专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20120101011A1 Sliding Member Coating Composition 审中-公开
标题翻译：滑动构件涂料组合物
公开(公告)号：US20120101011A1
公开(公告)日：2012-04-26
申请号：US13266810
申请日：2010-04-27
申请人： Shin Makino , Keisuke Miyamoto , Shoko Matsuo
发明人： Shin Makino , Keisuke Miyamoto , Shoko Matsuo
IPC分类号： F16C33/20
CPC分类号： C10M125/00 , C10M141/00 , C10M2201/041 , C10M2201/05 , C10M2201/062 , C10M2201/065 , C10M2201/066 , C10M2209/1003 , C10M2213/062 , C10M2217/0443 , C10M2221/0405 , C10N2220/082 , C10N2230/06 , C10N2250/141
摘要： There is provided a sliding member coating composition for forming a coating on the surface of a sliding member, which contains a binder resin, abrasion inhibiting members, and a solid lubricant as needed. The shape of the abrasion inhibiting members is a panel shape having an aspect ratio of 5 to 100 expressed by average particle diameter/average particle thickness, and has an average particle diameter of 15.0 μm or smaller and a Moh's hardness of 6 or higher. The content of the solid lubricant can be set to 0 to 15 parts by weight with respect to 100 parts by weight of the binder resin, and the content of the abrasion inhibiting members to 1 to 100 parts by weight with respect to 100 parts by weight of the binder resin. The solid lubricant may not be blended. The abrasion inhibiting members are preferably aluminas. According to the sliding member coating composition in the present invention, even when being exposed to severe frictional conditions for a long time, preferable lubricity can be guaranteed.
摘要翻译：提供了一种用于在滑动构件的表面上形成涂层的滑动构件涂料组合物，其包含粘合剂树脂，耐磨损构件和根据需要的固体润滑剂。耐磨损构件的形状是由平均粒径/平均粒子厚度表示的长径比为5〜100的面板形状，平均粒径为15.0μm以下，莫氏硬度为6以上。相对于100重量份的粘合剂树脂，固体润滑剂的含量可以设定为0〜15重量份，相对于100重量份，耐磨损剂的含量为1〜100重量份的粘合剂树脂。固体润滑剂不能混合。耐磨损构件优选为氧化铝。根据本发明的滑动部件涂料组合物，即使在长时间暴露于严格的摩擦条件下，也可以保证优选的润滑性。

2. 发明授权

US06465161B1 Method for forming resist pattern 失效
标题翻译：形成抗蚀剂图案的方法
公开(公告)号：US06465161B1
公开(公告)日：2002-10-15
申请号：US09600612
申请日：2000-07-17
申请人： Wen-Bing Kang , Shoko Matsuo , Ken Kimura , Yoshinori Nishiwaki , Hatsuyuki Tanaka
发明人： Wen-Bing Kang , Shoko Matsuo , Ken Kimura , Yoshinori Nishiwaki , Hatsuyuki Tanaka
IPC分类号： G03F700
CPC分类号： G03F7/16 , G03F7/0045 , G03F7/091
摘要： In a process for manufacturing integrated circuit elements or the like by photolithography, a method for reducing detrimental influence on resist shape due to properties of a substrate or acidity of substrate surface in case where a chemically amplified resist or the like is used as a photoresist, and a substrate-treating agent composition to be used for this method are described. The substrate-treating agent composition comprises a solution containing a salt between at least one basic compound selected from among primary, secondary and tertiary amines and nitrogen-containing heterocyclic compounds and an organic acid such as a sulfonic acid or a carboxylic acid. This composition is coated on a substrate surface having thereon a bottom anti-reflective coating such as SiON layer, baked and, if necessary washed, then a chemically amplified resist is coated on the thus-treated substrate, exposed and developed to form a resist pattern on the substrate.
摘要翻译：在通过光刻制造集成电路元件等的方法中，使用化学放大型抗蚀剂等作为光致抗蚀剂的情况下，由于基板性质或基板表面的酸度降低对抗蚀剂形状的有害影响的方法，并描述用于该方法的底物处理剂组合物。底物处理剂组合物包含含有至少一种选自伯胺，仲胺和叔胺的碱性化合物和含氮杂环化合物之间的盐和有机酸如磺酸或羧酸的溶液。将该组合物涂布在其上具有诸如SiON层的底部抗反射涂层的基底表面上，烘烤并且如果需要洗涤，然后将化学放大的抗蚀剂涂覆在如此处理的基底上，暴露并显影以形成抗蚀剂图案在基板上。

