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1. 发明申请

US20090081513A1 GAS DIFFUSION LAYER, FUEL CELL, METHOD FOR MANUFACTURING GAS DIFFUSION LAYER, AND METHOD FOR MANUFACTURING FUEL CELL 审中-公开
标题翻译：气体扩散层，燃料电池，制造气体扩散层的方法以及制造燃料电池的方法
公开(公告)号：US20090081513A1
公开(公告)日：2009-03-26
申请号：US12210459
申请日：2008-09-15
申请人： Yuji SASAKI , Takahiro TERADA , Yasutada NAKAGAWA , Yuichi YOSHIDA
发明人： Yuji SASAKI , Takahiro TERADA , Yasutada NAKAGAWA , Yuichi YOSHIDA
IPC分类号： H01M8/10 , H01M4/02 , B05D5/12
CPC分类号： H01M8/0234 , H01M8/04119 , H01M8/1009 , H01M8/1011 , H01M2008/1095 , Y02E60/523 , Y02P70/56
摘要： A gas diffusion layer to be provided on an air electrode of a fuel cell, the gas diffusion layer includes: a portion to be at a relatively high temperature; and a portion to be at a relatively low temperature. Gas permeability of the portion to be at a relatively high temperature is different from gas permeability of the portion to be at a relatively low temperature.
摘要翻译：一种设置在燃料电池的空气电极上的气体扩散层，气体扩散层包括：处于较高温度的部分; 以及处于较低温度的部分。处于相对较高温度的部分的气体渗透性不同于处于相对低的温度的部分的气体渗透性。

2. 发明申请

US20090250079A1 SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING APPARATUS 有权
标题翻译：基板清洗方法和基板清洗装置
公开(公告)号：US20090250079A1
公开(公告)日：2009-10-08
申请号：US12400419
申请日：2009-03-09
申请人： Kousuke YOSHIHARA , Yuichi YOSHIDA , Taro YAMAMOTO
发明人： Kousuke YOSHIHARA , Yuichi YOSHIDA , Taro YAMAMOTO
IPC分类号： B08B7/04
CPC分类号： G03F7/168 , B08B3/024 , G03F7/3021 , H01L21/67051
摘要： The present invention relates to a substrate cleaning method for cleaning a substrate whose static contact angle with respect to water is 85 degrees or more. The substrate cleaning method includes a step in which the substrate is held horizontally by a substrate holder in such a manner that a central part of the substrate and a central part in rotation correspond to each other; a step in which, while the substrate holder is being rotated about a vertical axis, a cleaning liquid is discharged from a cleaning-liquid nozzle to the central part of the substrate and is spread over all the surface of the substrate by a centrifugal force; a step in which, while the substrate holder is being continuously rotated, a to-be-discharged position of the cleaning liquid on the substrate is changed to an eccentric position deviated from the central part of the substrate, and a gas is discharged from a gas nozzle to the central part of the substrate so as to form a dried area of the cleaning liquid under a condition in which a distance between an interface on a side of a to-be-discharged position of the gas in the to-be-discharged position of the cleaning liquid and an interface on a side of the to-be-discharged position of the cleaning liquid in the to-be-discharged position of the gas is set between 9 mm and 15 mm; and a step in which, while the substrate holder is being continuously rotated, the to-be-discharged position of the cleaning liquid is moved toward a periphery of the substrate at a speed lower than a speed at which the dried area is spread outward.
摘要翻译：本发明涉及一种清洗相对于水的静态接触角为85度以上的基板的基板清洗方法。基板清洗方法包括以下步骤：基板由基板保持器水平地保持，使得基板的中心部分和旋转中心部分彼此对应; 在衬底保持器围绕垂直轴线旋转的同时，清洗液从清洗液喷嘴排出到基板的中心部分，并通过离心力分散在基板的所有表面上; 在基板保持器持续旋转的同时，将基板上的清洗液的排出位置变更为离开基板的中心部的偏心位置，从而从气体喷嘴到基板的中心部分，以便在待处理气体的待排出位置的一侧的界面之间的距离处于这样的条件下形成清洁液体的干燥区域，清洁液体的排出位置和待排出位置的清洗液体的待排出位置一侧的界面设定在9mm〜15mm之间; 以及在衬底保持器持续旋转的同时，清洗液的排出位置以比干燥区域向外扩展的速度朝向衬底的周边移动的步骤。

