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1. 发明公开

KR20180019783A 검사 방법 및 장치, 검사 방법 및 장치에서 사용되는 기판, 및 디바이스 제조 방법 审中-公开
标题翻译：检查方法和装置基板及其使用方法和装置制造方法
公开(公告)号：KR20180019783A
公开(公告)日：2018-02-26
申请号：KR20187004695
申请日：2014-05-02
申请人： ASML NETHERLANDS BV
发明人： BOGAART ERIK , BIJNEN FRANCISCUS , DEN BOEF ARIE , MATHIJSSEN SIMON GIJSBERT JOSEPHUS
IPC分类号： G03F7/20 , G01N21/65 , G01N21/95 , G01N21/956 , H01L21/66
CPC分类号： G03F7/70483 , G01N21/9501 , G01N21/956 , G01N2021/656 , G03F7/70625
摘要： 기판에는디바이스구조물및 계측구조물(800)이제공된다. 디바이스구조물은하나이상의파장의여기방사선의비탄성산란을나타내는재료를포함한다. 디바이스구조물은하나이상의치수에서충분히작아서비탄성산란의특성이양자구속에의하여크게영향받게하는구조를포함한다. 계측구조물(800)은조성및 치수에있어서디바이스피쳐와유사한디바이스-유사구조물(800b), 및교정구조물(800a)을포함한다. 교정구조물은조성에있어서디바이스피쳐와유사하지만적어도하나의치수에있어서상이하다. 라만분광을구현하는검사장치및 방법을사용하면, 디바이스-유사구조물의치수는디바이스-유사구조물및 교정구조물로부터비탄성적으로산란된방사선의스펙트럼피쳐를비교함으로써측정될수 있다.
摘要翻译：衬底配备有器件结构和度量结构（800）。器件结构包括显示一个或多个波长的激发辐射的非弹性散射的材料。器件结构包括在一个或多个维度上足够小的结构，非弹性散射的特性受量子限制的显着影响。度量结构（800）包括类似于器件特征和校准结构（800a）的组成和尺寸的器件状结构（800b）。校准结构与组成装置中的装置特征类似，但在至少一个维度上不同。使用实施拉曼光谱学的检查设备和方法，可以通过比较来自类似装置的结构和校准结构的非弹性散射辐射的光谱特征来测量装置状结构的尺寸。

2. 发明公开

KR20180043354A 리소그래피 장치 정렬 센서 및 방법 审中-公开
公开(公告)号：KR20180043354A
公开(公告)日：2018-04-27
申请号：KR20187008534
申请日：2016-08-22
申请人： ASML NETHERLANDS BV
发明人： MATHIJSSEN SIMON GIJSBERT JOSEPHUS , DEN BOEF ARIE JEFFREY , PANDEY NITESH , TINNEMANS PATRICIUS ALOYSIUS JACOBUS , WITTE STEFAN MICHIEL , EIKEMA KJELD SIJBRAND EDUARD
IPC分类号： G03F9/00
CPC分类号： G03F9/7088 , G03F9/7046 , G03F9/7092
摘要： 리소그래피장치는기판을홀딩하도록구성되는기판테이블; 및기판테이블에의해홀딩되는기판상에제공된정렬마크의위치를감지하도록구성되는센서를포함한다. 센서는정렬마크를방사선빔으로조명하도록구성되는방사선소스, 정렬마크와상호작용한바 있는방사선빔을아웃포커스광학패턴으로서검출하도록구성되는검출기, 및데이터처리시스템을포함한다. 데이터처리시스템은, 아웃포커스광학패턴을나타내는이미지데이터를수신하고, 무렌즈이미징알고리즘을아웃포커스광학패턴에적용하는것을포함하여, 정렬정보를결정하기위하여이미지데이터를처리하도록구성된다.

3. 发明公开

KR20200127045A 구조체의 특성을 결정하는 방법 및 장치, 디바이스 제조 방법 审中-公开
公开(公告)号：KR20200127045A
公开(公告)日：2020-11-09
申请号：KR20207030858
申请日：2017-04-11
申请人： ASML NETHERLANDS BV
发明人： TINNEMANS PATRICIUS ALOYSIUS JACOBUS , MATHIJSSEN SIMON GIJSBERT JOSEPHUS , ROOBOL SANDER BAS , LIN NAN
IPC分类号： G01N21/95 , G01N21/47 , G01N21/88 , G01N21/956 , G03F7/20 , G03F9/00 , H01L21/66
摘要： 관심구조체(T)는예컨대 x-선또는 EUV 파장대역에서방사선으로조사되고, 산란된방사선은검출기(19, 274, 908, 1012)에의해검출된다. 프로세서(PU)는예컨대방사선과구조체간의상호작용을시뮬레이션하는단계(S16) 및상기검출된방사선과상기시뮬레이션된 상호작용을비교하는단계(S17)에의해라인폭(CD) 또는오버레이(OV)와같은특성을계산한다. 이방법은검사방사선에의해야기된상기구조체의변화들을고려하여수정된다(S14a, S15a, S19a). 이러한변화들은예컨대재료의수축또는광학특성들의변화일수 있다. 상기변화들은현재관측또는이전관측에서검사방사선에의해야기될수 있다.

