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1. 发明申请

WO2007121336A3 RELIABLE FUEL CELL ELECTRODE DESIGN 审中-公开
标题翻译：可靠的燃料电池电极设计
公开(公告)号：WO2007121336A3
公开(公告)日：2008-05-29
申请号：PCT/US2007066596
申请日：2007-04-13
申请人： APPLIED MATERIALS INC , WEIDMAN TIMOTHY W , ARMSTRONG KARL J , EAGLESHAM DAVID J , KRISHNA NETY , HOFMANN RALF , STEWART MICHAEL P
发明人： WEIDMAN TIMOTHY W , ARMSTRONG KARL J , EAGLESHAM DAVID J , KRISHNA NETY , HOFMANN RALF , STEWART MICHAEL P
IPC分类号： H01M4/00
CPC分类号： H01M4/8867 , C23C28/321 , C23C28/322 , C23C28/34 , C23C28/3455 , H01M4/8817 , H01M4/92 , H01M8/0206 , H01M8/021 , H01M8/023 , H01M8/0236 , H01M8/0245 , H01M8/086 , H01M8/1004 , Y02P70/56
摘要： The present invention generally relates to the creation of fuel cell components and the method of forming the various fuel cell components that have an improved lifetime, lower production cost and improved process performance. The invention generally includes treating or conditioning a substrate surface by depositing a material layer, or layers, having good adhesion to the substrate, low electrical resistivity (high conductivity) and has good resistance to chemical attack during the operation of fuel cell. The substrate may be, for example, a fuel cell part, a conductive plate, a separator plate, a bipolar plate or an end plate, among others. In one embodiment, the substrate surface is treated or conditioned by exposing at least a portion of it to a gas or liquid comprising ruthenium tetroxide.
摘要翻译：本发明一般涉及燃料电池部件的制造和形成具有改善的寿命，降低生产成本和改进工艺性能的各种燃料电池部件的方法。本发明通常包括通过沉积对基材具有良好粘附性的材料层或低层电阻（高导电性）并且在燃料电池操作期间具有良好的抗化学侵蚀性能来处理或调理基材表面。基板可以是例如燃料电池部件，导电板，隔板，双极板或端板等。在一个实施方案中，通过将其至少一部分暴露于包含四氧化钌的气体或液体来处理或调理基底表面。

2. 发明申请

WO2009137513A2 MICROWAVE ROTATABLE SPUTTERING DEPOSITION 审中-公开
标题翻译：微波可旋转溅射沉积
公开(公告)号：WO2009137513A2
公开(公告)日：2009-11-12
申请号：PCT/US2009042891
申请日：2009-05-05
申请人： APPLIED MATERIALS INC , STOWELL MICHAEL W , KRISHNA NETY
发明人： STOWELL MICHAEL W , KRISHNA NETY
IPC分类号： C23C14/35 , C23C14/22 , C23C14/34
CPC分类号： C23C14/357 , H01J37/32192 , H01J37/3405 , H01J37/3426
摘要： Disclosed is an invention that uses a coaxial microwave antenna as a primary plasma source in PVD. The coaxial microwave antenna is positioned inside a sputtering target. Instead of using a cathode assist in sputtering, microwaves generated from the coaxial microwave antenna may leak through the sputtering target that comprises a dielectric material to form microwave plasma outside the sputtering target. To further enhance plasma density, a magnetron or a plurality of magnetrons may be added inside the target to help confine secondary electrons. An electric potential may be formed between adjacent magnetrons and may further enhance ionization. To achieve directional control of the generated microwaves, a shield that comprises a dielectric material or dielectric material coated metal may be added proximate the coaxial microwave antenna. Furthermore, for high utilization of expensive target materials, a target can rotate to improve the utilization efficiency.
摘要翻译：公开了使用同轴微波天线作为PVD中的主要等离子体源的发明。同轴微波天线位于溅射靶内。代替在溅射中使用阴极辅助，从同轴微波天线产生的微波可以通过包含电介质材料的溅射靶泄漏，以在溅射靶外形成微波等离子体。为了进一步提高等离子体密度，可以在靶内部添加磁控管或多个磁控管以帮助限制二次电子。可以在相邻的磁控管之间形成电位，并且可以进一步增强电离。为了实现产生的微波的方向控制，可以在同轴微波天线附近添加包括介电材料或电介质材料涂覆的金属的屏蔽。此外，为了高利用昂贵的目标材料，目标可以旋转以提高利用效率。

