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    • 5. 发明授权
    • Skeleton for umbrella tent
    • 伞帐篷骨架
    • US06354316B1
    • 2002-03-12
    • US09541607
    • 2000-04-03
    • Shih-Ching Chen
    • Shih-Ching Chen
    • E04H1524
    • E04H15/28
    • A skeleton for umbrella tent mainly includes a top hub to which multiple brace poles are radially and pivotally connected to stretch by a predetermined angle; a bottom hub to which multiple stretch arms are radially and pivotally connected to stretch by a predetermined angle, and outer ends of these stretch arms are separately pivotally connected to a predetermined point on the brace poles; a flexible telescopic portion located between the top and the bottom hubs and consisting of multiple sections in the form of hollow truncated cones; and a pull rope extending through the telescopic portion with an upper end fixed to the top hub and a lower end hanging from the bottom hub to connect to a ring handle. By pulling the pull rope downward, the telescopic portion is folded to easily cause the stretch arms and the brace poles to move into a stretched position to set up the tent.
    • 伞帐架的骨架主要包括一个顶部轮毂,多个支杆杆径向和枢转地连接到该顶部轴套上以预定的角度拉伸; 多个拉伸臂径向和枢转地连接以使其拉伸预定角度的底部毂,并且这些拉伸臂的外端分别枢转地连接到支柱杆上的预定点; 位于顶部和底部毂之间的柔性伸缩部分并且由中空截锥体形式的多个部分组成; 以及延伸穿过所述伸缩部分的拉绳,其上端固定到所述顶部轮毂,以及从所述底部轮毂悬挂以连接到环形手柄的下端。 通过向下拉动拉绳,伸缩部分被折叠以容易地使拉伸臂和支撑杆移动到拉伸位置以建立帐篷。
    • 8. 发明授权
    • Method of forming hemispherical grain polysilicon over lower electrode
capacitor
    • 在下电极电容器上形成半球晶粒多晶硅的方法
    • US6121109A
    • 2000-09-19
    • US191327
    • 1998-11-13
    • Shih-Ching ChenNeng-Hsing Shen
    • Shih-Ching ChenNeng-Hsing Shen
    • H01L21/02H01L21/8242H01L21/20
    • H01L28/82H01L28/84H01L27/10852
    • A method of forming a layer of hemispherical grain polysilicon over the lower electrode of a capacitor. The method comprises the steps of providing a substrate that has a field effect transistor already formed thereon, and then forming an insulating layer with a contact opening over the substrate. Subsequently, a polysilicon layer is formed over the insulating layer that completely fills the contact opening. This polysilicon layer is electrically coupled to one of the source/drain regions of the field effect transistor. Thereafter, a thin buffer layer is formed over the polysilicon layer, and then the thin buffer layer is patterned. The thin buffer layer is used as a mask for covering the polysilicon layer that is to be part of the lower electrode of a capacitor. Next, a plasma etching operation is carried out to remove the thin buffer layer and a portion of the polysilicon layer at the same time. Finally, a heat treatment is carried out to form a hemispherical grain polysilicon layer over the surface of the lower electrode.
    • 一种在电容器的下电极上形成半球晶粒多晶硅层的方法。 该方法包括以下步骤:提供具有已在其上形成的场效应晶体管的衬底,然后在衬底上形成具有接触开口的绝缘层。 随后,在完全填充接触开口的绝缘层上形成多晶硅层。 该多晶硅层电耦合到场效应晶体管的源/漏区之一。 此后,在多晶硅层上形成薄缓冲层,然后对薄缓冲层进行图案化。 薄缓冲层用作覆盖作为电容器的下电极的一部分的多晶硅层的掩模。 接下来,进行等离子体蚀刻操作以同时去除薄缓冲层和多晶硅层的一部分。 最后,进行热处理以在下电极的表面上形成半球形晶粒多晶硅层。