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1. 发明申请

US20060210982A1 Cleavable assigned molecules and screening method using the same 审中-公开
标题翻译：可拆分的分子和筛选方法使用相同
公开(公告)号：US20060210982A1
公开(公告)日：2006-09-21
申请号：US10543682
申请日：2004-02-02
申请人： Hiroshi Yanagawa , Nobuhide Doi , Tetsuya Nagano , Hideaki Takashima
发明人： Hiroshi Yanagawa , Nobuhide Doi , Tetsuya Nagano , Hideaki Takashima
IPC分类号： C40B40/08
CPC分类号： C40B30/04 , C07K14/00 , C12N15/1075
摘要： A method for screening a nucleic acid library for a nucleic acid encoding a protein that interacts with a target substance, which comprises: the step of producing a library of assigning molecules each comprising a protein and a nucleic acid encoding the protein linked to each other via a linker cleavable under a condition that does not change a nucleotide sequence of the nucleic acid; the step of mixing the library of assigning molecules and the target substance; the step of separating an assigning molecule binding to the target substance; the step of cleaving a linker of the separated assigning molecule under a condition that does not change a nucleotide sequence of the nucleic acid to release the nucleic acid; and the step of collecting the released nucleic acid. By this method, screening for an assigning molecule that specifically binds to a target substance can be conducted with high efficiency.
摘要翻译：一种用于筛选编码与靶物质相互作用的蛋白质的核酸的核酸文库的方法，该方法包括：产生分配分子的文库的步骤，每个分子包含蛋白质和编码相互连接的蛋白质的核酸通过在不改变核酸的核苷酸序列的条件下可切割的接头; 分配分子的文库和目标物质的步骤; 分离与靶物质结合的分配分子的步骤; 在不改变核酸的核苷酸序列以释放核酸的条件下切割分离的分配分子的接头的步骤; 以及收集释放的核酸的步骤。通过该方法，可以高效率地进行与目标物质特异性结合的分配分子的筛选。

2. 发明申请

US20080088930A1 GRATING, NEGATIVE AND REPLICA GRATINGS OF THE GRATING, AND METHOD OF MANUFACTURING THE SAME 失效
标题翻译：磨粒的磨粒，负面和复制磨砂及其制造方法
公开(公告)号：US20080088930A1
公开(公告)日：2008-04-17
申请号：US11948133
申请日：2007-11-30
申请人： Tetsuya Nagano , Masaru Koeda , Makoto Sato , Akira Sato , Shinji Miyauchi
发明人： Tetsuya Nagano , Masaru Koeda , Makoto Sato , Akira Sato , Shinji Miyauchi
IPC分类号： G02B5/18 , B29D11/00
CPC分类号： G02B5/1857 , B29D11/0074 , G01J3/18 , G02B5/1852 , G02B5/1861 , Y10T428/24479 , Y10T428/24612
摘要： A grating of the present invention has a groove cross section shaped, for example, like a sinusoidal wave or a sawtooth other than a laminar shape, and a groove bottom part shaped as a flat form. In a region wherein the groove cycle and the used wavelength are the same degree for wavelengths from near infrared to infrared, the grating of the present invention has the excellent spectrum performance (high efficiency in balance in a wide wavelength zone) more than a holographic grating and an echellette grating in related arts. When replicas for the grating of the present invention are manufactured, the engagement force of grooves with each other is small as the groove aspect ratio is small, and a release agent sufficiently reaches the groove bottom as the groove bottom is large.
摘要翻译：本发明的光栅具有例如像正弦波或除了片状以外的锯齿状的槽状横截面，以及成形为平面形状的槽底部。在其中槽周期和使用波长对于从近红外到红外线的波长相同的区域中，本发明的光栅具有比全息光栅更好的光谱性能（在宽波长区域中平衡的高效率）和相关领域的电子格子。当制造用于本发明的光栅的复制品时，由于沟槽纵横比小，沟槽的接合力小，并且当槽底部大时，剥离剂充分到达槽底。

3. 发明授权

US5363238A Diffraction grating 失效
$Diffraction grating$
标题翻译：衍射光栅
公开(公告)号：US5363238A
公开(公告)日：1994-11-08
申请号：US64912
申请日：1993-05-24
申请人： Yasuhiro Akune , Kichiya Tanino , Masaru Koeda , Tetsuya Nagano , Kazuo Sano , Eiji Ishiguro
发明人： Yasuhiro Akune , Kichiya Tanino , Masaru Koeda , Tetsuya Nagano , Kazuo Sano , Eiji Ishiguro
IPC分类号： G02B5/18 , G21K1/06 , G02B27/44
CPC分类号： G21K1/06
摘要： The present invention discloses diffraction gratings which do not generate any thermal strain and can perform extremely high-precision and high-efficiency diffraction nearly free from scattered beams. The diffraction gratings are built by allowing the chemically deposited film of silicon carbide whose crystal planes are strongly oriented to the (220) planes in terms of Miller indices to form on the substrate comprising sintered silicon carbide, polishing the surface of the deposited film to 5 .ANG. RMS or less, and directly etched laminar-type grating grooves on that surface by using ion-beam etching.
摘要翻译：本发明公开了不产生任何热应变的衍射光栅，能够实现几乎不受分散光束的极高精度和高效率的衍射。衍射光栅是通过使坩埚的化学沉积膜以米勒指数方向强烈地取向（220）面的碳化硅的化学沉积膜形成在包含烧结碳化硅的衬底上，将沉积膜的表面抛光至5 ANGSTROM RMS或更小，以及通过使用离子束蚀刻在该表面上直接蚀刻的层状光栅槽。

