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1. 发明公开

EP3084818A1 SUBSTRATE SUPPORT APPARATUS HAVING REDUCED SUBSTRATE PARTICLE GENERATION 有权
标题翻译：与还原的底物颗粒生产基底承载设备
公开(公告)号：EP3084818A1
公开(公告)日：2016-10-26
申请号：EP14871014.8
申请日：2014-12-08
申请人： Applied Materials, Inc.
发明人： AGARWAL, Pulkit , SUH, Song-Moon , MORI, Glen , SANSONI, Steven V.
IPC分类号： H01L21/683
CPC分类号： H01L21/68757 , B25J11/0095 , B25J15/0014 , H01L21/68707 , H01L21/6875
摘要： Embodiments of apparatus for supporting a substrate are disclosed herein. In some embodiments, an apparatus for supporting a substrate includes: a support surface; and a plurality of substrate contact elements protruding from the support surface, wherein the plurality of substrate contact elements are formed of a material having a hardness less than or equal to a hardness of silicon, having a low adhesion, having a coefficient of static friction large enough to prevent sliding, having a surface roughness less than or equal to 10 Ra, and that is electrically conductive.

2. 发明公开

EP3164883A1 SUBSTRATE TRANSFER ROBOT END EFFECTOR 审中-公开
标题翻译：基片传输机器人末端效应器
公开(公告)号：EP3164883A1
公开(公告)日：2017-05-10
申请号：EP15815072.2
申请日：2015-06-05
申请人： Applied Materials, Inc.
发明人： AGARWAL, Pulkit , GREENBERG, Daniel , SUH, Song-Moon , BRODINE, Jeffrey , SANSONI, Steven V. , MORI, Glen
IPC分类号： H01L21/677
CPC分类号： H01L21/68707 , H01L21/67766
摘要： Embodiments of apparatus for supporting a substrate are disclosed herein. In some embodiments, an apparatus for supporting a substrate includes a support member; and a plurality of substrate contact elements protruding from the support member, wherein each of the plurality of substrate contact elements includes: a first contact surface to support a substrate when placed thereon; and a second contact surface extending from the first contact surface, wherein the second contact surface is adjacent a periphery of the substrate to prevent radial movement of the substrate, wherein the first contact surface is at a first angle with respect to the support member and the second contact surface is at a second angle with respect to the support member, and wherein the first angle is between about 3 degrees and 5 degrees.
摘要翻译：这里公开了用于支撑衬底的设备的实施例。在一些实施例中，用于支撑衬底的装置包括支撑构件; 以及从所述支撑构件突出的多个基板接触元件，其中所述多个基板接触元件中的每一个均包括：第一接触表面，用于当放置在其上时支撑基板; 以及从所述第一接触表面延伸的第二接触表面，其中所述第二接触表面邻近所述衬底的周边以防止所述衬底的径向移动，其中所述第一接触表面相对于所述支撑构件成第一角度，并且所述第二接触表面相对于所述支撑构件处于第二角度，并且其中所述第一角度在大约3度和5度之间。

3. 发明授权

EP3084818B1 SUBSTRATE SUPPORT APPARATUS HAVING REDUCED SUBSTRATE PARTICLE GENERATION 有权
公开(公告)号：EP3084818B1
公开(公告)日：2020-11-25
申请号：EP14871014.8
申请日：2014-12-08
申请人： Applied Materials, Inc.
发明人： AGARWAL, Pulkit , SUH, Song-Moon , MORI, Glen , SANSONI, Steven V.
IPC分类号： B25J11/00 , B25J15/00 , H01L21/687