3. 发明申请

WO2009143254A3 THIN FILM BATTERIES AND METHODS FOR MANUFACTURING SAME 审中-公开
标题翻译：薄膜电池及其制造方法
公开(公告)号：WO2009143254A3
公开(公告)日：2010-03-11
申请号：PCT/US2009044691
申请日：2009-05-20
申请人： APPLIED MATERIALS INC
发明人： KWAK BYUNG SUNG , STOWELL MICHAEL , KRISHNA NETY
IPC分类号： C23C14/00 , H01M4/48 , H01M4/52 , H01M4/58 , H01M10/36
CPC分类号： C23C14/088 , C23C14/3414 , H01M4/0426 , H01M4/1391 , H01M4/525 , H01M4/5825 , H01M6/40 , H01M10/052 , H01M10/0585
摘要： A method of fabricating a layer of a thin film battery comprises providing a sputtering target and depositing the layer on a substrate using a physical vapor deposition process enhanced by a combination of plasma processes. The deposition process may include: (1) generation of a plasma between the target and the substrate; (2) sputtering the target; (3) supplying microwave energy to the plasma; and (4) applying radio frequency power to the substrate. A sputtering target for a thin film battery cathode layer has an average composition of LiMaNbZc, wherein 0.20 > (b/(a+b)} > 0 and the ratio of a to c is approximately equal to the stoichiometric ratio of a desired crystalline structure of the cathode layer, N is an alkaline earth element, M is selected from the group consisting of Co, Mn, Al, Ni and V, and Z is selected from the group consisting of (PO4), O, F and N.
摘要翻译：制造薄膜电池层的方法包括提供溅射靶并使用通过等离子体处理的组合增强的物理气相沉积工艺将该层沉积在衬底上。沉积过程可以包括：（1）在靶和衬底之间产生等离子体; （2）溅射目标; （3）向等离子体提供微波能量; 和（4）向基板施加射频功率。用于薄膜电池阴极层的溅射靶具有LiMaNbZc的平均组成，其中0.20>（b /（a + b）}> 0，并且a与c的比率近似等于所需晶体结构的化学计量比的阴极层，N是碱土金属元素，M选自Co，Mn，Al，Ni和V，Z选自（PO4），O，F和N.

4. 发明公开

EP2291876A4 THIN FILM BATTERIES AND METHODS FOR MANUFACTURING SAME 失效
标题翻译： VERFAHREN ZU IHRER HERSTELLUNG的DÜNNFILMBATTERIEN
公开(公告)号：EP2291876A4
公开(公告)日：2012-12-26
申请号：EP09751482
申请日：2009-05-20
申请人： APPLIED MATERIALS INC
发明人： KWAK BYUNG SUNG , STOWELL MICHAEL , KRISHNA NETY
IPC分类号： C23C14/34 , H01M4/48 , H01M4/52 , H01M4/58 , H01M10/36
CPC分类号： C23C14/088 , C23C14/3414 , H01M4/0426 , H01M4/1391 , H01M4/525 , H01M4/5825 , H01M6/40 , H01M10/052 , H01M10/0585

5. 发明申请

WO2009117229A3 COAXIAL MICROWAVE ASSISTED DEPOSITION AND ETCH SYSTEMS 审中-公开
标题翻译：同轴微波辅助沉积和蚀刻系统
公开(公告)号：WO2009117229A3
公开(公告)日：2009-11-12
申请号：PCT/US2009035325
申请日：2009-02-26
申请人： APPLIED MATERIALS INC , STOWELL MICHAEL W , KRISHNA NETY , HOFMANN RALF , GRIFFITH JOE
发明人： STOWELL MICHAEL W , KRISHNA NETY , HOFMANN RALF , GRIFFITH JOE
IPC分类号： C23C16/511 , C23C14/22 , H01L21/203 , H01L21/205 , H01L21/302
CPC分类号： H05H1/46 , C23C14/34 , C23C14/345 , C23C14/3485 , C23C16/511 , C23C16/515 , H01J37/32091 , H01J37/321 , H01J37/32192 , H01J37/3222 , H01J37/3408
摘要： Disclosed are systems for achieving improved film properties by introducing additional processing parameters, such as a movable position for the microwave source and pulsing power to the microwave source, and extending the operational ranges and processing windows with the assistance of the microwave source. A coaxial microwave antenna is used for radiating microwaves to assist in physical vapor deposition (PVD) or chemical vapor deposition (CVD) systems. The system may use a coaxial microwave antenna inside a processing chamber, with the antenna being movable between a substrate and a plasma source, such as a sputtering target, a planar capacitively generated plasma source, or an inductively coupled source. In a special case when only a microwave plasma source is present, the position of the microwave antenna is movable relative to a substrate. The coaxial microwave antenna adjacent to the plasma source can assist the ionization more homogeneously and allow substantially uniform deposition over large areas.
摘要翻译：公开了通过引入诸如用于微波源的可移动位置和对微波源的脉冲功率的附加处理参数以及在微波源的辅助下延伸操作范围和处理窗口来实现改进的膜性质的系统。同轴微波天线用于辐射微波以辅助物理气相沉积（PVD）或化学气相沉积（CVD）系统。该系统可以在处理室内使用同轴微波天线，天线可在基板和等离子体源之间移动，诸如溅射靶，平面电容产生的等离子体源或电感耦合源。在仅存在微波等离子体源的特殊情况下，微波天线的位置可相对于基板移动。与等离子体源相邻的同轴微波天线可以更均匀地帮助电离并且允许在大面积上的基本均匀的沉积。

