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1. 发明申请

WO2010123711A3 SUBSTRATE COOL DOWN CONTROL 审中-公开
标题翻译：基板冷却控制
公开(公告)号：WO2010123711A3
公开(公告)日：2011-01-20
申请号：PCT/US2010030741
申请日：2010-04-12
申请人： APPLIED MATERIALS INC , NEWMAN JACOB , KANAWADE DINESH , BARANDICA HENRY , MERRY NIR
发明人： NEWMAN JACOB , KANAWADE DINESH , BARANDICA HENRY , MERRY NIR
IPC分类号： H01L21/02
CPC分类号： G01K13/00 , G01J5/0003 , G01J5/0007 , G01J5/02 , G01J5/0255 , G01K11/18 , H01L21/67103 , H01L21/67248
摘要： Methods and apparatus for precise substrate cool down control are provided. Apparatus for measuring temperature of substrates may include a cool down plate to support a substrate; a sensor to provide data corresponding to a temperature of the substrate when disposed on the cool down plate; and a computer coupled to the sensor to determine the temperature of the substrate from the sensor data. A method for measuring the temperature of a substrate may include providing a substrate to be cooled to a chamber having a cool down plate disposed therein, a sensor to provide data corresponding to a temperature of the substrate, and a computer coupled to the sensor; sensing a first temperature of the substrate after a predetermined first time interval has elapsed; comparing the first temperature to a predetermined temperature; and determining whether the first temperature is greater than, equal to, or less than the predetermined temperature.
摘要翻译：提供了精确的基板冷却控制的方法和装置。用于测量衬底温度的装置可包括用于支撑衬底的冷却板; 传感器，当设置在所述冷却板上时，提供对应于所述基板的温度的数据; 以及耦合到所述传感器的计算机，以从所述传感器数据确定所述基板的温度。用于测量衬底的温度的方法可以包括将待冷却的衬底设置到设置有冷却板的腔室，传感器以提供对应于衬底的温度的数据和耦合到传感器的计算机; 在经过预定的第一时间间隔之后感测衬底的第一温度; 将第一温度与预定温度进行比较; 以及确定所述第一温度是否大于，等于或小于所述预定温度。

2. 发明申请

WO2010054206A3 IMPROVED PROCESS EQUIPMENT ARCHITECTURE 审中-公开
标题翻译：改进工艺设备建筑
公开(公告)号：WO2010054206A3
公开(公告)日：2010-07-22
申请号：PCT/US2009063568
申请日：2009-11-06
申请人： APPLIED MATERIALS INC , NEWMAN JACOB , KANAWADE DINESH , SCHWARTZ MIRIAM , MERRY NIR , HAAG MICHAEL THOMAS
发明人： NEWMAN JACOB , KANAWADE DINESH , SCHWARTZ MIRIAM , MERRY NIR , HAAG MICHAEL THOMAS
IPC分类号： H01L21/00 , H01L21/02
CPC分类号： H01L21/6719
摘要： Embodiments of the present invention relate to improvements to single-substrate, multi-chamber processing platform architecture for minimizing fabrication facility floor space requirements. Prior art systems require significant floor space around all sides to allow for adequate installation and servicing. Embodiments of the present invention provide platforms that allow for servicing the chambers and supporting systems via a front and rear of the platform allowing multiple, side-by-side platform placement within a fabrication facility, while providing improved serviceability of the platform components.
摘要翻译：本发明的实施例涉及对用于最小化制造设备占地面积要求的单基板多室处理平台架构的改进。现有技术的系统需要围绕所有侧面的显着的地板空间以允许适当的安装和维修。本发明的实施例提供了平台，其允许经由平台的前部和后部维护腔室和支撑系统，从而允许在制造设备内多个并排平台放置，同时提供平台组件的改进的可维护性。

