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1. 发明专利

JP2010245535A Wavelength tunable lighting system 有权
标题翻译：波长照明系统
公开(公告)号：JP2010245535A
公开(公告)日：2010-10-28
申请号：JP2010085601
申请日：2010-04-02
申请人： Asml Holding Nv , Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ. , エーエスエムエルホールディングエヌ.ブイ.
发明人： DEN BOEF ARIE JEFFREY , SEWELL HARRY , ANDRESEN KIETH WILLIAM , EBERT JR EARL WILLIAM , SANJEEV KUMAR SINGH
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70141 , G01B11/14 , G02F1/116 , G03F7/70191 , G03F9/7065
摘要： PROBLEM TO BE SOLVED: To provide an alignment system for a lithographic apparatus.
SOLUTION: A lithographic apparatus includes an alignment system containing a radiation source constituted so that narrow band radiation may be converted into continuous flat wide band radiation. An acoustic wavelength-variable narrow band-pass filter filters the wide band radiation so as to provide narrow band linearly polarized light radiation. The narrow band radiation can be focused on an alignment target of a wafer so that an alignment of the wafer can be performed. In one embodiment, the filter is constituted so as to modulate an intensity and wavelength of radiation generated by the radiation source and also to have a plurality of simultaneous pass bands. The radiation source generates radiation having high spatial coherence and low temporal coherence.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供用于光刻设备的对准系统。解决方案：光刻设备包括对准系统，其包含辐射源，该辐射源构成使得窄带辐射可以转换成连续的平坦宽带辐射。声波长可变窄带通滤波器对宽带辐射进行滤波，以便提供窄带线偏振光辐射。窄带辐射可以聚焦在晶片的对准目标上，从而可以执行晶片的对准。在一个实施例中，滤波器被构造成调制由辐射源产生的辐射的强度和波长，并且还具有多个同时的通带。辐射源产生具有高空间相干性和低时间相干性的辐射。版权所有（C）2011，JPO＆INPIT

2. 发明申请

WO2014056708A3 MARK POSITION MEASURING APPARATUS AND METHOD, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：标记位置测量设备和方法，光刻设备和设备制造方法
公开(公告)号：WO2014056708A3
公开(公告)日：2014-06-26
申请号：PCT/EP2013069664
申请日：2013-09-23
申请人： ASML NETHERLANDS BV , ASML HOLDING NV
发明人： MATHIJSSEN SIMON GIJSBERT JOSEPHUS , DEN BOEF ARIE JEFFREY , DRAZKIEWICZ STANLEY , KREUZER JUSTIN , NIJMEIJER GERRIT JOHANNES
IPC分类号： G03F9/00
CPC分类号： G03F7/70141 , G01B11/14 , G03F9/7069 , G03F9/7088
摘要： An apparatus to measure the position of a mark, the apparatus including an illumination arrangement to direct radiation across a pupil of the apparatus, the illumination arrangement comprising an illumination source to provide multiple-wavelength radiation of substantially equal polarization and a wave plate to alter the polarization of the radiation in dependency of the wavelength, such that radiation of different polarization is supplied; an objective lens to direct radiation on the mark using the radiation supplied by the illumination arrangement while scanning the radiation across the mark in a scanning direction; a radiation processing element to process radiation that is diffracted by the mark and received by the objective lens; and a detection arrangement to detect variation in an intensity of radiation output by the radiation processing element during the scanning and to calculate from the detected variation a position of the mark in at least a first direction of measurement.
摘要翻译：一种测量标记位置的设备，所述设备包括照射装置以将辐射引导通过装置的瞳孔，所述照射装置包括照射源以提供基本上相同的偏振的多波长辐射和波片以改变辐射的偏振取决于波长，从而提供不同偏振的辐射; 物镜，用于使用由照明装置提供的辐射将辐射引导到标记上，同时沿扫描方向在标记上扫描辐射; 辐射处理元件，用于处理由标记衍射并被物镜接收的辐射; 以及检测装置，用于检测在扫描期间由放射线处理元件输出的放射线的强度的变化，并根据检测到的变化来计算标记在至少第一测量方向上的位置。

