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1. 发明授权

US5350668A Method for processing silver halide color photographic material containing tabular silver iodobromide grains using a processing solution having a bleaching ability containing an iron (III) complex salt 失效
标题翻译：使用含有铁（III）络盐的漂白性能的处理液处理含有片状碘溴化银颗粒的卤化银彩色照相材料的方法
公开(公告)号：US5350668A
公开(公告)日：1994-09-27
申请号：US53198
申请日：1993-04-28
申请人： Akira Abe , Hiroyuki Seki , Hisashi Okada , Tadashi Inaba
发明人： Akira Abe , Hiroyuki Seki , Hisashi Okada , Tadashi Inaba
IPC分类号： G03C1/035 , G03C1/43 , G03C7/30 , G03C7/42 , G03C7/00 , G03C1/005 , G03C5/42 , G03C5/44
CPC分类号： G03C7/421 , G03C7/3022 , Y10S430/156
摘要： A method for processing a silver halide color photographic material comprising a support having thereon at least one silver halide emulsion layer which comprises subjecting the silver halide color photographic material to imagewise exposure and color development, and then processing with a processing solution having bleaching ability, wherein the silver halide emulsion layer contains silver halide grains having a composition such that tabular silver iodobromide grains having an aspect ratio of not higher than 3 account for at least 50% of the entire projected area of the silver halide grains, and the processing solution having bleaching ability contains as a bleaching agent an iron (III) complex salt of a compound having the described structural formula, used in a concentration of 0.01 to 0.17 mol/liter.
摘要翻译：一种用于处理卤化银彩色照相材料的方法，包括其上具有至少一个卤化银乳剂层的载体，其包括使卤化银彩色照相材料经受成像曝光和显色，然后用具有漂白能力的处理溶液进行处理，其中卤化银乳剂层含有卤化银颗粒，其组成使得长宽比不高于3的片状碘溴化银颗粒占卤化银颗粒的整个投影面积的至少50％，并且具有漂白的处理溶液能力含有具有所述结构式的化合物的铁（III）络合盐，其浓度为0.01至0.17mol /升。

2. 发明授权

US5409804A Photographic processing composition and processing method 失效
标题翻译：摄影处理组成及处理方法
公开(公告)号：US5409804A
公开(公告)日：1995-04-25
申请号：US185234
申请日：1994-01-24
申请人： Tadashi Inaba , Hisashi Okada , Hiroyuki Seki
发明人： Tadashi Inaba , Hisashi Okada , Hiroyuki Seki
IPC分类号： C09K3/00 , G03C5/26 , G03C5/30 , G03C5/44 , G03C7/407 , G03C7/42
CPC分类号： G03C7/42
摘要： A Photographic processing composition and a processing method using the same, wherein the composition contains a compound represented by formula (I) or a chelating compound of Fe(III) , M.sub.n (III), Co(III), Rh(II), Rh(III), Au(II), Au(III) or Ce(IV) and a compound represented by formula (I); ##STR1## wherein X.sub.1, X.sub.2, and X.sub.3 each represents a hydrogen atom, --L--COOM, or ##STR2## at least one of X.sub.1, X.sub.2, and X.sub.3 represents ##STR3## represents a carbon atomic group necessary for forming an aryl group; R.sub.1 represents a hydrogen atom or a substituent group; R.sub.2 represents an alkyl group, an alkoxy group, an acrylamino group, an alkylsulfonylamino group, an arylsulfonylamino group, a ureido group, an alkoxycarbonylamino group, an aryloxycarbonylamino group, a sulfamoyl group, a carbamoyl group, an alkylthio group, an alkylsulfonyl group, an arylsulfonyl group, an alkylsulfinyl group, an arylsulfinyl group, a hydroxy group, a halogen atom, a cyano group, --SO.sub.3 M.sup.1, --COOM.sup.1, --PO.sub.3 M.sup.1 M.sup.2 group, an acyl group, an alkoxycarbonyl group, an acyloxy group,a nitro group, or a hydroxamic acid group; n represents 0 or an integer of from 1 to 7; L represents an alkylene group; M, M.sup.1 and M.sup.2 each represents a hydrogen atom or a cation; and W represents a divalent linkage group containing an alkylene group and/or an arylene group.
摘要翻译： A的摄影处理用组合物及其加工方法，其中，所述组合物含有式（I）表示的化合物或Fe（III），Mn（III），Co（III），Rh（II），Rh （III），Au（II），Au（III）或Ce（IV）和由式（I）表示的化合物; X1，X2，X3中的至少一个代表“碳原子”，-L-COOM或“IMAGE”，表示形成芳基所需的碳原子团; R1表示氢原子或取代基; R2表示烷基，烷氧基，丙烯基氨基，烷基磺酰基氨基，芳基磺酰基氨基，脲基，烷氧基羰基氨基，芳氧基羰基氨基，氨磺酰基，氨基甲酰基，烷硫基，烷基磺酰基，芳基磺酰基，烷基亚磺酰基，芳基亚磺酰基，羟基，卤素原子，氰基，-SO 3 M 1，-COOM 1，-PO 3 M 1 M 2基，酰基，烷氧基羰基，酰氧基，硝基，或异羟肟酸基团; n表示0或1〜7的整数， L表示亚烷基; M，M1和M2各自表示氢原子或阳离子; W表示含有亚烷基和/或亚芳基的二价连接基团。

