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    • 2. 发明授权
    • Film thickness measuring method, polishing method, fabrication method of thin film magnetic head and substrate for forming the thin film magnetic head
    • 膜厚度测量方法,抛光方法,薄膜磁头的制造方法以及用于形成薄膜磁头的基板
    • US06475062B1
    • 2002-11-05
    • US09459653
    • 1999-12-13
    • Toshio KubotaMasumi SugawaraTakehiro Horinaka
    • Toshio KubotaMasumi SugawaraTakehiro Horinaka
    • B24B4900
    • G11B5/3166B24B37/013B24B37/042B24B49/12G11B5/3116G11B5/3163
    • The present invention relates to a film thickness measuring method measuring a film thickness of an element formation layer formed on a substrate and its object is to provide a film thickness measuring method which can measure a residual film thickness of a polishing object film in a polishing process at a high accuracy. In a fabrication method of a thin film magnetic head, alumina is coated over a dummy layer 54 and a bottom shielding layer 16 after forming the dummy layer 54 along with the bottom shielding layer 16 and a planarized layer 24 is formed by polishing the surface thereof using a CMP. Next, after forming a top shielding layer 32 over the bottom shielding layer 16, a planarized layer 38 is form by embedding alumina. A film thickness of an embedded 38 on the dummy layer 54 is measured by a non-contact optical film thickness measuring equipment and a film thickness of the top shielding layer 32 is measured based on the film thickness.
    • 本发明涉及测量形成在基板上的元件形成层的膜厚度的膜厚度测量方法,其目的是提供一种可以在抛光过程中测量抛光对象膜的残留膜厚度的膜厚度测量方法 以高精度。 在薄膜磁头的制造方法中,在与底部屏蔽层16一起形成虚设层54之后,将氧化铝涂覆在虚设层54和底部屏蔽层16上,并且通过抛光其表面形成平坦化层24 使用CMP。 接下来,在底部屏蔽层16上形成顶部屏蔽层32之后,通过包埋氧化铝形成平坦化层38。 通过非接触式光学膜厚度测量装置测量虚拟层54上的嵌入层38的膜厚度,并且基于膜厚度测量顶部屏蔽层32的膜厚度。
    • 5. 发明授权
    • Transparent fluorine-containing polymer
    • 透明含氟聚合物
    • US08871332B2
    • 2014-10-28
    • US13391056
    • 2010-08-16
    • Toshio KubotaTakehiro NagasawaMakoto HirookaEiko Hirooka
    • Toshio KubotaTakehiro NagasawaAkira Hirooka
    • B32B3/00C08F220/06C08L33/02C08L33/10C08F8/00C08F220/18C08F216/12
    • C08F220/18C08F216/125Y10T428/24802C08F220/12
    • Disclosed is a fluorine-containing polymer obtained by polymerizing a 1,6-diene-type ether compound represented by formula [1] and, for example, a (meth)acrylic acid compound represented by formula [2]. The fluorine-containing polymer shows high transparency, has a high glass transition point, and is soluble in a solvent and therefore has moldability. In the case where a (meth)acrylic unit has a reactive substituent, by utilizing the crosslinking reaction thereof, a thin film having high solvent resistance can be produced. In formulae [1] and [2], R1 and R2 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, which may be substituted, R3 represents a hydrogen atom, a fluorine atom, or a methyl group, and R4 represents a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, which may be substituted, or an aromatic group having 5 to 10 ring members, which may be substituted.
