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1. 发明授权

US07854962B2 Gas supply method using a gas supply system 失效
标题翻译：供气方式采用供气系统
公开(公告)号：US07854962B2
公开(公告)日：2010-12-21
申请号：US12320197
申请日：2009-01-21
申请人： Shigeru Kasai , Sum Tanaka , Tetsuya Saito , Norihiko Yamamoto , Kenichi Yanagitani
发明人： Shigeru Kasai , Sum Tanaka , Tetsuya Saito , Norihiko Yamamoto , Kenichi Yanagitani
IPC分类号： C23C16/448
CPC分类号： H01L21/67017 , C23C16/4481 , Y10T137/0324
摘要： Disclosed herein is a processing system that can supply a material gas produced inside a material reservoir tank into a processing apparatus while generating almost no pressure loss. The processing system has a processing apparatus including a gas injection injector for injecting a specific material gas into a processing vessel in order to provide specific processing to an object to be processed W, the material gas being produced from a metallic compound material M with low vapor pressure; and a gas supply system for supplying the specific material gas to the gas injector, the gas injector is a shower head portion and the gas supply system provides: a gas passage extending upwardly from the showerhead portion; a material reservoir tank attached to the upper-end portion of the gas passage for containing the metallic compound material therein; and an open/close valve for opening/closing the gas passage.
摘要翻译：这里公开了一种处理系统，其能够在几乎不产生压力损失的同时将材料储存罐内产生的材料气体提供到处理装置中。处理系统具有处理装置，该处理装置包括用于将特定材料气体注入到处理容器中的气体注入喷射器，以便对被加工物W进行特定处理，所述原料气体由低蒸气的金属化合物M 压力; 以及用于将特定材料气体供给到气体喷射器的气体供给系统，气体喷射器是淋浴头部分，气体供应系统提供：从喷头部分向上延伸的气体通道; 附着在气体通道的上端部分的材料储存罐，用于在其中容纳金属化合物材料; 以及用于打开/关闭气体通道的打开/关闭阀。

2. 发明申请

US20090133755A1 Gas supply system and proessing system 失效
标题翻译：供气系统和进气系统
公开(公告)号：US20090133755A1
公开(公告)日：2009-05-28
申请号：US12320197
申请日：2009-01-21
申请人： Shigeru Kasai , Sum Tanaka , Tetsuya Saito , Norihiko Yamamoto , Kenichi Yanagitani
发明人： Shigeru Kasai , Sum Tanaka , Tetsuya Saito , Norihiko Yamamoto , Kenichi Yanagitani
IPC分类号： C23C16/448 , G05D7/06
CPC分类号： H01L21/67017 , C23C16/4481 , Y10T137/0324
摘要： A processing system that can supply a material gas produced inside a material reservoir tank into a processing apparatus while generating almost no pressure loss is provided.In a processing system comprising: a processing apparatus including a gas injection means 42 for injecting a specific material gas into a processing vessel 26 in order to provide specific processing to an object to be processed W, said material gas being produced from a metallic compound material M with low vapor pressure; and a gas supply system 24 for supplying said specific material gas to said gas injection means, said gas injection means is a shower head portion and said gas supply system provides: a gas passage 56 extending upwardly from said showerhead portion; a material reservoir tank 58 attached to the upper-end portion of said gas passage for containing said metallic compound material therein; and an open/close valve 60 for opening/closing said gas passage.
摘要翻译：提供了一种处理系统，其能够在几乎不产生压力损失的同时将材料储存罐内产生的原料气体提供到处理设备中。一种处理系统，包括：处理装置，包括用于将特定材料气体注入处理容器26中的气体注入装置42，以便对被处理物体W进行特定处理，所述原料气体由金属化合物材料 M蒸汽压低; 以及用于向所述气体注入装置供应所述特定材料气体的气体供应系统24，所述气体注入装置是淋浴喷头部分，所述气体供应系统提供：从所述喷头部分向上延伸的气体通道56; 附着在所述气体通道的上端部分的材料储存罐58，用于在其中容纳所述金属化合物材料; 以及用于打开/关闭所述气体通道的打开/关闭阀60。

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