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    • 4. 发明授权
    • Method of fabricating patterned polymer film with nanometer scale
    • 用纳米级制作图案化聚合物膜的方法
    • US07081269B2
    • 2006-07-25
    • US10761277
    • 2004-01-22
    • Seung-Man YangSe Gyu JangDae-Geun Choi
    • Seung-Man YangSe Gyu JangDae-Geun Choi
    • B05D5/12
    • B82Y10/00B05D1/42B82Y40/00G03F7/0002H01L51/0004
    • A method of fabricating a patterned polymer film with nanometer scale includes filling particles each having a predetermined size in a pattern provided to a soft polymer mold to prepare an embossed stamp; placing the embossed stamp on a desired polymer film; allowing the embossed stamp placed on the polymer film to stand at temperatures higher than a glass transfer temperature of the polymer film for a predetermined time; and releasing the embossed stamp from the polymer film. Alternatively, the patterned polymer film is obtained by filling particles each having a predetermined size in a pattern provided to a soft polymer mold to prepare an embossed stamp; placing the embossed stamp on a coating layer of a polymer precursor formed on a substrate; curing the coating layer; and releasing the embossed stamp from the cured coating layer.
    • 制造具有纳米尺度的图案化聚合物膜的方法包括以提供给软聚合物模具的图案填充每个具有预定尺寸的颗粒以制备压花印模; 将压花印模放置在所需的聚合物膜上; 允许放置在聚合物膜上的压花印模在高于聚合物膜的玻璃转移温度的温度下静置预定时间; 并从聚合物膜中释放压花印模。 或者,通过以提供给软质聚合物模具的图案填充每个具有预定尺寸的颗粒来制备图案化的聚合物膜,以制备压花印模; 将压花印模放置在形成在基板上的聚合物前体的涂层上; 固化涂层; 并从固化的涂层上释放压花印模。
    • 5. 发明授权
    • Process for preparing a composite inorganic membrane for hydrogen
separation
    • 制备用于氢分离的复合无机膜的方法
    • US5782959A
    • 1998-07-21
    • US669005
    • 1996-06-21
    • Seung-Man YangSeung-Bin ParkSeung-Jin LeeSang-Yon Lee
    • Seung-Man YangSeung-Bin ParkSeung-Jin LeeSang-Yon Lee
    • B01D53/22B01D71/02C01B3/50
    • B01D67/0072B01D53/228B01D67/0048B01D67/0069B01D71/022C01B3/505B01D2257/108B01D2323/46B01D2325/10C01B2203/0405Y10S55/05
    • The present invention relates to a process for preparing a composite inorganic membrane for hydrogen separation, more specifically, to a process for preparing a composite inorganic membrane for hydrogen separation which comprises formation of intermediate layer in an asymmetric porous alumina support by sol-gel method, and modification of pores of the alumina membrane by soaking palladium acetate solution into the pores and vapor-deposition to enhance the permeability and selectivity for hydrogen. A process for preparing an inorganic membrane for hydrogen separation comprises the steps of: (i) dip-coating an alumina support in alumina sol containing a palladium precursor which is uniformly dispersed while vacuumizing the inside of the support, to form an intermediate layer of thin palladium impregnated alumina membrane; (ii) soaking the membrane obtained in step(i) in the palladium precursor solution, drying it under vacuum for 2 to 4 hours, and vaporizing the soaked materials with the gradual increase of temperature up to 170.degree. to 190.degree. C. for the vaporized palladium precursor to be deposited onto the pores; and, (iii) heating the alumina membrane whose pores are deposited with palladium at 290.degree. to 310.degree. C. while vacuumizing the inside of the support.