    • 公开了通过使由式[1]表示的1,6-二烯型醚化合物和例如由式[2]表示的(甲基)丙烯酸化合物聚合而获得的含氟聚合物。 含氟聚合物显示高透明度,玻璃化转变点高,并且溶于溶剂,因此具有成型性。 在(甲基)丙烯酸单元具有反应性取代基的情况下,通过利用其交联反应,可以制备耐溶剂性高的薄膜。 在式[1]和[2]中,R 1和R 2各自独立地表示氢原子或碳原子数1〜12的烷基,可以被取代,R 3表示氢原子,氟原子或甲基, R 4表示氢原子,可以被取代的碳原子数1〜12的烷基或可以被取代的环状成员5〜10的芳香族基。
    • 8. 发明授权
    • Method for pressure transport of methanol through a pipeline
    • 通过管道压力输送甲醇的方法
    • US4446881A
    • 1984-05-08
    • US409470
    • 1982-08-19
    • Yasuo KitamuraMasao SuzukiToshio KubotaHiroshi WatanabeMasaaki Tsujimoto
    • Yasuo KitamuraMasao SuzukiToshio KubotaHiroshi WatanabeMasaaki Tsujimoto
    • F17D1/14B01J4/00C23F15/00
    • C23F15/00Y10T137/0318
    • A method for the long-distance transport of a liquid of methanol or a solution of methanol and at least one organic compound other than methanol, under pressure, through a pipeline installation in which the portions of the pipeline installation that contact said liquid consist essentially of carbon steel and/or low alloy steel, the sum of whose metallic components other than Fe is up to 5 wt. %, in which the water content of said liquid is limited to (a) the range of 0 to 35 wt. % if the content of the formate radical in said liquid is up to 0.05 wt. %, (b) the range of 0.25 to 35 wt. % if the content of the formate radical in said liquid is in the range of 0.05 to 2 wt. % and (c) the range of 0 to 35 wt. % if the content of the formate radical in said liquid is in the range of 2 to 3 wt. %, so that said liquid is transported under pressure while the volume ratio of the formate radical to the water content is kept at a ratio that does not permit the presence of more than 3 wt. % of the formate radical in the liquid.
    • 一种用于在压力下通过管道装置长时间运送甲醇液体或甲醇和甲醇以外的至少一种有机化合物的方法,其中与所述液体接触的管道装置的部分基本上由 碳钢和/或低合金钢,其除Fe以外的金属成分的总和高达5wt。 %,其中所述液体的含水量限于(a)0至35重量%的范围。 %,如果所述液体中甲酸根的含量高达0.05wt。 %,(b)0.25〜35wt。 %,如果所述液体中甲酸根的含量在0.05-2重量%的范围内。 %,(c)0〜35重量%的范围。 %,如果所述液体中甲酸根的含量在2〜3重量%的范围内。 %,使得所述液体在压力下运输,同时甲酸基团与水含量的体积比保持不超过3重量%的比例。 液体中甲酸根的百分数。
    • 9. 发明授权
    • Machined magnetic head with contoured air bearing surfaces
    • 加工磁头与轮廓空气轴承表面
    • US5742451A
    • 1998-04-21
    • US736329
    • 1996-10-23
    • Toshio KubotaTetsuo Miyazaki
    • Toshio KubotaTetsuo Miyazaki
    • G11B5/31G11B5/60G11B21/21
    • G11B5/6082
    • The present invention is directed to stabilize the flying height at a constant level and prevent head crashes. Indented portions 104 and 105 are formed shorter than rail portions 101 and 102. Rear rail surfaces 113 and front rail surfaces 112 are formed at the slider 1 with middle rail surfaces 111 formed between them. The rear rail surfaces 113 and the front rail surfaces 112 each include a first surface (L1) whose surface width is determined by the entire width W01 or W02 of the rail portion 101 or 102 and a second surface (L3) whose surface width is gradually reduced starting from the surfaces width W01 or W02 of the first (L1) toward the surface width W11 or W12 of the middle rail surfaces 111. The requirements, i.e., L1.ltoreq.2.5% of L0 and L1
    • 本发明旨在将飞行高度稳定在一定水平并防止头部碰撞。 缩径部分104和105形成为比轨道部分101和102短。后轨道表面113和前轨道表面112形成在滑块1处,其间形成有中间轨道表面111。 后轨面113和前轨面112各自包括表面宽度由轨道部分101或102的整个宽度W01或W02决定的第一表面(L1)和表面宽度逐渐变小的第二表面(L3) 从第一(L1)的表面宽度W01或W02朝向中间轨道表面111的表面宽度W11或W12开始减小。要求,即L0和L1