3. 发明授权

US06939661B2 Blocked isocyanate compound-containing composition for forming a radiation absorbing coating and anti-reflective coating formed therefrom 有权
标题翻译：封闭的含异氰酸酯化合物的组合物，用于形成辐射吸收涂层和由其形成的抗反射涂层
公开(公告)号：US06939661B2
公开(公告)日：2005-09-06
申请号：US10232081
申请日：2002-08-30
申请人： Wen-Bing Kang , Ken Kimura , Shoko Matsuo , Yoshinori Nishiwaki , Hatsuyuki Tanaka
发明人： Wen-Bing Kang , Ken Kimura , Shoko Matsuo , Yoshinori Nishiwaki , Hatsuyuki Tanaka
IPC分类号： C08G18/80 , C09D175/04 , G03F7/09 , G03F7/004
CPC分类号： C08G18/80 , C09D175/04 , G02B1/111 , G03F7/091 , Y10S430/106 , Y10S430/107 , Y10S430/108 , Y10S430/115 , Y10S430/151
摘要： A composition for forming a radiation absorbing coating which comprises an organic solvent, a radiation absorbing polymer or a radiation absorbing material dissolved therein and a crosslinking agent having blocked isocyanate groups. Since the isocyanate groups of the crosslinking agent have been blocked, the composition containing the crosslinking agent has excellent storage stability. When the composition applied to a substrate and then baked, crosslinking proceeds to give an antireflective coating, which does not intermix with a resist layer to be formed thereon by coating and is free from diffusion of a photo-generated acid thereinto from the resist layer. As a result, a resist image free from footing or scum can be formed.
摘要翻译：一种用于形成辐射吸收涂层的组合物，其包含溶解在其中的有机溶剂，辐射吸收聚合物或辐射吸收材料以及具有封闭的异氰酸酯基团的交联剂。由于交联剂的异氰酸酯基团已经被阻断，所以含有交联剂的组合物具有优异的储存稳定性。当将组合物施加到基底上然后烘烤时，进行交联以得到抗反射涂层，其不与通过涂覆在其上形成的抗蚀剂层混合，并且其中没有光抗蚀剂层中的光产生的酸的扩散。结果，可以形成没有基脚或浮渣的抗蚀剂图像。

4. 发明授权

US06465148B1 Composition for light absorption film formation containing blocked isocyanate compound and antireflection film formed therefrom 有权
标题翻译：含有由其形成的封端异氰酸酯化合物和抗反射膜的吸光膜形成用组合物
公开(公告)号：US06465148B1
公开(公告)日：2002-10-15
申请号：US09486843
申请日：2000-05-23
申请人： Wen-Bing Kang , Ken Kimura , Shoko Matsuo , Yoshinori Nishiwaki , Hatsuyuki Tanaka
发明人： Wen-Bing Kang , Ken Kimura , Shoko Matsuo , Yoshinori Nishiwaki , Hatsuyuki Tanaka
IPC分类号： G03C173
CPC分类号： C08G18/80 , C09D175/04 , G02B1/111 , G03F7/091 , Y10S430/106 , Y10S430/107 , Y10S430/108 , Y10S430/115 , Y10S430/151
摘要： A composition for forming a radiation absorbing coating which comprises an organic solvent, a radiation absorbing polymer or a radiation absorbing material dissolved therein and a crosslinking agent having blocked isocyanate groups. Since the isocyanate groups of the crosslinking agent have been blocked, the composition containing the crosslinking agent has excellent storage stability. When the composition applied to a substrate and then baked, crosslinking proceeds to give an antireflective coating, which does not intermix with a resist layer to be formed thereon by coating and is free from diffusion of a photo-generated acid thereinto from the resist layer. As a result, a resist image free from footing or scum can be formed.
摘要翻译：一种用于形成辐射吸收涂层的组合物，其包含溶解在其中的有机溶剂，辐射吸收聚合物或辐射吸收材料以及具有封闭的异氰酸酯基团的交联剂。由于交联剂的异氰酸酯基团已经被阻断，所以含有交联剂的组合物具有优异的储存稳定性。当将组合物施加到基底上然后烘烤时，进行交联以得到抗反射涂层，其不与通过涂覆在其上形成的抗蚀剂层混合，并且其中没有光抗蚀剂层中的光产生的酸的扩散。结果，可以形成没有基脚或浮渣的抗蚀剂图像。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式