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1. 发明申请

US20130177706A1 METHOD FOR SEASONING UV CHAMBER OPTICAL COMPONENTS TO AVOID DEGRADATION 审中-公开
标题翻译：用于分解紫外线光学元件以避免降解的方法
公开(公告)号：US20130177706A1
公开(公告)日：2013-07-11
申请号：US13719047
申请日：2012-12-18
申请人： Sanjeev Baluja , Alexandros T. Demos , Bo Xie , Juan Carlos Rocha-Alvarez
发明人： Sanjeev Baluja , Alexandros T. Demos , Bo Xie , Juan Carlos Rocha-Alvarez
IPC分类号： B05D3/06
CPC分类号： B05D3/066 , C23C16/4404 , C23C16/4405
摘要： Methods for depositing a carbon-based seasoning layer on exposed surfaces of the optical components within a UV processing chamber are disclosed. In one embodiment, the method includes flowing a carbon-containing precursor radially inwardly across exposed surfaces of optical components within the thermal processing chamber from a circumference of the optical components, exposing the carbon-containing precursor to a thermal radiation emitted from a heating source to form a carbon-based seasoning layer on the exposed surfaces of the optical components, exposing the carbon-based seasoning layer to ozone, wherein the ozone is introduced into the processing chamber by flowing the ozone radially inwardly across exposed surfaces of optical components from the circumference of the optical components, heating the optical components to a temperature of about 400° C. or above while flowing the ozone to remove the carbon-based seasoning layer from exposed surfaces of the optical components.
摘要翻译：公开了在UV处理室内的光学部件的暴露表面上沉积碳基调味剂层的方法。在一个实施例中，该方法包括使含碳前驱体从光学部件的圆周径向向内流过热处理室内的光学部件的暴露表面，将含碳前体暴露于从加热源发射的热辐射至在光学部件的暴露表面上形成碳基调味剂层，将碳基调味剂层暴露于臭氧，其中臭氧通过径向向内流过来自圆周的光学部件的暴露表面而将臭氧引入处理室的光学部件，将光学部件加热至约400℃以上的温度，同时使臭氧流动，以从光学部件的露出表面除去碳基调味剂层。

2. 发明申请

US20120258259A1 APPARATUS AND METHOD FOR UV TREATMENT, CHEMICAL TREATMENT, AND DEPOSITION 审中-公开
标题翻译：紫外线处理，化学处理和沉积的装置和方法
公开(公告)号：US20120258259A1
公开(公告)日：2012-10-11
申请号：US13440720
申请日：2012-04-05
申请人： Amit Bansal , Dale R. Du Bois , Juan Carlos Rocha-Alvarez , Sanjeev Baluja , Scott A. Hendrickson , Thomas Nowak
发明人： Amit Bansal , Dale R. Du Bois , Juan Carlos Rocha-Alvarez , Sanjeev Baluja , Scott A. Hendrickson , Thomas Nowak
IPC分类号： C23C16/455 , C23C16/46 , C23C16/458
CPC分类号： C23C16/56 , C23C16/0272 , C23C16/4401 , C23C16/4404 , C23C16/45565 , C23C16/54
摘要： Embodiments of the present invention provide apparatus and methods for performing UV treatment and chemical treatment and/or deposition in the same chamber. One embodiment of the present invention provides a processing chamber including a UV transparent gas distribution showerhead disposed above a substrate support located in an inner volume of the processing chamber, a UV transparent window disposed above the UV transparent gas distribution showerhead, and a UV unit disposed outside the inner volume. The UV unit is configured to direct UV lights towards the substrate support through the UV transparent window and the UV transparent gas distribution showerhead.
摘要翻译：本发明的实施例提供了用于在相同的室中进行UV处理和化学处理和/或沉积的装置和方法。本发明的一个实施例提供了一种处理室，其包括设置在位于处理室的内部体积中的基板支撑件上方的UV透明气体分配喷头，设置在UV透明气体分配喷头上方的UV透明窗口和设置在UV透明气体分配喷头上的UV单元在内容之外。 UV单元被配置为通过UV透明窗口和UV透明气体分配喷头将UV光引向基板支撑。

