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1. 发明专利

JP2012191206A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2012191206A
公开(公告)日：2012-10-04
申请号：JP2012048439
申请日：2012-03-05
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： HAN-KWANG NIENHUYS , MARTINUS AGNES WILLEM CUIJPERS , LEVACIA LEON MARTIN , VAN SCHOOT JAN BERNARD PLECHELMUS , VAN DE VIJVER YURI JOHANNES GABRIEL , VOZNYI OLEG VIACHESLAVOVICH , JANSSEN FRANCISCUS JOHANNES JOSEPH , DANNY MARIA HUBERTUS PHILIPS , MARCIO ALEXANDRE CANO MIRANDA , OLEKSIY GALAKTIONOV , VAN BOKHOVEN LAURENTIUS JOHANNES ADRIANUS , KATE NICOLAAS TEN , MANISH RANJAN , RIJPMA ALBERT PIETER , KURSAT BAL , ROGER WILHELMUS ANTONIUS HENRICUS SCHMITZ , ALAIN LOUIS CLAUDE LEROUX
IPC分类号： H01L21/027
CPC分类号： G03F7/70933 , G03F7/70875 , G03F7/70891
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus capable of controlling a substrate temperature.SOLUTION: The lithographic apparatus comprises: a substrate table configured to hold a substrate; a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate; and a conduit having an outlet in the opening. The conduit is configured to supply gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
摘要翻译：要解决的问题：提供能够控制基板温度的光刻设备。光刻设备包括：被配置为保持基板的基板台; 投影系统，被配置为将图案化的辐射束通过开口投影到所述基板的目标部分上; 以及在开口中具有出口的导管。导管构造成向开口供应气体。光刻设备还包括由控制系统控制的冷却装置。冷却装置构造成冷却气体，使得当气体入射到基板上时，从开口行进到基板的气体具有预定温度。版权所有（C）2013，JPO＆INPIT

2. 发明专利

JP2010114445A Gas gauge, lithographic device and method for manufacturing device 有权
标题翻译：气体测量仪，光刻设备和制造设备的方法
公开(公告)号：JP2010114445A
公开(公告)日：2010-05-20
申请号：JP2009251601
申请日：2009-11-02
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： LABETSKI DZMITRY , VAN DE VIJVER YURI JOHANNES GABRIEL
IPC分类号： H01L21/027 , G01B13/12 , G03F7/20
CPC分类号： G03B27/52 , G01B13/12 , G03F9/7057
摘要： PROBLEM TO BE SOLVED: To provide a gas gage improving sensibility measuring partial differences of profiles for wafers for usage in a lithographic device. SOLUTION: The gas gauge includes a gas delivery pipe arranged so as to divide a distance up to an object. The gas delivery pipe includes a gas conduit, and supplies a proper measuring gas through the gas conduit. The measuring gas is discharged from the gas delivery pipe through an outlet under a pressure to collide with the object in an interaction region and the pressure of a rebounded gas is measured by a pressure detector. The gas having a small atomic number is used. A pressure sensor includes a thin film arranged in the gas delivery pipe at least partially surrounding the gas conduit in a gas outlet or a vicinity of the gas outlet. The pressure sensor includes a thin-film disk arranged around the gas conduit. The pressure sensor is disposed substantially on a common surface, and isolated from the gas conduit but includes a plurality of proper pressure elements for surrounding the gas conduit. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供气量计，其提高测量用于光刻设备的晶片的轮廓的偏差的灵敏度。解决方案：气量计包括气体输送管，该气体输送管被布置为将一段距离分隔成物体。气体输送管包括气体导管，并通过气体管道供应适当的测量气体。测量气体从气体输送管通过出口压力与相互作用区域中的物体碰撞，并且通过压力检测器测量回弹气体的压力。使用原子序数小的气体。压力传感器包括布置在气体输送管中的薄膜，至少部分地围绕气体出口或气体出口附近的气体导管。压力传感器包括布置在气体导管周围的薄膜盘。压力传感器基本上设置在公共表面上，并且与气体导管隔离，但包括用于包围气体导管的多个适当的压力元件。版权所有（C）2010，JPO＆INPIT

3. 发明专利

NL1035943A1 Lithographic Apparatus and Device Manufacturing Method. 未知
公开(公告)号：NL1035943A1
公开(公告)日：2009-03-18
申请号：NL1035943
申请日：2008-09-16
申请人： ASML NETHERLANDS BV
发明人： VAN DE VIJVER YURI JOHANNES GABRIEL , EMPEL TJARKO ADRIAAN RUDOLF VAN , SCHOOT JAN BERNARD PLECHELMUS , SWINKELS GERARDUS HUBERTUS PETRUS MARIA , SCHIMMEL HENDRIKUS GIJSBERTUS , LABETSKI DZMITRY
IPC分类号： G03F7/20 , G21K1/00 , H01L21/027

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