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1. 发明申请

WO2008072959A2 RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：辐射系统和光刻设备
公开(公告)号：WO2008072959A2
公开(公告)日：2008-06-19
申请号：PCT/NL2007050598
申请日：2007-11-27
申请人： ASML NETHERLANDS BV , WASSINK ARNOUD CORNELIS , BANINE VADIM YEVGENYEVICH , IVANOV VLADIMIR VITALEVITCH , KOSHELEV KONSTANTIN NIKOLAEVIT , CADEE THEODORUS PETRUS MARIA , KRIVTSUN VLADIMIR MIHAILOVITCH , KLUNDER DERK JAN WILFRED , VAN HERPEN MAARTEN MARINUS JOH , BROM PAUL PETER ANNA ANTONIUS , SOER WOUTER ANTHON , GLUSHKOV DENIS
发明人： WASSINK ARNOUD CORNELIS , BANINE VADIM YEVGENYEVICH , IVANOV VLADIMIR VITALEVITCH , KOSHELEV KONSTANTIN NIKOLAEVIT , CADEE THEODORUS PETRUS MARIA , KRIVTSUN VLADIMIR MIHAILOVITCH , KLUNDER DERK JAN WILFRED , VAN HERPEN MAARTEN MARINUS JOH , BROM PAUL PETER ANNA ANTONIUS , SOER WOUTER ANTHON , GLUSHKOV DENIS
IPC分类号： G03F7/20 , G21K1/00 , H05G2/00
CPC分类号： G03F7/70933 , G03F7/70858 , G03F7/70883 , G03F7/70916 , G03F7/70925 , G03F7/70983 , H05G2/003 , H05G2/005
摘要： A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.
摘要翻译：提供了一种用于产生限定光轴的辐射束的辐射系统。辐射系统包括用于产生EUV辐射的等离子体产生的放电源。放电源包括一对构造和布置成具有电压差的电极，以及用于在一对电极之间产生等离子体的系统，以便在电极之间的等离子体中提供放电。辐射系统还包括用于从电极捕获碎屑的碎片捕获屏蔽。碎片捕捉屏蔽被构造和布置成屏蔽电极与相对于光轴以预定球面角度提供的视线，并为视线中的电极之间的中心区域提供孔。

2. 发明申请

WO2008072966A3 PLASMA RADIATION SOURCE WITH AXIAL MAGNETIC FIELD 审中-公开
标题翻译：具有轴向磁场的等离子体辐射源
公开(公告)号：WO2008072966A3
公开(公告)日：2008-10-02
申请号：PCT/NL2007050652
申请日：2007-12-14
申请人： ASML NETHERLANDS BV , IVANOV VLADIMIR VITALEVITCH , BANINE VADIM YEVGENYEVICH , KOSHELEV KONSTANTIN NIKOLAEVIT
发明人： IVANOV VLADIMIR VITALEVITCH , BANINE VADIM YEVGENYEVICH , KOSHELEV KONSTANTIN NIKOLAEVIT
IPC分类号： H05G2/00 , G03F7/20
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70916 , H05G2/005
摘要： A patterned beam of radiation is projected onto a substrate. A reflective optical element is used to help forming the radiation beam from radiation emitted from a plasma region of a plasma source. In the plasma source, a plasma current is generated in the plasma region. To reduce damage to the reflective optical element, a magnetic field is applied in the plasma region with at least a component directed along a direction of the plasma current. This axial magnetic field helps limiting the collapse of the Z-pinch region of the plasma. By limiting the collapse, the number of fast ions emitted may be reduced.
摘要翻译：将图案化的辐射束投影到基底上。反射光学元件用于帮助从等离子体源的等离子体区域发射的辐射形成辐射束。在等离子体源中，在等离子体区域中产生等离子体电流。为了减少对反射光学元件的损伤，在等离子体区域中施加至少一个沿着等离子体电流的方向指向的分量的磁场。该轴向磁场有助于限制等离子体的Z夹点区域的崩溃。通过限制塌陷，可以减少发射的快速离子的数量。