6. 发明申请

WO2009117745A2 SURFACE PREHEATING TREATMENT OF PLASTICS SUBSTRATE 审中-公开
标题翻译：塑料衬底的表面预热处理
公开(公告)号：WO2009117745A2
公开(公告)日：2009-09-24
申请号：PCT/US2009044213
申请日：2009-05-15
申请人： APPLIED MATERIALS INC , STOWELL MICHAEL W , KRISHNA NETY
发明人： STOWELL MICHAEL W , KRISHNA NETY
IPC分类号： C23C14/02 , C23C14/50 , C23C16/02
CPC分类号： B05D3/0227 , B05D1/60 , B05D1/62 , B05D7/02 , C23C14/541 , C23C16/46
摘要： A source of IR radiation is used to heat a plastic substrate in a fast fashion inside a processing chamber, where the processing chamber is configured to preheat the plastic substrate and to perform thin film deposition, such as chemical vapor deposition (CVD) or physical vapor deposition (PVD), or plasma etching and cleaning. One aspect of using the source of IR radiation is to preheat only the surface of the plastic substrate while the core of the plastic substrate remains substantially unheated, so that the structure of the plastic substrate may remain unchanged. Meanwhile, the surface properties of the plastic substrate may be modified after the preheating treatment. The source of IR radiation may be provided at wavelength selected to substantially match the absorption wavelength of the plastic substrate. The plastic substrate moves through the heat flux zone generated by the source of IR radiation at a controllable speed.
摘要翻译：红外辐射源用于在处理室内以快速方式加热塑料衬底，其中处理室被配置为预热塑料衬底并执行薄膜沉积，诸如化学气相沉积（CVD）或物理蒸气沉积（PVD）或等离子体蚀刻和清洁。使用IR辐射源的一个方面是仅预热塑料基材的表面，而塑料基材的核心基本保持不加热，使得塑料基材的结构可以保持不变。同时，塑料基材的表面性质可以在预热处理后改变。 IR辐射源可以被提供在被选择为与塑料衬底的吸收波长基本匹配的波长处。塑料基板以可控的速度移动通过IR辐射源产生的热通量区。

7. 发明公开

EP2212962A4 METHOD FOR HIGH VOLUME MANUFACTURING OF THIN FILM BATTERIES 有权
标题翻译：用于大批量生产薄薄膜电池
公开(公告)号：EP2212962A4
公开(公告)日：2012-12-05
申请号：EP08842733
申请日：2008-10-23
申请人： APPLIED MATERIALS INC , MOTOROLA INC
发明人： KWAK BYUNG-SUNG , KRISHNA NETY , EISENBEISER KURT , DAUKSHER WILLIAM J , CANDELARIA JON
IPC分类号： H01M10/00 , B05C1/00 , H01M6/40
CPC分类号： H01M10/0585 , H01M6/40 , H01M10/0436 , H01M10/052 , H01M2300/0068

8. 发明公开

EP2027621A4 RELIABLE FUEL CELL ELECTRODE DESIGN 审中-公开
标题翻译：设计一个可靠的燃料电池电极
公开(公告)号：EP2027621A4
公开(公告)日：2010-01-13
申请号：EP07781877
申请日：2007-04-13
申请人： APPLIED MATERIALS INC
发明人： WEIDMAN TIMOTHY W , ARMSTRONG KARL J , EAGLESHAM DAVID J , KRISHNA NETY , HOFMANN RALF , STEWART MICHAEL P
IPC分类号： H01M4/88 , H01M4/92 , H01M8/02
CPC分类号： H01M4/8867 , C23C28/321 , C23C28/322 , C23C28/34 , C23C28/3455 , H01M4/8817 , H01M4/92 , H01M8/0206 , H01M8/021 , H01M8/023 , H01M8/0236 , H01M8/0245 , H01M8/086 , H01M8/1004 , Y02P70/56

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