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1. 发明申请

US20140065522A1 PATTERN FORMING METHOD, POSITIONAL DEVIATION MEASURING METHOD AND PHOTOMASK 有权
标题翻译：图案形成方法，位置偏差测量方法和光电子学
公开(公告)号：US20140065522A1
公开(公告)日：2014-03-06
申请号：US13724498
申请日：2012-12-21
申请人： Yoshinori HAGIO , Yosuke Okamoto
发明人： Yoshinori HAGIO , Yosuke Okamoto
IPC分类号： G03F7/20
CPC分类号： G03F7/70633 , G03F1/00 , G03F7/70533
摘要： According to one embodiment, a positional deviation measuring method includes measuring a positional deviation of a device pattern formed in a lower layer portion using an alignment mark of the lower layer portion as a reference; measuring a positional deviation of a device pattern formed in an upper layer portion above the lower layer portion using an alignment mark of the upper layer portion as a reference; measuring a positional deviation between the alignment mark of the lower layer portion and the alignment mark of the upper layer portion; and calculating a positional deviation between the device patterns based on the positional deviation between the alignment marks.
摘要翻译：根据一个实施例，位置偏差测量方法包括使用下层部分的对准标记作为基准来测量形成在下层部分中的器件图案的位置偏差; 使用上层部分的对准标记作为基准来测量形成在下层部分上方的上层部分中的器件图案的位置偏差; 测量下层部分的对准标记与上层部分的对准标记之间的位置偏差; 以及基于所述对准标记之间的位置偏差来计算所述装置图案之间的位置偏差。

2. 发明申请

US20130252429A1 MASK AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE 有权
标题翻译：用于制造半导体器件的掩模和方法
公开(公告)号：US20130252429A1
公开(公告)日：2013-09-26
申请号：US13569860
申请日：2012-08-08
申请人： Yosuke OKAMOTO , Kazutaka ISHIGO , Taketo KURIYAMA
发明人： Yosuke OKAMOTO , Kazutaka ISHIGO , Taketo KURIYAMA
IPC分类号： G03F1/00 , G03F7/20 , H01L21/302
CPC分类号： G03F1/42
摘要： A photo mask for exposing according to an embodiment includes a mark pattern arranged in a mark region that is different from an effective region to form a semiconductor device; and a regular pattern arranged in the mark region and around the mark pattern and smaller than the mark pattern in size and pitch.
摘要翻译：根据实施例的用于曝光的光掩模包括布置在与有效区域不同以形成半导体器件的标记区域中的标记图案; 以及布置在标记区域和标记图案周围的规则图案，并且尺寸和间距小于标记图案。

3. 发明授权

US08859167B2 Pattern forming method, positional deviation measuring method and photomask 有权
标题翻译：图案形成方法，位置偏差测量方法和光掩模
公开(公告)号：US08859167B2
公开(公告)日：2014-10-14
申请号：US13724498
申请日：2012-12-21
申请人： Yoshinori Hagio , Yosuke Okamoto
发明人： Yoshinori Hagio , Yosuke Okamoto
IPC分类号： G03F1/00 , G03F7/20
CPC分类号： G03F7/70633 , G03F1/00 , G03F7/70533
摘要： According to one embodiment, a positional deviation measuring method includes measuring a positional deviation of a device pattern formed in a lower layer portion using an alignment mark of the lower layer portion as a reference; measuring a positional deviation of a device pattern formed in an upper layer portion above the lower layer portion using an alignment mark of the upper layer portion as a reference; measuring a positional deviation between the alignment mark of the lower layer portion and the alignment mark of the upper layer portion; and calculating a positional deviation between the device patterns based on the positional deviation between the alignment marks.
摘要翻译：根据一个实施例，位置偏差测量方法包括使用下层部分的对准标记作为基准来测量形成在下层部分中的器件图案的位置偏差; 使用上层部分的对准标记作为基准来测量形成在下层部分上方的上层部分中的器件图案的位置偏差; 测量下层部分的对准标记与上层部分的对准标记之间的位置偏差; 以及基于所述对准标记之间的位置偏差来计算所述装置图案之间的位置偏差。

4. 发明授权

US07609803B2 Method for estimating scattered ray intensity in X-ray CT and X-ray CT apparatus 失效
标题翻译： X射线CT和X射线CT装置中散射光线强度的估计方法
公开(公告)号：US07609803B2
公开(公告)日：2009-10-27
申请号：US12244259
申请日：2008-10-02
申请人： Yosuke Okamoto , Naruomi Akino
发明人： Yosuke Okamoto , Naruomi Akino
IPC分类号： A61B6/00
CPC分类号： G01N23/04 , A61B6/032 , A61B6/5282
摘要： A method for estimating a scattered ray intensity distribution in an X-ray CT apparatus, the method includes: irradiating a subject with X-rays; and configuring a cross-sectional image of the subject by detecting the X-rays passing through the subject, on the basis of a path length of a scattered ray passing through the subject, an X-ray absorption coefficient of the subject and an X-ray scattering probability of the subject, intensity of the scattered ray being calculated.
摘要翻译：一种用于估计X射线CT装置中的散射光线强度分布的方法，所述方法包括：用X射线照射对象; 根据穿过被检体的散射光线的路径长度，检测被检体的X射线吸收系数和X射线吸收系数，构成被检体的截面图像，受试者的射线散射概率，计算散射光线的强度。