3. 发明授权

US5223379A Processing compositions for silver halide color photographic materials and method for processing the same materials 失效
标题翻译：银色彩色摄影材料的加工组合物及其加工方法
公开(公告)号：US5223379A
公开(公告)日：1993-06-29
申请号：US701238
申请日：1991-05-16
申请人： Hisashi Okada , Tadashi Inaba , Toshihiko Maekawa , Tsukasa Yamada , Hiroyuki Seki
发明人： Hisashi Okada , Tadashi Inaba , Toshihiko Maekawa , Tsukasa Yamada , Hiroyuki Seki
IPC分类号： G03C7/42
CPC分类号： G03C7/42
摘要： A processing composition having a bleaching ability which is used for processing silver halide color photographic materials, and containing a metal chelate compound formed fromthe salt of a metal selected from the group consisting of Fe(III), Mn(III), Co(III), Rh(II), Rh(III), Au(II), Au(III) and Ce(IV), andat least one of a compound represented by formula (I) and a compound represented by formula (II): ##STR1## wherein L.sub.1 and L.sub.2 each represents ##STR2## X.sub.1 and X.sub.2 each represents an oxygen atom or a sulfur atom, R, R.sub.1, R.sub.2 and R.sub.3 each represents a hydrogen atom or an aryl or alkyl group which may be substituted, R.sub.4 represents an aryl or alkyl group which may be substituted, ##STR3## or --OR.sub.7, R.sub.5 and R.sub.6 each has the same meaning as R.sub.1, R.sub.7 represents an aryl or alkyl group which may be substituted, Y.sub.1 and Y.sub.2 each represents an arylene or alkylene group which may be substituted, R, L.sub.1 and L.sub.2 may be joined together to form rings; ##STR4## where X.sub.1, X.sub.2, Y.sub.1, Y.sub.2, R.sub.1, R.sub.2, R.sub.3 and R.sub.4 have the same meaning as in formula (I), R.sub.a, R.sub.b and R.sub.c each represents a hydrogen atom or an aryl or alkyl group which may be substituted, R.sub.a, R.sub.b, R.sub.c and L.sub.3 may be joined together to form rings, and W represents a divalent linking group; or a processing composition having a bleaching ability which is used for processing silver halide color photographic materials, and containing a compound which has a standard electron migration rate constant k.sub.s in a gelatin film of at least 8.times.10.sup.-4 cm/s; anda method for processing silver halide color photographic materials after development with the above processing composition.

