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    • 2. 发明授权
    • Cadmium/rare gas discharge lamp of the short arc type, as well as
projection exposure device using the same
    • 短弧型的镉/稀有气体放电灯,以及使用其的投影曝光装置
    • US5471278A
    • 1995-11-28
    • US154404
    • 1993-11-19
    • Yukio YasudaAkiyasu YamaguchiTatsushi IgarashiYasuo OonishiKenzo KaiMasanori SugiharaTakashi MoriAkira Miyaji
    • Yukio YasudaAkiyasu YamaguchiTatsushi IgarashiYasuo OonishiKenzo KaiMasanori SugiharaTakashi MoriAkira Miyaji
    • G03F7/20H01J61/16H01J61/18H01J61/86
    • G03F7/70016H01J61/18H01J61/86
    • A cadmium/inert gas discharge lamp of the short arc type, which suppresses an unnecessary emission upstream and downstream of the necessary emission spectra in a wavelength range of 210 to 230 nm, achieves a high efficiency of the emission spectra in the range 210 to 230 nm and can be used in very satisfactory manner for industrial applications. Also, a highly efficient projection exposure device through the incorporation of a cadmium/rare gas discharge lamp of the short arc type having good emission spectrum characteristics in the wavelength range 210 to 230 nm, which can transmit in projecting manner fine image patterns with a large depth of focus. The cadmium/rare gas discharge lamp of the short arc type is arranged within a temperature-regulated quartz bulb, and is provided with a pair of adjacently facing electrodes, together with inert gas selected from xenon, krypton, argon, neon or mixtures of them. Metal cadmium with a pressure of 14 to 200 kPa is encapsulated in the tube in a stationary lighting operation. The lamp is operated in such a way that J/P, i.e. the ratio between a discharge current in a stationary lighting operation J (A) and a cadmium pressure in a stationary lighting operation P (kPa) is in a range 0.13 to 15. Also, a projection exposure device, which has the above-described discharge lamp and a power supply for carrying out the lighting operation of the discharge lamp under the above-described condtions.
    • 短波型的镉/惰性气体放电灯在210〜230nm的波长范围内抑制必要的发射光谱的上游和下游的不必要的发光,实现了210〜230的发射光谱的高效率 nm,可以以非常满意的方式用于工业应用。 另外,通过并入具有210〜230nm的波长范围内的发射光谱特性良好的短弧型镉/稀有气体放电灯的高效投影曝光装置,能以突出的方式突出显示具有大的图像的精细图像图案 焦点深度。 短弧型的镉/稀有气体放电灯布置在温度调节的石英灯泡内,并且设置有一对相邻的电极以及选自氙气,氪气,氩气,氖气或它们的混合物的惰性气体 。 压力为14至200kPa的金属镉在静止照明操作中封装在管中。 灯的操作方式是J / P,即静止点亮操作J(A)中的放电电流与静止点亮操作P(k​​Pa)中的镉压力之比在0.13至15的范围内。 此外,具有上述放电灯的投影曝光装置和用于在上述条件下进行放电灯的点亮操作的电源。
    • 3. 发明授权
    • Surface activating process, and device and lamp for performing said
process
    • 表面激活过程,以及用于执行所述过程的设备和灯
    • US5864388A
    • 1999-01-26
    • US680317
    • 1996-07-11
    • Toshiyuki ShimaAkiyasu YamaguchiShinji Suzuki
    • Toshiyuki ShimaAkiyasu YamaguchiShinji Suzuki
    • G02F1/1337G03F7/20G03B27/42G03B27/52G03B27/54
    • G03F7/7035G03F7/2004G03F7/70866G02F1/133788
    • A surface activating process in which treatment can be performed within a short time and in which activation of undesired areas does not occur is achieved by concentrating ultraviolet light with wavelengths from 200 nm to 300 nm by means of an oval focussing mirror. The ultraviolet light is incident in parallel on a mask via a first reflector, an integrator lens, a shutter, a second reflector, and a collimator, and is radiated through the mask onto a workpiece to activation a surface area of the workpiece. The arc length of the lamp is selected to be within a range from 7.5 to 29 mm to obtain a radiation intensity which is sufficient for surface activation. Furthermore, the relationship .alpha.>1.5.degree. and the relationship d.times.tan .alpha..ltoreq.0.1 W are satisfied at the same time, where .alpha. is the visual angle of the ultraviolet light, d is the thickness of an oxygencontaining gas layer which is formed between the mask and the workpiece, and W is the width of a minimum unit of the surface areas of the workpiece to be activated. In this way entry of adverse light can be prevented.
