC分类号： C23C16/45565 , C23C16/54
摘要： In some embodiments of the present invention, one or more small spot showerhead apparatus are used to deposit materials using CVD, PECVD, ALD, or PEALD on small spots in a site isolated, combinatorial manner. The small spot showerheads may be configured within a larger combinatorial showerhead to allow multi-layer film stacks to be deposited in a combinatorial manner.
摘要翻译：在本发明的一些实施例中，使用一个或多个小型喷头头装置，以分离，组合的方式在小斑点上沉积使用CVD，PECVD，ALD或PEALD的材料。小型喷头可配置在更大的组合喷淋头内，以允许以组合方式沉积多层胶片堆叠。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式