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1. 发明申请

WO2010027100A1 SYSTEM FOR ISOLATING AN EXPOSURE APPARATUS 审中-公开
标题翻译：隔离曝光装置的系统
公开(公告)号：WO2010027100A1
公开(公告)日：2010-03-11
申请号：PCT/JP2009/065785
申请日：2009-09-03
申请人： NIKON CORPORATION , HASHEMI Fardad A. , WATSON Douglas C. , MARGESON Christopher
发明人： HASHEMI Fardad A. , WATSON Douglas C. , MARGESON Christopher
IPC分类号： G03F7/20 , F16F15/00
CPC分类号： G03F7/709 , F16F15/06 , Y10T29/49826
摘要： A precision assembly (10) for fabricating a substrate (42) includes a precision fabrication apparatus (12), a pedestal assembly (14) and a suspension system (16). The precision fabrication apparatus (12) fabricates the substrate (42). The pedestal assembly (14) supports at least a portion of the fabrication apparatus (12). The suspension system (16) inhibits the transfer of motion between the mounting base (20) and the pedestal assembly (14). The suspension system (16) can include (i) a first boom (380) that is coupled to the mounting base (20) and the pedestal assembly (14), the first boom (380) being pivotable coupled to at least one of the mounting base (20) and the pedestal assembly (14), and (ii) a first resilient assembly (382) that is coupled between the mounting base (20) and at least one of the first boom (380) and the pedestal assembly (14). The first resilient assembly (382) can function similar to a zero length spring over an operational range of the resilient assembly (382). With this design, the components of the precision fabrication apparatus (12) are better protected by the suspension system (16) during a seismic disturbance. This reduces the likelihood of damage and misalignment of the components of the precision fabrication apparatus (12) during the seismic disturbance.
摘要翻译：一种用于制造基板（42）的精密组件（10）包括精密制造装置（12），基座组件（14）和悬挂系统（16）。精密制造装置（12）制造基板（42）。基座组件（14）支撑制造装置（12）的至少一部分。悬挂系统（16）禁止在安装基座（20）和基座组件（14）之间的运动传递。悬挂系统（16）可以包括（i）联接到安装基座（20）和基座组件（14）的第一起重臂（380），第一起重臂（380）可枢转地联接到至少一个安装基座（20）和基座组件（14），以及（ii）第一弹性组件（382），其联接在安装基座（20）和第一起重臂（380）和基座组件 14）。第一弹性组件（382）可以在弹性组件（382）的操作范围上类似于零长度弹簧起作用。通过这种设计，在地震干扰期间，精密制造装置（12）的部件被悬挂系统（16）更好地保护。这降低了在地震干扰期间精密制造装置（12）的部件的损坏和不对准的可能性。

2. 发明申请

WO2009061578A1 REFLECTIVE OPTICAL ELEMENTS EXHIBITING MULTIMETALLIC-LIKE SELF-CORRECTION OF DISTORTIONS CAUSED BY HEATING 审中-公开
标题翻译：反射光学元素展示多加速度自我修正由加热引起的失真
公开(公告)号：WO2009061578A1
公开(公告)日：2009-05-14
申请号：PCT/US2008/079079
申请日：2008-10-07
申请人： NIKON CORPORATION , PHILLIPS, Alton, H. , WATSON, Douglas, C.
发明人： PHILLIPS, Alton, H. , WATSON, Douglas, C.
IPC分类号： G02F1/29
CPC分类号： G02B7/181 , G02B7/008 , G02B7/028
摘要： Optical elements are disclosed that exhibit "multimetallic"-like self corrections of thermally induced distortions. An exemplary optical element includes first and second portions. The first portion has a first coefficient of thermal expansion (CTE), an obverse surface, and a reverse surface. A second portion is bonded to the reverse surface. The second portion has a second CTE different from the first CTE to form an optical element exhibiting a thermally multimetallic-like change in curvature of the obverse surface accompanying a temperature change of the optical element. The second portion has a thermal-response property in a first direction that is different from a thermal-response property in a second direction. Thus, aberrations such as astigma-type aberrations can be readily self-corrected.
摘要翻译：公开了表现出热诱导失真的“多金属”状自校正的光学元件。示例性的光学元件包括第一和第二部分。第一部分具有第一热膨胀系数（CTE），正面和反面。第二部分结合到反面。第二部分具有与第一CTE不同的第二CTE，以形成随着光学元件的温度变化而呈现正面的热多金属样变化的光学元件。第二部分在第一方向上具有与第二方向上的热响应特性不同的热响应特性。因此，诸如散光像差的像差可以容易地自校正。

