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    • 5. 发明公开
    • 정규 분포의 광을 갖는 조명계, 프로젝션 시스템 및칼라화상 형성방법
    • 提供高斯分布光照射系统的照明系统,投影系统和形成彩色图像的方法,其中安装了SLIT以控制排放角度
    • KR1020040082917A
    • 2004-09-30
    • KR1020030029753
    • 2003-05-12
    • 삼성전자주식회사
    • 조건호김대식김성하이희중
    • G02B27/18
    • H04N9/315H04N9/3117
    • PURPOSE: An illumination system provided with Gaussian distribution light, a projection system and a method for forming a color image are provided to improve the optical efficiency by making the light passing through the slit have Gaussian distribution in a color scrolling direction. CONSTITUTION: An illumination system provided with Gaussian distribution light includes a first cylindrical lens array(72), a second cylindrical lens array(73) and a relay lens(75). The first cylindrical lens array(72) divides the light emitted from the light source into a plurality of light beams by each of the cylindrical lens. The second cylindrical lens array(73) converges the light beams divided by the first cylindrical lens array(72) into a predetermined direction. And, the relay lens(75) makes the majority of the light beams passing through the second cylindrical lens array(73) have Gaussian distribution by overlapping it on a predetermined region.
    • 目的:提供一种具有高斯分配光的照明系统,投影系统和形成彩色图像的方法,通过使通过狭缝的光在彩色滚动方向上具有高斯分布来提高光学效率。 构成:具有高斯配光的照明系统包括第一柱面透镜阵列(72),第二柱面透镜阵列(73)和中继透镜(75)。 第一柱面透镜阵列(72)通过每个柱面透镜将从光源发射的光分成多个光束。 第二柱面透镜阵列(73)将由第一柱面透镜阵列(72)分割的光束会聚到预定方向。 并且,中继透镜75使通过第二柱面透镜阵列73的大部分光束通过在预定区域上重叠而具有高斯分布。
    • 6. 发明公开
    • 칼라 조명장치 및 이를 채용한 화상투사장치
    • 彩色照明设备和图像投影仪
    • KR1020040068691A
    • 2004-08-02
    • KR1020030005194
    • 2003-01-27
    • 삼성전자주식회사
    • 김대식조건호김성하이희중
    • G03B21/14
    • H04N9/3117
    • PURPOSE: A color illuminating device and an image projector are provided to illuminate high-density colored light and give high-density image by making a compact size for an optical system structure and simplify the optical system structure. CONSTITUTION: A color illuminating device includes a light source(60), a color filter(70), a spiral lens disc, and a beam splitter. The light source creates and projects light. The color filer(70) enables white light to progress in a predetermined direction. The white light is split according to wavelength area. The spiral lens disc includes a plurality of cylindrical lens arrays. The cylindrical lens arrays has a spiral surface. The cylindrical lens arrays periodically scrolls split light. The image projector includes a light source, a color filter, a beam splitter, an optical unit, and a projection lens unit.
    • 目的:提供彩色照明装置和图像投影仪,以照亮高密度彩色光,并通过为光学系统结构制造紧凑的尺寸并提供高密度图像,并简化光学系统结构。 构成:彩色照明装置包括光源(60),滤色器(70),螺旋透镜盘和分束器。 光源创建并投射光。 彩色滤光片(70)使得白光能够沿预定方向前进。 白光根据波长区域分裂。 螺旋透镜盘包括多个柱面透镜阵列。 柱面透镜阵列具有螺旋表面。 柱面透镜阵列周期性地滚动分光。 图像投影仪包括光源,滤色器,分束器,光学单元和投影透镜单元。
    • 7. 发明公开
    • 광 파이프와 칼라 조명장치 및 이를 채용한 화상투사장치
    • 光管和彩色照明装置和使用其的图像投影装置
    • KR1020040055544A
    • 2004-06-26
    • KR1020030004840
    • 2003-01-24
    • 삼성전자주식회사
    • 김성하조건호김대식이희중
    • G03B33/12
    • PURPOSE: An optical pipe and a color illumination device and an image projection apparatus employing the same are provided to efficiently use light by using the optical pipe allowing incident white light to be split into each colored-light and by providing the color illumination device capable of illuminating the colored-light. CONSTITUTION: An optical pipe and a color illumination device and an image projection apparatus employing the same include a first dichromatic prism(79), a second dichromatic prism(81), a third dichromatic prism(83), and a reflection surface. The first dichromatic prism(79) is slidably arranged to an incident light shaft. The first dichromatic includes a first mirror surface(80). The first mirror surface(80) reflects a first colored-light and transmits remaining colored-light. The second dichromatic prism(81) is slidably arranged to the incident light shaft. The second dichromatic prism(81) has a second mirror surface(82). The second mirror surface(82) reflects a second colored-light and transmits remaining light.