4. 发明授权

US5338649A Photographic processing composition and bleaching or bleach-fixing method 失效
标题翻译：摄影处理组合物和漂白或漂白固定方法
公开(公告)号：US5338649A
公开(公告)日：1994-08-16
申请号：US120461
申请日：1993-09-14
申请人： Tadashi Inaba , Hisashi Okada , Ryo Suzuki , Yasuhiro Katsuoka , Hiroyuki Seki
发明人： Tadashi Inaba , Hisashi Okada , Ryo Suzuki , Yasuhiro Katsuoka , Hiroyuki Seki
IPC分类号： C09K3/00 , G03C7/42 , G03C7/00 , G03C5/38 , G03C5/42 , G03C5/44
CPC分类号： G03C7/42 , Y10S430/164
摘要： A process for bleaching or bleach-fixing an imagewise exposed silver halide photographic material is provided, comprising developing in a color developing solution and bleaching or bleach-fixing in a processing composition having a bleaching capacity containing as a bleaching agent a metal chelate compound of a chelate-forming compound or salt thereof and a metal ion selected from the group consisting of Fe(III), Mn(III), Co(III), Rh(II), Rh(III), Au(II), Au(III) and Ce(IV), the chelate-forming compound or salt thereof is represented by formula (I): ##STR1## wherein G.sub.1 and G.sub.2 each represents a carboxyl group, a phosphono group, a sulfo group, a hydroxyl group, a mercapto group, an aryl group, a heterocyclic group, an alkylthio group, an amidino group, a guanidino group or a carbamoyl group; L.sub.1, L.sub.2 and L.sub.3 each represents a divalent aliphatic group, a divalent aromatic group or a divalent connecting group formed by a combination of a divalent aliphatic group and a divalent aromatic group; m and n each represents an integer 0 or 1; R represents a hydrogen atom, an aliphatic group or an aromatic group; and M represents a hydrogen atom or a cation.
摘要翻译：提供了一种用于漂白或漂白固定成像曝光的卤化银照相材料的方法，包括在彩色显影溶液中显影并漂白或漂白固定在具有漂白能力的处理组合物中，所述漂白能力含有作为漂白剂的金属螯合化合物螯合形成化合物或其盐和选自Fe（III），Mn（III），Co（III），Rh（II），Rh（III），Au（II），Au（III））和Ce（IV），螯合形成化合物或其盐由式（I）表示：其中G1和G2各自表示羧基，膦酰基，磺基，羟基巯基，芳基，杂环基，烷硫基，脒基，胍基或氨基甲酰基; L1，L2和L3各自表示二价脂族基团，二价芳族基团或通过二价脂族基团和二价芳族基团的组合形成的二价连接基团; m和n各自表示整数0或1; R表示氢原子，脂族基或芳基; M表示氢原子或阳离子。

5. 发明授权

US5250401A Processing composition for silver halide color photographic material and processing process including that composition 失效
标题翻译：卤化银彩色照相材料的加工组合物和包括该组合物的加工工艺
公开(公告)号：US5250401A
公开(公告)日：1993-10-05
申请号：US737876
申请日：1991-07-30
申请人： Hisashi Okada , Morio Yagihara , Tadashi Inaba , Hiroyuki Seki
发明人： Hisashi Okada , Morio Yagihara , Tadashi Inaba , Hiroyuki Seki
IPC分类号： G03C7/42
CPC分类号： G03C7/421
摘要： Disclosed is a method for processing a silver halide color photographic material, which comprises the steps of:image-wise exposing a silver halide color photographic material,color developing the image-wise exposed silver halide photographic material, andprocessing the color developed silver halide photographic material, in the presence of a processing composition containing a metal chelating compound formed by a compound represented by following formula (I) and a salt of a metal belonging to group Ib, IIb, IIIb,IVb, Vb, VIb, VIIb, or VIII of the Periodic Table: ##STR1## wherein Z represents a heterocyclic group; L represents a divalent linkage group; R.sub.11 and R.sub.12 each represents a hydrogen atom, an aliphatic group, an aromatic group, or a heterocyclic group; and n represents 0 or 1. Also disclosed is the processing composition used in the above method.
摘要翻译：公开了一种处理卤化银彩色照相材料的方法，其包括以下步骤：以成像方式暴露卤化银彩色照相材料，彩色显影图像曝光的卤化银照相材料，以及处理显色的卤化银照相在含有由下式（I）表示的化合物形成的金属螯合化合物和属于Ib，IIb，IIIb，IVb，Vb，VIb，VIIb或VIII族的金属的盐的处理组合物存在下，的周期表：其中Z表示杂环基;（I）其中Z表示杂环基; L表示二价连接基团; R 11和R 12各自表示氢原子，脂肪族基团，芳香族基团或杂环基团; 并且n表示0或1.还公开了用于上述方法的处理组合物。

