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    • 1. 发明专利
    • 被覆カーボンナノチューブの製造方法
    • 涂覆碳纳米管的制造方法
    • JP2015048291A
    • 2015-03-16
    • JP2013182636
    • 2013-09-04
    • 長野県Nagano Prefecture日立造船株式会社Hitachi Zosen Corp
    • TAKIZAWA SHUICHIMAKIMURA MIKANAMASUGI KOICHITAKIYA TOSHIOHIRAOKA KAZUYUKI
    • C01B31/02
    • 【課題】垂直配向のカーボンナノチューブのそれぞれの全周囲に被覆膜を容易に形成することができるとともに、品質を向上させることができる被覆カーボンナノチューブの製造方法を提供する。【解決手段】被覆膜3を垂直配向のカーボンナノチューブ2の全周囲に形成してなる被覆カーボンナノチューブ1の製造方法であって、上記被覆膜3と同一の材料からなる基板Kに垂直配向のカーボンナノチューブ2を配置し、上記被覆膜3と同一の材料からなる材料供給板Mを、上記垂直配向のカーボンナノチューブ2に対面させるように配置し、上記垂直配向のカーボンナノチューブ2が配置された基板Kと、上記材料供給板Mとを加熱することで、基板Kおよび材料供給板Mの材料を昇華させてカーボンナノチューブ2に付着させ、上記被覆膜3を形成する。【選択図】図7
    • 要解决的问题:提供一种涂覆碳纳米管的制造方法,其能够在垂直取向的每个碳纳米管的整个周边容易地形成涂膜,并且提高质量。溶液:涂膜3形成在 制作涂布碳纳米管1的碳纳米管2的整个周边。垂直取向的碳纳米管2配置在由与涂膜3相同的材料制成的基板K上,以及供给基板M由 与涂膜3相同的材料被布置成与垂直取向的碳纳米管2相对。 布置有垂直取向的碳纳米管2的基板K和材料供给板M被加热以使基板K和材料供给板M的材料隆起。升华的材料沉积在碳纳米管2上以形成涂层 电影3。
    • 3. 发明专利
    • Method for producing coated carbon nanotube
    • 生产涂覆碳纳米管的方法
    • JP2013173650A
    • 2013-09-05
    • JP2012039462
    • 2012-02-27
    • Nagano Prefecture長野県Hitachi Zosen Corp日立造船株式会社
    • TAKIZAWA SHUICHIMAKIMURA MIKAHIRAOKA KAZUYUKITAKITANI TOSHIO
    • C01B31/02B01J32/00B82Y30/00B82Y40/00C23C14/18
    • PROBLEM TO BE SOLVED: To provide a method for producing a coated carbon nanotube by which coating films can easily be formed on the respective entire circumferences of vertically aligned carbon nanotubes.SOLUTION: In a method for producing a coated carbon nanotube 1 by forming coating films 3 on the respective entire circumferences of vertically aligned carbon nanotubes 2, the vertically aligned carbon nanotubes 2 are arranged on a substrate K made of the same material as the coating films 3, and the substrate K on which the vertically aligned carbon nanotubes 2 have been arranged and a powder material M of the coating films 3 are heated at the same time, whereby the material of the substrate K and the powder material M are sublimed and attached to the carbon nanotubes 2 to form the coating films 3.
    • 要解决的问题:提供一种用于制造涂覆的碳纳米管的方法,其中可以容易地在垂直排列的碳纳米管的整个周边上形成涂膜。解决方案:在通过形成涂布膜来制造涂覆的碳纳米管1的方法 如图3所示,在垂直取向的碳纳米管2的各个周长上,垂直排列的碳纳米管2被布置在由与涂膜3相同的材料制成的基板K上,并且在其上具有垂直排列的碳纳米管2的基板K 并且同时加热涂膜3的粉末材料M,由此将基材K和粉末材料M的材料升华并附着到碳纳米管2上以形成涂膜3。
    • 4. 发明专利
    • Cvd apparatus for forming carbon nanotube
    • 形成碳纳米管的CVD装置
    • JP2011195397A
    • 2011-10-06
    • JP2010065370
    • 2010-03-23
    • Hitachi Zosen Corp日立造船株式会社
    • SUGIMOTO ITSUOHIRAOKA KAZUYUKITAKANABE KOJITAKITANI TOSHIOKIRA KOJIHARADA MAKI
    • C01B31/02
    • PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus which can obtain carbon nanotubes grown in a desired shape even on a substrate coated with a catalyst all over.SOLUTION: The CVD apparatus for forming carbon nanotubes has a heating chamber 13 in which the substrate K coated with the catalyst is disposed and which can keep a predetermined degree of vacuum, wherein a raw material gas G is supplied to the substrate K and carbon nanotubes are grown by a thermochemical vapor growth method. The CVD apparatus includes a plurality of gas guide duct bodies 23 for leading the raw material gas G to carbon nanotube formation ranges of the substrate K and a plurality of gas introduction pipes 5 the one end of each of which is connected to each gas guide duct body 23 to introduce the raw material gas G into the gas guide duct body 23.