3. 发明申请

US20120219212A1 FEATURE CONVERSION DEVICE, SIMILAR INFORMATION SEARCH APPARATUS PROVIDED THEREWITH, CODING PARAMETER GENERATION METHOD, AND COMPUTER PROGRAM 有权
标题翻译：特征转换装置，提供的类似信息搜索装置，编码参数生成方法和计算机程序
公开(公告)号：US20120219212A1
公开(公告)日：2012-08-30
申请号：US13405716
申请日：2012-02-27
申请人： Mitsuru ANBAI , Yuichi YOSHIDA
发明人： Mitsuru ANBAI , Yuichi YOSHIDA
IPC分类号： G06K9/62
CPC分类号： G06F17/30619
摘要： A bit code converter transforms a learning feature vector using a transformation matrix updated by a transformation matrix update unit, and converts the transformed learning feature vector into a bit code. When the transformation matrix update unit substitutes a substitution candidate for an element of the transformation matrix, a cost function calculator fixes the substitution candidate that minimizes a cost function as the element. The transformation matrix update unit selects the element while sequentially changing the elements, and the cost function calculator fixes the selected element every time the transformation matrix update unit selects the element, thereby finally fixing the optimum transformation matrix. A substitution candidate specifying unit specifies the substitution candidate such that a speed of transformation processing that the bit code converter performs using the transformation matrix using the transformation matrix is enhanced based on a constraint condition stored in a constraint condition storage unit.
摘要翻译：位代码转换器使用由变换矩阵更新单元更新的变换矩阵来变换学习特征向量，并将变换后的学习特征向量转换为位代码。当变换矩阵更新单元将替代候选替换为变换矩阵的元素时，成本函数计算器将成本函数最小化的替代候选者固定为元素。变换矩阵更新单元在顺序地改变元素的同时选择元素，并且每当变换矩阵更新单元选择元素时，成本函数计算器固定所选择的元素，从而最终确定最佳变换矩阵。替代候选指定单元指定替换候选，使得基于存储在约束条件存储单元中的约束条件来增强使用变换矩阵的比特码转换器使用变换矩阵执行的变换处理的速度。

4. 发明申请

US20100190087A1 FUEL CELL 审中-公开
标题翻译：燃料电池
公开(公告)号：US20100190087A1
公开(公告)日：2010-07-29
申请号：US12726236
申请日：2010-03-17
申请人： Yuichi YOSHIDA , Hiroyuki Hasebe , Nobuyasu Negishi , Koichi Kawamura
发明人： Yuichi YOSHIDA , Hiroyuki Hasebe , Nobuyasu Negishi , Koichi Kawamura
IPC分类号： H01M8/10
CPC分类号： H01M8/04201 , H01M8/04186 , H01M8/1011 , H01M2008/1095 , Y02E60/523
摘要： A fuel distribution mechanism of a fuel cell, including a fuel inlet communicating with the supply channel, a plurality of fuel outlets which are open so as to be opposite the fuel electrode, and a fuel passage communicating with the fuel inlet and the fuel outlets in order to circulate the fuel from the fuel inlet to the fuel outlets, and the fuel passage is formed between the fuel inlet and the fuel outlets and comprises a plurality of branch passages that are adjusted in passage cross-sectional shape and branch structure as the branch passages extend from upstream to downstream between the fuel passage situated upstream and the fuel outlets and that have a desired channel resistance.
摘要翻译：一种燃料电池的燃料分配机构，包括与供给通道连通的燃料入口，与燃料电极相对开放的多个燃料出口，以及与燃料入口和燃料出口连通的燃料通路为了将燃料从燃料入口循环到燃料出口，并且燃料通道形成在燃料入口和燃料出口之间，并且包括多个分支通道，其以通道横截面形状和分支结构调整为分支通道在位于上游的燃料通道和燃料出口之间的上游延伸到下游，并且具有期望的通道阻力。

