专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20090257647A1 Method and Apparatus for Inspecting Defects 有权
标题翻译：检查缺陷的方法和装置
公开(公告)号：US20090257647A1
公开(公告)日：2009-10-15
申请号：US12420932
申请日：2009-04-09
申请人： Yasuhiro Yoshitake , Hiroyuki Nakano , Yukihiro Shibata
发明人： Yasuhiro Yoshitake , Hiroyuki Nakano , Yukihiro Shibata
IPC分类号： G06K9/00 , H04N5/335
CPC分类号： G06K9/00 , G01N21/9501 , G06T7/0004 , G06T2207/30148 , H04N5/341 , H04N5/3743 , H04N5/378
摘要： A two-dimensional sensor is installed inclining at a predetermined angle to a moving direction of a stage on which an object to be inspected is mounted and, in synchronism with the movement of the stage, a picked up image is rearranged so that there can be obtained an image in high-density sampling with a picture-element size or less of the two-dimensional sensor with respect to a wafer. Thus, interpolation calculation during position alignment becomes unnecessary, and size calculation and classification of a defect can be performed with high accuracy.
摘要翻译：将二维传感器安装成倾斜预定角度，使其与安装被检查物体的平台的移动方向倾斜，并且与舞台的移动同步，拾取图像被重新排列，使得可以以相对于晶片的二维传感器的像素大小或更小的高密度采样获得图像。因此，位置对准中的插补计算变得不必要，可以高精度地执行缺陷的尺寸计算和分类。

2. 发明授权

US08121398B2 Method and apparatus for inspecting defects 有权
标题翻译：检查缺陷的方法和装置
公开(公告)号：US08121398B2
公开(公告)日：2012-02-21
申请号：US12420932
申请日：2009-04-09
申请人： Yasuhiro Yoshitake , Hiroyuki Nakano , Yukihiro Shibata
发明人： Yasuhiro Yoshitake , Hiroyuki Nakano , Yukihiro Shibata
IPC分类号： G06K9/00 , H04N5/335
CPC分类号： G06K9/00 , G01N21/9501 , G06T7/0004 , G06T2207/30148 , H04N5/341 , H04N5/3743 , H04N5/378
摘要： A two-dimensional sensor is installed inclining at a predetermined angle to a moving direction of a stage on which an object to be inspected is mounted and, in synchronism with the movement of the stage, a picked up image is rearranged so that there can be obtained an image in high-density sampling with a picture-element size or less of the two-dimensional sensor with respect to a wafer. Thus, interpolation calculation during position alignment becomes unnecessary, and size calculation and classification of a defect can be performed with high accuracy.
摘要翻译：将二维传感器安装成倾斜预定角度，使其与安装被检查物体的平台的移动方向倾斜，并且与舞台的移动同步，拾取图像被重新排列，使得可以以相对于晶片的二维传感器的像素大小或更小的高密度采样获得图像。因此，位置对准中的插补计算变得不必要，可以高精度地执行缺陷的尺寸计算和分类。

3. 发明申请

US20090213215A1 DEFECT INSPECTION APPARATUS AND METHOD 有权
标题翻译：缺陷检查装置和方法
公开(公告)号：US20090213215A1
公开(公告)日：2009-08-27
申请号：US12389962
申请日：2009-02-20
申请人： Yukihiro Shibata , Yasuhiro Yoshitake
发明人： Yukihiro Shibata , Yasuhiro Yoshitake
IPC分类号： H04N7/18 , G06K9/00
CPC分类号： G01N21/9501 , G01N21/95607 , G06T7/0004 , G06T2207/10152 , G06T2207/30148
摘要： In a defect inspection apparatus for inspecting a wafer provided with a circuit pattern for defects, the illuminating direction of illuminating light rays is selectively determined such that an area containing a defect that scatters light of high intensity coincides with the aperture of a dark-field detecting system, and such that regularly reflected light regularly reflected by a pattern, which is noise to defect detection, does not coincide with the aperture of the dark field detecting system.
摘要翻译：在用于检查具有缺陷的电路图案的晶片的缺陷检查装置中，选择性地确定照明光线的照明方向，使得包含散射高强度的光的缺陷的区域与暗场检测的孔径一致系统，并且使得通过由缺陷检测的噪声的图案规则反射的规则反射光与暗视场检测系统的孔径不一致。

4. 发明申请

US20090279079A1 METHOD AND APPARATUS FOR INSPECTING DEFECTS 有权
标题翻译：检查缺陷的方法和装置
公开(公告)号：US20090279079A1
公开(公告)日：2009-11-12
申请号：US12423902
申请日：2009-04-15
申请人： Yukihiro Shibata , Yasuhiro Yoshitake
发明人： Yukihiro Shibata , Yasuhiro Yoshitake
IPC分类号： G01N21/88
CPC分类号： G01N21/95623 , G01N2021/9563 , G03F7/7065
摘要： To provide a defect inspection apparatus for inspecting defects of a specimen without lowering resolution of a lens, without depending on a polarization characteristic of a defect scattered light, and with high detection sensitivity that is realized by the following. A detection optical path is branched by at least one of spectral splitting and polarization splitting, a spatial filter in the form of a two-dimensional array is disposed after the branch, and only diffracted light is shielded by the spatial filter in the form of a two-dimensional array.
摘要翻译：提供一种用于检查样本缺陷的缺陷检查装置，而不会降低透镜的分辨率，而不依赖于缺陷散射光的偏振特性，并且具有通过以下实现的高检测灵敏度。通过光谱分离和偏振分割中的至少一个来分支检测光路，在分支之后设置二维阵列形式的空间滤波器，只有衍射光被空间滤波器屏蔽二维数组。

