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1. 发明申请

WO2006031427A1 BIPOLAR POWER SUPPLY WITH LOSSLESS SNUBBER 审中-公开
标题翻译：双极电源与无忧SNUBBER
公开(公告)号：WO2006031427A1
公开(公告)日：2006-03-23
申请号：PCT/US2005/030695
申请日：2005-08-29
申请人： ADVANCED ENERGY INDUSTRIES, INC.
发明人： HESTERMAN, Bryce, L. , ILIC, Milan , MALININ, Audrey, B.
IPC分类号： H02M5/42
CPC分类号： H02M1/34 , H02M3/33569
摘要： There is provided by this invention an isolated power converter suitable for high power and high voltage applications that has stacked rectifiers that are snubbed with lossless snubber circuits which do not restrict the voltage conversion range.
摘要翻译：本发明提供了一种适用于大功率和高电压应用的隔离电源转换器，其具有堆叠整流器，该整流器利用不限制电压转换范围的无损耗缓冲电路进行缓冲。

2. 发明申请

WO2006023846A1 SOFT SWITCHING INTERLEAVED POWER CONVERTER 审中-公开
标题翻译：软开关互换电源转换器
公开(公告)号：WO2006023846A1
公开(公告)日：2006-03-02
申请号：PCT/US2005/029769
申请日：2005-08-23
申请人： ADVANCED ENERGY INDUSTRIES, INC.
发明人： HESTERMAN, Bryce, L. , ILIC, Milan , MALININ, Andrey, B. , SIDDABATTULA, Kalyan, N.C.
IPC分类号： G05F1/10
CPC分类号： H02M3/1584 , H02M3/07 , H02M2003/075 , H02M2003/076 , H02M2003/1586
摘要： There is provided by this invention soft switching interleaved power converters that are suitable for high power and high voltage applications such as plasma processing. They have greatly reduced switching losses and diode reverse-recovery :losses which allows operation at high switching frequencies. The peak values of the reverse-recovery currents of the diodes are substantially less then their peak forward operating currents. The power converters incorporate power converter cells that comprise a plurality of switching assemblies that are operated with an interleaved switching pattern, and that are each connected to an input terminal of an inductor assembly that also has a common terminal. The inductance between each pair of input terminals is less than the inductance between each input terminal and the common terminal of the inductor assembly.
摘要翻译：本发明提供了适用于诸如等离子体处理的高功率和高电压应用的软切换交错功率转换器。它们大大降低了开关损耗和二极管反向恢复：允许在高开关频率下工作的损耗。二极管的反向恢复电流的峰值明显小于它们的峰值正向工作电流。功率转换器包括功率转换器单元，其包括以交错开关模式操作的多个开关组件，并且每个开关组件都连接到也具有公共端子的电感器组件的输入端子。每对输入端子之间的电感小于每个输入端子和电感器组件的公共端子之间的电感。

3. 发明申请

WO2006014212A2 APPARATUS AND METHOD FOR FAST ARC EXTINCTION WITH EARLY SHUNTING OF ARC CURRENT IN PLASMA 审中-公开
标题翻译：用于在等离子体中早期分流电流的快速电弧灭弧装置和方法
公开(公告)号：WO2006014212A2
公开(公告)日：2006-02-09
申请号：PCT/US2005/020276
申请日：2005-06-09
申请人： ADVANCED ENERGY INDUSTRIES, INC.
发明人： ILIC, Milan , SIDDABATTULA, Kalyan, N.C. , MALININ, Andrey, B.
IPC分类号： B23K9/00
CPC分类号： B23K10/006 , H01J37/32935 , H01J2237/0206 , H05H1/36
摘要： There is provided by this invention a novel apparatus and method of operating a dc plasma process that diverts the power supply current from the plasma at the initiation of an arc, thereby inhibiting energy from flowing from the power supply to the plasma, and then to allow energy to flow again when the power supply re-enables energy flow to the plasma. The diverting means is connected to the output of the power supply to divert current away from the plasma at the initiation of an arc wherein the diverting means is actuated when the arc is detected on the output and diverts the current for a first pre-determined time. The diverting means is released at the end of the first predetermined time before the current reaches zero wherein current is redirected to the plasma and the diverting means is reactivated at the end of a second pre-determined time in the event the arc is not extinguished.
摘要翻译：本发明提供了一种新颖的设备和操作直流等离子体工艺的方法，该工艺在电弧起始时从等离子体转移电源电流，从而抑制能量从电源等离子体，然后当电源重新使能量流向等离子体时允许能量再次流动。转向装置连接到电源的输出，以在电弧开始时将电流从等离子体转移开，其中当在输出端上检测到电弧时转移装置被致动，并将电流转移第一预定时间。在电流达到零之前，转向装置被释放，在电流达到零之前确定的时间，其中电流被转向到等离子体，并且转向装置在电弧不是在第二预定时间结束时被重新激活熄灭。

