专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2004092833A3 ENVIRONMENTAL SYSTEM INCLUDING A TRANSPORT REGION FOR AN IMMERSION LITHOGRAPHY APPARATUS 审中-公开
标题翻译：环境系统，其中包括一个静态地图设备的运输区域
公开(公告)号：WO2004092833A3
公开(公告)日：2005-12-01
申请号：PCT/US2004009994
申请日：2004-04-01
申请人： NIPPON KOGAKU KK , NOVAK THOMAS W , HAZELTON ANDREW J , WATSON DOUGLAS C
发明人： NOVAK THOMAS W , HAZELTON ANDREW J , WATSON DOUGLAS C
IPC分类号： G03B27/42 , G03F20060101 , G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/7095
摘要： An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254), an immersion fluid system (252), and a transport region (256). The fluid barrier (254) is positioned near the device (30) and maintains the transport region (256) near the gap (246). The immersion fluid system (252) delivers an immersion fluid (248) that fills the gap (246). The transport region (256) transports at least a portion of the immersion fluid (248) that is near the fluid barrier (254) and the device (30) away from the device (30). The immersion fluid system (252) can include a fluid removal system (282) that is in fluid communication with the transport region (256). The transport region (256) can be made of a porous material.
摘要翻译：用于控制光学组件（16）和装置（30）之间的间隙（246）中的环境的环境系统（26）包括流体屏障（254），浸没流体系统（252）和输送区域 256）。流体屏障（254）位于装置（30）附近，并将输送区域（256）保持在间隙（246）附近。浸没流体系统（252）输送填充间隙（246）的浸没流体（248）。输送区域（256）将流体屏障（254）和装置（30）附近的浸没流体（248）的至少一部分输送离开装置（30）。浸没流体系统（252）可以包括与输送区域（256）流体连通的流体移除系统（282）。运输区域（256）可由多孔材料制成。

2. 发明申请

WO2004092830A3 LIQUID JET AND RECOVERY SYSTEM FOR IMMERSION LITHOGRAPHY 审中-公开
标题翻译：液体喷射和恢复系统
公开(公告)号：WO2004092830A3
公开(公告)日：2005-06-16
申请号：PCT/US2004010071
申请日：2004-04-01
申请人： NIPPON KOGAKU KK , NOVAK W THOMAS , HAZELTON ANDREW J , WATSON DOUGLAS C
发明人： NOVAK W THOMAS , HAZELTON ANDREW J , WATSON DOUGLAS C
IPC分类号： G03F7/20 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70341
摘要： A liquid jet and recovery system for an immersion lithography apparatus (100) has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected on a workpiece (W) such as a wafer. These nozzles are each adapted to serve selectively either as a source nozzle (21) for supplying a fluid (7) into the exposure region or as a recovery nozzle (23) for recovering the fluid from the exposure region. A fluid controlling device (14) functions to cause nozzles on selected one or more sides of the exposure region to serve as source nozzles and those on selected one or more of the remaining sides to serve as recovery nozzles such that a desired flow pattern can be established for the convenience of immersion lithography.
摘要翻译：用于浸没式光刻设备（100）的液体喷射和回收系统具有布置成使其开口位于曝光区域附近的喷嘴阵列，图像图案通过该曝光区域投射在诸如晶片的工件（W）上。这些喷嘴各自适于选择性地用作用于将流体（7）供应到曝光区域中的源喷嘴（21），或用作从曝光区域回收流体的回收喷嘴（23）。流体控制装置（14）用于使曝光区域的所选一个或多个侧面上的喷嘴用作源喷嘴，并且在所选择的一个或多个剩余侧面上的喷嘴用作回收喷嘴，使得期望的流动模式可以建立了为了方便浸没光刻。

3. 发明申请

WO2006052855A2 FINE STAGE Z SUPPORT APPARATUS 审中-公开
标题翻译：精美舞台Z支持装置
公开(公告)号：WO2006052855A2
公开(公告)日：2006-05-18
申请号：PCT/US2005040229
申请日：2005-11-04
申请人： NIPPON KOGAKU KK , BINNARD MICHAEL B , HAZELTON ANDREW J , WATSON DOUGLAS C , ARAI YOICHI
发明人： BINNARD MICHAEL B , HAZELTON ANDREW J , WATSON DOUGLAS C , ARAI YOICHI
IPC分类号： A47J43/08
CPC分类号： G03F7/70816 , G03F7/70716 , H01L21/682 , Y10T29/41
摘要： An apparatus for supporting an object is disclosed. The apparatus includes an air bearing coupled to an air bellows. When used in a vacuum environment, the apparatus preferably includes an air bearing housing with vacuum to remove the pressurized fluid used in the air bearing.
摘要翻译：公开了一种用于支撑物体的装置。该装置包括联接到空气波纹管的空气轴承。当在真空环境中使用时，装置优选地包括具有真空的空气轴承壳体，以去除在空气轴承中使用的加压流体。

