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    • 4. 发明公开
    • 표시 장치
    • 显示设备
    • KR1020090074518A
    • 2009-07-07
    • KR1020080000328
    • 2008-01-02
    • 삼성디스플레이 주식회사한국과학기술원
    • 장재혁노남석신성식배주한이경호윤준보
    • G02F1/136G02F1/1343
    • G02B26/02G02B26/04
    • A display device is provided to remove a signal line for applying voltage to an isolated member, thereby simplifying a structure of the display device. The first electrode(121) and the second electrode(151) are formed on a substrate. The first voltage is applied to the first electrode. The second voltage having polarity opposite to the first voltage is applied to the second electrode. An insulating layer(180) is formed on the first electrode and the second electrode. An electrically isolated member(191) is formed on the insulating layer. An induction charge is generated in the isolated member by application of the first and second voltages. Light transmittance is controlled according as the first and second voltages are applied.
    • 提供显示装置以去除用于向隔离构件施加电压的信号线,从而简化了显示装置的结构。 第一电极(121)和第二电极(151)形成在基板上。 第一电压施加到第一电极。 具有与第一电压相反的极性的第二电压被施加到第二电极。 绝缘层(180)形成在第一电极和第二电极上。 在绝缘层上形成电隔离部件(191)。 通过施加第一和第二电压在隔离构件中产生感应电荷。 根据施加第一和第二电压来控制透光率。
    • 5. 发明公开
    • 표시 기판 및 그 제조 방법
    • 显示基板及其制造方法
    • KR1020080032905A
    • 2008-04-16
    • KR1020060099018
    • 2006-10-11
    • 삼성디스플레이 주식회사
    • 조승환송근규신성식김보성
    • G02F1/136
    • G02F1/1362B41J2/01G02F1/1368G02F2001/136231H01L27/1214
    • A display substrate and a manufacturing method thereof are provided to form a gate electrode by performing a photo process once and form source and drain electrodes by performing the photo process once, thereby reducing the number of process steps, improving productivity and reducing manufacturing costs. A gate conductive film is formed on a substrate(1). A first photoresist film pattern having a first thickness by area and a second thickness bigger than the first thickness is formed on the gate conductive film. By using the first photoresist film pattern, the gate conductive film is patterned and a gate electrode(11) formed. A first bank(20) for partially exposing the gate electrode is formed by removing the first photoresist film pattern as much as the first thickness. On the first bank, a data conductive film is formed. On the data conductive film, a second photoresist film pattern is formed. The second photoresist film pattern has a third thickness by area and a fourth thickness bigger than the third thickness, and exposes the data conductive film at a predetermined area on the gate electrode. By using the second photoresist film pattern, the exposed data conductive film is patterned. A source electrode(41), a drain electrode(42) spaced from the source electrode and a pixel electrode(50) connected to an end of the drain electrode are formed. By removing the second photoresist film pattern as much as the third thickness, a second bank(60) for exposing an area where the pixel electrode is formed is formed. By applying a first organic film to the spaced area between the source and drain electrodes on the gate electrode through an inkjet mode, a gate insulating film pattern(70) is formed. By applying a second organic film onto the gate insulating film pattern through the inkjet mode, a semiconductor film pattern(80) is formed.
