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1. 发明授权

US4762771A Method of treating photosensitive printing plate 失效
标题翻译：感光印版的处理方法
公开(公告)号：US4762771A
公开(公告)日：1988-08-09
申请号：US890737
申请日：1986-07-30
申请人： Hiroshi Matsumoto , Hitoshi Hagiwara
发明人： Hiroshi Matsumoto , Hitoshi Hagiwara
IPC分类号： G03F7/00 , G03F7/40 , G03C7/02
CPC分类号： G03F7/40
摘要： The present invention provides a method of treating photosensitive printing plate, which comprises subjecting a photosensitive lithographic plate to exposure, development and burning-in treatment, characterized in that an aqueous solution containing phytic acid and aminobenzenesulfonic acid is applied to the lithographic plate after the development but prior to the burning-in treatment and then the burning-in treatment is conducted in the presence of these compounds.According to the invention, there can be prepared a lithographic plate free from background stain and having an excellent ink-receptive property in its image-forming area.
摘要翻译：本发明提供了一种处理光敏印版的方法，该方法包括使光敏平版印刷板进行曝光，显影和燃烧处理，其特征在于，在显影后将含有植酸和氨基苯磺酸的水溶液施加到平版印刷板上但在燃烧处理之前，然后在这些化合物的存在下进行燃烧处理。根据本发明，可以制备没有背景污渍的平版印刷版，并且在其成像区域具有优异的油墨接受性。

2. 发明授权

US4606995A Process for developing light-sensitive o-quinonediazide lithographic plates with developing solution having cobalt or nickel compound 失效
标题翻译：用具有钴或镍化合物的显影液开发光敏邻醌二叠氮平版印刷版的方法
公开(公告)号：US4606995A
公开(公告)日：1986-08-19
申请号：US566454
申请日：1983-12-28
申请人： Nobuyuki Kita , Hiroshi Matsumoto , Hitoshi Hagiwara
发明人： Nobuyuki Kita , Hiroshi Matsumoto , Hitoshi Hagiwara
IPC分类号： G03F7/00 , G03F7/30 , G03F7/32 , G03F7/08
CPC分类号： G03F7/322 , G03F7/00
摘要： A developing solution for developing a light-sensitive lithographic plate having a o-quinonediazide compound-containing light-sensitive layer is disclosed. The developing solution is comprised of an aqueous solution containing alkali silicate and an alkali aqueous solution-soluble compound of a metal selected from the group consisting of Sn, Pb, Fe, Co and Ni. The developing solution provides excellent resolving power, has excellent development stability, processing capability and adaptability with respect to automatic developing machines.
摘要翻译：公开了一种用于开发含有邻醌二叠氮化合物的感光层的光敏平版印刷板的显影液。显影液由含有碱金属硅酸盐的水溶液和选自Sn，Pb，Fe，Co和Ni的金属的碱溶性水溶性化合物构成。开发解决方案提供优异的分辨能力，具有优异的显影稳定性，加工能力和相对于自动显影机的适应性。

3. 发明授权

US4500625A Developer for light-sensitive lithographic printing plate precursor 失效
标题翻译：光敏平版印刷版前体显影剂
公开(公告)号：US4500625A
公开(公告)日：1985-02-19
申请号：US548808
申请日：1983-11-04
申请人： Nobuyuki Kita , Hiroshi Matsumoto , Hitoshi Hagiwara
发明人： Nobuyuki Kita , Hiroshi Matsumoto , Hitoshi Hagiwara
IPC分类号： G03C1/72 , G03F7/00 , G03F7/022 , G03F7/30 , G03F7/32 , G03C5/24 , G03C5/00 , G03F7/08
CPC分类号： G03F7/322
摘要： A developer for a light-sensitive lithographic printing plate having an o-quinonediazide-containing light-sensitive layer is disclosed. The developer is comprised of an aqueous solution of an alkali silicate containing an organic boron compound. The organic boron compound is represented by the formula ##STR1## the substituents are defined within the specification. By utilizing the developer of the invention it is possible to provide excellent developing power, development stability, processability and preferred forming properties during development.
摘要翻译：公开了一种具有含有邻醌二叠氮化物的感光层的感光平版印刷版的显影剂。显影剂由含有有机硼化合物的碱性硅酸盐的水溶液组成。有机硼化合物由式IMA表示，取代基在本说明书中定义。通过利用本发明的显影剂，可以在显影期间提供优异的显影能力，显影稳定性，可加工性和优选的成形性能。

4. 发明授权

US5496677A Presensitized plate for use in making lithographic printing plate comprising a mat layer and coating layer on the back face of the substrate 失效
标题翻译：用于制造平版印刷版的预感板，其在基材的背面上包含垫层和涂层
公开(公告)号：US5496677A
公开(公告)日：1996-03-05
申请号：US357085
申请日：1994-12-15
申请人： Tadao Toyama , Hitoshi Hagiwara , Nobuyuki Kita
发明人： Tadao Toyama , Hitoshi Hagiwara , Nobuyuki Kita
IPC分类号： G03F7/09 , G03F7/11 , G03F7/021 , G03F7/023 , G03F7/032
CPC分类号： G03F7/092
摘要： A presensitized plate for use in making a lithographic printing plate comprises a substrate; a photosensitive layer and a mat layer whose projections have an average diameter of not more than 100 .mu.m, an average height of not more than 10 .mu.m and whose coated amount ranges from 5 to 200 mg/m.sup.2, the photosensitive layer and the mat layer being applied onto the upper surface of the substrate; and a coating layer of an organic polymeric compound having a glass transition point of not less than 20.degree. C. and a thickness ranging from 0.01 to 8.0 .mu.m, the coating layer being applied onto the back face of the substrate. The presensitized plate makes it possible to solve the problem of the formation of scratches and the adhesion of the photosensitive layer to the back face of the PS plate even when a large number of PS plates are transported and/or stored while putting them in piles without sandwiching the PS plate between interleaves. The coated layer applied to the back face of the PS plate is tough and shows good adhesion to the substrate and is not peeled off during handling, development processing and printing operations.
摘要翻译：用于制造平版印刷版的预感板包括基材; 感光层和垫层，其平均直径不大于100μm，平均高度不大于10μm，涂布量为5-200mg / m 2，感光层和垫层施加到基板的上表面上; 以及玻璃化转变温度为20℃以上且厚度为0.01〜8.0μm的有机高分子化合物的被覆层，涂布在基材的背面。即使在大量PS板被输送和/或储存的同时将它们放置在桩中也可以解决形成刮痕和感光层粘附到PS板的背面的问题，将PS板夹在交错之间。施加到PS板的背面的涂层是坚韧的，并且对基材具有良好的粘附性，并且在处理，显影处理和印刷操作期间不会剥离。

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