5. 发明申请

US20080063254A1 UNEVENNESS INSPECTION METHOD, METHOD FOR MANUFACTURING DISPLAY PANEL, AND UNEVENNESS INSPECTION APPARATUS 失效
标题翻译：无人检查方法，制造显示面板的方法和无法检查装置
公开(公告)号：US20080063254A1
公开(公告)日：2008-03-13
申请号：US11851806
申请日：2007-09-07
申请人： Hiroyuki Tanizaki , Naoko Toyoshima , Yosuke Okamoto , Yasunori Takase
发明人： Hiroyuki Tanizaki , Naoko Toyoshima , Yosuke Okamoto , Yasunori Takase
IPC分类号： G06K9/00
CPC分类号： G06T7/0004
摘要： An unevenness inspection method for inspecting presence of unevenness in a panel material, the method includes: acquiring a plurality of primary images by imaging the panel material under inspection on a plurality of levels of condition; creating a plurality of secondary images by processing the plurality of primary images to enhance variation of the image; creating a composite image by combining the plurality of secondary images with a prescribed weighting; and determining the presence of unevenness using the composite image, the prescribed weighting being determined so that a region having the unevenness can be distinguished from the other region, when the plurality of secondary images are created for the panel material for training use having unevenness and are combined into a composite image.
摘要翻译：一种用于检查面板材料中不均匀性的不均匀性检查方法，所述方法包括：通过在多个水平的状态下对被检查的面板材料进行成像来获取多个原始图像; 通过处理多个主要图像来创建多个次要图像以增强图像的变化; 通过将所述多个次要图像与规定的加权组合来创建合成图像; 并且使用所述合成图像来确定不均匀性的存在，所述规定的加权被确定为使得具有不平坦度的区域可以与其他区域区分开，当为具有不均匀性的训练用面板材料创建多个二次图像时，组合成合成图像。

6. 发明申请

US20070285864A1 Power supply circuit structure comprising a current sensor, and method of assembling the same 有权
标题翻译：包括电流传感器的电源电路结构及其组装方法
公开(公告)号：US20070285864A1
公开(公告)日：2007-12-13
申请号：US11806405
申请日：2007-05-31
申请人： Noriyuki Yoshida , Hiroyuki Wakamatsu , Yosuke Okamoto
发明人： Noriyuki Yoshida , Hiroyuki Wakamatsu , Yosuke Okamoto
IPC分类号： H02H3/08
CPC分类号： H01M10/48 , G01R15/18 , G01R31/40
摘要： A power supply circuit structure includes: a first bus bar in which a power supply side terminal that is to be connected with a power supply post protruded from a DC/DC converter is disposed in one end side, a current sensor passing portion is disposed on another end side, and an output terminal portion is disposed at the tip end of the current sensor passing portion; and a second bus bar having an input terminal portion which is to be connected with the output terminal portion of the first bus bar, and an output terminal portion which is to be connected with a terminal of a power supply wire end, and which is on another end side.
摘要翻译：电源电路结构包括：一个第一汇流条，其一端侧设置有与从DC / DC转换器突出的供电站连接的电源侧端子，电流传感器通过部分设置在另一端侧，输出端子部设置在电流传感器通过部的前端部; 以及第二母线，其具有与第一母线的输出端子部分连接的输入端子部分和与电源线端子的端子连接的输出端子部分，并且其处于另一端。

7. 发明申请

US20050222845A1 Device for transmitting speech information 有权
标题翻译：用于发送语音信息的装置
公开(公告)号：US20050222845A1
公开(公告)日：2005-10-06
申请号：US11091480
申请日：2005-03-29
申请人： Seiji Nakagawa , Kiyoshi Fujimoto , Yoh-ichi Fujisaka , Yosuke Okamoto
发明人： Seiji Nakagawa , Kiyoshi Fujimoto , Yoh-ichi Fujisaka , Yosuke Okamoto
IPC分类号： G10L21/02 , H04R25/00 , G10L15/00
CPC分类号： G10L21/0364
摘要： A device (1) for transmitting speech information to the human body, comprising: a microphone (2) for inputting speech from an external source; a speech signal processor (20) that produces a consonant-clarified signal based on the input speech signal; a carrier signal generator (6) that produces a carrier signal; an amplitude modulator (8) that modulates the amplitude of the carrier signal based on the consonant-clarified signal; and a vibrator (12) that transmits mechanical vibrations based on the amplitude-modulated output signal; the speech signal processor (20) comprising: a consonant extracting unit that extracts the consonant parts from the speech signal; and a repetition processing unit that adds the extracted consonant parts to the speech signal to produce a consonant-clarified signal in which each of the consonant parts of the speech signal is repeated two or more times. This speech information transmitting device realizes good discriminability of speech information.
摘要翻译：一种用于向人体发送语音信息的装置（1），包括：麦克风（2），用于从外部源输入语音; 语音信号处理器（20），其基于所述输入语音信号产生辅音澄清信号; 载波信号发生器（6），其产生载波信号; 振幅调制器（8），其基于所述辅音清晰的信号来调制载波信号的幅度; 以及基于调幅输出信号传递机械振动的振动器（12）; 语音信号处理器（20）包括：辅音提取单元，从语音信号中提取辅音部分; 以及重复处理单元，其将提取的辅音部分添加到语音信号，以产生其中语音信号的每个辅音部分重复两次或更多次的辅音澄清信号。该语音信息发送装置实现语音信息的良好判别性。