    • 本发明涉及一种制备用于氢分离的复合无机膜的方法,更具体地涉及制备用于氢分离的复合无机膜的方法,该方法包括通过溶胶 - 凝胶法在不对称多孔氧化铝载体中形成中间层, 并通过将乙酸钯溶液浸入孔中并进行气相沉积来改善氧化铝膜的孔,以增强氢的渗透性和选择性。 制备用于氢分离的无机膜的方法包括以下步骤:(i)将含有均匀分散的钯前体的氧化铝溶胶中的氧化铝载体浸渍,同时使载体的内部真空化,形成薄的中间层 钯浸渍氧化铝膜; (ii)将步骤(i)中获得的膜浸泡在钯前体溶液中,在真空下干燥2至4小时,并将浸泡的材料蒸发,温度逐渐升高至170℃至190℃, 蒸发的钯前体沉积在孔上; 和(iii)在290℃至310℃下加热其气孔用钯沉积的氧化铝膜,同时使载体的内部真空化。
    • 7. 发明授权
    • Method of preparing patterned colloidal crystals
    • 制备图案化胶体晶体的方法
    • US07063938B2
    • 2006-06-20
    • US10662088
    • 2003-09-12
    • Seung-Man YangKi-Ra YiYong- Hak ParkSarah Kim
    • Seung-Man YangKi-Ra YiYong- Hak ParkSarah Kim
    • G03F7/00B01J13/00
    • G03F7/0005B82Y20/00C30B29/60G02B6/1225
    • A method of preparing patterned colloidal crystals includes filling a monomer solution in the interstices between particles of planar colloidal crystals for photopolymerization inside them, and performing a selective photopolymerization process between the colloidal crystals using a mask. In one exemplary method, a first monomer solution for photopolymerization is filled inside planar colloidal crystals. A first selective photopolymerization process is performed inside the colloidal crystals using a mask. A second monomer solution for photopolymerization is filled into the firstly patterned colloidal crystals. At least one additional photopolymerization process is performed inside the firstly patterned colloidal crystals using an additional mask. Through this method, colloidal crystalline regions oriented in the same direction with different refractive indexes can be controlled in a level of μm. Further, repeated patterns can be inexpensively and easily prepared.
    • 制备图案化胶态晶体的方法包括将单体溶液填充在其内的光致聚合的平面胶体晶体的颗粒之间的间隙中,并使用掩模在胶体晶体之间进行选择性光聚合过程。 在一个示例性方法中,用于光聚合的第一单体溶液填充在平面胶体晶体内。 使用掩模在胶体晶体内进行第一选择性光聚合方法。 用于光聚合的第二单体溶液被填充到首先构图的胶体晶体中。 使用附加的掩模在第一图案化胶体晶体内进行至少一个额外的光聚合过程。 通过该方法,可以将具有不同折射率的相同方向取向的胶体结晶区域控制在一定程度上。 此外,可以廉价且容易地制备重复的图案。
    • 9. 发明授权
    • Preparing method of silica slurry for wafer polishing
    • 二氧化硅浆料的制备方法用于晶片抛光
    • US06432151B1
    • 2002-08-13
    • US09644018
    • 2000-08-22
    • Jae Hyun SoMin Ho OhSun Hyuck BaeSeung Man YangDo Hyun Kim
    • Jae Hyun SoMin Ho OhSun Hyuck BaeSeung Man YangDo Hyun Kim
    • C09K314
    • C09K3/1463C01B33/126C09G1/02
    • Disclosed herein is a method of preparing silica slurry for wafer polishing. This method includes pre-treating relatively inexpensive and commercially available fumed or colloidal silica particles as a seed by a settling, a crushing using a ball mill and a paint shaker, and a sonication to produce an aqueous dispersion of the silica particles. The pre-treated silica particles are then combined with tetraethylorothosilicate as a precursor, an alcohol solvent and a base, and grown to a desired size by hydrolysis and polycondensation of the precursor, tetraethylorothosilicate. Then, the alcohol solvent, in which the silica particles are grown, are displaced with water by a vacuum distillation. The resulting aqueous dispersion of the grown silica dispersion is hydrothermally treated in an autoclave. Thus, this method allows the economical preparation of the spherical silica particles having a highly uniform size and a very high purity.
    • 本文公开了一种制备用于晶片抛光的二氧化硅浆料的方法。 该方法包括通过沉降,使用球磨机和油漆搅拌器进行粉碎,超声处理来预处理比较廉价且市售的热解法或胶态二氧化硅颗粒作为种子,以产生二氧化硅颗粒的水分散体。 然后将经预处理的二氧化硅颗粒与作为前体的四乙基偏硅酸盐,醇溶剂和碱组合,并通过前体四乙基硅酸酯的水解和缩聚生长至所需尺寸。 然后,通过真空蒸馏,用水代替生成二氧化硅颗粒的醇溶剂。 将生成的二氧化硅分散体的所得水分散体在高压釜中进行水热处理。 因此,该方法允许经济地制备具有高度均匀尺寸和非常高纯度的球形二氧化硅颗粒。