3. 发明申请

WO2008143327A8 KINEMATIC CHUCKS FOR RETICLES AND OTHER PLANAR BODIES 审中-公开
公开(公告)号：WO2008143327A8
公开(公告)日：2008-11-27
申请号：PCT/JP2008/059483
申请日：2008-05-15
申请人： NIKON CORPORATION , NOVAK, Thomas, W. , WATSON, Douglas, C. , PHILLIPS, Alton, H.
发明人： NOVAK, Thomas, W. , WATSON, Douglas, C. , PHILLIPS, Alton, H.
IPC分类号： G03F7/20
摘要： Devices are disclosed for holding and moving a planar body such as a reticle (25) as used, for example, in microlithography. An exemplary device includes a stage (12) and a body chuck (10). The stage has a movable support surface (17a, 17b). A proximal region (18a, 18b) of a first membrane (16a, 16b) is mounted to the support surface. A distal region (20a, 20b) of the first membrane extends from the support surface and is coupled to the chuck such that the first membrane at least partially supports the chuck. The chuck includes a surface (28) from wh'ich multiple pins (38,40,44) extend. The surface is situated at the distal region. The pins are arrayed to contact and support a respective region of the body. The pin arrangement is configured such that, during- movements of the chuck imparted by the support surface, body slippage relative to the pins due to forces caused by the movement is substantially uniform at each pin.

4. 发明申请

WO2004092833A3 ENVIRONMENTAL SYSTEM INCLUDING A TRANSPORT REGION FOR AN IMMERSION LITHOGRAPHY APPARATUS 审中-公开
标题翻译：环境系统，其中包括一个静态地图设备的运输区域
公开(公告)号：WO2004092833A3
公开(公告)日：2005-12-01
申请号：PCT/US2004009994
申请日：2004-04-01
申请人： NIPPON KOGAKU KK , NOVAK THOMAS W , HAZELTON ANDREW J , WATSON DOUGLAS C
发明人： NOVAK THOMAS W , HAZELTON ANDREW J , WATSON DOUGLAS C
IPC分类号： G03B27/42 , G03F20060101 , G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/7095
摘要： An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254), an immersion fluid system (252), and a transport region (256). The fluid barrier (254) is positioned near the device (30) and maintains the transport region (256) near the gap (246). The immersion fluid system (252) delivers an immersion fluid (248) that fills the gap (246). The transport region (256) transports at least a portion of the immersion fluid (248) that is near the fluid barrier (254) and the device (30) away from the device (30). The immersion fluid system (252) can include a fluid removal system (282) that is in fluid communication with the transport region (256). The transport region (256) can be made of a porous material.
摘要翻译：用于控制光学组件（16）和装置（30）之间的间隙（246）中的环境的环境系统（26）包括流体屏障（254），浸没流体系统（252）和输送区域 256）。流体屏障（254）位于装置（30）附近，并将输送区域（256）保持在间隙（246）附近。浸没流体系统（252）输送填充间隙（246）的浸没流体（248）。输送区域（256）将流体屏障（254）和装置（30）附近的浸没流体（248）的至少一部分输送离开装置（30）。浸没流体系统（252）可以包括与输送区域（256）流体连通的流体移除系统（282）。运输区域（256）可由多孔材料制成。

5. 发明申请

WO2004092830A3 LIQUID JET AND RECOVERY SYSTEM FOR IMMERSION LITHOGRAPHY 审中-公开
标题翻译：液体喷射和恢复系统
公开(公告)号：WO2004092830A3
公开(公告)日：2005-06-16
申请号：PCT/US2004010071
申请日：2004-04-01
申请人： NIPPON KOGAKU KK , NOVAK W THOMAS , HAZELTON ANDREW J , WATSON DOUGLAS C
发明人： NOVAK W THOMAS , HAZELTON ANDREW J , WATSON DOUGLAS C
IPC分类号： G03F7/20 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70341
摘要： A liquid jet and recovery system for an immersion lithography apparatus (100) has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected on a workpiece (W) such as a wafer. These nozzles are each adapted to serve selectively either as a source nozzle (21) for supplying a fluid (7) into the exposure region or as a recovery nozzle (23) for recovering the fluid from the exposure region. A fluid controlling device (14) functions to cause nozzles on selected one or more sides of the exposure region to serve as source nozzles and those on selected one or more of the remaining sides to serve as recovery nozzles such that a desired flow pattern can be established for the convenience of immersion lithography.
摘要翻译：用于浸没式光刻设备（100）的液体喷射和回收系统具有布置成使其开口位于曝光区域附近的喷嘴阵列，图像图案通过该曝光区域投射在诸如晶片的工件（W）上。这些喷嘴各自适于选择性地用作用于将流体（7）供应到曝光区域中的源喷嘴（21），或用作从曝光区域回收流体的回收喷嘴（23）。流体控制装置（14）用于使曝光区域的所选一个或多个侧面上的喷嘴用作源喷嘴，并且在所选择的一个或多个剩余侧面上的喷嘴用作回收喷嘴，使得期望的流动模式可以建立了为了方便浸没光刻。