5. 发明申请

US20130010319A1 IMAGE FORMING SYSTEM, OUTPUT MANAGEMENT METHOD, AND PROGRAM PRODUCT 有权
标题翻译：图像形成系统，输出管理方法和程序产品
公开(公告)号：US20130010319A1
公开(公告)日：2013-01-10
申请号：US13538258
申请日：2012-06-29
申请人： Saori IURA , Isamu MITSUKE , Yuichi YOSHIDA , Takahiro HIRAKAWA
发明人： Saori IURA , Isamu MITSUKE , Yuichi YOSHIDA , Takahiro HIRAKAWA
IPC分类号： G06K15/02
CPC分类号： G06F3/1205 , G06F3/122 , G06F3/123 , G06F3/1244 , G06F3/1288 , G06K15/1807 , G06K15/1811 , G06K15/1817 , G06K15/402
摘要： An image forming system includes an image forming apparatus and an output management server. The output management server includes a receiving unit to receive an output data, an analysis unit to analyze the output data and determine a PDL required for outputting the output data, a management unit to determine whether the PDL is available, and a transmitting unit to transmit the output data and an executable file of the PDL to the designated image forming apparatus, when the PDL is determined as available. The image forming apparatus includes a receiving unit to receive the output data and the executable file of the PDL, a control unit to activate the executable file of the PDL and develop the output data, an output unit to output the output data, and a deleting unit to delete the executable file of the PDL, after the outputting of the output data is completed.
摘要翻译：图像形成系统包括图像形成装置和输出管理服务器。输出管理服务器包括：接收单元，用于接收输出数据，分析单元，分析输出数据，确定输出数据所需的PDL;管理单元，确定PDL是否可用;发送单元，发送当PDL被确定为可用时，PDL的输出数据和可执行文件到指定图像形成装置。图像形成装置包括：接收单元，用于接收PDL的输出数据和可执行文件;控制单元，激活PDL的可执行文件并开发输出数据;输出单元，输出输出数据;以及删除单位删除PDL的可执行文件，输出完毕后输出数据。

6. 发明申请

US20120115090A1 SUBSTRATE TREATMENT METHOD, COMPUTER STORAGE MEDIUM AND SUBSTRATE TREATMENT APPARATUS 有权
标题翻译：基板处理方法，计算机存储介质和基板处理设备
公开(公告)号：US20120115090A1
公开(公告)日：2012-05-10
申请号：US13280409
申请日：2011-10-25
申请人： Hirofumi TAKEGUCHI , Yuichi YOSHIDA
发明人： Hirofumi TAKEGUCHI , Yuichi YOSHIDA
IPC分类号： G03F7/30 , B05B1/00
CPC分类号： H01L21/67051 , G03F7/3021 , G03F7/38 , H01L21/6715
摘要： The present disclosure is a substrate treatment method of supplying a surface treatment liquid onto a surface of a substrate having a film with high water repellency formed thereon, the method including: a liquid puddle forming step of forming a liquid puddle of the surface treatment liquid by supplying the surface treatment liquid from a nozzle to one location of a peripheral portion of the substrate; and a liquid puddle moving step of then moving the liquid puddle formed at the peripheral portion of the substrate to a central portion of the substrate by moving the nozzle from a position above the peripheral portion of the substrate to a position above the central portion of the substrate while continuing the supply of the surface treatment liquid.
摘要翻译：本公开是一种将表面处理液体供给到具有形成在其上形成有高斥水性的膜的基板的表面上的基板处理方法，该方法包括：液体水坑形成步骤，通过以下方式形成表面处理液体的液体熔池：将所述表面处理液体从喷嘴供给到所述基板的周边部分的一个位置; 以及液体搅拌移动步骤，然后通过将所述喷嘴从所述基板的周边部分上方的位置移动到所述基板的中心部分上方的位置，将形成在所述基板的周边部分处的所述液体熔池移动到所述基板的中心部分同时继续供应表面处理液体。

