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    • 9. 发明申请
    • SURFACE PASSIVATION OF A SEMI-CONDUCTOR STRUCTURE AND CORRESPPONDING PRODUCTION METHOD
    • 表面钝化半导体结构及相应方法
    • WO2009092424A3
    • 2009-09-24
    • PCT/EP2008010639
    • 2008-12-15
    • FRAUNHOFER GES FORSCHUNGUNIV ALBERT LUDWIGS FREIBURGSCHULTZ OLIVERBENICK JANHERMLE MARTIN
    • SCHULTZ OLIVERBENICK JANHERMLE MARTIN
    • H01L31/18H01L31/0224
    • H01L31/1868H01L31/022425Y02E10/50Y02P70/521
    • The invention relates to a semi-conductor structure, comprising an n metallization and a p metallization (7), and a semi-conductor substrate having an n-doped base region (1) and a p-doped emitter region (2) adjoining the same at least partially for configuring an emitter/base p-n junction, wherein the emitter region (2) extends at least partially approximately parallel to an emitter surface (2b) of the semi-conductor substrate, and the n metallization is connected to the base region (1), and the p metallization (7) is connected to the emitter region (2) in an electrically conductive manner. It is essential to the invention that the semi-conductor structure further comprises an n-doped passivation region (5), which is disposed at least partially between the emitter surface (2b) and the emitter region (2), wherein the passivation region (5) is neither connected to the n metallization nor to the p metallization (7) in an electrically conductive manner. The invention further relates to a method for the production of such a semi-conductor structure.
    • 本发明涉及一种半导体结构,包括一个n金属化和p金属化(7),并用n掺杂基极区(1)一个半导体衬底和一个至少部分地邻接的p型掺杂的发射极区(2),用于形成发射器/ 基pn结,所述发射极区域(2)至少部分大致平行地延伸的发射器表面(2b)中的半导体基板和n金属化到基座部分(1)和p Metallisiefung(7)与所述 发射极区域(2)被导电地连接。 至关重要的是,该半导体结构进一步包括(5),其发射极表面(2b)和所述发射区2之间至少部分地被布置在n型掺杂的钝化区域,其中所述钝化区(5)任一所述n金属化或与 对 - 金属化(7)被导电地连接。 本发明还涉及一种制造这样的半导体结构的方法。