4. 发明申请

WO2004093130A3 CLEANUP METHOD FOR OPTICS IN IMMERSION LITHOGRAPHY 审中-公开
标题翻译： CLEANUP方法在透视图中的光学
公开(公告)号：WO2004093130A3
公开(公告)日：2005-11-03
申请号：PCT/US2004010309
申请日：2004-04-02
申请人： NIPPON KOGAKU KK , HAZELTON ANDREW J , KAWAI HIDEMI , WATSON DOUGLAS C , NOVAK W THOMAS
发明人： HAZELTON ANDREW J , KAWAI HIDEMI , WATSON DOUGLAS C , NOVAK W THOMAS
IPC分类号： B08B3/04 , B08B3/12 , G03F7/20 , G03B27/42
CPC分类号： G03F7/70341 , B08B3/04 , B08B3/12 , G03F7/70891 , G03F7/70916 , G03F7/70925
摘要： An immersion lithography apparatus has a reticle stage (RST) arranged to retain a reticle (R), a working stage (9) arranged to retain a workpiece (W), and an optical system including an illumination source (1) and an optical element (PL) opposite the workpiece for having an image pattern of the reticle projected by radiation from the illumination source. A gap is defined between the optical element (4) and the workpiece (W), and a fluid supplying device serves to supply an immersion liquid (7) into this gap such that the supplied immersion liquid contacts both the optical element (4) and the workpiece (W) during an immersion lithography process. A cleaning device (30) is incorporated for removing absorbed liquid from the optical element (4) during a cleanup process. The cleaning device may make use of a cleaning liquid having affinity to the absorbed liquid, heat, a vacuum condition, ultrasonic vibrations or cavitating bubbles for the removal of the absorbed liquid.
摘要翻译：浸没式光刻设备具有布置成保持标线片（R）的掩模版台（RST），布置成保持工件（W）的工作台（9）和包括照明源（1）和光学元件（PL），用于具有由来自照明源的辐射投影的标线片的图像图案。在光学元件（4）和工件（W）之间限定间隙，并且流体供应装置用于将浸液（7）供应到该间隙中，使得所提供的浸没液体接触光学元件（4）和在浸没光刻过程中的工件（W）。一种清洁装置（30），用于在净化过程中从光学元件（4）中去除吸收的液体。清洁装置可以利用对吸收的液体具有亲和性的清洁液体，热，真空条件，超声波振动或气泡以去除吸收的液体。

5. 发明申请

WO2008143327A1 KINEMATIC CHUCKS FOR RETICLES AND OTHER PLANAR BODIES 审中-公开
标题翻译：用于反应和其他平面机构的动力卡
公开(公告)号：WO2008143327A1
公开(公告)日：2008-11-27
申请号：PCT/JP2008059483
申请日：2008-05-15
申请人： NIPPON KOGAKU KK , COAKLEY SCOTT , NOVAK THOMAS W , WATSON DOUGLAS C , PHILLIPS ALTON H
发明人： COAKLEY SCOTT , NOVAK THOMAS W , WATSON DOUGLAS C , PHILLIPS ALTON H
IPC分类号： G03F7/20
CPC分类号： G03F7/70783 , G03F7/707
摘要： Devices are disclosed for holding and moving a planar body such as a reticle (25) as used, for example, in microlithography. An exemplary device includes a stage (12) and a body chuck (10). The stage has a movable support surface (17a, 17b). A proximal region (18a, 18b) of a first membrane (16a, 16b) is mounted to the support surface. A distal region (20a, 20b) of the first membrane extends from the support surface and is coupled to the chuck such that the first membrane at least partially supports the chuck. The chuck includes a surface (28) from wh'ich multiple pins (38,40,44) extend. The surface is situated at the distal region. The pins are arrayed to contact and support a respective region of the body. The pin arrangement is configured such that, during- movements of the chuck imparted by the support surface, body slippage relative to the pins due to forces caused by the movement is substantially uniform at each pin.
摘要翻译：公开了用于保持和移动诸如例如在微光刻中使用的掩模版（25）的平面体的装置。示例性装置包括台（12）和主体卡盘（10）。舞台具有可移动的支撑表面（17a，17b）。第一膜（16a，16b）的近端区域（18a，18b）安装到支撑表面。第一膜的远端区域（20a，20b）从支撑表面延伸并且联接到卡盘，使得第一膜片至少部分地支撑卡盘。卡盘包括从多个销（38,40,44）延伸的表面（28）。表面位于远端区域。引脚被排列成接触和支撑身体的相应区域。销配置被构造成使得在由支撑表面赋予的卡盘的运动期间，由于由运动引起的力的相对于销的主体滑动在每个销处基本均匀。