4. 发明申请

WO2016010694A1 CLEANING OF CHAMBER COMPONENTS WITH SOLID CARBON DIOXIDE PARTICLES 审中-公开
标题翻译：用固体二氧化碳颗粒清洗室内组分
公开(公告)号：WO2016010694A1
公开(公告)日：2016-01-21
申请号：PCT/US2015/037261
申请日：2015-06-23
申请人： APPLIED MATERIALS, INC.
发明人： SUH, Song-Moon , GUO, Yuanhong , XUAN, Guangchi , AGARWAL, Pulkit
IPC分类号： H01L21/302 , H01L21/02
CPC分类号： B24C1/003 , B08B3/04 , B24C1/00 , B24C3/32
摘要： Disclosed herein are systems and methods for cleaning a ceramic article using a stream of solid carbon dioxide (CO 2 ) particles. A method includes flowing liquid CO 2 into a spray nozzle, and directing a first stream of solid CO 2 particles from the spray nozzle toward a ceramic article for a first time duration to clean the ceramic article. The liquid CO 2 is converted into the first stream of solid CO 2 particles upon exiting the spray nozzle. The first stream of solid CO 2 particles causes a layer of solid CO 2 to be formed on the ceramic article. After the layer of solid CO 2 has sublimated, a second stream of solid CO 2 particles is directed from the spray nozzle toward the ceramic article for at least one of the first time duration or a second time duration to further clean the ceramic article.
摘要翻译：本文公开了使用固体二氧化碳（CO 2）颗粒流清洁陶瓷制品的系统和方法。一种方法包括将液体CO 2流入喷嘴中，并将来自喷嘴的固体CO 2颗粒的第一流引导至陶瓷制品第一时间以清洁陶瓷制品。液体CO 2在离开喷嘴时被转化为第一流的固体CO 2颗粒。固体CO 2颗粒的第一流引起在陶瓷制品上形成一层固体CO 2。在固体CO 2层升华之后，将第二股固体CO 2颗粒流从喷嘴朝着陶瓷制品引导至少第一持续时间或第二持续时间，以进一步清洁陶瓷制品。

5. 发明申请

WO2016003598A1 SUBSTRATE TRANSFER ROBOT END EFFECTOR 审中-公开
标题翻译：基台转移机器人终端效应器
公开(公告)号：WO2016003598A1
公开(公告)日：2016-01-07
申请号：PCT/US2015/034333
申请日：2015-06-05
申请人： APPLIED MATERIALS, INC.
发明人： AGARWAL, Pulkit , GREENBERG, Daniel , SUH, Song-Moon , BRODINE, Jeffrey , SANSONI, Steven V. , MORI, Glen
IPC分类号： H01L21/677
CPC分类号： H01L21/68707 , H01L21/67766
摘要： Embodiments of apparatus for supporting a substrate are disclosed herein. In some embodiments, an apparatus for supporting a substrate includes a support member; and a plurality of substrate contact elements protruding from the support member, wherein each of the plurality of substrate contact elements includes: a first contact surface to support a substrate when placed thereon; and a second contact surface extending from the first contact surface, wherein the second contact surface is adjacent a periphery of the substrate to prevent radial movement of the substrate, wherein the first contact surface is at a first angle with respect to the support member and the second contact surface is at a second angle with respect to the support member, and wherein the first angle is between about (3) degrees and (5) degrees.
摘要翻译：本文公开了用于支撑衬底的装置的实施例。在一些实施例中，用于支撑衬底的装置包括支撑构件; 以及从所述支撑构件突出的多个基板接触元件，其中所述多个基板接触元件中的每一个包括：当放置在其上时支撑基板的第一接触表面; 以及从所述第一接触表面延伸的第二接触表面，其中所述第二接触表面邻近所述衬底的周边以防止所述衬底的径向移动，其中所述第一接触表面相对于所述支撑构件处于第一角度，第二接触表面相对于支撑构件成第二角度，并且其中第一角度在约（3）度和（5）度之间。