6. 发明申请

US20090082240A1 STRIPPING LIQUID FOR SEMICONDUCTOR DEVICE, AND STRIPPING METHOD 审中-公开
标题翻译：用于半导体器件的剥离液和剥离方法
公开(公告)号：US20090082240A1
公开(公告)日：2009-03-26
申请号：US12210721
申请日：2008-09-15
申请人： Katsuyuki NUKUI , Hiroyuki Seki , Tadashi Inaba
发明人： Katsuyuki NUKUI , Hiroyuki Seki , Tadashi Inaba
IPC分类号： G03F7/42
CPC分类号： G03F7/425 , G03F7/423
摘要： A stripping liquid for a semiconductor device is provided that includes an aqueous solution containing a quaternary ammonium hydroxide, an oxidizing agent, an alkanolamine, and an alkali metal hydroxide. There is also provided a stripping method that includes a stripping liquid preparation step of preparing the stripping liquid and a stripping step of removing at least one deposit selected from the group consisting of a photoresist, an anti-reflection film, and an etching residue by means of the stripping liquid obtained in the stripping liquid preparation step.
摘要翻译：提供一种用于半导体器件的剥离液，其包括含有季铵氢氧化物，氧化剂，链烷醇胺和碱金属氢氧化物的水溶液。还提供了一种剥离方法，其包括制备剥离液的剥离液制备步骤和剥离步骤，通过装置除去选自光致抗蚀剂，抗反射膜和蚀刻残渣中的至少一种沉积物的汽提液制备步骤中获得的汽提液。

7. 发明授权

US07888300B2 Cleaning liquid for semiconductor device and cleaning method 有权
标题翻译：半导体器件清洗液及清洗方法
公开(公告)号：US07888300B2
公开(公告)日：2011-02-15
申请号：US12585486
申请日：2009-09-16
申请人： Hiroyuki Seki , Katsuyuki Nukui , Tadashi Inaba , Hideo Fushimi
发明人： Hiroyuki Seki , Katsuyuki Nukui , Tadashi Inaba , Hideo Fushimi
IPC分类号： C11D3/16
CPC分类号： C11D11/0047 , C11D1/008 , C11D1/58 , C11D1/62 , C11D1/72 , C11D3/0042 , H01L21/02071
摘要： The invention provides a cleaning liquid for semiconductor devices which is capable of removing deposits on a surface of an object to be cleaned including a photoresist, an antireflective film, an etching residue and an ashing residue at a low temperature in a short period of time with reduced environmental burdens and without causing corrosion of an interlayer dielectric film, a metal, a metal nitride, and an alloy in the object to be cleaned. The cleaning liquid for semiconductor devices according to the invention contains a reducing agent and a surfactant and has a pH of 10 to 14.
摘要翻译：本发明提供了一种能够在短时间内在低温下除去包括光致抗蚀剂，抗反射膜，蚀刻残渣和灰化残留物在内的待清洁物体的表面上的沉积物的清洗液，降低环境负荷，并且不会在待清洁物体中引起层间电介质膜，金属，金属氮化物和合金的腐蚀。本发明的半导体装置用清洗液含有还原剂和表面活性剂，其pH为10〜14。