3. 发明申请

WO2008075952A2 REDUCING FAST IONS IN A PLASMA RADIATION SOURCE 审中-公开
标题翻译：减少等离子体辐射源中的快速离子
公开(公告)号：WO2008075952A2
公开(公告)日：2008-06-26
申请号：PCT/NL2007050670
申请日：2007-12-19
申请人： ASML NETHERLANDS BV , IVANOV VLADIMIR VITALEVITCH , BANINE VADIM YEVGENYEVICH , KOSHELEV KONSTANTIN NIKOLAEVIT
发明人： IVANOV VLADIMIR VITALEVITCH , BANINE VADIM YEVGENYEVICH , KOSHELEV KONSTANTIN NIKOLAEVIT
IPC分类号： H05G2/00 , G03F7/20
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70916
摘要： Reducing Fast Ions in a Plasma Radiation Source A radiation source with an anode and a cathode to create a discharge in a discharge space between the anode and the cathode is disclosed. A plasma is formed in the radiation source which generates electromagnetic radiation, such as EUV radiation. The radiation source includes a first activation source to direct a first energy pulse onto a first spot in the radiation source near the discharge space to create a main plasma channel which triggers the discharge. The radiation source also has a second activation source to direct a second energy pulse onto a second spot in the radiation source near the discharge space to create an additional plasma channel. By directing the second energy pulse during the same discharge, a shortcutting of the main plasma current is realized which in turn may reduce the amount of fast ions produced.
摘要翻译：降低等离子体辐射源中的快速离子体公开了一种具有阳极和阴极以在阳极和阴极之间的放电空间中产生放电的辐射源。在辐射源中形成等离子体，其产生诸如EUV辐射的电磁辐射。辐射源包括第一激活源，用于将第一能量脉冲引导到放电空间附近的辐射源中的第一点上，以产生触发放电的主等离子体通道。辐射源还具有第二激活源，以将第二能量脉冲引导到放电空间附近的辐射源中的第二点上，以产生附加的等离子体通道。通过在相同的放电期间引导第二能量脉冲，实现了主等离子体电流的快捷方式，这又可以减少产生的快速离子的量。

4. 发明专利

JP2007019031A Radiation source, lithographic apparatus, and device manufacturing method 审中-公开
标题翻译：辐射源，光刻设备和器件制造方法
公开(公告)号：JP2007019031A
公开(公告)日：2007-01-25
申请号：JP2006211722
申请日：2006-08-03
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： ZUKAVISHVILI GIVI GEORGIEVITCH , IVANOV VLADIMIR VITAL EVITCH , KOSHELEV KONSTANTIN NIKOLAEVIT , KOROB EVGENII DMITREEVITCH , BANINE VADIM YEVGENYEVICH , PAVEL STANISLAVOVICH ANTSIFERO
IPC分类号： G21K5/00 , H05G2/00 , F28D15/02 , G03F7/20 , G21K1/00 , G21K5/02 , G21K5/08 , H01L21/027 , H05G1/02 , H05H1/24
CPC分类号： H05G2/003 , B82Y10/00 , F28D15/0266 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005
摘要： PROBLEM TO BE SOLVED: To improve efficiency of conversion of electrical energy to radiation.
SOLUTION: To improve conversion efficiency of a radiation source including an anode and a cathode, the anode and the cathode being configured and arranged to create a discharge in a substance in a space between the anode and cathode and to form plasma so as to generate electromagnetic radiation, the radiation source unit is constructed to have a low inductance and to operate with a minimum of plasma. To improve heat dissipation, a fluid circulation system is created within the radiation source space and a wick by using a fluid in both its vapor and liquid phases. To prevent contamination from entering a lithographic projection apparatus, the radiation source unit is constructed to minimize the production of contamination, and a trap is employed to capture the contamination without interfering with the emitted radiation.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提高电能转换到辐射的效率。解决方案：为了提高包括阳极和阴极的辐射源的转换效率，阳极和阴极被配置和布置成在阳极和阴极之间的空间中的物质中产生放电并形成等离子体，以便为了产生电磁辐射，辐射源单元被构造为具有低电感并且以最小的等离子体进行操作。为了改善散热，在辐射源空间和油雾中通过在气相和液相中使用流体产生流体循环系统。为了防止污染进入光刻投影装置，辐射源单元被构造成使污染物的产生最小化，并且使用捕集阱来捕获污染物而不干扰所发射的辐射。版权所有（C）2007，JPO＆INPIT