4. 发明申请

WO2014019846A3 POSITION MEASURING APPARATUS, POSITION MEASURING METHOD, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：位置测量装置，位置测量方法，平面设备和装置制造方法
公开(公告)号：WO2014019846A3
公开(公告)日：2014-05-22
申请号：PCT/EP2013064982
申请日：2013-07-16
申请人： ASML NETHERLANDS BV
发明人： MATHIJSSEN SIMON GIJSBERT JOSEPHUS , DEN BOEF ARIE JEFFREY
IPC分类号： G03F9/00
CPC分类号： G03F7/70141 , G03F9/7026 , G03F9/7034
摘要： An apparatus for measuring positions of marks on a substrate, includes an illumination arrangement for supplying radiation with a predetermined illumination profile across a pupil of the apparatus, an objective lens for forming a spot of radiation on a mark using radiation supplied by said illumination arrangement, a radiation processing element for processing radiation that is diffracted by the mark, a first detection arrangement for detecting variations in an intensity of radiation output by the radiation processing element and for calculating therefrom a position of the mark, an optical arrangement, a second detection arrangement, wherein the optical arrangement serves to direct diffracted radiation to the second detection arrangement, and wherein the second detection arrangement is configured to detect size and/or position variations in the radiation and to calculate therefrom a defocus and/or local tilt of the mark.
摘要翻译：一种用于测量基板上的标记位置的装置，包括：用于向设备的光瞳提供具有预定照明轮廓的辐射的照明装置;用于使用由所述照明装置提供的辐射在标记上形成辐射点的物镜; 用于处理由标记衍射的辐射的辐射处理元件;第一检测装置，用于检测由辐射处理元件输出的辐射强度的变化，并用于计算标记的位置，光学装置，第二检测装置，其中所述光学装置用于将衍射辐射引导到所述第二检测装置，并且其中所述第二检测装置被配置为检测所述辐射中的尺寸和/或位置变化并由其计算所述标记的散焦和/或所述局部倾斜。

5. 发明申请

WO2014056708A3 MARK POSITION MEASURING APPARATUS AND METHOD, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：标记位置测量设备和方法，光刻设备和设备制造方法
公开(公告)号：WO2014056708A3
公开(公告)日：2014-06-26
申请号：PCT/EP2013069664
申请日：2013-09-23
申请人： ASML NETHERLANDS BV , ASML HOLDING NV
发明人： MATHIJSSEN SIMON GIJSBERT JOSEPHUS , DEN BOEF ARIE JEFFREY , DRAZKIEWICZ STANLEY , KREUZER JUSTIN , NIJMEIJER GERRIT JOHANNES
IPC分类号： G03F9/00
CPC分类号： G03F7/70141 , G01B11/14 , G03F9/7069 , G03F9/7088
摘要： An apparatus to measure the position of a mark, the apparatus including an illumination arrangement to direct radiation across a pupil of the apparatus, the illumination arrangement comprising an illumination source to provide multiple-wavelength radiation of substantially equal polarization and a wave plate to alter the polarization of the radiation in dependency of the wavelength, such that radiation of different polarization is supplied; an objective lens to direct radiation on the mark using the radiation supplied by the illumination arrangement while scanning the radiation across the mark in a scanning direction; a radiation processing element to process radiation that is diffracted by the mark and received by the objective lens; and a detection arrangement to detect variation in an intensity of radiation output by the radiation processing element during the scanning and to calculate from the detected variation a position of the mark in at least a first direction of measurement.
摘要翻译：一种测量标记位置的设备，所述设备包括照射装置以将辐射引导通过装置的瞳孔，所述照射装置包括照射源以提供基本上相同的偏振的多波长辐射和波片以改变辐射的偏振取决于波长，从而提供不同偏振的辐射; 物镜，用于使用由照明装置提供的辐射将辐射引导到标记上，同时沿扫描方向在标记上扫描辐射; 辐射处理元件，用于处理由标记衍射并被物镜接收的辐射; 以及检测装置，用于检测在扫描期间由放射线处理元件输出的放射线的强度的变化，并根据检测到的变化来计算标记在至少第一测量方向上的位置。