3. 发明申请

WO2010022309A2 VERTICAL SUBSTRATE BUFFERING SYSTEM 审中-公开
标题翻译：垂直底板缓冲系统
公开(公告)号：WO2010022309A2
公开(公告)日：2010-02-25
申请号：PCT/US2009054577
申请日：2009-08-21
申请人： APPLIED MATERIALS INC , MERRY NIR , NEWMAN JACOB
发明人： MERRY NIR , NEWMAN JACOB
IPC分类号： H01L21/677 , H01L21/00
CPC分类号： H01L21/67769 , Y10S414/14
摘要： A substrate buffering system is provided herein. In some embodiments, a substrate buffering system may include a frame having a vertical shaft disposed therethrough; two storage platforms, one each disposed on either side of the frame, each to receive a substrate carrier thereon; and a transfer mechanism coupled to the vertical shaft and capable of vertical movement along the vertical shaft and lateral movement sufficient to move the transfer mechanism over either of the two storage platforms. The transfer mechanism may further include a telescoping fork arm capable of laterally extending in a first direction and in a second direction corresponding to lateral positions of the two storage platforms on either side of the frame. In some embodiments, the substrate may be a wafer. In some embodiments, the substrate may be a semiconductor wafer.
摘要翻译：本文提供了一种衬底缓冲系统。在一些实施例中，衬底缓冲系统可以包括具有穿过其的竖直轴的框架; 两个存储平台，一个设置在框架的任一侧上，每个用于在其上接收衬底载体; 以及耦合到垂直轴并且能够沿垂直轴垂直移动的传送机构和足以使传送机构移动到两个存储平台中的任何一个上的横向移动。传送机构还可以包括能够在第一方向和第二方向上横向延伸的伸缩叉臂，对应于框架两侧的两个存储平台的横向位置。在一些实施例中，衬底可以是晶片。在一些实施例中，衬底可以是半导体晶片。

4. 发明申请

WO2010120805A2 MODIFICATION OF MAGNETIC PROPERTIES OF FILMS USING ION AND NEUTRAL BEAM IMPLANTATION 审中-公开
标题翻译：使用离子和中性光束植入修改膜的磁性
公开(公告)号：WO2010120805A2
公开(公告)日：2010-10-21
申请号：PCT/US2010030924
申请日：2010-04-13
申请人： APPLIED MATERIALS INC , FOAD MAJEED A , MERRY NIR
发明人： MERRY NIR
IPC分类号： G11B5/84 , G11B5/73 , G11B5/82
CPC分类号： G11B5/865 , B82Y10/00 , C23C14/042 , C23C14/48 , C23C14/5826 , C23C14/5833 , C23C14/5853 , G11B5/743 , G11B5/746 , G11B5/855 , H01J2237/316 , H01J2237/3165 , H01J2237/31711
摘要： Methods and apparatus for forming substrates having magnetically patterned surfaces is provided. A magnetic layer comprising one or more materials having magnetic properties is formed on the substrate. The magnetic layer is subjected to a patterning process in which selected portions of the surface of the magnetic layer are altered such that the altered portions have different magnetic properties from the non-altered portions without changing the topography of the substrate. A protective layer and a lubricant layer are deposited over the patterned magnetic layer. The patterning is accomplished through a number of alternative processes that expose substrates to energy of varying forms.
摘要翻译：提供了用于形成具有磁性图案化表面的基底的方法和设备。在基板上形成包含一种或多种具有磁性的材料的磁性层。对磁性层进行图案化处理，其中磁性层的表面的选定部分被改变，使得改变的部分与未改变的部分具有不同的磁性，而不改变衬底的形貌。在图案化的磁性层上沉积保护层和润滑剂层。图案化是通过将衬底暴露于不同形式的能量的许多替代工艺完成的。

