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1. 发明申请

US20060144738A1 Holding tray for substrate, substrate alignment system using the same and method thereof 有权
标题翻译：用于基板的保持托盘，使用其的基板对准系统及其方法
公开(公告)号：US20060144738A1
公开(公告)日：2006-07-06
申请号：US11325575
申请日：2006-01-05
申请人： Sang-Jin Han , Kwan-Seop Song , Hee-Cheol Kang , Seok-Heon Jeong
发明人： Sang-Jin Han , Kwan-Seop Song , Hee-Cheol Kang , Seok-Heon Jeong
IPC分类号： B65D85/48
CPC分类号： H01L21/68728 , H01L21/68735 , H01L21/68778 , Y10S414/136 , Y10S414/141 , Y10T29/53265
摘要： Disclosed are a holding tray, a substrate alignment system using the same and a method thereof. More specifically, the present invention relates to a holding tray for substrate capable of accomplishing high-precision alignment and conducting a stable deposition. A holding means is included in at least one side of the substrate to hold and support the substrate in a manner that the substrate is vertically held and supported on a flat surface of the holding tray during a vacuum process. The holding tray according to the present invention, the substrate alignment system using the same, and the method thereof include a substrate on which a deposition is made, a frame formed to receive the substrate, a tray formed to receive the frame, and at least one holding means formed to hold the substrate on the frame. The holding tray for substrate according to the present invention, the substrate alignment system using the same, and the method thereof are useful to accomplish high-precision alignment and conduct a stable deposition process due to the stable vertical arrangement of the substrate during the deposition process.
摘要翻译：公开了一种保持托盘，使用其的基板对准系统及其方法。更具体地，本发明涉及一种能够实现高精度对准并进行稳定沉积的基板用保持托盘。保持装置包括在基板的至少一侧，以在真空过程中将基板竖直保持并支撑在保持托盘的平坦表面上以保持和支撑基板。根据本发明的保持托盘，使用其的基板对准系统及其方法包括其上形成沉积物的基板，形成为接收基板的框架，形成为接收框架的托盘，并且至少一个保持装置被形成为将基板保持在框架上。根据本发明的基板用保持托盘，使用其的基板对准系统及其方法可用于实现高精度对准并且由于在沉积工艺期间基板的稳定垂直排列而进行稳定的沉积工艺。

2. 发明申请

US20060130766A1 Deposition source and deposition apparatus including deposition source 审中-公开
标题翻译：沉积源和沉积设备包括沉积源
公开(公告)号：US20060130766A1
公开(公告)日：2006-06-22
申请号：US11289631
申请日：2005-11-30
申请人： Do-Geun Kim , Jae-Hong Ahn , Kwan-Seop Song , Myung-Soo Huh , Seok-Heon Jeong
发明人： Do-Geun Kim , Jae-Hong Ahn , Kwan-Seop Song , Myung-Soo Huh , Seok-Heon Jeong
IPC分类号： C23C16/00
CPC分类号： C23C14/12 , C23C14/24 , C23C14/243
摘要： A deposition source having a constant deposition rate and high reproducibility, and a deposition apparatus including the deposition source includes: a heating chamber having a linear opening portion; and a cover including a plurality of holes and attached to the linear opening portion of the heating chamber. The distances between the holes formed on the cover vary along a long side direction of the linear opening portion of the heating chamber. The number of holes formed on the cover along a long side direction of the linear opening portion of the heating chamber can also vary.
摘要翻译：具有恒定沉积速率和高再现性的沉积源，以及包括沉积源的沉积设备包括：加热室，其具有线性开口部分; 以及包括多个孔并且附接到加热室的线性开口部分的盖。形成在盖上的孔之间的距离沿着加热室的线性开口部分的长边方向变化。沿着加热室的线性开口部的长边方向形成在盖上的孔的数量也可以变化。