3. 发明申请

US20120132618A1 METHOD AND APPARATUS FOR MODULATING WAFER TREATMENT PROFILE IN UV CHAMBER 有权
标题翻译：用于调节UV室中的水处理轮廓的方法和装置
公开(公告)号：US20120132618A1
公开(公告)日：2012-05-31
申请号：US13301558
申请日：2011-11-21
申请人： SANJEEV BALUJA , Juan Carlos Rocha-Alvarez , Alexandros T. Demos
发明人： SANJEEV BALUJA , Juan Carlos Rocha-Alvarez , Alexandros T. Demos
IPC分类号： C23F1/08 , G02B5/22 , C23F1/00 , C23C16/48 , C08J7/18
CPC分类号： G02B5/22 , G02B5/208 , H01L21/67115
摘要： A method and apparatus for providing a uniform UV radiation irradiance profile across a surface of a substrate is provided. In one embodiment, a substrate processing tool includes a processing chamber defining a processing region, a substrate support for supporting a substrate within the processing region, an ultraviolet (UV) radiation source spaced apart from the substrate support and configured to transmit ultraviolet radiation toward the substrate positioned on the substrate support, and a light transmissive window positioned between the UV radiation source and the substrate support, the light transmissive window having an optical film layer coated thereon. In one example, the optical film layer has a non-uniform thickness profile in a radial direction, wherein a thickness of the optical film layer at the peripheral area of the light transmissive window is relatively thicker than at the center region of the optical film layer.
摘要翻译：提供了一种用于在衬底的表面上提供均匀的UV辐射辐照度分布的方法和装置。在一个实施例中，衬底处理工具包括限定处理区域的处理室，用于支撑处理区域内的衬底的衬底支撑件，与衬底支撑件间隔开并且被配置成向衬底支撑件发射紫外线辐射的紫外线（UV）辐射源位于基板支撑件上的基板和位于UV辐射源和基板支撑件之间的透光窗口，透光窗口具有涂覆在其上的光学膜层。在一个示例中，光学膜层在径向上具有不均匀的厚度分布，其中在透光窗的周边区域处的光学膜层的厚度比在光学膜层的中心区域处的厚度更厚。

4. 发明申请

US20120129275A1 DUAL-BULB LAMPHEAD CONTROL METHODOLOGY 有权
标题翻译：双通道灯泡控制方法
公开(公告)号：US20120129275A1
公开(公告)日：2012-05-24
申请号：US13011687
申请日：2011-01-21
申请人： Yao-Hung Yang , Abhijit Kangude , Sanjeev Baluja , Michael Martinelli , Liliya Krivulina , Thomas Nowak , Juan Carlos Rocha-Alvarez , Scott Hendrickson
发明人： Yao-Hung Yang , Abhijit Kangude , Sanjeev Baluja , Michael Martinelli , Liliya Krivulina , Thomas Nowak , Juan Carlos Rocha-Alvarez , Scott Hendrickson
IPC分类号： H01L21/26 , H05B37/02
CPC分类号： H05B41/3921 , H01L21/67115 , H05B41/3922
摘要： The present invention generally relates to methods of controlling UV lamp output to increase irradiance uniformity. The methods generally include determining a baseline irradiance within a chamber, determining the relative irradiance on a substrate corresponding to a first lamp and a second lamp, and determining correction or compensation factors based on the relative irradiances and the baseline irradiance. The lamps are then adjusted via closed loop control using the correction or compensation factors to individually adjust the lamps to the desired output. The lamps may optionally be adjusted to equal irradiances prior to adjusting the lamps to the desired output. The closed loop control ensures process uniformity from substrate to substrate. The irradiance measurement and the correction or compensation factors allow for adjustment of lamp set points due to chamber component degradation, chamber component replacement, or chamber cleaning.
摘要翻译：本发明一般涉及控制UV灯输出以增加辐照度均匀性的方法。方法通常包括确定室内的基线辐照度，确定对应于第一灯和第二灯的衬底上的相对辐照度，以及基于相对辐照度和基线辐照度确定校正或补偿因子。然后通过使用校正或补偿因子的闭环控制来调节灯，以将灯单独调节到期望的输出。在将灯调节到期望的输出之前，灯可以可选地被调整为相等的辐照度。闭环控制确保从基板到基板的工艺均匀性。辐照度测量和校正或补偿因素允许由于室部件劣化，腔室部件更换或腔室清洁而调节灯具设定点。