5. 发明申请

WO2008002780B1 BATCH PROCESSING PLATFORM FOR ALD AND CVD 审中-公开
标题翻译：用于ALD和CVD的批处理平台
公开(公告)号：WO2008002780B1
公开(公告)日：2008-05-08
申请号：PCT/US2007071368
申请日：2007-06-15
申请人： APPLIED MATERIALS INC , WEBB AARON , BRAILOVE ADAM , YUDOVSKY JOSEPH , MERRY NIR , CONSTANT ANDREW , QUILES EFRAIN , RICE MICHAEL R , ROSEN GARY J , SHAH VINAY
发明人： WEBB AARON , BRAILOVE ADAM , YUDOVSKY JOSEPH , MERRY NIR , CONSTANT ANDREW , QUILES EFRAIN , RICE MICHAEL R , ROSEN GARY J , SHAH VINAY
IPC分类号： H01L21/20 , C23C16/00
CPC分类号： C23C16/54 , C23C16/4583 , H01L21/67173 , H01L21/67742 , H01L21/67757 , H01L21/67769 , Y10S414/14
摘要： A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.
摘要翻译：用于ALD或CVD处理的批处理平台配置为高吞吐量和最小占地面积。在一个实施例中，处理平台包括大气转移区域，至少一个具有缓冲室和分段平台的分批处理室，以及设置在传送区域中的传送机器人，其中传送机器人具有至少一个基板传送臂，其包括多个基板处理刀片。平台可以包括两个批处理室，其配置有设置在其间的服务通道，以提供对传送机器人和沉积站的必要的服务访问。在另一个实施例中，处理平台包括至少一个批处理室，适于在FOUP和处理盒之间传送基板的基板传送机器人以及包含盒式处理机器人的盒传送区域。盒式处理机器人可以是线性致动器或旋转台。

6. 发明申请

WO2010036999A3 SUBSTRATE PROCESSING CHAMBER WITH OFF-CENTER GAS DELIVERY FUNNEL 审中-公开
标题翻译：带中心气体输送机的基板加工室
公开(公告)号：WO2010036999A3
公开(公告)日：2010-08-12
申请号：PCT/US2009058557
申请日：2009-09-28
申请人： APPLIED MATERIALS INC , MERRY NIR , NGUYEN SON T
发明人： MERRY NIR , NGUYEN SON T
IPC分类号： H01L21/205 , H01L21/00
CPC分类号： C23C16/45544 , C23C16/45502 , C23C16/45563
摘要： Methods and apparatus for processing substrates are disclosed herein. The process chamber includes a chamber body, a substrate support pedestal, a pump port and a gas injection funnel. The chamber body has an inner volume and the substrate support pedestal is disposed in the inner volume of the chamber body. The pump port is coupled to the inner volume and is disposed off-center from a central axis of the substrate support pedestal. The pump port provides azimuthally non-uniform pumping proximate to a surface of the substrate support pedestal and creates localized regions of high pressure and low pressure within the inner volume during use. The gas injection funnel is disposed in a ceiling of the chamber body and opposite the substrate support pedestal. The gas injection funnel is offset from the central axis of the substrate support pedestal and is disposed in a region of low pressure.
摘要翻译：本文公开了处理衬底的方法和设备。处理室包括室主体，基板支撑基座，泵口和气体注入漏斗。腔体具有内部体积，并且衬底支撑基座设置在腔体的内部体积中。泵口连接到内部体积并且设置在离基板支撑基座的中心轴线偏心的位置。泵端口提供靠近基板支撑基座的表面的方位不均匀的泵送，并且在使用期间在内部体积内产生高压和低压的局部区域。气体注入漏斗设置在室主体的顶部并与衬底支撑基座相对。气体注入漏斗偏离衬底支撑基座的中心轴线并且设置在低压区域中。

