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1. 发明申请

WO2008002780A3 BATCH PROCESSING PLATFORM FOR ALD AND CVD 审中-公开
标题翻译：用于ALD和CVD的批处理平台
公开(公告)号：WO2008002780A3
公开(公告)日：2008-03-20
申请号：PCT/US2007071368
申请日：2007-06-15
申请人： APPLIED MATERIALS INC , WEBB AARON , BRAILOVE ADAM , YUDOVSKY JOSEPH , MERRY NIR , CONSTANT ANDREW , QUILES EFRAIN , RICE MICHAEL R , ROSEN GARY J , SHAH VINAY
发明人： WEBB AARON , BRAILOVE ADAM , YUDOVSKY JOSEPH , MERRY NIR , CONSTANT ANDREW , QUILES EFRAIN , RICE MICHAEL R , ROSEN GARY J , SHAH VINAY
IPC分类号： H01L21/20 , C23C16/00
CPC分类号： C23C16/54 , C23C16/4583 , H01L21/67173 , H01L21/67742 , H01L21/67757 , H01L21/67769 , Y10S414/14
摘要： A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.
摘要翻译：用于ALD或CVD处理的批处理平台配置为高吞吐量和最小占用空间。在一个实施例中，处理平台包括大气转移区域，至少一个具有缓冲腔室和分级平台的批处理腔室，以及设置在转移区域中的传送机器人，其中传送机器人具有至少一个基板传送臂，基板处理刀片。该平台可以包括两个批处理腔室，该两个批处理腔室配置有布置在其间的服务通道以向传送机器人和沉积站提供必要的服务访问。在另一个实施例中，处理平台包括至少一个批处理腔室，适于在FOUP和处理盒之间传送基板的基板传送机器人，以及包含盒处理器机器人的盒传送区域。盒式搬运机器人可以是线性致动器或旋转台。

2. 发明申请

WO2008002780B1 BATCH PROCESSING PLATFORM FOR ALD AND CVD 审中-公开
标题翻译：用于ALD和CVD的批处理平台
公开(公告)号：WO2008002780B1
公开(公告)日：2008-05-08
申请号：PCT/US2007071368
申请日：2007-06-15
申请人： APPLIED MATERIALS INC , WEBB AARON , BRAILOVE ADAM , YUDOVSKY JOSEPH , MERRY NIR , CONSTANT ANDREW , QUILES EFRAIN , RICE MICHAEL R , ROSEN GARY J , SHAH VINAY
发明人： WEBB AARON , BRAILOVE ADAM , YUDOVSKY JOSEPH , MERRY NIR , CONSTANT ANDREW , QUILES EFRAIN , RICE MICHAEL R , ROSEN GARY J , SHAH VINAY
IPC分类号： H01L21/20 , C23C16/00
CPC分类号： C23C16/54 , C23C16/4583 , H01L21/67173 , H01L21/67742 , H01L21/67757 , H01L21/67769 , Y10S414/14
摘要： A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.
摘要翻译：用于ALD或CVD处理的批处理平台配置为高吞吐量和最小占地面积。在一个实施例中，处理平台包括大气转移区域，至少一个具有缓冲室和分段平台的分批处理室，以及设置在传送区域中的传送机器人，其中传送机器人具有至少一个基板传送臂，其包括多个基板处理刀片。平台可以包括两个批处理室，其配置有设置在其间的服务通道，以提供对传送机器人和沉积站的必要的服务访问。在另一个实施例中，处理平台包括至少一个批处理室，适于在FOUP和处理盒之间传送基板的基板传送机器人以及包含盒式处理机器人的盒传送区域。盒式处理机器人可以是线性致动器或旋转台。