    • 提供显示基板及其制造方法,通过进行一次光刻处理来形成栅电极,通过进行一次照相处理形成源极和漏极,从而减少处理步骤的数量,提高生产率并降低制造成本。 在基板(1)上形成栅极导电膜。 在栅极导电膜上形成具有第一厚度区域和大于第一厚度的第二厚度的第一光致抗蚀剂膜图案。 通过使用第一光致抗蚀剂膜图案,对栅极导电膜进行图案化并形成栅电极(11)。 通过将第一光致抗蚀剂膜图案除去第一厚度来形成用于部分曝光栅电极的第一堤(20)。 在第一组上形成数据导电膜。 在数据导电膜上形成第二光刻胶膜图案。 第二光致抗蚀剂膜图案具有第三厚度区域和大于第三厚度的第四厚度,并且将数据导电膜暴露在栅电极上的预定区域。 通过使用第二光致抗蚀剂膜图案,对曝光的数据导电膜进行图案化。 形成源极电极(41),与源电极间隔开的漏电极(42)和连接到漏电极的端部的像素电极(50)。 通过除去与第三厚度相同的第二光致抗蚀剂图案,形成用于曝光形成像素电极的区域的第二堤岸(60)。 通过喷墨方式将第一有机膜施加到栅电极上的源极和漏极之间的间隔区域,形成栅极绝缘膜图案(70)。 通过通过喷墨模式将第二有机膜施加到栅极绝缘膜图案上,形成半导体膜图案(80)。
    • 6. 发明公开
    • 표시 기판 및 이를 구비한 전기영동 표시장치
    • 显示基板和具有该基板的电子显示装置
    • KR1020080031602A
    • 2008-04-10
    • KR1020060121945
    • 2006-12-05
    • 삼성디스플레이 주식회사
    • 배주한송근규신성식김보성
    • G02F1/167
    • G02F1/167C25D1/12G02F2001/1676G02F2001/1678G02F2201/123
    • A display substrate and an electro phoretic display having the same are provided to form a passivation layer for covering a TFT(Thin Film Transistor) layer through an opaque pixel electrode and opaque material, thereby preventing deterioration of luminance caused by leaked light and preventing leakage currents of a TFT caused by the leaked light. A display substrate for an electro phoretic display comprises the followings. A gate line is formed on an insulating substrate(110). A data line(172) is prolonged in a direction of crossing the gate line. A switching device is connected to the gate line and the data line. A pixel electrode is electrically connected with the switching device and includes a reflection electrode layer for reflecting light and an absorption electrode layer for absorbing the light.
    • 提供显示基板和具有该显示基板的电泳显示器以形成用于通过不透明像素电极和不透明材料覆盖TFT(薄膜晶体管)层的钝化层,从而防止由泄漏光引起的亮度劣化并防止漏电流 由漏光引起的TFT。 用于电泳显示器的显示基板包括以下部件。 在绝缘基板(110)上形成栅极线。 数据线(172)在与栅极线交叉的方向上延长。 开关器件连接到栅极线和数据线。 像素电极与开关器件电连接,并且包括用于反射光的反射电极层和用于吸收光的吸收电极层。
    • 7. 发明公开
    • 표시 장치 및 그 제조 방법
    • 显示装置及其制造方法
    • KR1020080013168A
    • 2008-02-13
    • KR1020060074304
    • 2006-08-07
    • 삼성디스플레이 주식회사한국과학기술원
    • 장재혁신성식노남석윤준보이경호
    • G02F1/1335G02F1/1339
    • B29D11/00365G02B5/201G02B26/02G09F9/372
    • A display device and a manufacturing method thereof are provided to display images by adjusting light transmittance according as a micro shutter electrode is opened by electrostatic force, and remove the necessity for forming a special spacer by performing a function of the spacer by using a fixed electrode. A display device comprises an upper substrate(210), a black matrix(220), a color filter(230), a lower substrate(110), a micro shutter electrode(190) and a fixed electrode(270). The black matrix is formed in the upper substrate. The color filter is formed between the black matrixes. The micro shutter electrode is formed on the lower substrate, and has a re-closable structure. The fixed electrode is vertically formed.
    • 提供一种显示装置及其制造方法,通过利用静电力打开微型快门电极,通过调整透光率来显示图像,并且通过使用固定电极来执行间隔物的功能而消除形成特殊间隔物的必要性 。 显示装置包括上基板(210),黑矩阵(220),滤色器(230),下基板(110),微快门电极(190)和固定电极(270)。 黑色矩阵形成在上基板中。 滤色器形成在黑色矩阵之间。 微型快门电极形成在下基板上,并且具有可重新闭合的结构。 固定电极是垂直形成的。