5. 发明授权

US08416402B2 Method and apparatus for inspecting defects 有权
标题翻译：检查缺陷的方法和装置
公开(公告)号：US08416402B2
公开(公告)日：2013-04-09
申请号：US13483104
申请日：2012-05-30
申请人： Yukihiro Shibata , Yasuhiro Yoshitake
发明人： Yukihiro Shibata , Yasuhiro Yoshitake
IPC分类号： G01N21/00
CPC分类号： G01N21/95623 , G01N2021/9563 , G03F7/7065
摘要： To provide a defect inspection apparatus for inspecting defects of a specimen without lowering resolution of a lens, without depending on a polarization characteristic of a defect scattered light, and with high detection sensitivity that is realized by the following. A detection optical path is branched by at least one of spectral splitting and polarization splitting, a spatial filter in the form of a two-dimensional array is disposed after the branch, and only diffracted light is shielded by the spatial filter in the form of a two-dimensional array.
摘要翻译：提供一种用于检查样本缺陷的缺陷检查装置，而不会降低透镜的分辨率，而不依赖于缺陷散射光的偏振特性，并且具有通过以下实现的高检测灵敏度。通过光谱分离和偏振分割中的至少一个来分支检测光路，在分支之后设置二维阵列形式的空间滤波器，只有衍射光被空间滤波器屏蔽二维数组。

6. 发明申请

US20120019816A1 DEFECT INSPECTION METHOD AND DEFECT INSPECTION APPARATUS 审中-公开
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US20120019816A1
公开(公告)日：2012-01-26
申请号：US13145138
申请日：2010-01-06
申请人： Yukihiro Shibata , Toshihiko Nakata , Toshifumi Honda , Yasuhiro Yoshitake
发明人： Yukihiro Shibata , Toshihiko Nakata , Toshifumi Honda , Yasuhiro Yoshitake
IPC分类号： G01N21/88
CPC分类号： G01N21/95 , G01N21/21 , G01N21/47 , G01N21/9501 , G01N21/956 , G01N21/95607
摘要： The present invention provides a spatial filtering technology for exposing a defect image independently of polarization properties of defect scattered light, a defect inspection method for increasing a defect capture rate by suppressing the brightness saturation of a normal pattern, and a defect inspection apparatus that uses the defect inspection method. An array of spatial filters is disposed in one or more optical paths, which are obtained by polarizing and splitting a detection optical path, to filter diffracted light and scattered light emitted from the normal pattern. An image whose brightness saturation is suppressed is obtained by controlling an illumination light amount and/or detection efficiency during image detection in accordance with the amount of scattered light from the normal pattern.
摘要翻译：本发明提供了一种独立于缺陷散射光的偏振特性曝光缺陷图像的空间滤波技术，通过抑制正常图案的亮度饱和来增加缺陷捕获率的缺陷检查方法，以及使用缺陷检查方法。空间滤波器阵列设置在通过偏振和分离检测光路获得的一个或多个光路中，以滤除衍射光和从正常图案发射的散射光。根据来自正常图案的散射光的量，通过控制图像检测期间的照明光量和/或检测效率来获得亮度饱和度被抑制的图像。

7. 发明授权

US5684565A Pattern detecting method, pattern detecting apparatus, projection exposing apparatus using the same and exposure system 失效
标题翻译：图案检测方法，图案检测装置，使用其的投影曝光装置和曝光系统
公开(公告)号：US5684565A
公开(公告)日：1997-11-04
申请号：US304586
申请日：1994-09-12
申请人： Yoshitada Oshida , Hisafumi Iwata , Yasuhiro Yoshitake , Minoru Yoshida , Yukihiro Shibata
发明人： Yoshitada Oshida , Hisafumi Iwata , Yasuhiro Yoshitake , Minoru Yoshida , Yukihiro Shibata
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G03B27/42 , G03B27/72
CPC分类号： G03F9/7065
摘要： A method and apparatus is disclosed for detecting a pattern image of each of a plurality of patterns on the surface of an object. Light emitted from either a light source including a wide wavelength or a light source including a plurality of monowavelengths is applied to the object. The object includes a layered structure having a plurality of layers, wherein at least a part of an uppermost layer of the object is optically transparent. Spectral illumination intensity characteristics of the light emitted from the light source is varied, depending on information about both the layered structure of the object, and a material of the object to obtain a desired spectral illumination intensity, and a pattern image of each of patterns is detected as either a one-dimensional or a two-dimensional image based on light reflected from the object.
摘要翻译：公开了一种用于检测物体表面上的多个图案中的每一个的图案图像的方法和装置。从包括宽波长的光源或包括多个单波长的光源发射的光被施加到物体。该物体包括具有多个层的分层结构，其中物体的最上层的至少一部分是光学透明的。根据关于物体的分层结构和物体的材料的信息，从光源发射的光的光谱照度强度特性是变化的，以获得期望的光谱照度，并且每个图案的图案图像是基于从对象反射的光被检测为一维或二维图像。

