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    • 1. 发明授权
    • Developing method for photosensitive material
    • 感光材料的显影方法
    • US4837131A
    • 1989-06-06
    • US875480
    • 1986-06-18
    • Kesanao KobayashiHisao OhbaTadao Toyama
    • Kesanao KobayashiHisao OhbaTadao Toyama
    • G03F7/30
    • G03F7/3042
    • This invention provides a developing method for photosensitive materials, in particlar for a positive photosensitive lithographic printing plate, which enables an efficient development with minimum consumption of the developing liquid. The developing method of the present invention comprises the steps of: conducting a preparatory development by applying a developing liquid to an exposed photosensitive layer of a photosensitive material, the developing liquid being supplied in an amount of necessary for each developing cycle; removing the developing liquid; discarding the developing liquid; and again applying a developing liquid to the photosensitive material to complete the development.
    • 本发明提供了一种用于光敏材料的显影方法,特别是用于正性光敏平版印刷版,其能够以最少的显影液消耗量进行有效发展。 本发明的显影方法包括以下步骤:通过将显影液施加到感光材料的曝光感光层来进行预备显影,所述显影液以每个显影循环所需的量供应; 去除显影液; 丢弃显影液体; 并再次将显影液体施加到感光材料上以完成显影。
    • 7. 发明授权
    • Presensitized plate for use in making lithographic printing plate
comprising a mat layer and coating layer on the back face of the
substrate
    • 用于制造平版印刷版的预感板,其在基材的背面上包含垫层和涂层
    • US5496677A
    • 1996-03-05
    • US357085
    • 1994-12-15
    • Tadao ToyamaHitoshi HagiwaraNobuyuki Kita
    • Tadao ToyamaHitoshi HagiwaraNobuyuki Kita
    • G03F7/09G03F7/11G03F7/021G03F7/023G03F7/032
    • G03F7/092
    • A presensitized plate for use in making a lithographic printing plate comprises a substrate; a photosensitive layer and a mat layer whose projections have an average diameter of not more than 100 .mu.m, an average height of not more than 10 .mu.m and whose coated amount ranges from 5 to 200 mg/m.sup.2, the photosensitive layer and the mat layer being applied onto the upper surface of the substrate; and a coating layer of an organic polymeric compound having a glass transition point of not less than 20.degree. C. and a thickness ranging from 0.01 to 8.0 .mu.m, the coating layer being applied onto the back face of the substrate. The presensitized plate makes it possible to solve the problem of the formation of scratches and the adhesion of the photosensitive layer to the back face of the PS plate even when a large number of PS plates are transported and/or stored while putting them in piles without sandwiching the PS plate between interleaves. The coated layer applied to the back face of the PS plate is tough and shows good adhesion to the substrate and is not peeled off during handling, development processing and printing operations.
    • 用于制造平版印刷版的预感板包括基材; 感光层和垫层,其平均直径不大于100μm,平均高度不大于10μm,涂布量为5-200mg / m 2,感光层和垫 层施加到基板的上表面上; 以及玻璃化转变温度为20℃以上且厚度为0.01〜8.0μm的有机高分子化合物的被覆层,涂布在基材的背面。 即使在大量PS板被输送和/或储存的同时将它们放置在桩中也可以解决形成刮痕和感光层粘附到PS板的背面的问题, 将PS板夹在交错之间。 施加到PS板的背面的涂层是坚韧的,并且对基材具有良好的粘附性,并且在处理,显影处理和印刷操作期间不会剥离。
    • 8. 发明授权
    • Method for processing photosensitive copying materials
    • 感光复印材料的处理方法
    • US5326674A
    • 1994-07-05
    • US875028
    • 1992-04-28
    • Tadao ToyamaAtsushi Sakamoto
    • Tadao ToyamaAtsushi Sakamoto
    • G03F7/09G03F7/30G03C5/00
    • G03F7/092G03F7/30
    • A method for processing a photosensitive copying material comprises the steps of imagewise exposing to light a photosensitive copying material which comprises in order (i) a first photosensitive organic coating layer whose solubility in a developer varies through irradiation with light rays and (ii) a second organic coating layer containing a water-insoluble and organic solvent-soluble polymeric compound having an film-forming ability and then developing the imagewise exposed copying material, wherein the imagewise exposed material is dipped in the developer and then water-washed to remove the first and second organic coating layers on non-image portions. According to this method, the ability of the developer to process photosensitive copying materials is substantially improved, the amount of the waste liquor can substantially be reduced and a problem of environmental pollution can effectively be solved.
    • 一种用于处理感光复印材料的方法包括以下步骤:将感光复印材料成像曝光,其包括:(i)第一光敏有机涂层,其在显影剂中的溶解度通过光线照射而变化,和(ii)第二 有机涂层,其含有具有成膜能力的水不溶性和有机溶剂可溶性聚合物,然后显影成像曝光的复印材料,其中将成像曝光材料浸在显影剂中,然后水洗以除去第一和 非图像部分上的第二有机涂层。 根据该方法,可显着提高显影剂处理感光性复印材料的能力,能够大幅降低废液的使用量,能够有效地解决污染问题。