3. 发明授权

US08166641B2 Holding tray for substrate, substrate alignment system using the same and method thereof 有权
标题翻译：用于基板的保持托盘，使用其的基板对准系统及其方法
公开(公告)号：US08166641B2
公开(公告)日：2012-05-01
申请号：US11325575
申请日：2006-01-05
申请人： Sang-Jin Han , Kwan-Seop Song , Hee-Cheol Kang , Seok-Heon Jeong
发明人： Sang-Jin Han , Kwan-Seop Song , Hee-Cheol Kang , Seok-Heon Jeong
IPC分类号： H01L21/68
CPC分类号： H01L21/68728 , H01L21/68735 , H01L21/68778 , Y10S414/136 , Y10S414/141 , Y10T29/53265
摘要： Disclosed are a holding tray, a substrate alignment system using the same and a method thereof. More specifically, the present invention relates to a holding tray for substrate capable of accomplishing high-precision alignment and conducting a stable deposition. A holding means is included in at least one side of the substrate to hold and support the substrate in a manner that the substrate is vertically held and supported on a flat surface of the holding tray during a vacuum process.The holding tray according to the present invention, the substrate alignment system using the same, and the method thereof include a substrate on which a deposition is made, a frame formed to receive the substrate, a tray formed to receive the frame, and at least one holding means formed to hold the substrate on the frame.The holding tray for substrate according to the present invention, the substrate alignment system using the same, and the method thereof are useful to accomplish high-precision alignment and conduct a stable deposition process due to the stable vertical arrangement of the substrate during the deposition process.
摘要翻译：公开了一种保持托盘，使用其的基板对准系统及其方法。更具体地，本发明涉及一种能够实现高精度对准并进行稳定沉积的基板用保持托盘。保持装置包括在基板的至少一侧，以在真空过程中将基板竖直保持并支撑在保持托盘的平坦表面上以保持和支撑基板。根据本发明的保持托盘，使用其的基板对准系统及其方法包括其上形成沉积物的基板，形成为接收基板的框架，形成为接收框架的托盘，并且至少一个保持装置被形成为将基板保持在框架上。根据本发明的基板用保持托盘，使用其的基板对准系统及其方法可用于实现高精度对准并且由于在沉积工艺期间基板的稳定垂直排列而进行稳定的沉积工艺。

4. 发明授权

US08048229B2 Apparatus for depositing an organic layer and method for controlling a heating unit thereof 有权
标题翻译：用于沉积有机层的设备和用于控制其加热单元的方法
公开(公告)号：US08048229B2
公开(公告)日：2011-11-01
申请号：US11515364
申请日：2006-08-31
申请人： Min Jae Jeong , Do Geun Kim , Seok Heon Jeong
发明人： Min Jae Jeong , Do Geun Kim , Seok Heon Jeong
IPC分类号： C23C16/00 , G05F1/00
CPC分类号： C23C14/243
摘要： An apparatus for depositing an organic layer and a method for controlling the heating unit thereof are provided. The apparatus includes a crucible positioned in a deposition chamber and containing materials for evaporation. The apparatus also includes a heating unit having first and second heat sources for heating the crucible. A housing isolates the heat emitted from the heating unit and an outer wall anchors the crucible. A nozzle sprays the materials evaporated from the crucible. The first and second heat sources are positioned on first and second sides of the crucible, respectively, and are independently controlled to minimize the time required to stabilize the deposition rate.
摘要翻译：提供了一种用于沉积有机层的设备及其加热单元的控制方法。该装置包括位于沉积室中并包含用于蒸发的材料的坩埚。该装置还包括具有用于加热坩埚的第一和第二热源的加热单元。外壳隔离加热单元发出的热量，外壁将坩埚固定。喷嘴喷洒从坩埚蒸发的材料。第一和第二热源分别位于坩埚的第一和第二侧上，并且被独立地控制以最小化稳定沉积速率所需的时间。

5. 发明授权

US07833579B2 Method for in-situ polycrystalline thin film growth 有权
标题翻译：原位多晶薄膜生长方法
公开(公告)号：US07833579B2
公开(公告)日：2010-11-16
申请号：US11433176
申请日：2006-05-12
申请人： Han Ki Kim , Myoung Soo Kim , Myung Soo Huh , Seok Heon Jeong , Hee Cheol Kang
发明人： Han Ki Kim , Myoung Soo Kim , Myung Soo Huh , Seok Heon Jeong , Hee Cheol Kang
IPC分类号： C23C16/00
CPC分类号： C23C16/24 , C23C16/44
摘要： A method for in-situ polycrystalline thin film growth is provided. A catalyst enhanced chemical vapor deposition (CECVD) apparatus is used to grow the polycrystalline silicon thin film. No subsequent annealing or dehydrogenating process is needed. The method comprises exhausting a chamber to form a vacuum chamber, and then purging vacuum chamber and introducing a catalyst. A substrate is then placed in the vacuum chamber and reaction gas is injected into the chamber. The reaction gas reacts with the catalyst in the chamber to grow a polycrystalline thin film on the substrate. The inventive method reduces processing time and production cost and can be used to fabricate larger devices due to the elimination of bulky annealing equipment.
摘要翻译：提供了一种原位多晶薄膜生长的方法。使用催化剂增强化学气相沉积（CECVD）装置来生长多晶硅薄膜。不需要随后的退火或脱氢过程。该方法包括排空室以形成真空室，然后净化真空室并引入催化剂。然后将基板放置在真空室中，并将反应气体注入室中。反应气体与室中的催化剂反应，以在衬底上生长多晶薄膜。本发明的方法减少了处理时间和生产成本，并且由于消除了大型退火设备而可用于制造更大的装置。