6. 发明申请

WO2012027406A2 VACUUM CHAMBER ASSEMBLY FOR SUPPORTING A WORKPIECE 审中-公开
标题翻译：用于支持工件的真空室组件
公开(公告)号：WO2012027406A2
公开(公告)日：2012-03-01
申请号：PCT/US2011048862
申请日：2011-08-23
申请人： NIPPON KOGAKU KK , HASHEMI FARDAD A , WATSON DOUGLAS C
发明人： HASHEMI FARDAD A , WATSON DOUGLAS C
IPC分类号： B05C15/00
CPC分类号： G03F1/64 , G03B27/64 , G03F1/66 , G03F7/70841 , G03F7/70908 , H01L21/6719
摘要： A chamber assembly (26) for providing a sealed chamber (40) adjacent to a workpiece (28) to counteract the influence of gravity on the workpiece (28) includes a chamber housing (244), and a seal assembly (33) that expands and/or contracts to better seal against the workpiece (28). Further, the chamber assembly (26) can include one or more transducer assemblies (34) that expand or contract to quickly respond to leaks or injections of fluid in chamber assembly (26) to maintain a constant and stable chamber pressure in the chamber assembly (26). Moreover, the chamber assembly (26) can utilize a pressure source (35) that directs a lager amount of fluid (374) through a fluid passageway (368) to accurately maintain the pressure within the chamber assembly (26).
摘要翻译：用于提供邻近工件（28）的密封腔室（40）以抵消重力对工件（28）的影响的腔室组件（26）包括腔室壳体（244）和密封组件（33），所述密封组件和/或收缩以更好地密封工件（28）。此外，腔室组件（26）可包括一个或多个换能器组件（34），所述换能器组件（34）膨胀或收缩以快速响应腔室组件（26）中的流体的泄漏或注射，以维持腔室组件中恒定且稳定的腔室压力 26）。此外，室组件（26）可以利用压力源（35），该压力源引导大量流体（374）通过流体通道（368）以精确地维持室组件（26）内的压力。

7. 发明申请

WO2012176929A3 MULTIPLE-BLADE HOLDING DEVICES 审中-公开
标题翻译：多片式保持装置
公开(公告)号：WO2012176929A3
公开(公告)日：2013-02-28
申请号：PCT/JP2012066311
申请日：2012-06-20
申请人： NIPPON KOGAKU KK , WATSON DOUGLAS C , HASHEMI FARDAD , MARGESON CHRISTOPHER S
发明人： WATSON DOUGLAS C , HASHEMI FARDAD , MARGESON CHRISTOPHER S
IPC分类号： F16F7/08
CPC分类号： F16F7/082
摘要： An exemplary device includes first and second portions that are movably connected together by first and second sets, respectively, of multiple blades interleaved with each other at an overlap region (20). When the overlap region is compressed, displacement of the first and second portions relative to each other is prevented so as to provide relatively high stiffness in first and second orthogonal directions (e.g., z- and y- directions) and relatively low stiffness in a third orthogonal direction (e.g., x-direction). The device can be used in coordination with an actuator (38), wherein operation of the actuator and compression of the overlap region are automated.
摘要翻译：示例性装置包括分别由重叠区域（20）彼此交错的多个叶片的第一和第二组可移动地连接在一起的第一和第二部分。当重叠区域被压缩时，防止第一和第二部分相对于彼此的位移，以便在第一和第二正交方向（例如，z方向和y方向）上提供相对高的刚度，并且在第三正交方向（例如，x方向）。该装置可以与致动器（38）配合使用，其中致动器的操作和重叠区域的压缩是自动化的。