5. 发明专利

JP2005183950A Lithographic apparatus, illumination system, and method for providing projection beam of euv radiation 有权
标题翻译：光刻设备，照明系统和提供EUV辐射投影光束的方法
公开(公告)号：JP2005183950A
公开(公告)日：2005-07-07
申请号：JP2004350743
申请日：2004-12-03
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： IVANOV VLADIMIR VITALEVICH , BANINE VADIM YEVGENYEVICH , KOSHELEV KONSTANTIN NIKOLAEVIT
IPC分类号： G21K5/02 , G03F7/20 , H01L21/027 , H05G2/00
CPC分类号： G03F7/70858 , G03F7/70916
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus that is not influenced by problems caused by particles that are produced by the by-product of EUV radiation production.
SOLUTION: The lithographic apparatus has an illumination system supplying a beam of radiation and a supporting structure supporting a patterning structure arranged. The patterning structure is formed to impart patterns to the cross section of the radiation beam. Moreover, the apparatus has a substrate support supporting a substrate and a projection system for projecting the patterned beam onto the target portion of the substrate. The illumination system has a radiation producing system of producing extreme ultraviolet radiation and a radiation collecting system of collecting extreme ultraviolet radiation arranged. The particles produced as the by-product of extreme ultraviolet radiation production move substantially in a particle movement direction. The radiation collecting system is regulated in such a manner as to collect the extreme ultraviolet radiation that radiates in the collecting direction that is largely different from the particle movement direction.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供不受由由EUV辐射生产的副产物产生的颗粒引起的问题的光刻设备。解决方案：光刻设备具有提供辐射束的照明系统和支撑布置图案化结构的支撑结构。形成图形结构以赋予辐射束横截面图案。此外，该装置具有支撑基板的基板支撑件和用于将图案化的光束投影到基板的目标部分上的投影系统。照明系统具有产生极紫外辐射的辐射产生系统和收集极紫外辐射的辐射收集系统。作为极紫外线辐射产生的副产物产生的颗粒基本上在颗粒移动方向上移动。辐射收集系统被调节成收集与颗粒移动方向大不相同的收集方向辐射的极紫外线辐射。版权所有（C）2005，JPO＆NCIPI

6. 发明专利

JP2009141378A Lithographic apparatus, illumination system and method for providing projection beam of euv radiation 有权
标题翻译：提供EUV辐射投影光束的照相装置，照明系统和方法
公开(公告)号：JP2009141378A
公开(公告)日：2009-06-25
申请号：JP2009007569
申请日：2009-01-16
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： IVANOV VLADIMIR VITALEVICH , BANINE VADIM YEVGENYEVICH , KOSHELEV KONSTANTIN NIKOLAEVIT
IPC分类号： G21K5/02 , H01L21/027 , G03F7/20 , H05G2/00
CPC分类号： G03F7/70858 , G03F7/70916
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus which is not influenced by a problem caused by particles produced as a by-product of the EUV radiation production.
SOLUTION: The lithographic apparatus includes an illumination system that provides a beam of radiation and a support structure that supports a patterning structure. The patterning structure is configured to impart a pattern to the beam of radiation in its cross-section. The apparatus also includes a substrate support that supports a substrate and a projection system that projects the patterned beam onto a target portion of the substrate. The illumination system includes a radiation-production system that produces extreme ultra-violet radiation and a radiation-collection system that collects extreme ultra-violet radiation. Particles that are produced as a by-product of extreme ultra-violet radiation production move substantially in a particle-movement direction. The radiation-collection system is adjusted to collect extreme ultra-violet radiation which radiates in a collection-direction, which is substantially different from the particle-movement direction.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供不受由作为EUV辐射生产的副产物产生的颗粒引起的问题的光刻设备。光刻设备包括提供辐射束的照明系统和支撑图形结构的支撑结构。图案形成结构被配置为在其横截面中赋予辐射束的图案。该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。照明系统包括产生极紫外辐射的辐射生产系统和收集极紫外辐射的辐射收集系统。作为极紫外线辐射产物的副产物产生的颗粒基本上沿颗粒移动方向移动。调整辐射收集系统以收集在与颗粒移动方向基本不同的收集方向上辐射的极紫外辐射。版权所有（C）2009，JPO＆INPIT