6. 发明申请

US20060150910A1 Alignment system, vertical tray transporting assembly, and deposition apparatus with the same 审中-公开
标题翻译：校准系统，垂直托盘运输组件和具有相同的沉积设备
公开(公告)号：US20060150910A1
公开(公告)日：2006-07-13
申请号：US11302522
申请日：2005-12-14
申请人： Sang-Jin Han , Kwan-Seop Song , Seok-Heon Jeong , Hee-Cheol Kang
发明人： Sang-Jin Han , Kwan-Seop Song , Seok-Heon Jeong , Hee-Cheol Kang
IPC分类号： C23C16/00
CPC分类号： C23C14/042 , C23C14/50
摘要： An alignment system, a vertical tray transporting assembly and a deposition apparatus having the same allow alignment of high precision, and perform a stable deposition process in a short period of time, minimize the effect of fine particles during transportation, and secure a sufficient uniformity of a mask by fixing and supporting a vertically disposed substrate using a fixing holder member and an auxiliary attaching member in a tray of a vertical in-line deposition alignment system.
摘要翻译：对准系统，垂直托盘传送组件和具有该对准系统的沉积设备允许高精度对准，并且在短时间内执行稳定的沉积处理，使运输期间细颗粒的影响最小化，并确保足够的均匀性通过使用垂直的在线沉积取向系统的托盘中的固定保持器构件和辅助附接构件来固定和支撑垂直布置的基底的掩模。

7. 发明授权

US07914621B2 Vapor deposition source and vapor deposition apparatus having the same 有权
标题翻译：蒸气沉积源及其蒸镀装置
公开(公告)号：US07914621B2
公开(公告)日：2011-03-29
申请号：US11342681
申请日：2006-01-31
申请人： Do Geun Kim , Myung Soo Huh , Seok Heon Jeong , Hee Cheol Kang , Kazuo Furuno
发明人： Do Geun Kim , Myung Soo Huh , Seok Heon Jeong , Hee Cheol Kang , Kazuo Furuno
IPC分类号： C23C16/00
CPC分类号： C23C14/243 , C23C14/24
摘要： A vapor deposition source has a reduced size by disposing a crucible, a heating portion, and a nozzle portion in one defined space. A vapor deposition apparatus deposits deposition materials on a substrate using the vapor deposition source. The vapor deposition source includes a housing, and the crucible is mounted in the housing for vaporizing the deposition materials. The heating portion is installed adjacent to the crucible in the housing for heating the crucible. The nozzle portion injects the vaporized deposition materials into a substrate disposed at an exterior of the housing through an injection nozzle. The vapor deposition source is manufactured in a smaller and lightweight form in comparison with conventional vapor deposition sources in which a crucible and a nozzle portion are arranged in different spaces. The diameter and number of injection nozzles of the invention are restricted to block radiant heat discharged from the vapor deposition source, so that deposition materials are uniformly deposited. Furthermore, the output power of a conveyer for conveying the vapor deposition source is reduced. In addition, a plurality of vapor deposition sources is arranged in a line to perform concentrated deposition of deposition materials so that quality of the resultant product is improved.
摘要翻译：气相沉积源通过在一个限定的空间内设置坩埚，加热部分和喷嘴部分而具有减小的尺寸。气相沉积设备使用蒸镀源将沉积材料沉积在基板上。气相沉积源包括壳体，并且坩埚安装在壳体中以使沉积材料蒸发。加热部分安装在坩埚附近，用于加热坩埚。喷嘴部分通过注射喷嘴将蒸发的沉积材料注入设置在外壳外部的基板中。与其中坩埚和喷嘴部分布置在不同空间中的常规气相沉积源相比，气相沉积源以更小和轻质的形式制造。本发明的注射喷嘴的直径和数量被限制为阻挡从蒸镀源排出的辐射热，从而均匀地沉积沉积材料。此外，用于输送气相沉积源的输送机的输出功率降低。此外，多个气相沉积源被排列成一行，以进行沉积材料的浓缩沉积，从而提高所得产品的质量。