4. 发明申请

WO2010065806A1 DELIVERED ENERGY COMPENSATION DURING PLASMA PROCESSING 审中-公开
标题翻译：在等离子体加工过程中提供能源补偿
公开(公告)号：WO2010065806A1
公开(公告)日：2010-06-10
申请号：PCT/US2009/066681
申请日：2009-12-04
申请人： ADVANCED ENERGY INDUSTRIES INC. , ILIC, Milan , FILE, Darren
发明人： ILIC, Milan , FILE, Darren
IPC分类号： C23C16/52 , H01J37/32 , C23C16/50 , H01L21/205
CPC分类号： H01J37/3299 , H01J37/32064 , H01J37/32935 , H01J37/32944
摘要： An apparatus and method for controlling an application of power to power a plasma chamber. A detector detects actual power out from the power stage to the plasma chamber during a sampling interval. A compare module compares the actual power out during the sampling interval to a present power setting during the sampling interval and generates a compensation value. An adjust module updates the present power setting for the power stage with the compensation value to provide a new power setting for the power stage to control the power out from power stage to the plasma chamber during the deposition process whereby power losses occurring during the deposition process are compensated during the deposition process. If there is a fixed time period for the deposition process, the compensation method and apparatus may be used to compensate the deposition process for energy losses without extending the duration of the deposition process.
摘要翻译：一种用于控制对等离子体室供电的电力的应用的装置和方法。在采样间隔期间，检测器检测从功率级到等离子体室的实际功率。比较模块将采样间隔期间的实际功率输出与采样间隔期间的当前功率设置进行比较，并生成补偿值。调整模块利用补偿值更新功率级的当前功率设置，以提供功率级的新功率设置，以在沉积过程中控制从功率级到等离子体室的功率，由此在沉积过程中发生功率损耗在沉积过程中得到补偿。如果沉积过程具有固定的时间段，则可以使用补偿方法和装置来补偿沉积过程中的能量损失，而不会延长沉积过程的持续时间。

5. 发明申请

WO2007127896A2 METHOD AND SYSTEM FOR CONDITIONING A VAPOR DEPOSITION TARGET 审中-公开
标题翻译：用于调节蒸发沉积目标的方法和系统
公开(公告)号：WO2007127896A2
公开(公告)日：2007-11-08
申请号：PCT/US2007/067589
申请日：2007-04-27
申请人： ADVANCED ENERGY INDUSTRIES, INC.
发明人： ILIC, Milan , HUFF, Robert , MCDONOUGH, George
IPC分类号： C23C14/32 , C23C14/00
CPC分类号： C23C14/34 , C23C14/54 , H01J37/32935 , H01J37/3299
摘要： A method and system for conditioning a vapor deposition target is described. In one illustrative embodiment, a vapor deposition system is operated in which a vapor deposition target is used, the occurrence of electrical arcs in the vapor deposition system is detected, and the vapor deposition target is conditioned by adjusting an output current of a power supply that powers the vapor deposition system and adjusting an interval during which energy is delivered to each arc to deliver substantially the same energy to each arc. In some embodiments, the energy delivered to each arc is approximately equal to the maximum energy that the vapor deposition target can withstand without being damaged. The described method and system significantly reduces the time required to remove impurities from a target and does not require the venting of the vacuum chamber or the removal of the target from the chamber.
摘要翻译：描述了用于调节气相沉积靶的方法和系统。在一个说明性实施例中，操作气相沉积系统，其中使用气相沉积靶，在气相沉积系统中发现电弧，并且通过调节电源的输出电流来调节气相沉积靶，为气相沉积系统提供动力并调整能量传递到每个电弧的间隔，以向每个电弧输送基本相同的能量。在一些实施例中，输送到每个电弧的能量近似等于气相沉积靶材能够承受而不被损坏的最大能量。所描述的方法和系统显着地减少了从靶中除去杂质所需的时间，并且不需要真空室的排放或者从室中移出靶。