8. 发明授权

US08832607B2 Method for making correction map of dose amount, exposure method, and method for manufacturing semiconductor device 有权
标题翻译：制造剂量的校正图，曝光方法和制造半导体器件的方法的方法
公开(公告)号：US08832607B2
公开(公告)日：2014-09-09
申请号：US13598736
申请日：2012-08-30
申请人： Takashi Koike , Hiroyuki Mizuno , Yosuke Okamoto
发明人： Takashi Koike , Hiroyuki Mizuno , Yosuke Okamoto
IPC分类号： G06F17/50 , G03F1/00 , G03F7/20
CPC分类号： G03F1/144 , G03F7/2002 , G03F7/705 , G03F7/70558 , G03F7/70941 , G06F17/5068 , G06F17/5081
摘要： According to one embodiment, a method for making a correction map of a dose amount of EUV light used when exposing with the EUV light, includes estimating an exposure result based on an initial correction map of the dose amount and flare of the EUV light, determining a goodness of the exposure result, and correcting the initial correction map in the case where the exposure result is unacceptable. And, the correcting of the initial correction map, the estimating of the exposure result, and the determining of the goodness are repeated until the exposure result is good.
摘要翻译：根据一个实施例，一种用于在用EUV光曝光时使用的EUV光的剂量的校正图的方法包括基于EUV光的剂量量和耀斑的初始校正图来估计曝光结果，确定暴露结果的良好，并且在曝光结果不可接受的情况下校正初始校正图。并且，重复校正初始校正图，曝光结果的估计和良品的确定直到曝光结果良好。

9. 发明授权

US08778570B2 Photomask and method for manufacturing the same 有权
标题翻译：光掩模及其制造方法
公开(公告)号：US08778570B2
公开(公告)日：2014-07-15
申请号：US13409638
申请日：2012-03-01
申请人： Kentaro Okuda , Yosuke Okamoto , Takaki Hashimoto , Hidenori Sato
发明人： Kentaro Okuda , Yosuke Okamoto , Takaki Hashimoto , Hidenori Sato
IPC分类号： G03F1/42 , G03F1/44
CPC分类号： G03F1/42 , G03F1/26 , G03F1/44
摘要： According to one embodiment, a photomask includes a substrate, a film portion, a pattern, and a plurality of detection marks. The film portion is provided on a surface of the substrate. The film portion has a light transmittance lower than light transmittance of the substrate. The pattern is provided in a surface of the film portion. The pattern is configured to be transferred to a transfer target. The plurality of detection marks is provided in the film portion, with intensity of light transmitted through the detection marks being suppressed so as to suppress transfer the detection marks to the transfer target.
摘要翻译：根据一个实施例，光掩模包括基板，膜部分，图案和多个检测标记。膜部设置在基板的表面上。膜部的透光率比基板的透光率低。该图案设置在膜部分的表面中。该模式被配置为传送到转移目标。多个检测标记设置在胶片部分中，通过检测标记传输的光的强度被抑制，以便抑制检测标记传送到转印目标。

10. 发明申请

US20130252176A1 METHOD FOR MAKING CORRECTION MAP OF DOSE AMOUNT, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 有权
标题翻译：用于制造剂量校正图的方法，曝光方法和制造半导体器件的方法
公开(公告)号：US20130252176A1
公开(公告)日：2013-09-26
申请号：US13598736
申请日：2012-08-30
申请人： Takashi KOIKE , Hiroyuki Mizuno , Yosuke Okamoto
发明人： Takashi KOIKE , Hiroyuki Mizuno , Yosuke Okamoto
IPC分类号： G03F1/00 , G03F7/20
CPC分类号： G03F1/144 , G03F7/2002 , G03F7/705 , G03F7/70558 , G03F7/70941 , G06F17/5068 , G06F17/5081
摘要： According to one embodiment, a method for making a correction map of a dose amount of EUV light used when exposing with the EUV light, includes estimating an exposure result based on an initial correction map of the dose amount and flare of the EUV light, determining a goodness of the exposure result, and correcting the initial correction map in the case where the exposure result is unacceptable. And, the correcting of the initial correction map, the estimating of the exposure result, and the determining of the goodness are repeated until the exposure result is good.
摘要翻译：根据一个实施例，一种用于在用EUV光曝光时使用的EUV光的剂量的校正图的方法包括基于EUV光的剂量量和耀斑的初始校正图来估计曝光结果，确定暴露结果的良好，并且在曝光结果不可接受的情况下校正初始校正图。并且，重复校正初始校正图，曝光结果的估计和良品的确定直到曝光结果良好。

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