6. 发明申请

WO2012176929A3 MULTIPLE-BLADE HOLDING DEVICES 审中-公开
标题翻译：多片式保持装置
公开(公告)号：WO2012176929A3
公开(公告)日：2013-02-28
申请号：PCT/JP2012066311
申请日：2012-06-20
申请人： NIPPON KOGAKU KK , WATSON DOUGLAS C , HASHEMI FARDAD , MARGESON CHRISTOPHER S
发明人： WATSON DOUGLAS C , HASHEMI FARDAD , MARGESON CHRISTOPHER S
IPC分类号： F16F7/08
CPC分类号： F16F7/082
摘要： An exemplary device includes first and second portions that are movably connected together by first and second sets, respectively, of multiple blades interleaved with each other at an overlap region (20). When the overlap region is compressed, displacement of the first and second portions relative to each other is prevented so as to provide relatively high stiffness in first and second orthogonal directions (e.g., z- and y- directions) and relatively low stiffness in a third orthogonal direction (e.g., x-direction). The device can be used in coordination with an actuator (38), wherein operation of the actuator and compression of the overlap region are automated.
摘要翻译：示例性装置包括分别由重叠区域（20）彼此交错的多个叶片的第一和第二组可移动地连接在一起的第一和第二部分。当重叠区域被压缩时，防止第一和第二部分相对于彼此的位移，以便在第一和第二正交方向（例如，z方向和y方向）上提供相对高的刚度，并且在第三正交方向（例如，x方向）。该装置可以与致动器（38）配合使用，其中致动器的操作和重叠区域的压缩是自动化的。

7. 发明申请

WO2012174108A1 MIRROR ASSEMBLY FOR AN EXPOSURE APPARATUS 审中-公开
标题翻译：镜面装置用于曝光装置
公开(公告)号：WO2012174108A1
公开(公告)日：2012-12-20
申请号：PCT/US2012/042250
申请日：2012-06-13
申请人： NIKON CORPORATION , PHILLIPS, Alton, H. , WATSON, Douglas, C.
发明人： PHILLIPS, Alton, H. , WATSON, Douglas, C.
IPC分类号： G02B7/195
CPC分类号： G03F7/7015 , G02B7/1815
摘要： A mirror assembly (332) for directing a beam (28) from an illumination source (26) to a reticle (36) includes a mirror (352) and a back plate (350). The mirror (352) includes a mirror body (352A) that defines a reflective first surface (352B) that directs the beam (28), a mirror mounting region (370), a mirror perimeter region (372) that encircles the mirror mounting region (370), and mirror slot (374) that separates the mirror perimeter region (372) from the mirror mounting region (370). The back plate (350) retains and engages the mirror mounting region (370) of the mirror (352) with the mirror perimeter region (372) spaced apart from the back plate (350). Further, the mirror body (352A) can include a second surface (352C) that is substantially opposite the first surface (352B), and the mirror mounting region (370) extends between the second surface (352C) to near the first surface (352B). Further, the mirror slot (374) extends from the second surface (352C) to near the first surface (352B).
摘要翻译：用于将光束（28）从照明源（26）引导到掩模版（36）的反射镜组件（332）包括反射镜（352）和背板（350）。反射镜（352）包括：镜体（352A），其限定引导光束（28）的反射第一表面（352B）;反射镜安装区域（370）;镜面周边区域（372），其包围反射镜安装区域（370）和将反射镜周边区域（372）与反射镜安装区域（370）分离的反射镜槽（374）。背板（350）将反射镜（352）的反射镜安装区域（370）保持并与反射镜周边区域（372）与后板（350）间隔开。此外，镜体（352A）可以包括与第一表面（352B）大致相对的第二表面（352C），并且镜安装区域（370）在第二表面（352C）之间延伸到第一表面（352B）附近）。此外，镜槽（374）从第二表面（352C）延伸到第一表面（352B）附近。