3. 发明公开

KR20180021218A 회절 기반 오버레이 메트롤로지 툴 및 방법 审中-公开
标题翻译：基于衍射的覆盖度量工具和方法
公开(公告)号：KR20180021218A
公开(公告)日：2018-02-28
申请号：KR20187004581
申请日：2008-12-09
申请人： ASML NETHERLANDS BV
发明人： DEN BOEF ARIE JEFFREY
IPC分类号： G03F7/20 , G01N21/956 , H01L21/027
CPC分类号： G01N21/95607 , G03F7/7015 , G03F7/70633
摘要： 기판(100) 상의제 1 격자(110)와제 2 격자(120) 간의오버레이오차를결정하는방법이제공되며, 상기제 2 격자(120)는상기제 1 격자(110)의최상부상에있고, 상기제 2 격자(120)는상기제 1 격자(110)와실질적으로동일한피치(P1)를가지고, 상기제 2 격자및 상기제 1 격자는복합격자(110, 120)를형성하며, 상기방법은, 상기복합격자(110, 120)를상기기판의표면을따르는제 1 수평방향(D1)을따라소정의입사각(β)으로조명하는제 1 조명빔(IB)을제공하는단계; 상기복합격자(110, 120)로부터 1차회절빔(B+)의제 1 세기(i+)를측정하는단계; 상기복합격자(110, 120)를상기기판의표면을따르는제 2 수평방향(D2)을따라소정의입사각(-β)으로조명하는제 2 조명빔을제공하는단계 - 제 2 수평방향(D2)은제 1 수평방향(D1)과대향됨 -; 및상기복합격자(110, 120)로부터 -1차회절빔(B-)의제 2 세기(i-)를측정하는단계를포함한다.
摘要翻译：提供了系统，方法和设备，用于利用在衬底上的图案顶部上的抗蚀剂层中限定的掩模图案来确定衬底上的图案的覆盖。第一光栅设置在第二光栅下方，每个光栅具有与另一光栅基本相同的间距，一起形成复合光栅。第一照明光束在沿第一水平方向的入射角下被提供。测量来自复合光栅的衍射光束的强度。在沿着第二水平方向的入射角下提供第二照明光束。第二水平方向与第一水平方向相反。测量来自复合光栅的衍射光束的强度。线性缩放来自第一照明光束的衍射光束和来自第二照明光束的衍射光束之间的差异导致重叠误差。

4. 发明公开

KR20200126021A 회절 기반 오버레이 메트롤로지 툴 및 방법 审中-公开
公开(公告)号：KR20200126021A
公开(公告)日：2020-11-05
申请号：KR20207031099
申请日：2008-12-09
申请人： ASML NETHERLANDS BV
发明人： DEN BOEF ARIE JEFFREY
IPC分类号： G03F7/20 , G01N21/956 , H01L21/027
摘要： 기판(100) 상의제 1 격자(110)와제 2 격자(120) 간의오버레이오차를결정하는방법이제공되며, 상기제 2 격자(120)는상기제 1 격자(110)의최상부상에있고, 상기제 2 격자(120)는상기제 1 격자(110)와실질적으로동일한피치(P1)를가지고, 상기제 2 격자및 상기제 1 격자는복합격자(110, 120)를형성하며, 상기방법은, 상기복합격자(110, 120)를상기기판의표면을따르는제 1 수평방향(D1)을따라소정의입사각(β)으로조명하는제 1 조명빔(IB)을제공하는단계; 상기복합격자(110, 120)로부터고차회절빔의제 1 세기(i+)를측정하는단계; 상기복합격자(110, 120)를상기기판의표면을따르는제 2 수평방향(D2)을따라소정의입사각(-β)으로조명하는제 2 조명빔을제공하는단계 - 제 2 수평방향(D2)은제 1 수평방향(D1)과대향됨 -; 및상기복합격자(110, 120)로부터고차회절빔의제 2 세기(i-)를측정하는단계를포함한다.