7. 发明专利

JP2007305992A Method of activating radiation source, lithographic apparatus, and device manufacturing method 有权
标题翻译：激发辐射源的方法，光刻设备和器件制造方法
公开(公告)号：JP2007305992A
公开(公告)日：2007-11-22
申请号：JP2007120962
申请日：2007-05-01
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KOSHELEV KONSTANTIN NIKOLAEVIT , BANINE VADIM YEVGENYEVICH , IVANOV VLADIMIR VITAL EVITCH , KIEFT ERIK RENE , LOOPSTRA ERIK ROELOF , STEVENS LUCAS HENRICUS JOHANNE , SIDELKOV YURII VICTOROVITCH , KOLOSHNIKOV VSEVOLOD GRIGOREVI , KRIVTSUN VLADIMIR MIHAILOVITCH , GAYAZOV ROBERT RAFILEVITCH , FRIJNS OLAV WALDEMAR VLADIMIR
IPC分类号： G21K5/00 , H01L21/027 , F28D15/02 , G03F7/20 , G21K5/02 , G21K5/08 , H05G2/00 , H05H1/24
CPC分类号： H05G2/003 , B82Y10/00 , F28D15/0266 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005
摘要： PROBLEM TO BE SOLVED: To provide a radiation source that actualizes an output level and a repetition rate suitable for manufacturing. SOLUTION: A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or a vapor in a space between the anode and cathode for forming a plasma so as to generate electromagnetic radiation. The gas or vapor may contain xenon, indium, lithium and/or tin. To improve heat dissipation, the radiation source comprises multiple plasma discharge elements, each of which is used only for short intervals. After one discharge element is used, another discharge element is selected. To improve an exact timing of pinch formation and thus that of pulse of EUV radiation, the radiation source comprises a triggering device. To improve conversion efficiency, the radiation source is configured to have a low inductance, and operates in a self-triggering mode. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供实现适合于制造的输出电平和重复率的辐射源。解决方案：辐射源包括阳极和阴极，其构造和布置成在阳极和阴极之间的空间中的气体或蒸汽中产生放电，以形成等离子体，以便产生电磁辐射。气体或蒸汽可以含有氙，铟，锂和/或锡。为了改善散热，辐射源包括多个等离子体放电元件，每个等离子体放电元件仅用于短时间间隔。在使用一个放电元件之后，选择另一个放电元件。为了提高夹紧形成的准确时间，并且因此提高EUV辐射脉冲的准确时间，辐射源包括触发装置。为了提高转换效率，辐射源被配置为具有低电感，并以自触发模式工作。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2004165155A Radiation source, lithography apparatus, and device manufacturing method 有权
公开(公告)号：JP2004165155A
公开(公告)日：2004-06-10
申请号：JP2003363845
申请日：2003-09-17
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： KOSHELEV KONSTANTIN NIKOLAEVIT , BANINE VADIM YEVGENYEVICH , IVANOV VLADIMIR VITAL EVITCH , KIEFT ERIK RENE , LOOPSTRA ERIK ROELOF , STEVENS LUCAS HENRICUS JOHANNE , SIDELKOV YURII VICTOROVITCH , KOLOSHNIKOV VSEVOLOD GRIGOREVI , KRIVTSUN VLADIMIR MIHAILOVITCH , GAYAZOV ROBERT RAFILEVITCH , FRIJNS OLAV WALDEMAR VLADIMIR
IPC分类号： G21K5/00 , F28D15/02 , G03F7/20 , G21K5/02 , G21K5/08 , H01L21/027 , H05G2/00 , H05H1/24
CPC分类号： H05G2/003 , B82Y10/00 , F28D15/0266 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005
摘要： PROBLEM TO BE SOLVED: To provide a radiation source in which an output level and a repeating speed that are suitable for production are realized.
SOLUTION: The radiation source comprises an anode 220 and a cathode 210 that are configured and arranged to create a discharge in a gas or vapor in a space between the anode 220 and cathode 210 to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium, and tin. In order to improve heat dissipation, the radiation source LA comprises a plurality of plasma discharge elements 240, each of which is only used for short intervals, after which another discharge element is selected.
COPYRIGHT: (C)2004,JPO