6. 发明申请

WO2006023847A1 DC-DC CONVERTER WITH OVER-VOLTAGE PROTECTION CIRCUIT 审中-公开
标题翻译：带过压保护电路的直流 - 直流转换器
公开(公告)号：WO2006023847A1
公开(公告)日：2006-03-02
申请号：PCT/US2005/029770
申请日：2005-08-23
申请人： ADVANCED ENERGY INDUSTRIES, INC.
发明人： ILIC, Milan , SIDDABATTULA, Kalyan N., C. , SHILO, Vladislav, V.
IPC分类号： B23K9/00
CPC分类号： H01J37/32027 , B23K10/006 , H05H1/36
摘要： There is provided by this invention an apparatus and method of supplying to ignite a plasma wherein in the event of an arc a shunt switch is used to divert the power away from the plasma that is incorporated into an over-voltage protection circuit that controls the shunt switch to act as a boost switch when the arc is extinguished such that the stored inductor energy is used to boost the ignition voltage for reigniting the plasma if it is extinguished. When the arc is extinguished, the inductor current is diminished, and the plasma is ignited, then the switch S1 is turned OFF and the inductor energy goes to the plasma and the power supply operates in its normal operating mode.
摘要翻译：本发明提供了一种用于点燃等离子体的装置和方法，其中在电弧的情况下，使用分流开关将功率转移离开等离子体，该等离子体被结合到控制分流器的过电压保护电路中当电弧熄灭时，切换到起升压开关的作用，使得存储的电感能量用于提升点火电压，以便在等离子体熄灭时重新点燃。当电弧熄灭时，电感电流减小，等离子体点火，开关S1断开，电感能量进入等离子体，电源工作在正常工作状态。

7. 发明申请

WO2008103600A1 ARC RECOVERY WITHOUT OVER-VOLTAGE PLASMA CHAMBER POWER SUPPLIES USING A SHUNT SWITCH 审中-公开
标题翻译：没有超压等离子体电源的ARC恢复使用分流开关
公开(公告)号：WO2008103600A1
公开(公告)日：2008-08-28
申请号：PCT/US2008/054056
申请日：2008-02-15
申请人： ADVANCED ENERGY INDUSTRIES, INC. , ILIC, Milan , SHILO, Vladislav, V. , HUFF, Robert
发明人： ILIC, Milan , SHILO, Vladislav, V. , HUFF, Robert
IPC分类号： G01R31/00
CPC分类号： H05H1/46 , H01J37/32174 , H01J37/32623
摘要： A system and method for over- voltage protection is described. In one embodiment of the invention, an apparatus includes an output port configured to deliver power to a plasma chamber to ignite a plasma. The apparatus also includes a shunt switch in parallel with the output port and a processor configured to receive an indicator of an arc in the plasma. The processor is configured to close the shunt switch for a period of time to divert current away from the arc. The processor is also configured to trigger a pulse of the shunt switch to limit a voltage of an increasing voltage condition associated with the arc.
摘要翻译：描述了一种用于过电压保护的系统和方法。在本发明的一个实施例中，一种装置包括输出端口，该输出端口被配置为向等离子体室输送功率以点燃等离子体。该装置还包括与输出端口并联的分流开关和被配置为接收等离子体中的电弧指示器的处理器。处理器被配置为将分流开关关闭一段时间以将电流转移离开电弧。处理器还被配置为触发分流开关的脉冲以限制与电弧相关联的增加的电压状态的电压。

