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    • 6. 发明授权
    • PS plate and method for processing same
    • PS板及其加工方法
    • US5464724A
    • 1995-11-07
    • US91358
    • 1993-07-15
    • Keiji AkiyamaNoriaki WatanabeHisashi HottaTadao ToyamaNobuyuki Nishimiya
    • Keiji AkiyamaNoriaki WatanabeHisashi HottaTadao ToyamaNobuyuki Nishimiya
    • G03F7/00B41N1/08B41N3/03G03F7/09G03F7/11G03F7/30G03F7/32G03C1/77
    • B41N1/083B41N3/03
    • A PS plate comprises an aluminum substrate having anodized layers on both sides, a photosensitive layer on one side of the substrate and a coating layer of a metal oxide obtained by hydrolyzing and polycondensing an organic or inorganic metal compound on the side of the substrate opposite to that carrying the photosensitive layer. The PS plate is processed by a method comprising the steps of imagewise exposing it to light and then developing the imagewise exposed plate with an alkali aqueous solution containing an alkali metal silicate and having a pH of not less than 12. The PS plate and the method for processing the same permit substantial reduction of the amount of a replenisher for development to be supplemented and ensure a stable processing of the plate over a long time period without accompanying formation of insolubles in a developer. The PS plates never cause adhesion and peeling off of the photosensitive layers even when they are put in stacks. Moreover, the PS plate does not suffer from a problem of contamination of the back face due to adhesion of lipophilic substances such as a developing ink.
    • PS板包括铝基板,其两侧具有阳极化层,在基板的一侧上的感光层和金属氧化物的涂层,所述金属氧化物通过将有机或无机金属化合物水解和缩聚在与基板相对的一侧上的有机或无机金属化合物 携带感光层。 PS板通过包括以下步骤的方法进行处理:将成像曝光到光,然后用含有碱金属硅酸盐的碱性水溶液显影成像曝光的平板,并且pH值不小于12.P板和方法 为了加工相同的许可证,可显着减少用于补充的补充剂的量,并确保板在长时间内的稳定加工,而不伴随在显影剂中形成不溶物。 即使将它们放入堆叠中,PS板也不会引起感光层的粘附和剥离。 此外,PS板不会由于诸如显影油墨等亲油性物质的粘附而遭受背面污染的问题。
    • 7. 发明授权
    • Method of making lithographic printing plate
    • 制作平版印刷版的方法
    • US5230988A
    • 1993-07-27
    • US848854
    • 1992-03-10
    • Keiji AkiyamaTadao Toyama
    • Keiji AkiyamaTadao Toyama
    • B41N3/03G03F7/32
    • B41N3/038G03F7/322
    • A method of making a lithographic printing plate comprises the steps of imagewise exposing to light a presensitized plate which comprises a hydrophilized substrate provided thereon with an organic layer comprising at least one compound selected from the group consisting of substituted or unsubstituted aliphatic or aromatic compounds represented by the following general formula:R.sup.1 (PO(OH.sub.2).sub.n (I) orR.sup.1 (PO(OH)(R.sup.2)).sub.n (II)wherein n is 1 or 2, if n is 1, R.sup.1 and R.sup.2 each represents a substituted or unsubstituted alkyl, alkoxy, aryloxy, aryl, acyl or acyloxy group and if n is 2, R.sup.1 represents a substituted or unsubstituted alkylene or arylene group and R.sup.2 is the same as that defined above, and a positive-working light-sensitive layer comprising an o-quinondiazide compound and developing the exposed plate with an aqueous solution which contains at least one compound selected from the group consisting of alkali metal salts and ammonium salts of inorganic acids other than silicic acid, alkali metal hydroxides, ammonium hydroxide and water-soluble organic amine compounds. This method can provide a lithographic printing plate having good resistance to contamination and high printing durability. Further, even if developing treatment is performed for a long time with an automatic developing machine in this method, deposits and sludge are not produced.
    • 10. 发明授权
    • Developing method for photosensitive material
    • 感光材料的显影方法
    • US4837131A
    • 1989-06-06
    • US875480
    • 1986-06-18
    • Kesanao KobayashiHisao OhbaTadao Toyama
    • Kesanao KobayashiHisao OhbaTadao Toyama
    • G03F7/30
    • G03F7/3042
    • This invention provides a developing method for photosensitive materials, in particlar for a positive photosensitive lithographic printing plate, which enables an efficient development with minimum consumption of the developing liquid. The developing method of the present invention comprises the steps of: conducting a preparatory development by applying a developing liquid to an exposed photosensitive layer of a photosensitive material, the developing liquid being supplied in an amount of necessary for each developing cycle; removing the developing liquid; discarding the developing liquid; and again applying a developing liquid to the photosensitive material to complete the development.
    • 本发明提供了一种用于光敏材料的显影方法,特别是用于正性光敏平版印刷版,其能够以最少的显影液消耗量进行有效发展。 本发明的显影方法包括以下步骤:通过将显影液施加到感光材料的曝光感光层来进行预备显影,所述显影液以每个显影循环所需的量供应; 去除显影液; 丢弃显影液体; 并再次将显影液体施加到感光材料上以完成显影。