5. 发明公开

KR20180043354A 리소그래피 장치 정렬 센서 및 방법 审中-公开
公开(公告)号：KR20180043354A
公开(公告)日：2018-04-27
申请号：KR20187008534
申请日：2016-08-22
申请人： ASML NETHERLANDS BV
发明人： MATHIJSSEN SIMON GIJSBERT JOSEPHUS , DEN BOEF ARIE JEFFREY , PANDEY NITESH , TINNEMANS PATRICIUS ALOYSIUS JACOBUS , WITTE STEFAN MICHIEL , EIKEMA KJELD SIJBRAND EDUARD
IPC分类号： G03F9/00
CPC分类号： G03F9/7088 , G03F9/7046 , G03F9/7092
摘要： 리소그래피장치는기판을홀딩하도록구성되는기판테이블; 및기판테이블에의해홀딩되는기판상에제공된정렬마크의위치를감지하도록구성되는센서를포함한다. 센서는정렬마크를방사선빔으로조명하도록구성되는방사선소스, 정렬마크와상호작용한바 있는방사선빔을아웃포커스광학패턴으로서검출하도록구성되는검출기, 및데이터처리시스템을포함한다. 데이터처리시스템은, 아웃포커스광학패턴을나타내는이미지데이터를수신하고, 무렌즈이미징알고리즘을아웃포커스광학패턴에적용하는것을포함하여, 정렬정보를결정하기위하여이미지데이터를처리하도록구성된다.

6. 发明公开

KR20180017188A 레시피간 일치도에 기초한 레시피 선택 审中-公开
标题翻译：基于配方之间匹配的配方选择
公开(公告)号：KR20180017188A
公开(公告)日：2018-02-20
申请号：KR20187001374
申请日：2016-06-10
申请人： ASML NETHERLANDS BV
发明人： DEN BOEF ARIE JEFFREY , DAVIS TIMOTHY DUGAN , ENGBLOM PETER DAVID , BHATTACHARYYA KAUSTUVE
IPC分类号： G03F7/20 , G01B11/27 , G03F9/00
CPC分类号： G03F9/7069 , G01B11/272 , G03F7/70633
摘要： 복수개의기판측정레시피중 하나의기판측정레시피와상기복수개의기판측정레시피중 나머지기판측정레시피들각각사이의레시피일치도를결정하는단계; 상기레시피일치도의함수를계산하는단계; 상기함수가기준을만족시키면상기복수개의기판측정레시피중에서상기하나의기판측정레시피를제거하는단계; 및종결조건이만족될때까지상기결정하는단계, 계산하는단계및 제거하는단계를반복하는단계를포함하는, 방법이개시된다. 또한, 복수개의기판측정레시피를저장하도록구성되는저장소, 및복수개의기판측정레시피사이의레시피일치도에기초하여복수개의기판측정레시피중에서하나이상의기판측정레시피를선택하도록구성되는프로세서를포함하는, 기판측정장치가개시된다.
摘要翻译：确定多个基板测量配方的基板测量配方与多个基板测量配方中的每个剩余基板测量配方之间的配方匹配程度; 计算食谱匹配度的函数; 如果功能满足标准，则从多个基板测量配方中移除一个基板测量配方; 并重复确定，计算和删除，直到满足终止条件。以及处理器，其被配置为基于所述多个基板测量配方之间的配方一致性来从多个基板测量配方中选择一个或多个基板测量配方，其中所述处理器被配置为存储多个基板测量配方，该装置启动。