8. 发明申请

WO2006014215A2 DC POWER SUPPLY UTILIZING REAL TIME ESTIMATION OF DYNAMIC IMPEDANCE 审中-公开
标题翻译：直流电源利用动态阻抗的实时估计
公开(公告)号：WO2006014215A2
公开(公告)日：2006-02-09
申请号：PCT/US2005/020393
申请日：2005-06-09
申请人： ADVANCED ENERGY INDUSTRIES, INC.
发明人： ILIC, Milan , SIDDABATTULA, Kalyan, N. C. , ROOP, Gerald, C., Jr. , CHRISTIE, David, J.
IPC分类号： H01J7/24
CPC分类号： H01J37/3405 , H01J37/32027 , H01J37/3299 , H05H1/46
摘要： There is provided by this invention an apparatus and method for controlling a dc magnetron plasma processing system that automatically adjusts the control signal to the power supply based upon the dynamic impedance of the load to control the output power to the plasma. The output voltage and the output current of the power supply that supplies power to the plasma is sampled over at a sampling frequency at least four to five times higher than the switching frequency and the dynamic impedance of the plasma is calculated based upon the sampled voltage and current from the algorithm R plasma = Δ V n wherein ΔV n , and ΔI n is the maximum Δ I n difference among samples on one switching cycle. If the dynamic impedance seen is negative in nature then the control signal is compensated accordingly.
摘要翻译：本发明提供一种用于控制直流磁控管等离子体处理系统的装置和方法，该系统基于负载的动态阻抗自动调节对电源的控制信号，以控制等离子体的输出功率。向等离子体供电的电源的输出电压和输出电流以比开关频率至少高四至五倍的采样频率被采样，并且基于采样电压来计算等离子体的动态阻抗，来自算法

9. 发明申请

WO2010065942A1 ARC RECOVERY WITH OVER-VOLTAGE PROTECTION FOR PLASMA-CHAMBER POWER SUPPLIES 审中-公开
标题翻译：电弧恢复与等离子体电源的过电压保护
公开(公告)号：WO2010065942A1
公开(公告)日：2010-06-10
申请号：PCT/US2009/066899
申请日：2009-12-05
申请人： ADVANCED ENERGY INDUSTRIES, INC. , ILIC, Milan
发明人： ILIC, Milan
IPC分类号： H05H1/00 , H01J37/00 , H02H9/00
CPC分类号： B23K10/006 , H01J37/32045 , H05H1/46
摘要： A system and method for managing power delivered to a processing chamber is described. In one embodiment current is drawn away from the plasma processing chamber while initiating an application of power to the plasma processing chamber during an initial period of time, the amount of current being drawn away decreasing during the initial period of time so as to increase the amount of power applied to the plasma processing chamber during the initial period of time.
摘要翻译：描述了用于管理传送到处理室的功率的系统和方法。在一个实施例中，电流从等离子体处理室被拉出，同时在初始时间段期间开始向等离子体处理室施加电力，在初始时间段内电流的量被减少，从而增加量在初始时间期间施加到等离子体处理室的功率。

10. 发明申请

WO2010065493A1 DIGITAL CHARGE-MODE CONTROL OF A POWER SUPPLY 审中-公开
标题翻译：电源数字充电模式控制
公开(公告)号：WO2010065493A1
公开(公告)日：2010-06-10
申请号：PCT/US2009/066183
申请日：2009-12-01
申请人： ADVANCED ENERGY INDUSTRIES, INC. , ILIC, Milan , SHILO, Vladishav, V.
发明人： ILIC, Milan , SHILO, Vladishav, V.
IPC分类号： G05B11/01 , G05F1/10
CPC分类号： H02M3/157 , H02M2001/0019
摘要： Disclosed herein are an apparatus and method for charge-mode control. An embodiment of a charge mode controller may include an analog/digital converter configured to monitor the current through a duty cycle switch and convert the current to a switch current value; an accumulator module configured to integrate the switch current value during the switching cycle and output an accumulated charge value; and a comparator module responsive to the accumulated charge value and a charge set point configured to generate a gate drive signal for the duty cycle switch that turns the duty cycle switch ON when the accumulated charge value is less than the charge set point and turns the duty cycle switch OFF when the accumulated charge value reaches the charge set point and thereby controls the duty cycle of the converter and the power supplied by the power stage.
摘要翻译：这里公开了一种用于充电模式控制的装置和方法。充电模式控制器的实施例可以包括模拟/数字转换器，其被配置为监视通过占空比开关的电流并将电流转换为开关电流值; 累加器模块，被配置为在开关周期期间积分开关电流值，并输出累积电荷值; 以及响应于所述累积电荷值的比较器模块和被配置为产生所述占空比开关的栅极驱动信号的充电设定点，所述占空比开关在所述累积电荷值小于所述充电设定点时将所述占空比开关导通，并且使所述占空比当累积电荷值达到充电设定点时，循环开关OFF，从而控制转换器的占空比和由功率级提供的电力。

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