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    • 4. 发明公开
    • Metal precursor solutions for chemical vapor deposition
    • Metallvorläuferlösungenfürchemische Dampfabscheidung
    • EP1983073A1
    • 2008-10-22
    • EP08154630.1
    • 2008-04-16
    • Air Products and Chemicals, Inc.
    • Lei, XinjianQuinn, Liam J.Norman, John Anthony ThomasBurgoyne, William Franklin, Jr.Lal, Gauri SankarUlman, MichaelSpence, Daniel P.
    • C23C16/18C23C16/16
    • C23C16/18C23C16/16
    • Metal source containing precursor liquid solutions for chemical vapor deposition processes, including atomic layer deposition, for fabricating conformal metal-containing films on substrates are described. More specifically, the metal source precursor liquid solutions are comprised of (i) at least one metal complex selected from β-diketonates, β-ketoiminates, β-diiminates, alkyl metal, metal carbonyl, alkyl metal carbonyl, aryl metal, aryl metal carbonyl, cyclopentadienyl metal, cyclopentadienyl metal isonitrile, cyclopentadienyl metal nitrile, cyclopentadienyl metal carbonyl, metal alkoxide, metal ether alkoxide, and metal amides wherein the ligand can be monodentate, bidentate and multidentate coordinating to the metal atom and the metal is selected from group 2 to 14 elements, and (ii) a solvent selected from organic amides including linear amides and cyclic amides for such metal source containing precursors.
    • 描述了用于在衬底上制造保形的含金属膜的用于化学气相沉积工艺的包含原子层沉积的前体液体溶液的金属源。 更具体地说,金属源前体液体溶液由(i)至少一种选自2-二酮酸盐,2-酮亚胺酸盐,二 - 二亚胺,烷基金属,金属羰基,烷基金属羰基,芳基金属,芳基金属羰基 ,环戊二烯基金属,环戊二烯基金属异腈,环戊二烯基金属腈,环戊二烯基金属羰基,金属醇盐,金属醚醇盐和金属酰胺,其中配体可以是单齿,双齿和多齿配位的金属原子,金属选自组2 14元素,和(ⅱ)选自有机酰胺的溶剂,包括用于这种含金属源的前体的线型酰胺和环状酰胺。