3. 发明申请

WO2006055984A3 SUBSTRATE PROCESSING APPARATUS USING A BATCH PROCESSING CHAMBER 审中-公开
标题翻译：使用分批处理室的基板处理装置
公开(公告)号：WO2006055984A3
公开(公告)日：2006-08-24
申请号：PCT/US2005042762
申请日：2005-11-22
申请人： APPLIED MATERIALS INC , THAKUR RANDHIR P S , GHANAYEM STEVE G , YUDOVSKY JOSEPH , WEBB AARON , BRAILOVE ADAM A , MERRY NIR , SHAH VINAY K , HEGEDUS ANDREAS G
发明人： THAKUR RANDHIR P S , GHANAYEM STEVE G , YUDOVSKY JOSEPH , WEBB AARON , BRAILOVE ADAM A , MERRY NIR , SHAH VINAY K , HEGEDUS ANDREAS G
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01L21/67109 , C23C16/45546 , C23C16/45593 , C23C16/4584 , C23C16/481 , C23C16/54 , H01L21/67017 , H01L21/67115 , H01L21/67167 , H01L21/6719 , H01L21/67207 , H01L21/67745 , H01L21/67757 , H01L21/67781
摘要： Aspects of the invention include a method and apparatus for processing a substrate using a multi-chamber processing system (e.g., a cluster tool) adapted to process substrates in one or more batch and/or single substrate processing chambers to increase the system throughput. In one embodiment, a system is configured to perform a substrate processing sequence that contains batch processing chambers only, or batch and single substrate processing chambers, to optimize throughput and minimize processing defects. In one embodiment, a batch processing chamber is used to increase the system throughput by performing a process recipe step that is disproportionately long compared to other process recipe steps in the substrate processing sequence. Aspects of the invention also include an apparatus and method for delivering a precursor to a processing chamber so that a repeatable ALD or CVD deposition process can be performed.
摘要翻译：本发明的各方面包括一种用于使用适合于在一个或多个批处理和/或单个基板处理室中处理基板以提高系统处理量的多室处理系统（例如，群集工具）来处理基板的方法和装置。在一个实施例中，系统被配置为执行仅包含批量处理室或批量和单个衬底处理室的衬底处理序列，以优化吞吐量并最小化处理缺陷。在一个实施例中，批处理室用于通过执行与衬底处理序列中的其他处理配方步骤相比不成比例地长的处理配方步骤来增加系统处理量。本发明的各方面还包括用于将前体传送到处理室的设备和方法，以便可以执行可重复的ALD或CVD沉积过程。

4. 发明申请

WO2007041012A3 BATCH WAFER HANDLING SYSTEM 审中-公开
标题翻译：批量晶圆处理系统
公开(公告)号：WO2007041012A3
公开(公告)日：2007-11-01
申请号：PCT/US2006036866
申请日：2006-09-21
申请人： APPLIED MATERIALS INC , BRAILOVE ADAM A , WEBB AARON
发明人： BRAILOVE ADAM A , WEBB AARON
IPC分类号： C23C16/00
CPC分类号： H01L21/67781 , H01L21/67757
摘要： The present invention generally provides a batch processing system having a processing chamber and a loading chamber. Substrates are transferred in and out the processing chamber in a batch by a substrate boat. A batch handling tool of the present invention is generally used in the loading chamber to load and unload the structured substrate support by group. The batch handling tool generally comprises a support member, which is configured to host at least two sets of support blades. The at least two sets of substrate supports are generally mounted on the support member and their positions are switchable when the support member rotates. Each set of the support blades is configured to load (unload) at least two substrates into(from) the substrate boat.
摘要翻译：本发明通常提供具有处理室和装载室的批处理系统。基板通过基板船一批一批地转入和转出处理室。通常在装载室中使用本发明的批量处理工具来逐组装载和卸载结构化衬底支撑件。批量处理工具通常包括支撑构件，该支撑构件构造成容纳至少两组支撑叶片。至少两组基底支撑件通常安装在支撑构件上，并且当支撑构件旋转时它们的位置是可切换的。每组支撑刀片被构造成将至少两个衬底加载（卸载）到衬底舟中（从）衬底舟。

5. 发明专利

SG11202003438QA HIGH PRESSURE STEAM ANNEAL PROCESSING APPARATUS 未知
公开(公告)号：SG11202003438QA
公开(公告)日：2020-05-28
申请号：SG11202003438Q
申请日：2018-10-11
申请人： APPLIED MATERIALS INC
发明人： SCHALLER JASON M , VOPAT ROBERT BRENT , CARLSON CHARLES T , BLAHNIK JEFFREY CHARLES , FRANKLIN TIMOTHY JOSEPH , BLAHNIK DAVID , WEBB AARON
IPC分类号： H01L21/67 , H01L21/673
摘要： Apparatuses for annealing semiconductor substrates, such as a batch processing chamber, are provided herein. The batch processing chamber includes a chamber body enclosing an internal volume, a cassette moveably disposed within the internal volume and a plug coupled to a bottom wall of the cassette. The chamber body has a hole through a bottom wall of the chamber body and is interfaced with one or more heaters operable to maintain the chamber body at a temperature of greater than 290° C. The cassette is configured to be raised to load a plurality of substrates thereon and lowered to seal the internal volume. The plug is configured to move up and down within the internal volume. The plug includes a downward-facing seal configured to engage with a top surface of the bottom wall of the chamber body and close the hole through the bottom wall of the chamber body.