    • 要解决的问题:提供一种即使在涂覆有催化剂的基材上也可以获得以所需形状生长的碳纳米管的气相沉积装置。解决方案:用于形成碳纳米管的CVD装置具有加热室13,其中基板 设置涂布有催化剂的K,并且可以保持预定的真空度,其中原料气体G被供给到基板K,并且通过热化学气相生长法生长碳纳米管。 CVD装置包括多个气体引导管体23,用于将原料气体G引导到基板K的碳纳米管形成范围和多个气体导入管5,每个气体导入管5的一端连接到每个气体导管 主体23将原料气体G引入气体导管体23。
    • 6. 发明专利
    • Solar cell device
    • 太阳能电池装置
    • JP2014086601A
    • 2014-05-12
    • JP2012235216
    • 2012-10-25
    • Hitachi Zosen Corp日立造船株式会社
    • HIRAOKA KAZUYUKIMIURA SEIKISHIMOMA YASUHIKO
    • H01L31/06H01L31/042
    • Y02E10/52
    • PROBLEM TO BE SOLVED: To provide a solar cell device capable of enhancing photoelectric conversion efficiency.SOLUTION: A solar cell device consists of: a first binary lens 2 on which sunlight is made incident and with which it is converged; a second binary lens 3 with a small diameter for parallelizing sunlight converged by the first binary lens 2; diffraction gratings 4to 4split symmetrically on both left and right sides depending on wave length by incoming sunlight parallelized by the second binary lens 3 and arranged in three stages; a solar cell 5 which makes each lights (wave length:λto λ) split by each diffraction gratings 4, be incident and performs photoelectric conversion; and a voltage regulator 7 for guiding electric power obtained by the solar cell 5 via an electric wire 6, and regulating to a desired voltage and outputting the power.
    • 要解决的问题:提供一种能够提高光电转换效率的太阳能电池装置。解决方案:一种太阳能电池装置由以下部分组成:第一二元透镜2,入射太阳光并与其会聚; 由第一二次透镜2收敛的用于平行化太阳的小直径的第二二进制透镜3; 衍射光栅4至4根据由第二二进制透镜3平行的入射太阳光的波长而在左右两侧对称分布并分三个布置; 使每个衍射光栅4分裂的每个光(波长λtoλ)入射并进行光电转换的太阳能电池5; 以及电压调节器7,用于经由电线6引导由太阳能电池5获得的电力,并调节到期望的电压并输出电力。
    • 9. 发明专利
    • Vacuum deposition device
    • 真空沉积装置
    • JP2012136761A
    • 2012-07-19
    • JP2010291415
    • 2010-12-28
    • Hitachi Zosen Corp日立造船株式会社
    • HIRAOKA KAZUYUKISUGIMOTO ITSUOTAKANABE KOJIIMASAKA REISHIHARADA MAKIKIRA KOJI
    • C23C16/455C01B31/02
    • PROBLEM TO BE SOLVED: To provide a vacuum deposition device that has a gas exhaust means capable of controlling a generation of chemical synthetic material including a harmful material like a tar material or the like at the exhaust side with an inexpensive structure.SOLUTION: The vacuum deposition device is a thermal CVD device which includes a heating device 21 disposing a substrate K horizontally and heating the upper side of the substrate K, a heating chamber 13 which is provided with a gas supply port 5 at the bottom capable of introduction of a source gas G, and can deposit a deposition material to the lower side surface of the substrate. Furthermore, the thermal CVD device includes a gas guiding duct 24 capable of introducing the source gas from the gas supply port 5 to the lower side surface of the substrate in the heating chamber, wherein a clearance δ is formed between an upper side edge surface of the gas guiding duct and the lower side surface of the substrate, and includes a substrate height maintaining member 25 capable of maintaining the height position of the substrate at the upper position of the substrate, and the gas exhaust device 23 having a vacuum pump 27 at the upper wall part of the heating chamber.
    • 解决问题:提供一种真空沉积装置,该真空沉积装置具有能够以廉价的结构在废气侧控制包括诸如焦油材料等的有害物质的化学合成材料的产生的排气装置。

      解决方案:真空沉积装置是一种热CVD装置,其包括加热装置21,其水平地设置基板K并加热基板K的上侧;加热室13,其在该处设置有气体供给口5 底部能够引入源气体G,并且可以将沉积材料沉积到衬底的下侧表面。 此外,热CVD装置包括能够将气体从气体供给口5引入加热室内的基板的下侧面的气体引导管道24,其中在上部侧边缘表面 气体引导管和基板的下侧表面,并且包括能够将基板的高度位置保持在基板的上部位置的基板高度保持构件25,以及具有真空泵27的排气装置23 加热室的上壁部分。 版权所有(C)2012,JPO&INPIT