8. 发明申请

WO2005047981A3 THERMOPHORETIC TECHNIQUES FOR PROTECTING RETICLES FROM CONTAMINANTS 审中-公开
标题翻译：热污染技术保护污染物不受污染
公开(公告)号：WO2005047981A3
公开(公告)日：2005-10-20
申请号：PCT/US2004037542
申请日：2004-11-10
申请人： NIPPON KOGAKU KK , ALTON PHILLIPS H , SOGARD MICHAEL R , WATSON DOUGLAS C , TANAKA KEIICHI
发明人： ALTON PHILLIPS H , SOGARD MICHAEL R , WATSON DOUGLAS C , TANAKA KEIICHI
IPC分类号： G03F7/20
CPC分类号： G03F7/70741 , G03B27/52 , G03F1/82 , G03F7/70875 , G03F7/70916
摘要： Thermophoresis within lithography systems for protecting reticles from contaminants (e.g., floating particles). Generally, thermophoretic protection is implemented by maintaining the reticle at a higher temperature than its surrounding environment. Thermophoretic protection can be maintained throughout a reticle's use in a lithography system. For example, a reticle can be thermophoretically protected while in storage, through various stages of transportation via a reticle handler (also referred to as an end-effector), to its period of use while attached to a reticle chuck.
摘要翻译：光刻系统内用于保护标线免受污染物（例如漂浮颗粒）的热泳。通常，热泳保护是通过将光罩保持在比周围环境更高的温度下来实现的。在光刻系统中使用掩模版的过程中可以保持热泳保护。例如，掩模版可以在储存期间通过经由掩模版处理器（也称为末端执行器）的各种运输阶段被热泳保护到其附着于掩模版卡盘的使用期间。

9. 发明公开

EP1814427A4 FINE STAGE Z SUPPORT APPARATUS 审中-公开
标题翻译：细STAGE Z-载波设备
公开(公告)号：EP1814427A4
公开(公告)日：2009-01-07
申请号：EP05826284
申请日：2005-11-04
申请人： NIPPON KOGAKU KK
发明人： BINNARD MICHAEL B , HAZELTON ANDREW J , WATSON DOUGLAS C , ARAI YOICHI
IPC分类号： G03B27/42 , G03B27/58
CPC分类号： G03F7/70816 , G03F7/70716 , H01L21/682 , Y10T29/41
摘要： An apparatus for supporting an object is disclosed. The apparatus includes an air bearing coupled to an air bellows. When used in a vacuum environment, the apparatus preferably includes an air bearing housing with vacuum to remove the pressurized fluid used in the air bearing.

10. 发明公开

EP1614001A4 CLEANUP METHOD FOR OPTICS IN IMMERSION LITHOGRAPHY 有权
标题翻译： REINIGUNGSVERFAHRENFÜROPTIK IN ER IMMERSIONSLITHOGRAPHIE
公开(公告)号：EP1614001A4
公开(公告)日：2007-05-16
申请号：EP04759103
申请日：2004-04-02
申请人： NIPPON KOGAKU KK
发明人： HAZELTON ANDREW J , KAWAI HIDEMI , WATSON DOUGLAS C , NOVAK W THOMAS
IPC分类号： G03B27/42 , B08B3/04 , B08B3/12 , G03F7/20
CPC分类号： G03F7/70341 , B08B3/04 , B08B3/12 , G03F7/70891 , G03F7/70916 , G03F7/70925
摘要： An immersion lithography apparatus (100) has a reticle stage (RST) arranged to retain a reticle (R), a working stage (9-11) arranged to retain a workpiece (W), and an optical system including an illumination source and an optical element (4) opposite the workpiece (W) for having an image pattern of the reticle (R) projected by radiation from the illumination source. A gap is defined between the optical element (4) and the workpiece (W), and a fluid-supplying device (5) serves to supply an immersion liquid (7) into this gap such that the supplied immersion liquid (7) contacts both the optical element (4) and the workpiece (W) during an immersion lithography process. A cleaning device (30) is incorporated for removing absorbed liquid from the optical element (4) during a cleanup process. The cleaning device (30) may make use of a cleaning liquid having affinity to the absorbed liquid, heat, a vacuum condition, ultrasonic vibrations or cavitating bubbles for the removal of the absorbed liquid. The cleaning liquid may be supplied through the same fluid-applying device provided with a switching device such as a valve.
摘要翻译：浸没式光刻设备（100）具有布置成保持掩模版（R），布置成保持工件（W）的工作台（9-11）的掩模版台（RST）和包括照明源和光学元件（4），其与工件（W）相对，用于具有通过来自照明源的辐射而突出的标线（R）的图像图案。在光学元件（4）和工件（W）之间限定间隙，并且流体供应装置（5）用于将浸没液体（7）供应到该间隙中，使得所提供的浸液（7）接触两者光学元件（4）和工件（W）。一种清洁装置（30），用于在净化过程中从光学元件（4）中去除吸收的液体。清洁装置（30）可以利用对被吸收的液体，热，真空条件，超声波振动或气蚀气泡具有亲和性的清洁液体，以除去吸收的液体。可以通过设置有诸如阀门的开关装置的相同的流体施加装置来供应清洁液体。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式