7. 发明申请

WO2008016647A2 TEMPERATURE UNIFORMITY MEASUREMENTS DURING RAPID THERMAL PROCESSING 审中-公开
标题翻译：在快速热处理期间的温度均匀度测量
公开(公告)号：WO2008016647A2
公开(公告)日：2008-02-07
申请号：PCT/US2007017190
申请日：2007-07-31
申请人： APPLIED MATERIALS INC , ADERHOLD WOLFGANG , HEGEDUS ANDREAS , MERRY NIR
发明人： ADERHOLD WOLFGANG , HEGEDUS ANDREAS , MERRY NIR
IPC分类号： G01J5/00
CPC分类号： G01J5/0022 , G01J2005/0081
摘要： Methods and apparatus for measuring substrate uniformity is provided. The invention includes placing a substrate in a thermal processing chamber, rotating the substrate while the substrate is heated, measuring a temperature of the substrate at a plurality of radial locations as the substrate rotates, correlating each temperature measurement with a location on the substrate, and generating a temperature contour map for the substrate based on the correlated temperature measurements. Numerous other aspects are provided.
摘要翻译：提供了测量基板均匀性的方法和装置。本发明包括将衬底放置在热处理室中，在衬底被加热的同时旋转衬底，在衬底旋转时在多个径向位置测量衬底的温度，使每个温度测量与衬底上的位置相关，以及基于相关的温度测量产生用于衬底的温度轮廓图。提供了许多其他方面。

8. 发明申请

WO2006132878A3 SUBSTRATE SUPPORT 审中-公开
标题翻译：基板支持
公开(公告)号：WO2006132878A3
公开(公告)日：2007-11-29
申请号：PCT/US2006021077
申请日：2006-05-31
申请人： APPLIED MATERIALS INC , SMITH JACOB , TAM ALEXANDER , IYER R SURYANARAYANAN , SEUTTER SEAN , TRAN BINH , MERRY NIR , BRAILOVE ADAM , SHYDO JR ROBERT , ANDREWS ROBERT , ROBERTS FRANK , SMICK THEODORE , RYDING GEOFFREY
发明人： SMITH JACOB , TAM ALEXANDER , IYER R SURYANARAYANAN , SEUTTER SEAN , TRAN BINH , MERRY NIR , BRAILOVE ADAM , SHYDO JR ROBERT , ANDREWS ROBERT , ROBERTS FRANK , SMICK THEODORE , RYDING GEOFFREY
IPC分类号： C23C16/458 , H01L21/00
CPC分类号： H01L21/68792 , C23C16/4584 , H01L21/67126 , H01L21/68742
摘要： A method and apparatus for processing a substrate utilizing a rotating substrate support are disclosed herein. In one embodiment, an apparatus for processing a substrate includes a chamber having a substrate support assembly disposed within the chamber. The substrate support assembly includes a substrate support having a support surface and a heater disposed beneath the support surface. A shaft is coupled to the substrate support and a motor is coupled to the shaft through a rotor to provide rotary movement to the substrate support. A seal block is disposed around the rotor and forms a seal therewith. The seal block has at least one seal and at least one channel disposed along the interface between the seal block and the shaft. A port is coupled to each channel for connecting to a pump. A lift mechanism is coupled to the shaft for raising and lowering the substrate support.
摘要翻译：本文公开了一种利用旋转衬底支撑件来处理衬底的方法和装置。在一个实施例中，用于处理衬底的装置包括具有设置在腔室内的衬底支撑组件的室。衬底支撑组件包括具有支撑表面的衬底支撑件和设置在支撑表面下方的加热器。轴连接到基板支撑件，并且电机通过转子联接到轴，以向基板支撑件提供旋转运动。密封块设置在转子周围并与其形成密封。密封块具有至少一个密封件和沿密封块和轴之间的界面设置的至少一个通道。端口连接到每个通道以连接到泵。升降机构联接到轴上以升高和降低基板支撑。