5. 发明申请

US20060249175A1 High efficiency UV curing system 审中-公开
标题翻译：高效UV固化系统
公开(公告)号：US20060249175A1
公开(公告)日：2006-11-09
申请号：US11230975
申请日：2005-09-20
申请人： Thomas Nowak , Juan Rocha-Alvarez , Andrzej Kaszuba , Scott Hendrickson , Dustin Ho , Sanjeev Baluja , Tom Cho , Josephine Chang , Hichem M'Saad
发明人： Thomas Nowak , Juan Rocha-Alvarez , Andrzej Kaszuba , Scott Hendrickson , Dustin Ho , Sanjeev Baluja , Tom Cho , Josephine Chang , Hichem M'Saad
IPC分类号： B08B3/12 , B08B7/00 , B08B9/00 , H01L21/306
CPC分类号： B08B7/0035 , C23C16/4405
摘要： An ultraviolet (UV) cure chamber enables curing a dielectric material disposed on a substrate and in situ cleaning thereof. A tandem process chamber provides two separate and adjacent process regions defined by a body covered with a lid having windows aligned respectively above each process region. One or more UV bulbs per process region that are covered by housings coupled to the lid emit UV light directed through the windows onto substrates located within the process regions. The UV bulbs can be an array of light emitting diodes or bulbs utilizing a source such as microwave or radio frequency. The UV light can be pulsed during a cure process. Using oxygen radical/ozone generated remotely and/or in-situ accomplishes cleaning of the chamber. Use of lamp arrays, relative motion of the substrate and lamp head, and real-time modification of lamp reflector shape and/or position can enhance uniformity of substrate illumination.
摘要翻译：紫外线（UV）固化室可固化设置在基底上的电介质材料并进行原位清洁。串联处理室提供由覆盖有盖的主体限定的两个单独的和相邻的过程区域，所述盖子具有分别位于每个处理区域上方的窗口。每个处理区域的一个或多个UV灯泡被耦合到盖的壳体覆盖，将通过窗口的UV光发射到位于处理区域内的衬底上。 UV灯泡可以是利用诸如微波或射频的源的发光二极管或灯泡阵列。紫外光可以在固化过程中被脉冲。使用远程生成的氧自由基/臭氧和/或原位实现清洁室。灯阵列的使用，基板和灯头的相对运动以及灯反射器形状和/或位置的实时修改可以增强基板照明的均匀性。