    • 通过椭圆形聚焦镜将浓度为200nm至300nm的波长的紫外光聚焦,可以在短时间内进行处理并且不发生不想要的区域的激活的表面活化过程。 紫外光通过第一反射器,积分透镜,快门,第二反射器和准直器平行地入射到掩模上,并通过掩模辐射到工件上以激活工件的表面区域。 灯的弧长选择在7.5至29mm的范围内,以获得足以用于表面活化的辐射强度。 此外,同时满足α> 1.5°和关系dxtanα<= = 0.1W的关系,其中α是紫外光的视角,d是形成在所述紫外线之间的含氧气体层的厚度 掩模和工件,W是要被激活的工件的表面积的最小单位的宽度。 以这种方式可以防止不利光的进入。
    • 5. 发明授权
    • Cadmium ARC lamp with improved UV emission
    • 镉ARC灯具有改善的紫外线发射
    • US5541481A
    • 1996-07-30
    • US282267
    • 1994-07-29
    • Akiyasu YamaguchiYukio YasudaHiromitsu MatsunoTatsushi Igarashi
    • Akiyasu YamaguchiYukio YasudaHiromitsu MatsunoTatsushi Igarashi
    • H01J61/12H01J61/18H01J61/30H01J61/86
    • H01J61/86H01J61/12H01J61/18H01J61/302
    • A cadmium rare gas discharge lamp of the short arc type that has a high power of the spectra in a wavelength range of 210 nm to 230 nm and a stable lamp voltage in lighting operation for a long period. An arc tube 1 is provided within which are disposed opposed, spaced apart electrodes 2, 3 and thermal insulation films 6, 7. A rare gas is encapsulated together with metal cadmium and a quartz glass is used for the material of the arc tube whose OH radical has a weight content of no more than 200 ppm. Electrodes 4 and 5 are spaced apart no more than 10 mm, so that with a lamp current at least 20 amperes, an arc of the electrode-stable type is formed and radiant light of Cd ions obtained. For the encapsulated rare gas, in one embodiment at least one of the rare gases neon, argon or krypton, are used and are encapsulated at a gas pressure of 35 kPa to 2.5 MPa at a standard temperature of 25.degree. C. The arc tube 1 is formed of quartz glass, electrodes 2 and 3 are placed opposite one another. In another embodiment, a halogen gas is encapsulated in the arc to in an amount from 4.5.times.10.sup.-10 mol/cm.sup.3 of arc tube volume to 2.1.times.10.sup.-7 mol/cm.sup.3 of are tube volume.
    • 一种短弧型的镉稀释气体放电灯,其在210nm至230nm的波长范围内具有高功率的光谱,并且在长时间的照明操作中具有稳定的灯电压。 设置有电弧管1,其中设置相对的间隔开的电极2,3和绝热膜6,7,稀有气体与金属镉一起被密封,并且石英玻璃用于电弧管的材料,其OH 自由基的重量含量不超过200ppm。 电极4和5的间隔不超过10毫米,使得灯电流至少为20安培,形成电极稳定型弧,并获得Cd离子的辐射光。 对于包封的稀有气体,在一个实施方案中,使用至少一种稀有气体氖,氩或氪,并在25℃的标准温度下以35kPa至2.5MPa的气体压力包封。电弧管1 由石英玻璃形成,电极2和3彼此相对放置。 在另一个实施方案中,将卤素气体以弧形管体积的4.5×10 -10 mol / cm 3封装到管体积的2.1×10 -7 mol / cm 3的量。