8. 发明授权

US08416292B2 Defect inspection apparatus and method 有权
标题翻译：缺陷检查装置及方法
公开(公告)号：US08416292B2
公开(公告)日：2013-04-09
申请号：US12389962
申请日：2009-02-20
申请人： Yukihiro Shibata , Yasuhiro Yoshitake
发明人： Yukihiro Shibata , Yasuhiro Yoshitake
IPC分类号： H04N7/18
CPC分类号： G01N21/9501 , G01N21/95607 , G06T7/0004 , G06T2207/10152 , G06T2207/30148
摘要： In a defect inspection apparatus for inspecting a wafer provided with a circuit pattern for defects, the illuminating direction of illuminating light rays is selectively determined such that an area containing a defect that scatters light of high intensity coincides with the aperture of a dark-field detecting system, and such that regularly reflected light regularly reflected by a pattern, which is noise to defect detection, does not coincide with the aperture of the dark field detecting system.
摘要翻译：在用于检查具有缺陷的电路图案的晶片的缺陷检查装置中，选择性地确定照明光线的照明方向，使得包含散射高强度的光的缺陷的区域与暗场检测的孔径一致系统，并且使得通过由缺陷检测的噪声的图案规则反射的规则反射光与暗视场检测系统的孔径不一致。

9. 发明授权

US08203706B2 Method and apparatus for inspecting defects 有权
标题翻译：检查缺陷的方法和装置
公开(公告)号：US08203706B2
公开(公告)日：2012-06-19
申请号：US12423902
申请日：2009-04-15
申请人： Yukihiro Shibata , Yasuhiro Yoshitake
发明人： Yukihiro Shibata , Yasuhiro Yoshitake
IPC分类号： G01N21/00
CPC分类号： G01N21/95623 , G01N2021/9563 , G03F7/7065
摘要： To provide a defect inspection apparatus for inspecting defects of a specimen without lowering resolution of a lens, without depending on a polarization characteristic of a defect scattered light, and with high detection sensitivity that is realized by the following. A detection optical path is branched by at least one of spectral splitting and polarization splitting, a spatial filter in the form of a two-dimensional array is disposed after the branch, and only diffracted light is shielded by the spatial filter in the form of a two-dimensional array.
摘要翻译：提供一种用于检查样本缺陷的缺陷检查装置，而不会降低透镜的分辨率，而不依赖于缺陷散射光的偏振特性，并且具有通过以下实现的高检测灵敏度。通过光谱分离和偏振分割中的至少一个来分支检测光路，在分支之后设置二维阵列形式的空间滤波器，只有衍射光被空间滤波器屏蔽二维数组。

10. 发明授权

US07859656B2 Defect inspection method and system 有权
标题翻译：缺陷检查方法和系统
公开(公告)号：US07859656B2
公开(公告)日：2010-12-28
申请号：US12366956
申请日：2009-02-06
申请人： Sachio Uto , Hiroyuki Nakano , Yukihiro Shibata , Akira Hamamatsu , Yuta Urano
发明人： Sachio Uto , Hiroyuki Nakano , Yukihiro Shibata , Akira Hamamatsu , Yuta Urano
IPC分类号： G01N21/00 , G01N21/88 , H01L27/00
CPC分类号： G01N21/9501 , G01N21/21 , G01N21/4788 , G01N21/94 , G01N21/956
摘要： An inspection system includes: a facility that uses wide-band illumination light having different wavelengths and single-wavelength light to perform dark-field illumination on an object of inspection, which has the surface thereof coated with a transparent film, in a plurality of illuminating directions at a plurality of illuminating angles; a facility that detects light reflected or scattered from repetitive patterns and light reflected or scattered from non-repetitive patterns with the wavelengths thereof separated from each other; a facility that efficiently detects light reflected or scattered from a foreign matter or defect in the repetitive patterns or non-repetitive patterns or a foreign matter or defect on the surface of the transparent film; and a facility that removes light, which is diffracted by the repetitive patterns, from a diffracted light image of actual patterns or design data representing patterns. Consequently, a more microscopic defect can be detected stably.
摘要翻译：检查系统包括：使用具有不同波长的宽带照明光和单波长光的设备，在具有透明膜的表面上的多个照明中对被检查对象进行暗视场照明多个照明角度的方向; 检测从重复图案反射或散射的光和从彼此分离的波长的非重复图案反射或散射的光的设备; 有效地检测异物反射或散射的光或重复图案或非重复图案中的缺陷或透明膜表面上的异物或缺陷的设备; 以及通过重复图案衍射的光从实际图案的衍射光图像或表示图案的设计数据中去除的设施。因此，能够稳定地检测出更微细的缺陷。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式