6. 发明授权

US08911553B2 Quartz showerhead for nanocure UV chamber 有权
标题翻译：用于纳米级紫外线室的石英花洒
公开(公告)号：US08911553B2
公开(公告)日：2014-12-16
申请号：US13248656
申请日：2011-09-29
申请人： Sanjeev Baluja , Juan Carlos Rocha-Alvarez , Alexandros T. Demos , Thomas Nowak , Jianhua Zhou
发明人： Sanjeev Baluja , Juan Carlos Rocha-Alvarez , Alexandros T. Demos , Thomas Nowak , Jianhua Zhou
IPC分类号： C23C16/455 , C23C16/48 , C23C16/56 , H01L21/67 , C23C16/44 , H01L21/677
CPC分类号： C23C16/56 , C23C16/4405 , C23C16/45565 , C23C16/482 , H01L21/6719 , H01L21/67742 , Y10T137/0391
摘要： Embodiments of the invention generally provide apparatuses and methods for controlling the gas flow profile within a processing chamber. In one embodiment, a processing tool includes an ultraviolet processing chamber defining a processing region, a substrate support, a window disposed between a UV radiation source and the substrate support, and a transparent showerhead disposed within the processing region between the window and the substrate support and having one or more transparent showerhead passages between upper and lower processing regions. The processing tool also includes a gas distribution ring having one or more gas distribution ring passages between a gas distribution ring inner channel and the upper processing region and a gas outlet ring positioned below the gas distribution ring, the gas outlet ring having one or more gas outlet passages between a gas outlet ring inner channel within the gas outlet ring and the lower processing region.
摘要翻译：本发明的实施例通常提供用于控制处理室内的气流分布的装置和方法。在一个实施例中，处理工具包括限定处理区域的紫外线处理室，衬底支撑件，设置在UV辐射源和衬底支撑件之间的窗口，以及布置在窗口和衬底支撑件之间的处理区域内的透明花洒并且在上下处理区域之间具有一个或多个透明花洒通道。处理工具还包括气体分配环，气体分配环具有在气体分配环内部通道和上部加工区域之间的一个或多个气体分配环通道和位于气体分配环下方的气体出口环，气体出口环具有一个或多个气体气体出口环内的气体出口环内部通道和下部加工区域之间的出口通道。

7. 发明授权

US08841629B2 Microwave excursion detection for semiconductor processing 有权
标题翻译：微波偏移检测用于半导体处理
公开(公告)号：US08841629B2
公开(公告)日：2014-09-23
申请号：US13534575
申请日：2012-06-27
申请人： Scott A. Hendrickson , Liliya Krivulina , Juan Carlos Rocha , Sanjeev Baluja
发明人： Scott A. Hendrickson , Liliya Krivulina , Juan Carlos Rocha , Sanjeev Baluja
IPC分类号： G01J1/42
CPC分类号： H05B3/0047
摘要： Devices and methods are provided for monitoring low-level microwave excursions from a UV curing system to determine if equipment is damaged, such as screen tears or improper assembly of UV lampheads. A radio frequency (RF) detector may be used to detect microwaves in a range of about 0.2-5 mW/cm2, wherein the RF detector comprises an antenna with a hoop shaped portion, a circuit board having a diode detector and an amplifier circuit, a housing, and a bracket coupled to the housing that is suitable for coupling the RF detector to the UV curing system. An alarm threshold may also be set, which can be correlated to microwave levels at or below levels that could cause damage to semiconductor devices being processed. A substrate processing system comprising an RF detector is also provided.
摘要翻译：提供的装置和方法用于监测来自UV固化系统的低水平微波偏移，以确定设备是否损坏，如屏幕撕裂或UV灯头的组装不当。可以使用射频（RF）检测器来检测约0.2-5mW / cm 2范围内的微波，其中RF检测器包括具有环形部分的天线，具有二极管检测器和放大器电路的电路板，壳体和联接到壳体的支架，其适于将RF检测器耦合到UV固化系统。还可以设置警报阈值，其可以与可能对正被处理的半导体器件造成损坏的等于或低于水平的微波水平相关。还提供了包括RF检测器的衬底处理系统。

