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    • 3. 发明申请
    • Adjustable gas distribution system
    • 可调气体分配系统
    • US20050109460A1
    • 2005-05-26
    • US10856584
    • 2004-05-27
    • Jay DeDontneyJack Yao
    • Jay DeDontneyJack Yao
    • C23C16/00C23C16/455C23F1/00H01L20060101H01L21/306
    • C23C16/45565C23C16/45574
    • The present invention provides a gas distribution apparatus comprising a plurality of outlets and at least one replaceable insert placed in at least one of the outlets. The insert is provided with a passageway adapted to alter the size of the at least one of the outlets and/or the direction of gases exiting the at least one of the outlets. The insert is provided with passageway that may be substantial straight and cylindrical. The passageway may have a first portion with a smaller diameter and a second portion with a larger diameter to selectively alter the size of the outlet passage in the gas distribution apparatus. Alternatively, the insert is provided with a main passageway and plurality of secondary passageways branched and angled from the main passageway. The angle between the main and branch passageways is in the range from about 10 to about 90 degrees. In one embodiment, the angle between the main and branch passageways is about 90 degrees.
    • 本发明提供了一种气体分配装置,其包括多个出口和至少一个可更换的插入件,其放置在至少一个出口中。 该插入件具有适于改变至少一个出口的尺寸和/或离开该至少一个出口的气体的方向的通道。 插入件设置有可以是基本上直的和圆柱形的通道。 通道可以具有较小直径的第一部分和具有较大直径的第二部分,以选择性地改变气体分配设备中出口通道的尺寸。 替代地,插入件设置有主通道和从主通道分支和成角度的多个次通道。 主通道和分支通道之间的角度在约10度至约90度的范围内。 在一个实施例中,主通道和分支通道之间的角度为大约90度。
    • 7. 发明申请
    • Gas distribution system
    • 燃气分配系统
    • US20050217580A1
    • 2005-10-06
    • US11142087
    • 2005-05-31
    • Jay DeDontneyJack Yao
    • Jay DeDontneyJack Yao
    • C23C16/00C23C16/455C23F1/00H01L20060101H01L21/306
    • C23C16/45565C23C16/45574
    • The present invention provides a gas distribution apparatus useful in semiconductor manufacturing. The gas distribution apparatus comprises a unitary member and a gas distribution network formed within the unitary member for uniformly delivering a gas into a process region. The gas distribution network is formed of an inlet passage extending upwardly through the upper surface of the unitary member for connecting to a gas source, a plurality of first passages converged at a junction and connected with the inlet passage at the junction, a plurality of second passages connected with the plurality of first passages, and a plurality of outlet passages connected with the plurality of second passages for delivering the gas into a processing region. The first passages extend radially and outwardly from the junction to the periphery surface of the unitary member, and the second passages are non-perpendicular to the first passages and extend outwardly from the first passages to the periphery surface. The outlet passages extend downwardly through the lower surface of the unitary member for delivering the gas into the processing region.
    • 本发明提供一种可用于半导体制造的气体分配装置。 气体分配装置包括整体构件和形成在整体构件内用于将气体均匀地输送到处理区域中的气体分配网络。 气体分配网络由向上延伸穿过整体构件的上表面的入口通道形成,用于连接到气体源,多个第一通道汇合在结点处并与接合处的入口通道连接,多个第二通道 与多个第一通道连接的通道,以及与多个第二通道连接的多个出口通道,用于将气体输送到处理区域。 所述第一通道从所述连接件的所述连接部向所述整体构件的周向表面径向向外延伸,并且所述第二通道与所述第一通道非垂直并且从所述第一通道向外延伸到所述周边表面。 出口通道向下延伸穿过整体构件的下表面,用于将气体输送到处理区域中。