7. 发明申请

US20120111373A1 SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING APPARATUS AND STORAGE MEDIUM FOR SUBSTRATE CLEANING 审中-公开
标题翻译：基板清洗方法，基板清洗装置和基板清洗存储介质
公开(公告)号：US20120111373A1
公开(公告)日：2012-05-10
申请号：US13288255
申请日：2011-11-03
申请人： Hiroshi ARIMA , Yuichi YOSHIDA , Kousuke YOSHIHARA
发明人： Hiroshi ARIMA , Yuichi YOSHIDA , Kousuke YOSHIHARA
IPC分类号： B08B7/00 , B08B5/00 , B08B3/04
CPC分类号： G03F7/422 , H01L21/67051
摘要： A method for cleaning a surface of a substrate having a circuit pattern formed thereon, includes: forming a liquid film on the surface by feeding a cleaning solution onto the center of the surface while rotating the substrate with the substrate kept horizontal; forming a dry region by discharging gas to the center while moving a position of feed of the cleaning solution on the surface by a distance from the center toward the periphery of the substrate with the substrate being rotated; moving the position of feed of the cleaning solution on the surface toward the periphery at a speed equal to a speed at which the dry region is expanded toward the periphery while rotating the substrate; and controlling temperature of the cleaning solution to form the liquid film such that the temperature becomes higher than process atmosphere temperature on the surface during feed of the cleaning solution.
摘要翻译：一种用于清洗其上形成有电路图案的基板的表面的方法，包括：通过在将基板保持水平的同时旋转基板的同时将清洁溶液馈送到表面的中心而在表面上形成液膜; 通过在基板旋转的同时将清洁溶液的进料位置从基板的中心向外周移动到表面上的方式将气体排出到中心而形成干燥区域; 在旋转基板的同时，以与干燥区域朝向周边膨胀的速度相等的速度将清洁溶液的表面朝向周边移动的位置; 以及控制清洁溶液的温度以形成液膜，使得在清洁溶液的进料期间温度变得高于表面上的处理气氛温度。

8. 发明申请

US20130107288A1 IMAGE FORMING APPARATUS, IMAGE FORMING SYSTEM, IMAGE DATA PROCESSING METHOD, PROGRAM, AND STORAGE MEDIUM 有权
标题翻译：图像形成装置，图像形成系统，图像数据处理方法，程序和存储介质
公开(公告)号：US20130107288A1
公开(公告)日：2013-05-02
申请号：US13654660
申请日：2012-10-18
申请人： Chan GU , Saori IURA , Yuichi YOSHIDA , Takahiro HIRAKAWA , Yasuyuki IGARASHI , Isamu MITSUKE , Nobuyuki IWATA
发明人： Chan GU , Saori IURA , Yuichi YOSHIDA , Takahiro HIRAKAWA , Yasuyuki IGARASHI , Isamu MITSUKE , Nobuyuki IWATA
IPC分类号： G06K15/02
CPC分类号： G06K15/1822 , G06K15/1807
摘要： The purpose of this invention is to avoid unnecessary print out and cut wasteful consumption of resources and electricity. A printer receives a command indicating whether or not a user does not need to print out images such as advertisements on web pages. If a drawing command acquired by analyzing received print data is image, the printer determines whether or not the command is to draw images based on the user's choice and execute a drawing process along with the command from the user. Consequently, the printer can print out text information with eliminating image information which is noise for the user and can eliminate print out for unnecessary image information.
摘要翻译：本发明的目的是避免不必要的打印出来，浪费资源和电力的消耗。打印机接收指示用户是否不需要打印诸如网页上的广告的图像的命令。如果通过分析所接收的打印数据获取的绘制命令是图像，则打印机根据用户的选择确定该命令是否绘制图像，并且与用户的命令一起执行绘图处理。因此，打印机可以消除文本信息，消除用户的噪声的图像信息，并且可以消除不必要的图像信息的打印。