8. 发明申请

WO2008143337A1 MONOLITHIC, NON-CONTACT SIX DEGREE-OF-FREEDOM STAGE APPARATUS 审中-公开
标题翻译：单声道，非接触式六自由度舞台装置
公开(公告)号：WO2008143337A1
公开(公告)日：2008-11-27
申请号：PCT/JP2008/059497
申请日：2008-05-16
申请人： NIKON CORPORATION , BINNARD, Michael B. , ARAI, Youichi , WATSON, Douglas C. , PHILLIPS, Alton H.
发明人： BINNARD, Michael B. , ARAI, Youichi , WATSON, Douglas C. , PHILLIPS, Alton H.
IPC分类号： G03F7/20 , H01L21/67 , H01L21/68
CPC分类号： G03F7/709 , G03F7/70725 , G03F7/70758 , G03F7/70766 , G03F7/70816
摘要： Methods and apparatus for controlling a stage assembly (110) in up to six degrees of freedom using actuators (115A-115C) which each allow for forces to be generated in a horizontal (130C) direction and a vertical direction (130A) are disclosed. According to one aspect of the present invention, a stage apparatus includes a stage assembly (110) and a first stator arrangement. The stage assembly (110) includes a first magnet arrangement of an actuator assembly, and the first stator arrangement is part of the actuator assembly. The first magnet arrangement cooperates with the first stator arrangement to allow the stage assembly (110) to move relative to a first horizontal axis as well as a vertical axis (130A, 130C).
摘要翻译：公开了使用致动器（115A-115C）控制舞台组件（110）的方法和装置，该致动器各自允许在水平（130C）方向和垂直方向（130A）上产生力。根据本发明的一个方面，一种舞台装置包括舞台组件（110）和第一定子装置。舞台组件（110）包括致动器组件的第一磁体布置，并且第一定子装置是致动器组件的一部分。所述第一磁体装置与所述第一定子装置配合以允许所述平台组件（110）相对于第一水平轴线以及垂直轴线（130A，130C）移动。

9. 发明申请

WO2006052855A2 FINE STAGE Z SUPPORT APPARATUS 审中-公开
标题翻译：精美舞台Z支持装置
公开(公告)号：WO2006052855A2
公开(公告)日：2006-05-18
申请号：PCT/US2005040229
申请日：2005-11-04
申请人： NIPPON KOGAKU KK , BINNARD MICHAEL B , HAZELTON ANDREW J , WATSON DOUGLAS C , ARAI YOICHI
发明人： BINNARD MICHAEL B , HAZELTON ANDREW J , WATSON DOUGLAS C , ARAI YOICHI
IPC分类号： A47J43/08
CPC分类号： G03F7/70816 , G03F7/70716 , H01L21/682 , Y10T29/41
摘要： An apparatus for supporting an object is disclosed. The apparatus includes an air bearing coupled to an air bellows. When used in a vacuum environment, the apparatus preferably includes an air bearing housing with vacuum to remove the pressurized fluid used in the air bearing.
摘要翻译：公开了一种用于支撑物体的装置。该装置包括联接到空气波纹管的空气轴承。当在真空环境中使用时，装置优选地包括具有真空的空气轴承壳体，以去除在空气轴承中使用的加压流体。

10. 发明申请

WO2005047981A3 THERMOPHORETIC TECHNIQUES FOR PROTECTING RETICLES FROM CONTAMINANTS 审中-公开
标题翻译：热污染技术保护污染物不受污染
公开(公告)号：WO2005047981A3
公开(公告)日：2005-10-20
申请号：PCT/US2004037542
申请日：2004-11-10
申请人： NIPPON KOGAKU KK , ALTON PHILLIPS H , SOGARD MICHAEL R , WATSON DOUGLAS C , TANAKA KEIICHI
发明人： ALTON PHILLIPS H , SOGARD MICHAEL R , WATSON DOUGLAS C , TANAKA KEIICHI
IPC分类号： G03F7/20
CPC分类号： G03F7/70741 , G03B27/52 , G03F1/82 , G03F7/70875 , G03F7/70916
摘要： Thermophoresis within lithography systems for protecting reticles from contaminants (e.g., floating particles). Generally, thermophoretic protection is implemented by maintaining the reticle at a higher temperature than its surrounding environment. Thermophoretic protection can be maintained throughout a reticle's use in a lithography system. For example, a reticle can be thermophoretically protected while in storage, through various stages of transportation via a reticle handler (also referred to as an end-effector), to its period of use while attached to a reticle chuck.
摘要翻译：光刻系统内用于保护标线免受污染物（例如漂浮颗粒）的热泳。通常，热泳保护是通过将光罩保持在比周围环境更高的温度下来实现的。在光刻系统中使用掩模版的过程中可以保持热泳保护。例如，掩模版可以在储存期间通过经由掩模版处理器（也称为末端执行器）的各种运输阶段被热泳保护到其附着于掩模版卡盘的使用期间。

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