4. 发明授权

US08092701B2 Grating, negative and replica gratings of the grating, and method of manufacturing the same 失效
标题翻译：光栅的光栅，负和复制光栅及其制造方法
公开(公告)号：US08092701B2
公开(公告)日：2012-01-10
申请号：US11948133
申请日：2007-11-30
申请人： Tetsuya Nagano , Masaru Koeda , Makoto Sato , Akira Sato , Shinji Miyauchi
发明人： Tetsuya Nagano , Masaru Koeda , Makoto Sato , Akira Sato , Shinji Miyauchi
IPC分类号： B44C1/22
CPC分类号： G02B5/1857 , B29D11/0074 , G01J3/18 , G02B5/1852 , G02B5/1861 , Y10T428/24479 , Y10T428/24612
摘要： A grating of the present invention has a groove cross section shaped, for example, like a sinusoidal wave or a sawtooth other than a laminar shape, and a groove bottom part shaped as a flat form. In a region wherein the groove cycle and the used wavelength are the same degree for wavelengths from near infrared to infrared, the grating of the present invention has the excellent spectrum performance (high efficiency in balance in a wide wavelength zone) more than a holographic grating and an echellette grating in related arts. When replicas for the grating of the present invention are manufactured, the engagement force of grooves with each other is small as the groove aspect ratio is small, and a release agent sufficiently reaches the groove bottom as the groove bottom is large.
摘要翻译：本发明的光栅具有例如像正弦波或除了片状以外的锯齿状的槽状横截面，以及成形为平面形状的槽底部。在其中槽周期和使用波长对于从近红外到红外线的波长相同的区域中，本发明的光栅具有比全息光栅更好的光谱性能（在宽波长区域中平衡的高效率）和相关领域的电子格子。当制造用于本发明的光栅的复制品时，由于沟槽纵横比小，沟槽的接合力小，并且当槽底部大时，剥离剂充分到达槽底。

5. 发明授权

US5234537A Dry etching method and its application 失效
标题翻译：干蚀刻方法及其应用
公开(公告)号：US5234537A
公开(公告)日：1993-08-10
申请号：US854684
申请日：1992-03-20
申请人： Tetsuya Nagano , Masaru Koeda
发明人： Tetsuya Nagano , Masaru Koeda
IPC分类号： C03C15/00 , C04B41/53 , C04B41/91 , G02B5/18 , G02B6/124 , H01L21/04
CPC分类号： G02B6/124 , C03C15/00 , C04B41/5346 , C04B41/91 , G02B5/1857 , H01L21/0475
摘要： A dry etching method for etching a surface of a substrate with plasma of mixed gas including i) gas that is reactive to the material of the substrate, and ii) inert gas. Accumulation of reaction products between the substrate and the reactive gas ions on the substrate is effectively eliminated by the ions of the inert gas plasma. Accordingly the etching rate of the substrate is not lowered. Silicon carbide (SiC) is one of the most suitable object of the plasma etching of the present invention, since it is hard to engrave by conventional dry etching methods.

6. 发明申请

US20060216478A1 GRATING, NEGATIVE AND REPLICA GRATINGS OF THE GRATING, AND METHOD OF MANUFACTURING THE SAME 审中-公开
标题翻译：磨粒的磨粒，负面和复制磨砂及其制造方法
公开(公告)号：US20060216478A1
公开(公告)日：2006-09-28
申请号：US11420932
申请日：2006-05-30
申请人： Tetsuya Nagano , Masaru Koeda , Makoto Sato , Akira Sato , Shinji Miyauchi
发明人： Tetsuya Nagano , Masaru Koeda , Makoto Sato , Akira Sato , Shinji Miyauchi
IPC分类号： B32B3/00
CPC分类号： G02B5/1857 , B29D11/0074 , G01J3/18 , G02B5/1852 , G02B5/1861 , Y10T428/24479 , Y10T428/24612
摘要： A grating of the present invention has a groove cross section shaped, for example, like a sinusoidal wave or a sawtooth other than a laminar shape, and a groove bottom part shaped as a flat form. In a region wherein the groove cycle and the used wavelength are the same degree for wavelengths from near infrared to infrared, the grating of the present invention has the excellent spectrum performance (high efficiency in balance in a wide wavelength zone) more than a holographic grating and an echellette grating in related arts. When replicas for the grating of the present invention are manufactured, the engagement force of grooves with each other is small as the groove aspect ratio is small, and a release agent sufficiently reaches the groove bottom as the groove bottom is large.
摘要翻译：本发明的光栅具有例如像正弦波或除了片状以外的锯齿状的槽状横截面，以及成形为平面形状的槽底部。在其中槽周期和使用波长对于从近红外到红外线的波长相同的区域中，本发明的光栅具有比全息光栅更好的光谱性能（在宽波长区域中平衡的高效率）和相关领域的电子格子。当制造用于本发明的光栅的复制品时，由于沟槽纵横比小，沟槽的接合力小，并且当槽底部大时，剥离剂充分到达槽底。

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