9. 发明申请

US20110200953A1 DEVELOPING APPARATUS, DEVELOPING METHOD AND STORAGE MEDIUM 有权
标题翻译：开发设备，开发方法和存储介质
公开(公告)号：US20110200953A1
公开(公告)日：2011-08-18
申请号：US13025490
申请日：2011-02-11
申请人： Hiroshi ARIMA , Kousuke YOSHIHARA , Yuichi YOSHIDA , Yasushi TAKIGUCHI , Taro YAMAMOTO
发明人： Hiroshi ARIMA , Kousuke YOSHIHARA , Yuichi YOSHIDA , Yasushi TAKIGUCHI , Taro YAMAMOTO
IPC分类号： G03F7/30 , G03B27/52
CPC分类号： G03F7/3021
摘要： There is provided a developing apparatus capable of achieving high throughput. The developing apparatus includes an airtightly sealed processing vessel that forms a processing atmosphere therein; an atmosphere gas supply unit that supplies an atmosphere gas containing mist of a developing solution into the processing vessel in order to form a liquid film of the developing solution on a surface of a substrate loaded into the processing vessel; and a drying unit that dries the substrate in order to stop a developing process by the liquid film. A reaction between a resist and the developing solution can be stopped. Therefore, a developing process can be performed in parallel with a cleaning process performed by a cleaning module and high throughput is achieved.
摘要翻译：提供了能够实现高产量的显影装置。显影装置包括在其中形成处理气氛的气密密封处理容器; 气氛气体供给单元，其将含有显影液雾的气氛气体供给到处理容器中，以在装载到处理容器中的基板的表面上形成显影液的液膜; 以及干燥单元，其干燥基板以便通过液膜来停止显影处理。可以停止抗蚀剂与显影液的反应。因此，可以与由清洁模块执行的清洁处理并行执行显影处理，并且实现高生产率。

10. 发明申请

US20100233638A1 SUBSTRATE TREATMENT APPARATUS, SUBSTRATE TREATMENT METHOD, COATING AND DEVELOPING APPARATUS, COATING AND DEVELOPING METHOD, AND STORAGE MEDIUM 审中-公开
标题翻译：基板处理设备，基板处理方法，涂装和开发设备，涂装和开发方法以及存储介质
公开(公告)号：US20100233638A1
公开(公告)日：2010-09-16
申请号：US12720072
申请日：2010-03-09
申请人： Yuichi YOSHIDA , Hiroshi ARIMA , Taro YAMAMOTO , Kousuke YOSHIHARA
发明人： Yuichi YOSHIDA , Hiroshi ARIMA , Taro YAMAMOTO , Kousuke YOSHIHARA
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： H01L21/67748 , H01L21/67109 , H01L21/6715
摘要： The substrate treatment apparatus includes a heating plate that heats the substrate prepared by coating a surface of the substrate with a resist and exposing the resist-coated substrate to light; a surface treatment liquid atomizing unit that atomizes a surface treatment liquid used to improve wettability of the substrate with a developer that is supplied onto the resist; a cooling unit that cools the substrate heated by the heating plate; and a surface treatment liquid supply unit that supplies the atomized surface treatment liquid onto the substrate for a portion of the period from the time when the substrate is heated until the cooling means terminates the cooling of the substrate.
摘要翻译：基板处理装置包括加热板，其加热通过用抗蚀剂涂布基板的表面而制备的基板，并将抗蚀剂涂覆的基板曝光; 表面处理液体雾化单元，其用提供给抗蚀剂的显影剂使用于改善基材的润湿性的表面处理液雾化; 冷却单元，其冷却由所述加热板加热的所述基板; 以及表面处理液体供给单元，其从基板被加热直到冷却单元终止基板的冷却的期间的一部分，将雾化表面处理液供给到基板上。

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