9. 发明专利

JP2006352081A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：JP2006352081A
公开(公告)日：2006-12-28
申请号：JP2006093871
申请日：2006-03-30
申请人： ASML NETHERLANDS BV
发明人： BAKKER LEVINUS P , BANINE VADIM YEVGENYEVICH , IVANOV VLADIMIR VITALEVITCH , KOSHELEV KONSTANTIN NIKOLAEVIT , MERTENS BASTIAAN MATTHIAS , MOORS JOHANNES HUBERTUS JOSEPH , SCHUURMANS FRANK JEROEN PIETER , ZUKAVISHVILI GIVI GEORGIEVITCH , WOLSCHRIJN BASTIAAN THEODOOR , VAN DER VELDEN MARC H L
IPC分类号： H01L21/027 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus for reducing sputtering caused by gas introduced to a projection beam optical path, and a method for manufacturing the apparatus. SOLUTION: The lithographic apparatus is arranged to project a beam from a radiation source to a substrate. The lithographic apparatus includes an optical element in an optical path of the beam, a gas inlet for introducing gas into the optical path of the beam so that the gas is ionized by the beam to a create electric field toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy that is greater than kinetic energy developed by ions of the gas in the electric fields for sputtering the optical element. COPYRIGHT: (C)2007,JPO&INPIT

10. 发明专利

JP2004165160A Radiation source, lithography arrangement, and device manufacturing method 有权
标题翻译：辐射源，光栅装置和器件制造方法
公开(公告)号：JP2004165160A
公开(公告)日：2004-06-10
申请号：JP2003376283
申请日：2003-09-30
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： ZUKAVISHVILI GIVI GEORGIEVITCH , IVANOV VLADIMIR VITAL EVITCH , KOSHELEV KONSTANTIN NIKOLAEVIT , KOROB EVGENII DMITREEVITCH , BANINE VADIM YEVGENYEVICH , PAVEL STANISLAVOVICH ANTSIFERO
IPC分类号： G21K5/00 , F28D15/02 , G03F7/20 , G21K5/02 , G21K5/08 , H01L21/027 , H05G2/00 , H05H1/24
CPC分类号： H05G2/003 , B82Y10/00 , F28D15/0266 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005
摘要： PROBLEM TO BE SOLVED: To provide a radiation source that improves the conversion efficiency of electric energy into radiation.
SOLUTION: A radiation source unit comprises an anode and a cathode that are configured and arranged to create discharge in a substance in a space between the anode and the cathode to form plasma so as to generate electromagnetic radiation. The liquid may comprises xenon, indium, lithium, tin, or an arbitrary suitable material. In order to improve the conversion efficiency, the radiation source unit is constructed to have low inductance and operated with the minimum of plasma. In order to improve heat dissipation, a liquid circulation system is created in the radiation source space and a wick by using a fluid in both vapor and liquid phases. In order to prevent contamination from entering a lithographic projection apparatus, the radiation source unit is constructed to minimize the generation of contamination, and a trap is employed to capture the contamination without interfering with the emitted radiation.
COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供一种提高电能转换成辐射的转换效率的辐射源。解决方案：辐射源单元包括阳极和阴极，其构造和布置成在阳极和阴极之间的空间中的物质中产生放电，以形成等离子体，从而产生电磁辐射。液体可以包括氙，铟，锂，锡或任意合适的材料。为了提高转换效率，辐射源单元被构造为具有低电感并且以最小的等离子体运行。为了改善散热，通过在气相和液相中使用流体，在辐射源空间和芯中产生液体循环系统。为了防止污染进入光刻投影设备，辐射源单元被构造成使污染物的产生最小化，并且采用陷阱来捕获污染物而不干扰所发射的辐射。版权所有（C）2004，JPO

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