    • 目的:提供一种光管和彩色照明装置以及采用该光管的图像投影装置,通过使用允许入射的白光分裂成各色光的光学管道,通过提供能够 照亮彩色光。 构成:光管和彩色照明装置以及使用其的图像投影装置包括第一二色棱镜(79),第二二色棱镜(81),第三二色棱镜(83)和反射面。 第一二色棱镜(79)可滑动地布置到入射光轴上。 第一二色体包括第一镜面(80)。 第一镜面(80)反射第一着色光并透过剩余的彩色光。 第二二色棱镜(81)可滑动地布置到入射光轴上。 第二二色棱镜(81)具有第二镜面(82)。 第二镜面(82)反射第二着色光并透过剩余的光。
    • 8. 发明授权
    • 반도체 롬 장치 형성 방법
    • 반도체롬장치형성방법
    • KR100428769B1
    • 2004-04-28
    • KR1020010035701
    • 2001-06-22
    • 삼성전자주식회사
    • 이희중윤기창
    • H01L21/8246
    • H01L27/11253H01L21/28273H01L29/66825
    • A ROM device is fabricated by forming a first conductive layer pattern including a sidewall, on an insulating layer on an integrated circuit substrate. Ions are implanted into the integrated circuit substrate using the first conductive layer pattern as an implantation mask. At least a portion of the integrated circuit substrate, and at least a portion of the sidewall are thermally oxidized, to form a thermal oxide layer on at least a portion of the integrated circuit substrate and on the sidewall, and to form a buried doping layer from the implanted ions beneath the thermal oxide layer. A second conductive layer pattern is then formed on at least a portion of the thermal oxide layer and on at least a portion of the first conductive layer pattern.
    • 通过在集成电路衬底上的绝缘层上形成包括侧壁的第一导电层图案来制造ROM器件。 使用第一导电层图案作为注入掩模将离子注入到集成电路衬底中。 集成电路衬底的至少一部分和侧壁的至少一部分被热氧化,以在集成电路衬底的至少一部分上和侧壁上形成热氧化物层,并且形成掩埋掺杂层 来自热氧化层下面的注入离子。 然后在热氧化物层的至少一部分上和第一导电层图案的至少一部分上形成第二导电层图案。
    • 9. 发明公开
    • 반도체 소자의 컨택 형성 방법
    • 形成半导体器件接触的方法
    • KR1020010068782A
    • 2001-07-23
    • KR1020000000887
    • 2000-01-10
    • 삼성전자주식회사
    • 이희중이운경김의도피민석
    • H01L21/28
    • PURPOSE: A method for forming a contact of a semiconductor device is provided to form a contact having an anchor structure with forming the contact one time without adding a number of processes. CONSTITUTION: The method includes six steps. The first step is to prepare a silicon substrate(30) on the upper surface of which first through third insulating films(32,34,35) are sequentially formed. The second insulating film is formed of an insulating material the etching rate of which is larger than those of the first and second insulating films. The second step is to form a contact hole(38) by etching the insulating layers using a dry etch so that the upper surface of the silicon substrate is exposed. The third step is to etch using a wet etch to remove a silicon oxide film formed on the upper surface of the silicon substrate exposed via the contact hole. The fourth step is to form a metal base layer on the third insulating layer including the contact hole. The fifth step is to form a contact metal layer on the metal base layer so as to capable of charging the contact hole. The sixth step is to form a contact by removing the contact metal layer of the upper of the metal base layer on the third insulating layer. In the third step, the second insulating film exposed to the contact hole is more wet-etched in the direction of the inside than the first and third insulating films, thereby the contact formed to the contact hole in the sixth step is solidly fixed.
    • 目的:提供一种用于形成半导体器件的接触的方法,以形成具有锚定结构的触点,形成触点一次,而不增加多个工艺。 规定:该方法包括六个步骤。 第一步是在其上依次形成第一至第三绝缘膜(32,34,35)的上表面上制备硅衬底(30)。 第二绝缘膜由绝缘材料形成,其蚀刻速率大于第一和第二绝缘膜的蚀刻速率。 第二步是通过使用干蚀刻蚀刻绝缘层以形成硅衬底的上表面而露出接触孔(38)。 第三步骤是使用湿蚀刻来蚀刻以除去在经由接触孔暴露的硅衬底的上表面上形成的氧化硅膜。 第四步骤是在包括接触孔的第三绝缘层上形成金属基层。 第五步是在金属基底层上形成接触金属层,以便能够对接触孔充电。 第六步是通过去除第三绝缘层上金属基层的上部的接触金属层来形成接触。 在第三步骤中,暴露于接触孔的第二绝缘膜在内部的方向上比第一和第三绝缘膜更湿式蚀刻,从而在第六步骤中与接触孔形成的接触牢固地固定。