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热词
    • 1. 发明授权
    • Fine processing method, fine processing apparatus, and recording medium with fine processing program recorded thereon
    • 精加工方法,精细加工装置以及记录有精加工程序的记录介质
    • US08691123B2
    • 2014-04-08
    • US13204844
    • 2011-08-08
    • Yasutada NakagawaTakuya KonoIkuo YonedaMasayuki Hatano
    • Yasutada NakagawaTakuya KonoIkuo YonedaMasayuki Hatano
    • B29C43/58
    • G05B19/418B82Y10/00B82Y40/00G03F7/0002G03F7/16
    • According to one embodiment, a fine processing method includes determining a resist amount required for each first region of a pattern formation surface and a total amount of resist. The method include dividing the total amount of resist by a volume of one resist drop to determine the resist drops total number. The method include determining a provisional position for the resist drop of the total number. The method include assigning the each first region to nearest one resist drop, and partitioning again the pattern formation surface into second regions assigned to the each resist drop. The method include determining a divided value by dividing the volume of the one resist drop by the required total amount of resist determined. The method include finalizing a final position of the each resist drop, if a distribution of the divided value in the pattern formation surface falls within a target range.
    • 根据一个实施例,精细处理方法包括确定图案形成表面的每个第一区域和抗蚀剂总量所需的抗蚀剂量。 该方法包括将抗蚀剂的总量除以一个抗蚀剂滴的体积以确定抗蚀剂滴数总数。 该方法包括确定总数的抗蚀剂落下的临时位置。 该方法包括将每个第一区域分配给最接近的一个抗蚀剂层,以及再次将图案形成表面分割成分配给每个抗蚀剂层的第二区域。 该方法包括通过将一个抗蚀剂液滴的体积除以所需的抗蚀剂总量确定分割值。 如果图案形成表面中的分割值的分布落在目标范围内,则该方法包括确定每个抗蚀剂液滴的最终位置。