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    • 6. 发明申请
    • GaN-BASED NITRIC OXIDE SENSORS AND METHODS OF MAKING AND USING THE SAME
    • 基于GaN的氮氧化物传感器及其制造和使用方法
    • US20110097837A1
    • 2011-04-28
    • US12948946
    • 2010-11-18
    • Michael A. GarciaScott D. WolterApril S. BrownJoseph BonaventuraThomas F. Kuech
    • Michael A. GarciaScott D. WolterApril S. BrownJoseph BonaventuraThomas F. Kuech
    • H01L21/18
    • G01N33/0037G01N27/4141Y02A50/245
    • GaN-based heterojunction field effect transistor (HFET) sensors are provided with engineered, functional surfaces that act as pseudo-gates, modifying the drain current upon analyte capture. In some embodiments, devices for sensing nitric oxide (NO) species in a NO-containing fluid are provided which comprise a semiconductor structure that includes a pair of separated GaN layers and an AlGaN layer interposed between and in contact with the GaN layers. Source and drain contact regions are formed on one of the GaN layers, and an exposed GaN gate region is formed between the source and drain contact regions for contact with the NO-containing fluid. The semiconductor structure most preferably is formed on a suitable substrate (e.g., SiC). An insulating layer may be provided so as to cover the semiconductor structure. The insulating layer will have a window formed therein so as to maintain exposure of the GaN gate region and thereby allow the gate region to contact the NO-containing fluid. Electrical contact pads are preferably provided in some embodiments so as to be in electrical contact with the source and drain contact regions, respectively. Electrical leads may thus be connected to the contact pads. According to other embodiments, the NO detection device will include a metalloporphyrin adsorbed on the GaN gate region.
    • GaN基异质结场效应晶体管(HFET)传感器具有用作伪栅极的工程化功能表面,在分析物捕获时修改漏极电流。 在一些实施例中,提供了用于感测含NO流体中的一氧化氮(NO)物质的装置,其包括半导体结构,该半导体结构包括一对分离的GaN层和介于GaN层之间并与GaN层接触的AlGaN层。 源极和漏极接触区域形成在GaN层之一上,并且在源极和漏极接触区域之间形成暴露的GaN栅极区域以与含NO的流体接触。 最优选地,半导体结构形成在合适的衬底(例如,SiC)上。 可以提供绝缘层以覆盖半导体结构。 绝缘层将具有形成在其中的窗口,以便保持GaN栅极区域的曝光,从而允许栅极区域与含NO的流体接触。 在一些实施例中,电接触焊盘优选地设置成分别与源极和漏极接触区域电接触。 因此,电引线可以连接到接触垫。 根据其它实施方案,NO检测装置将包括吸附在GaN栅极区上的金属卟啉。