6. 发明申请

WO2014146906A3 METHOD AND APPARATUS FOR MEASURING ASYMMETRY OF A MICROSUTRUCTURE, POSITION MEASURING METHOD, POSITION MEASURING APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：用于测量微结构不对称的方法和装置，位置测量方法，位置测量装置，平面设备和装置制造方法
公开(公告)号：WO2014146906A3
公开(公告)日：2014-11-20
申请号：PCT/EP2014054345
申请日：2014-03-06
申请人： ASML NETHERLANDS BV
发明人： MATHIJSSEN SIMON GIJSBERT JOSEPHUS
IPC分类号： G03F9/00
CPC分类号： G03F7/70141 , G01B11/14 , G03F9/7046 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： A lithographic apparatus includes an alignment sensor including a self-referencing interferometer for reading the position of a mark comprising a periodic structure. An illumination optical system focuses radiation of different colors and polarizations into a spot (406) which scans said structure. Multiple position-dependent signals I A (G,R,N,F), I B (G,R,N,F) are detected (430A, 430B) in a detection optical system and processed (PU) to obtain multiple candidate position measurements. Each mark comprises sub-structures of a size smaller than a resolution of the optical system. Each mark is formed with a positional offset between the sub-structures and larger structures that is a combination of both known (d1, d2) and unknown (∆d) components. A measured position of at least one mark is calculated using signals from a pair of marks (702-1, 702-2), together with information on differences between the known offsets. in order to correct for said unknown component of said positional offset.
摘要翻译：光刻设备包括对准传感器，其包括用于读取包括周期性结构的标记的位置的自参考干涉仪。照明光学系统将不同颜色和偏振的辐射聚焦到扫描所述结构的光斑（406）中。在检测光学系统中检测多个位置相关信号I A（G，R，N，F），I B（G，R，N，F）（430A，430B）并处理（PU）以获得多个候选位置测量。每个标记包括尺寸小于光学系统的分辨率的子结构。每个标记形成在子结构和作为已知（d1，d2）和未知（Δd）分量的组合的较大结构之间的位置偏移。使用来自一对标记（702-1,702-2）的信号以及关于已知偏移之间的差异的信息来计算至少一个标记的测量位置。以便校正所述位置偏移的所述未知分量。

7. 发明申请

WO2014026819A3 METHOD AND APPARATUS FOR MEASURING ASYMMETRY OF A MICROSTRUCTURE, POSITION MEASURING METHOD, POSITION MEASURING APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：用于测量显微结构的不对称性的方法和设备，位置测量方法，位置测量设备，光刻设备和设备制造方法
公开(公告)号：WO2014026819A3
公开(公告)日：2014-04-10
申请号：PCT/EP2013065069
申请日：2013-07-17
申请人： ASML NETHERLANDS BV
发明人： MATHIJSSEN SIMON GIJSBERT JOSEPHUS , BOGAART ERIK WILLEM , TINNEMANS PATRICIUS ALOYSIUS JACOBUS , DEN BOEF ARIE JEFFREY
IPC分类号： G03F9/00 , G03F7/20
CPC分类号： G01B11/14 , G01B9/02 , G01B11/27 , G03F7/70058 , G03F7/70625 , G03F7/70633 , G03F9/7069 , G03F9/7088
摘要： A lithographic apparatus includes an alignment sensor including a self-referencing interferometer for reading the position of an alignment target comprising a periodic structure. An illumination optical system for focusing radiation into a spot on said structure. An asymmetry detection optical system receives a share of positive and negative orders of radiation diffracted by the periodic structure, and forms first and second images of said spot on first and second detectors respectively, wherein said negative order radiation is used to form the first image and said positive order radiation is used to form the second image. A processor for processing together signals from said first and second detectors representing intensities of said positive and negative orders to produce a measurement of asymmetry in the periodic structure. The asymmetry measurement can be used to improve accuracy of the position read by the alignment sensor.
摘要翻译：一种光刻设备包括对准传感器，该对准传感器包括用于读取包括周期性结构的对准目标的位置的自参考干涉仪。一种照明光学系统，用于将辐射聚焦到所述结构上的一个点上。不对称检测光学系统接收由周期性结构衍射的正辐射和负辐射阶数的份额，并分别在第一和第二检测器上形成所述光斑的第一和第二图像，其中所述负阶辐射用于形成第一图像，以及所述正序照射被用于形成第二图像。处理器，用于一起处理来自所述第一和第二检测器的代表所述正和负阶的强度的信号，以产生周期性结构中的不对称性的测量结果。不对称测量可用于提高对准传感器读取位置的准确度。

9. 发明专利

NL2013457A POLARIZATION INDEPENDENT INTERFEROMETER. 未知
公开(公告)号：NL2013457A
公开(公告)日：2015-04-13
申请号：NL2013457
申请日：2014-09-11
申请人： ASML NETHERLANDS BV , ASML HOLDING NV
发明人： TINNEMANS PATRICIUS ALOYSIUS JACOBUS , BOEF ARIE JEFFREY , KREUZER JUSTIN LOYD , MATHIJSSEN SIMON GIJSBERT JOSEPHUS
IPC分类号： G01B9/02 , G03F7/20
摘要： Apparatus, systems, and methods are used for detecting the alignment of a feature on a substrate using a polarization independent interferometer. The apparatus, system, and methods include optical elements that receive light that has diffracted or scattered from a mark on a substrate. The optical elements may split the diffracted light into multiple subbeams of light which are detected by one or more detectors. The diffracted light may be combined optically or during processing after detection. The system may determine alignment and/or overlay based on the received diffracted light having any polarization angle or state.

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