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    • 3. 发明申请
    • DUAL ZONE GAS INJECTION NOZZLE
    • 双区气体喷射喷嘴
    • WO2009085810A1
    • 2009-07-09
    • PCT/US2008/087139
    • 2008-12-17
    • APPLIED MATERIALS, INC.LIU, WeiSWENBERG, Johanes S.NGUYEN, Hanh D.NGUYEN, Son T.CURTIS, RogerBOTTINI, Philip A.
    • LIU, WeiSWENBERG, Johanes S.NGUYEN, Hanh D.NGUYEN, Son T.CURTIS, RogerBOTTINI, Philip A.
    • H01L21/02
    • H01J37/3244H01J37/32449
    • The present invention generally provides apparatus and method for processing a substrate. Particularly, the present invention provides apparatus and methods to obtain a desired distribution of a process gas. One embodiment of the present invention provides an apparatus for processing a substrate comprising an injection nozzle having a first fluid path including a first inlet configured to receive a fluid input, and a plurality of first injection ports connected with the first inlet, wherein the plurality of first injection ports are configured to direct a fluid from the first inlet towards a first region of a process volume, and a second fluid path including a second inlet configured to receive a fluid input, and a plurality of second injection ports connected with the second inlet, wherein the second injection ports are configured to direct a fluid from the second inlet towards a second region of the process volume.
    • 本发明总体上提供了用于处理衬底的装置和方法。 特别地,本发明提供了获得处理气体的期望分布的装置和方法。 本发明的一个实施例提供一种用于处理衬底的装置,其包括具有第一流体路径的注射喷嘴,所述第一流体路径包括构造成接收流体输入的第一入口和与第一入口连接的多个第一注入口,其中, 第一注入口构造成将流体从第一入口引向处理容积的第一区域,并且第二流体路径包括构造成接收流体输入的第二入口和与第二入口连接的多个第二注入口 ,其中所述第二注射端口被配置为将流体从所述第二入口引导到所述处理体积的第二区域。