6. 发明专利

SG11202001807XA DUAL PORT REMOTE PLASMA CLEAN ISOLATION VALVE 未知
公开(公告)号：SG11202001807XA
公开(公告)日：2020-04-29
申请号：SG11202001807X
申请日：2018-09-28
申请人： APPLIED MATERIALS INC
发明人： RIORDON BENJAMIN B , CARLSON CHARLES T , WEBB AARON , WYKA GARY
IPC分类号： H01J37/32 , F16K51/02
摘要： The present disclosure generally relates to an isolation device for use in processing systems. The isolation device has a body with an inlet opening disposed at a first end coupled to a processing system component such as a remote plasma source and outlet openings, for example two, disposed at a second end which are coupled to a processing system component such as a process chamber. Flaps disposed within the body are actuatable to an open position from a closed position or to a closed position from an open position, to selectively allow or prevent passage of a fluid from the processing system component coupled to the isolation device to the other processing system component coupled thereto.

7. 发明申请

WO2011057247A3 SYSTEM AND METHOD FOR HANDLING MULTIPLE WORKPIECES FOR MATRIX CONFIGURATION PROCESSING 审中-公开
标题翻译：用于处理矩阵配置处理的多个工件的系统和方法
公开(公告)号：WO2011057247A3
公开(公告)日：2011-11-03
申请号：PCT/US2010055986
申请日：2010-11-09
申请人： VARIAN SEMICONDUCTOR EQUIPMENT , WEAVER WILLIAM T , CARRERA JAMIE A , VOPAT ROBERT B , WEBB AARON , CARLSON CHARLES T
发明人： WEAVER WILLIAM T , CARRERA JAMIE A , VOPAT ROBERT B , WEBB AARON , CARLSON CHARLES T
IPC分类号： H01L21/677 , B65G49/06 , H01L21/687
CPC分类号： H01L21/67739 , G21K5/10 , H01L21/67742 , H01L21/67766 , H01L21/68707
摘要： A system for loading workpieces into a process chamber for processing in a matrix configuration includes a conveyor configured to transport multiple workpieces in a linear fashion. A workpiece hotel is configured to receive the multiple workpieces from the conveyor. The workpiece hotel comprises a matrix of cells arranged in N columns and M floors. A pick blade is configured to insert into the hotel and retract from the hotel in order to unload a plurality of substrates from a first floor into a single row of the pick blade, and to repeat the unloading operation to form a matrix comprising a plurality of rows of substrates disposed on the pick blade. In one example, the workpiece hotel has a staggered configuration that provides individual accessibility of each hotel cell.
摘要翻译：用于将工件加载到用于以矩阵构造处理的处理室中的系统包括被构造成以线性方式输送多个工件的传送器。工件酒店被配置为从输送机接收多个工件。工件酒店包括排列在N列和M层的单元矩阵。拾取刀片被配置成插入酒店并从酒店退回，以便将多个基板从第一层卸载到单行拾取刀片中，并且重复卸载操作以形成矩阵，其包括多个设置在拾取刀片上的一排衬底。在一个例子中，工件酒店具有交错的配置，可以提供每个酒店单元的个人可访问性。

8. 发明申请

WO2007038647A2 METHODS AND APPARATUS FOR COUPLING SEMICONDUCTOR DEVICE MANUFACTURING EQUIPMENT TO THE FACILITIES OF A MANUFACTURING LOCATION 审中-公开
标题翻译：用于将半导体器件制造设备耦合到制造地点的设备的方法和装置
公开(公告)号：WO2007038647A2
公开(公告)日：2007-04-05
申请号：PCT/US2006037776
申请日：2006-09-26
申请人： APPLIED MATERIALS INC
发明人： DE VRIES NICHOLAS , WEBB AARON
IPC分类号： B24B7/00
CPC分类号： H01L21/67161 , H01L21/67775
摘要： In a first aspect, an apparatus is provided for coupling a semiconductor device manufacturing tool to facilities. The apparatus includes (1) a docking station adapted to mount to a raised floor and having a thickness approximately equal to the raised floor; (2) a plurality of tool point of connection (POC) locations disposed on a top surface of the docking station, each tool POC location being adapted to be connected to a POC of a semiconductor device manufacturing tool; and (3) a plurality of facilities POC locations disposed on a bottom surface of the docking station. Each facilities POC location is adapted to be connected to a POC of a facility. Numerous other aspects are provided.
摘要翻译：在第一方面，提供一种用于将半导体器件制造工具耦合到设备的装置。该设备包括（1）适于安装到高架地板并具有大致等于高架地板的厚度的坞站; （2）设置在对接站的顶表面上的多个工具连接点（POC）位置，每个工具POC位置适于连接到半导体器件制造工具的POC; 和（3）设置在对接站的底面上的多个设施POC位置。每个设施POC位置都适合连接到设施的POC。提供了许多其他方面。

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