8. 发明授权

US07547335B2 Metal polishing composition and method of polishing using the same 失效
标题翻译：金属抛光组合物和使用其的抛光方法
公开(公告)号：US07547335B2
公开(公告)日：2009-06-16
申请号：US11287386
申请日：2005-11-28
申请人： Hiroyuki Seki , Katsuhiro Yamashita , Tomohiko Akatsuka , Tadashi Inaba
发明人： Hiroyuki Seki , Katsuhiro Yamashita , Tomohiko Akatsuka , Tadashi Inaba
IPC分类号： B24D3/02 , C09C1/68
CPC分类号： C09G1/02 , H01L21/3212
摘要： A metal polishing composition comprising at least one of the compound represented by formula (1) defined herein and the compound represented by formula (2) defined herein, and an oxidizing agent, and a chemical mechanical polishing method comprising bringing the metal polishing composition into contact with a surface to be polished and providing a relative movement between the surface to be polished and a polishing surface.
摘要翻译：包含本文定义的由式（1）表示的化合物和由本文定义的式（2）表示的化合物和氧化剂中的至少一种的金属抛光组合物，以及包括使金属抛光组合物接触的化学机械抛光方法具有要抛光的表面并且在待抛光表面和抛光表面之间提供相对运动。

9. 发明申请

US20060115973A1 Metal polishing composition and method of polishing using the same 失效
公开(公告)号：US20060115973A1
公开(公告)日：2006-06-01
申请号：US11287386
申请日：2005-11-28
申请人： Hiroyuki Seki , Katsuhiro Yamashita , Tomohiko Akatsuka , Tadashi Inaba
发明人： Hiroyuki Seki , Katsuhiro Yamashita , Tomohiko Akatsuka , Tadashi Inaba
IPC分类号： H01L21/44
CPC分类号： C09G1/02 , H01L21/3212
摘要： A metal polishing composition comprising at least one of the compound represented by formula (1) defined herein and the compound represented by formula (2) defined herein, and an oxidizing agent, and a chemical mechanical polishing method comprising bringing the metal polishing composition into contact with a surface to be polished and providing a relative movement between the surface to be polished and a polishing surface.

10. 发明申请

US20100160200A1 Cleaning liquid for semiconductor device and cleaning method 有权
标题翻译：半导体器件清洗液及清洗方法
公开(公告)号：US20100160200A1
公开(公告)日：2010-06-24
申请号：US12585486
申请日：2009-09-16
申请人： Hiroyuki Seki , Katsuyuki Nukui , Tadashi Inaba , Hideo Fushimi
发明人： Hiroyuki Seki , Katsuyuki Nukui , Tadashi Inaba , Hideo Fushimi
IPC分类号： C11D7/32
CPC分类号： C11D11/0047 , C11D1/008 , C11D1/58 , C11D1/62 , C11D1/72 , C11D3/0042 , H01L21/02071
摘要： The invention provides a cleaning liquid for semiconductor devices which is capable of removing deposits on a surface of an object to be cleaned including a photoresist, an antireflective film, an etching residue and an ashing residue at a low temperature in a short period of time with reduced environmental burdens and without causing corrosion of an interlayer dielectric film, a metal, a metal nitride, and an alloy in the object to be cleaned. The cleaning liquid for semiconductor devices according to the invention contains a reducing agent and a surfactant and has a pH of 10 to 14.
摘要翻译：本发明提供了一种能够在短时间内在低温下除去包括光致抗蚀剂，抗反射膜，蚀刻残渣和灰化残留物在内的待清洁物体的表面上的沉积物的清洗液，降低环境负荷，并且不会在待清洁物体中引起层间电介质膜，金属，金属氮化物和合金的腐蚀。本发明的半导体装置用清洗液含有还原剂和表面活性剂，其pH为10〜14。

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