9. 发明申请

WO2007027458A2 BATCH DEPOSITION TOOL AND COMPRESSED BOAT 审中-公开
标题翻译：批量沉没工具和压缩船
公开(公告)号：WO2007027458A2
公开(公告)日：2007-03-08
申请号：PCT/US2006032413
申请日：2006-08-17
申请人： APPLIED MATERIALS INC , YUDOVSKY JOSEPH , COOK ROBERT C , MERRY NIR
发明人： YUDOVSKY JOSEPH , COOK ROBERT C , MERRY NIR
IPC分类号： H01L21/677
CPC分类号： H01L21/67309 , H01L21/67757
摘要： Aspects of the invention include methods and apparatus for processing a batch of substrates. In one embodiment, a compressed substrate boat is configured to reduce pumping volume in a batch processing chamber. The compressed substrate boat comprises a stationary substrate boat and a movable substrate boat, each may be loaded/unloaded independently. The movable substrate boat and the stationary substrate boat may be interleaving with one another such that the distance between the substrates is reduced. In another embodiment, a substrate boat having removable substrate holder is configured to provide susceptors without dramatically increasing pumping volume. The removable substrate holder may be loaded/unloaded away from the substrate boat with susceptors. The removable substrate holder is engaged with the substrate boat such that substrates thereon are interleaving with the susceptors. Embodiments of the present invention reduces pumping volume and increases throughput, hence reduces cost of ownership during batch processing.
摘要翻译：本发明的方面包括用于处理一批基底的方法和装置。在一个实施例中，压缩衬底舟被配置成减少间歇处理室中的泵送体积。压缩的基板舟皿包括固定的基板船和可移动的基板船，每个可以独立地加载/卸载。可移动衬底舟皿和固定衬底舟皿可以彼此交错，使得衬底之间的距离减小。在另一个实施例中，具有可移除衬底保持器的衬底舟皿构造成提供感受器而不会显着增加泵送容积。可移除的基板保持器可以与基座一起装载/卸载离开基板舟皿。可拆卸衬底保持器与衬底舟皿接合，使得其上的衬底与感受器交错。本发明的实施例减少了泵送量并增加了生产量，因此在批量处理期间降低了所有权成本。

10. 发明申请

WO2006055984A3 SUBSTRATE PROCESSING APPARATUS USING A BATCH PROCESSING CHAMBER 审中-公开
标题翻译：使用分批处理室的基板处理装置
公开(公告)号：WO2006055984A3
公开(公告)日：2006-08-24
申请号：PCT/US2005042762
申请日：2005-11-22
申请人： APPLIED MATERIALS INC , THAKUR RANDHIR P S , GHANAYEM STEVE G , YUDOVSKY JOSEPH , WEBB AARON , BRAILOVE ADAM A , MERRY NIR , SHAH VINAY K , HEGEDUS ANDREAS G
发明人： THAKUR RANDHIR P S , GHANAYEM STEVE G , YUDOVSKY JOSEPH , WEBB AARON , BRAILOVE ADAM A , MERRY NIR , SHAH VINAY K , HEGEDUS ANDREAS G
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01L21/67109 , C23C16/45546 , C23C16/45593 , C23C16/4584 , C23C16/481 , C23C16/54 , H01L21/67017 , H01L21/67115 , H01L21/67167 , H01L21/6719 , H01L21/67207 , H01L21/67745 , H01L21/67757 , H01L21/67781
摘要： Aspects of the invention include a method and apparatus for processing a substrate using a multi-chamber processing system (e.g., a cluster tool) adapted to process substrates in one or more batch and/or single substrate processing chambers to increase the system throughput. In one embodiment, a system is configured to perform a substrate processing sequence that contains batch processing chambers only, or batch and single substrate processing chambers, to optimize throughput and minimize processing defects. In one embodiment, a batch processing chamber is used to increase the system throughput by performing a process recipe step that is disproportionately long compared to other process recipe steps in the substrate processing sequence. Aspects of the invention also include an apparatus and method for delivering a precursor to a processing chamber so that a repeatable ALD or CVD deposition process can be performed.
摘要翻译：本发明的各方面包括一种用于使用适合于在一个或多个批处理和/或单个基板处理室中处理基板以提高系统处理量的多室处理系统（例如，群集工具）来处理基板的方法和装置。在一个实施例中，系统被配置为执行仅包含批量处理室或批量和单个衬底处理室的衬底处理序列，以优化吞吐量并最小化处理缺陷。在一个实施例中，批处理室用于通过执行与衬底处理序列中的其他处理配方步骤相比不成比例地长的处理配方步骤来增加系统处理量。本发明的各方面还包括用于将前体传送到处理室的设备和方法，以便可以执行可重复的ALD或CVD沉积过程。

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