8. 发明授权

US08679987B2 Deposition of an amorphous carbon layer with high film density and high etch selectivity 有权
标题翻译：沉积具有高膜密度和高蚀刻选择性的无定形碳层
公开(公告)号：US08679987B2
公开(公告)日：2014-03-25
申请号：US13468776
申请日：2012-05-10
申请人： Patrick Reilly , Shahid Shaikh , Tersem Summan , Deenesh Padhi , Sanjeev Baluja , Juan Carlos Rocha-Alvarez , Thomas Nowak , Bok Hoen Kim , Derek R. Witty
发明人： Patrick Reilly , Shahid Shaikh , Tersem Summan , Deenesh Padhi , Sanjeev Baluja , Juan Carlos Rocha-Alvarez , Thomas Nowak , Bok Hoen Kim , Derek R. Witty
IPC分类号： H01L21/47 , H01L21/312
CPC分类号： H01L21/02527 , C23C16/26 , C23C16/56 , H01L21/02115 , H01L21/02274 , H01L21/02348 , H01L21/02592 , H01L21/0262 , H01L21/31144
摘要： Embodiments described herein relate to a method for processing a substrate. In one embodiment, the method includes introducing a gas mixture comprising a hydrocarbon source and a diluent gas into a deposition chamber located within a processing system, generating a plasma from the gas mixture in the deposition chamber at a temperature between about 200° C. and about 700° C. to form a low-hydrogen content amorphous carbon layer on the substrate, transferring the substrate into a curing chamber located within the processing system without breaking vacuum, and exposing the substrate to UV radiation within the curing chamber at a curing temperature above about 200° C.
摘要翻译：本文所述的实施例涉及一种用于处理衬底的方法。在一个实施方案中，该方法包括将包含烃源和稀释气体的气体混合物引入位于处理系统内的沉积室中，在沉积室中从约200℃至约200℃的温度和约700℃以在基底上形成低氢含量的无定形碳层，将基底转移到位于处理系统内的固化室中，而不破坏真空，并在固化温度下将基底暴露于固化室内的UV辐射高于约200℃

9. 发明申请

US20140000515A1 MICROWAVE EXCURSION DETECTION FOR SEMICONDUCTOR PROCESSING 有权
标题翻译：用于半导体处理的微波检测
公开(公告)号：US20140000515A1
公开(公告)日：2014-01-02
申请号：US13534575
申请日：2012-06-27
申请人： SCOTT A. HENDRICKSON , Liliya Krivulina , Juan Carlos Rocha , Sanjeev Baluja
发明人： SCOTT A. HENDRICKSON , Liliya Krivulina , Juan Carlos Rocha , Sanjeev Baluja
IPC分类号： C23C16/52 , G01T1/00
CPC分类号： H05B3/0047
摘要： Devices and methods are provided for monitoring low-level microwave excursions from a UV curing system to determine if equipment is damaged, such as screen tears or improper assembly of UV lampheads. A radio frequency (RF) detector may be used to detect microwaves in a range of about 0.2-5 mW/cm2, wherein the RF detector comprises an antenna with a hoop shaped portion, a circuit board having a diode detector and an amplifier circuit, a housing, and a bracket coupled to the housing that is suitable for coupling the RF detector to the UV curing system. An alarm threshold may also be set, which can be correlated to microwave levels at or below levels that could cause damage to semiconductor devices being processed. A substrate processing system comprising an RF detector is also provided.
摘要翻译：提供的装置和方法用于监测来自UV固化系统的低水平微波偏移，以确定设备是否损坏，如屏幕撕裂或UV灯头的组装不当。可以使用射频（RF）检测器来检测约0.2-5mW / cm 2范围内的微波，其中RF检测器包括具有环形部分的天线，具有二极管检测器和放大器电路的电路板，壳体和联接到壳体的支架，其适于将RF检测器耦合到UV固化系统。还可以设置警报阈值，其可以与可能对正被处理的半导体器件造成损坏的等于或低于水平的微波水平相关。还提供了包括RF检测器的衬底处理系统。

10. 发明授权

US08597011B2 Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections 有权
标题翻译：使用具有椭圆形和抛物面反射部分的反射器将衬底暴露于UV辐射的装置和方法
公开(公告)号：US08597011B2
公开(公告)日：2013-12-03
申请号：US12976746
申请日：2010-12-22
申请人： Andrzei Kaszuba , Juan Carlos Rocha-Alvarez , Thomas Nowak , Sanjeev Baluja , Ashish Shah , Inna Shmurun
发明人： Andrzei Kaszuba , Juan Carlos Rocha-Alvarez , Thomas Nowak , Sanjeev Baluja , Ashish Shah , Inna Shmurun
IPC分类号： B29C35/08
CPC分类号： B05D3/067 , B29C71/04 , B29C2035/0827 , F26B3/28 , H01L21/67115
摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.
摘要翻译：本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本均匀的辐照度图案。还公开了其他实施例。

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