7. 发明专利

JP2012191177A Measuring method, measuring apparatus, lithographic apparatus and device manufacturing method 有权
标题翻译：测量方法，测量装置，平面设备和装置制造方法
公开(公告)号：JP2012191177A
公开(公告)日：2012-10-04
申请号：JP2012027626
申请日：2012-02-10
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： DEN BOEF ARIE JEFFREY , BEEMS MARCEL HENDRIKUS MARIA , CADEE THEODORUS PETRUS MARIA , LAFARRE RAYMOND WILHELMUS LOUIS
IPC分类号： H01L21/027 , G03F9/00
CPC分类号： G01B11/14 , G01B11/00 , G02B21/0048 , G02B26/105 , G03F7/70625 , G03F9/7088
摘要： PROBLEM TO BE SOLVED: To enable accurate measurement without degrading throughput of an alignment sensor.SOLUTION: A measurement optical system comprises an illumination subsystem for illuminating a mark 202 with a radiation spot and a detecting subsystem 580 for detecting radiation diffracted by the mark. A substrate and the measurement optical system move relatively to each other at a first velocity (v) so as to scan the mark while synchronously moving the radiation spot relatively to the reference frame of the measurement optical system at a second velocity (v). The spot scans the mark at a third velocity (v) which is lower than the first velocity to allow more time for accurate position measurements to be acquired. An objective lens 524 remains fixed in relation to the reference frame while a moving optical element 562 imparts the movement of the radiation spot relative to the reference frame.
摘要翻译：要解决的问题：使得能够精确测量而不降低对准传感器的生产量。解决方案：测量光学系统包括用于用辐射点照射标记202的照明子系统和用于检测由标记衍射的辐射的检测子系统580。基板和测量光学系统以第一速度（v W ）彼此相对移动，以便在相对于参考系的参考系同步移动辐射点的同时扫描标记测量光学系统处于第二速度（v SPOT ）。该点以比第一速度低的第三速度（v EFF ）扫描标记，以允许更多时间获取准确的位置测量。物镜524相对于参考框架保持固定，而移动的光学元件562相对于参考框架传递辐射点的移动。版权所有（C）2013，JPO＆INPIT

8. 发明专利

JP2012175103A Optical apparatus, method of scanning, lithographic apparatus and device manufacturing method 有权
标题翻译：光学设备，扫描方法，光刻设备和器件制造方法
公开(公告)号：JP2012175103A
公开(公告)日：2012-09-10
申请号：JP2012027606
申请日：2012-02-10
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： DEN BOEF ARIE JEFFREY
IPC分类号： H01L21/027 , G01B11/00
CPC分类号： G01B11/14 , G01B11/00 , G02B21/0048 , G02B26/105 , G03F7/70625 , G03F9/7088
摘要： PROBLEM TO BE SOLVED: To provide an optical scanning mechanism which avoids or reduces additional cost and bulk to a sensor and/or inaccuracies in measurement.SOLUTION: The optical apparatus measures a position of a mark 202 on a lithographic substrate W. A measurement optical system comprises an illumination subsystem for illuminating the mark with a spot of radiation and a detecting subsystem 580 for detecting radiation diffracted by the mark. A tilting mirror 562 moves the spot of radiation relative to the reference frame of the measurement optical system synchronously with a scanning motion of the mark itself, to allow more time for accurate position measurements to be acquired. The mirror tilt axis 568 is arranged along the intersection of the mirror plane with a pupil plane P of an objective lens 524 to minimize artifacts of the scanning. The same geometrical arrangement can be used for scanning in other types of apparatus, for example a confocal microscope.
摘要翻译：要解决的问题：提供一种光学扫描机构，其避免或减少传感器的额外成本和体积，和/或测量中的不准确性。解决方案：光学装置测量光刻基板W上的标记202的位置。测量光学系统包括用于用辐射点照射标记的照明子系统和用于检测由标记衍射的辐射的检测子系统580 。倾斜镜562与标记本身的扫描运动同步地相对于测量光学系统的参考系移动辐射点，以允许更多的时间获得精确的位置测量。镜面倾斜轴568沿着镜面与物镜524的光瞳平面P的相交被布置，以最小化扫描的伪影。可以使用相同的几何布置来在其他类型的装置中进行扫描，例如共聚焦显微镜。版权所有（C）2012，JPO＆INPIT