6. 发明申请

WO2015094743A1 SUBSTRATE SUPPORT APPARATUS HAVING REDUCED SUBSTRATE PARTICLE GENERATION 审中-公开
标题翻译：基板支撑装置具有减少的基板颗粒生成
公开(公告)号：WO2015094743A1
公开(公告)日：2015-06-25
申请号：PCT/US2014/069031
申请日：2014-12-08
申请人： APPLIED MATERIALS, INC.
发明人： AGARWAL, Pulkit , SUH, Song-Moon , MORI, Glen , SANSONI, Steven V.
IPC分类号： H01L21/683
CPC分类号： H01L21/68757 , B25J11/0095 , B25J15/0014 , H01L21/68707 , H01L21/6875
摘要： Embodiments of apparatus for supporting a substrate are disclosed herein. In some embodiments, an apparatus for supporting a substrate includes: a support surface; and a plurality of substrate contact elements protruding from the support surface, wherein the plurality of substrate contact elements are formed of a material having a hardness less than or equal to a hardness of silicon, having a low adhesion, having a coefficient of static friction large enough to prevent sliding, having a surface roughness less than or equal to 10 Ra, and that is electrically conductive.
摘要翻译：本文公开了用于支撑衬底的装置的实施例。在一些实施例中，用于支撑衬底的装置包括：支撑表面; 以及从所述支撑面突出的多个基板接触元件，其中，所述多个基板接触元件由硬度小于或等于硅的硬度的材料形成，具有低粘附性，具有较大的静摩擦系数足以防止具有小于或等于10Ra的表面粗糙度并且是导电的滑动。

7. 发明申请

WO2017091571A1 METHODS FOR FORMING LOW-RESISTANCE CONTACTS THROUGH INTEGRATED PROCESS FLOW SYSTEMS 审中-公开
标题翻译：通过集成工艺流程系统形成低电阻接触的方法
公开(公告)号：WO2017091571A1
公开(公告)日：2017-06-01
申请号：PCT/US2016/063321
申请日：2016-11-22
申请人： APPLIED MATERIALS, INC.
发明人： LEI, Yu , BANTHIA, Vikash , WU, Kai , FU, Xinyu , XU, Yi , DAITO, Kazuya , MA, Feiyue , AGARWAL, Pulkit , LIN, Chi-Chou , WU, Dien-Yeh , JIAN, Guoqiang , TANG, Wei V. , BAKKE, Jonathan , CHANG, Mei , RAMAMURTHY, Sundar
IPC分类号： H01L21/02 , H01L21/205 , H01L21/285
CPC分类号： H01L21/76843 , C23C16/0227 , C23C16/0281 , C23C16/045 , C23C16/06 , C23C16/08 , C23C16/4401 , C23C16/45536 , C23C16/45544 , C23C16/46 , C23C16/505 , C23C16/52 , C23C16/54 , H01L21/31116 , H01L21/76802 , H01L21/76877
摘要： Methods for forming metal contacts having tungsten liner layers are provided herein. In some embodiments, a method of processing a substrate includes: exposing a substrate, within a first substrate process chamber, to a plasma formed from a first gas comprising a metal organic tungsten precursor gas or a fluorine-free tungsten halide precursor to deposit a tungsten liner layer, wherein the tungsten liner layer is deposited atop a dielectric layer and within a feature formed in a first surface of the dielectric layer of a substrate; transferring the substrate to a second substrate process chamber without exposing the substrate to atmosphere; and exposing the substrate to a second gas comprising a tungsten fluoride precursor to deposit a tungsten fill layer atop the tungsten liner layer.
摘要翻译：本文提供了用于形成具有钨衬垫层的金属触点的方法。在一些实施例中，一种处理衬底的方法包括：在第一衬底处理室内将衬底暴露于由包含金属有机钨前体气体或无氟卤化钨前体的第一气体形成的等离子体以沉积钨衬里层，其中所述钨衬里层沉积在介电层顶上并且形成在衬底的所述介电层的第一表面中的特征内; 将衬底转移到第二衬底处理室而不将衬底暴露于大气; 以及将衬底暴露于包含氟化钨前体的第二气体以在钨衬垫层顶上沉积钨填充层。

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