8. 发明授权

US07548304B2 Chuck plate assembly with cooling means 有权
标题翻译：带冷却装置的卡盘组件
公开(公告)号：US07548304B2
公开(公告)日：2009-06-16
申请号：US11298566
申请日：2005-12-12
申请人： Sang Jin Han , Sung Ho Lee , Myung Soo Huh , Seok Heon Jeong , Kwan Seop Song , Hee Cheol Kang
发明人： Sang Jin Han , Sung Ho Lee , Myung Soo Huh , Seok Heon Jeong , Kwan Seop Song , Hee Cheol Kang
IPC分类号： G03B27/62 , G03B27/52 , C23C14/00 , C23C16/00
CPC分类号： C03C17/28 , C03C17/001 , C03C17/002 , C23C14/042 , C23C14/541
摘要： The invention provides a chuck plate assembly that includes a shadow mask formed with a predetermined pattern; a shadow mask frame holding the shadow mask and having heat-radiating and cooling functions; a substrate aligned with the shadow mask and onto which deposition materials from a deposition source are deposited; and a chuck plate, attaching the substrate to the shadow mask, that includes a refrigerant circulating duct. The temperature of the substrate is optimized in consideration of the temperature of the shadow mask so that an alignment error due to thermal deformation is minimized. That is, the temperature of the shadow mask itself is prevented from rising, and thereby prevents deformation of the shadow mask due to thermal expansion, which improves the precision of a substrate pattern position.
摘要翻译：本发明提供一种卡盘板组件，其包括以预定图案形成的荫罩; 保持荫罩并具有散热和冷却功能的荫罩框架; 与荫罩对准的衬底，沉积来自沉积源的沉积材料; 以及夹持板，将基板安装在荫罩上，该荫罩包括制冷剂循环管道。考虑到荫罩的温度来优化衬底的温度，使得由于热变形引起的取向误差最小化。也就是说，防止荫罩本身的温度上升，从而防止由于热膨胀而引起的荫罩的变形，这提高了基板图案位置的精度。

9. 发明申请

US20070148348A1 Evaporation source and method of depositing thin film using the same 审中-公开
标题翻译：蒸发源和使用其沉积薄膜的方法
公开(公告)号：US20070148348A1
公开(公告)日：2007-06-28
申请号：US11583930
申请日：2006-10-20
申请人： Myung Soo Huh , Kazuo Furuno , Sang Jin Han , Jae Hong Ahn , Seok Heon Jeong
发明人： Myung Soo Huh , Kazuo Furuno , Sang Jin Han , Jae Hong Ahn , Seok Heon Jeong
IPC分类号： C23C16/00
CPC分类号： C23C14/12 , C23C14/243
摘要： An evaporation source and method for depositing a thin film, including a crucible having a predetermined space for placing a deposition material and at least one baffle, the baffle positioned inside the crucible and parallel to the predetermined space to divide the crucible into a plurality of channels, a heating unit, and at least one spray nozzle in fluid communication with the crucible, the spray nozzle having a plurality of spray orifices.
摘要翻译：一种用于沉积薄膜的蒸发源和方法，包括具有用于放置沉积材料和至少一个挡板的预定空间的坩埚，所述挡板位于坩埚内并平行于预定空间，以将坩埚分成多个通道，加热单元和与坩埚流体连通的至少一个喷嘴，喷嘴具有多个喷射孔。

10. 发明申请

US20060121816A1 Method of manufacturing organic light emitting device by using mirror shaped target sputtering apparatus 审中-公开
标题翻译：使用镜像靶溅射装置制造有机发光器件的方法
公开(公告)号：US20060121816A1
公开(公告)日：2006-06-08
申请号：US11171498
申请日：2005-07-01
申请人： Kyu-Sung Lee , Han-Ki Kim , Do-Geun Kim , Myung-Soo Huh , Seok-Heon Jeong
发明人： Kyu-Sung Lee , Han-Ki Kim , Do-Geun Kim , Myung-Soo Huh , Seok-Heon Jeong
IPC分类号： H01J9/24 , H01J9/00
CPC分类号： H01L51/5203 , C23C14/352 , H01L51/0008 , H01L51/0021
摘要： A method of manufacturing an organic light emitting device by using a facing target sputtering apparatus is provided. The method includes forming a first electrode on a substrate; forming an organic film on the first electrode; and forming a second electrode on the organic film by using a facing target sputtering apparatus. Accordingly, an electrode film is formed on the organic light emitting device at a low temperature without deterioration of the electrode film due to plasma, it is possible to improve light emitting efficiency and electro-optical characteristics of the organic light emitting device.
摘要翻译：提供了一种通过使用面对靶溅射装置制造有机发光器件的方法。该方法包括在基板上形成第一电极; 在第一电极上形成有机膜; 以及通过使用面对靶溅射装置在所述有机膜上形成第二电极。因此，在低温下在有机发光器件上形成电极膜，而不会由于等离子体而导致电极膜的劣化，可以提高有机发光器件的发光效率和电光特性。

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