9. 发明专利

JP2012114485A Lithographic device and device manufacturing method 有权
公开(公告)号：JP2012114485A
公开(公告)日：2012-06-14
申请号：JP2012066781
申请日：2012-03-23
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JOERI LOF , BUTLER HANS , DONDERS SJOERD NICOLAAS LAMBERTUS , ALEXEI KOLESNE TCHENKO , LOOPSTRA ERIK ROELOF , MEIJER HENDRICUS JOHANNES MARIA , MULKENS JOHANNES CATHARINUS HUBERTUS , RITSEMA ROELOF AEILKO SIEBRAND , VAN SCHAIK FRANK , SENGERS TIMOTHEUS FRANCISCUS , KLAUS SIMON , DE SMIT JOANNES THEODOOR , ALEXANDER STOLE YALE , STREEFKERK BOB , ERIK THEODORUS MARIA BIJLAART , CHRISTIAAN ALEXANDER HOOGENDAM , HELMAR VAN SANTEN , VAN DE KERKHOF MARCUS ADRIANUS , KROON MARK , DEN BOEF ARIE JEFFREY , OTTENS JOOST JEROEN , JEROEN JOHANNES SOPHIA MARIA MERTENS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： PROBLEM TO BE SOLVED: To provide an immersion-type lithography projection device with improved functionality.SOLUTION: An immersion-type lithography projection device comprises: a radiation systems Ex, IL which are provided with a radiation source LA and supply projection beams PB of radiation; a first object table (mask table) MT connected to first positioning means for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to second positioning means for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of a radiated part of the mask MA on a target part C of a substrate W.

10. 发明专利

JP2012054601A Lithographic projection apparatus 审中-公开
标题翻译： LITHOGRAPHIC投影设备
公开(公告)号：JP2012054601A
公开(公告)日：2012-03-15
申请号：JP2011243513
申请日：2011-11-07
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JOERI LOF , BUTLER HANS , DONDERS SJOERD NICOLAAS LAMBERTUS , ALEXEI KOLESNE TCHENKO , LOOPSTRA ERIK ROELOF , MEIJER HENDRICUS JOHANNES MARIA , MULKENS JOHANNES CATHARINUS HUBERTUS , RITSEMA ROELOF AEILKO SIEBRAND , VAN SCHAIK FRANK , SENGERS TIMOTHEUS FRANCISCUS , KLAUS SIMON , DE SMIT JOANNES THEODOOR , ALEXANDER STOLE YALE , STREEFKERK BOB , ERIK THEODORUS MARIA BIJLAART , CHRISTIAAN ALEXANDER HOOGENDAM , HELMAR VAN SANTEN , VAN DE KERKHOF MARCUS ADRIANUS , KROON MARK , DEN BOEF ARIE JEFFREY , OTTENS JOOST JEROEN , JEROEN JOHANNES SOPHIA MARIA MERTENS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： PROBLEM TO BE SOLVED: To provide an immersion-type lithographic projection apparatus with improved functionality.SOLUTION: The immersion-type lithographic projection apparatus comprises: a radiation system Ex which is provided with a radiation source LA and supplies a radiation projection beam PB; an illumination system IL; a first object table (mask table) MT connected to first positioning means for accurately positioning a mask to a member PL; a second object table (substrate table) WT connected to second positioning means for accurately positioning the substrate to the member PL; and a projection system PL for imaging an irradiated part of a mask MA on a target part C of a substrate W. This apparatus also includes at least one sensor that is disposed so as to be illuminated with a radiation projection beam that has passed through an immersion liquid.
摘要翻译：要解决的问题：提供具有改进的功能的浸没式光刻投影设备。浸渍式光刻投影装置包括：放射线系统Ex，其设置有辐射源LA并提供辐射投射光束PB; 照明系统IL; 连接到第一定位装置的第一目标表（掩模台）MT，用于将掩模精确地定位到构件PL; 连接到第二定位装置的第二对象台（衬底台）WT，用于将衬底精确地定位到构件PL; 以及投影系统PL，用于对基板W的目标部分C上的掩模MA的照射部分进行成像。该装置还包括至少一个传感器，其布置成被辐射投影光束照射，浸液版权所有（C）2012，JPO＆INPIT

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