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1. 发明申请

US20120129275A1 DUAL-BULB LAMPHEAD CONTROL METHODOLOGY 有权
标题翻译：双通道灯泡控制方法
公开(公告)号：US20120129275A1
公开(公告)日：2012-05-24
申请号：US13011687
申请日：2011-01-21
申请人： Yao-Hung Yang , Abhijit Kangude , Sanjeev Baluja , Michael Martinelli , Liliya Krivulina , Thomas Nowak , Juan Carlos Rocha-Alvarez , Scott Hendrickson
发明人： Yao-Hung Yang , Abhijit Kangude , Sanjeev Baluja , Michael Martinelli , Liliya Krivulina , Thomas Nowak , Juan Carlos Rocha-Alvarez , Scott Hendrickson
IPC分类号： H01L21/26 , H05B37/02
CPC分类号： H05B41/3921 , H01L21/67115 , H05B41/3922
摘要： The present invention generally relates to methods of controlling UV lamp output to increase irradiance uniformity. The methods generally include determining a baseline irradiance within a chamber, determining the relative irradiance on a substrate corresponding to a first lamp and a second lamp, and determining correction or compensation factors based on the relative irradiances and the baseline irradiance. The lamps are then adjusted via closed loop control using the correction or compensation factors to individually adjust the lamps to the desired output. The lamps may optionally be adjusted to equal irradiances prior to adjusting the lamps to the desired output. The closed loop control ensures process uniformity from substrate to substrate. The irradiance measurement and the correction or compensation factors allow for adjustment of lamp set points due to chamber component degradation, chamber component replacement, or chamber cleaning.
摘要翻译：本发明一般涉及控制UV灯输出以增加辐照度均匀性的方法。方法通常包括确定室内的基线辐照度，确定对应于第一灯和第二灯的衬底上的相对辐照度，以及基于相对辐照度和基线辐照度确定校正或补偿因子。然后通过使用校正或补偿因子的闭环控制来调节灯，以将灯单独调节到期望的输出。在将灯调节到期望的输出之前，灯可以可选地被调整为相等的辐照度。闭环控制确保从基板到基板的工艺均匀性。辐照度测量和校正或补偿因素允许由于室部件劣化，腔室部件更换或腔室清洁而调节灯具设定点。

2. 发明授权

US08309421B2 Dual-bulb lamphead control methodology 有权
标题翻译：双灯泡灯头控制方法
公开(公告)号：US08309421B2
公开(公告)日：2012-11-13
申请号：US13011687
申请日：2011-01-21
申请人： Yao-Hung Yang , Abhijit Kangude , Sanjeev Baluja , Michael Martinelli , Liliya Krivulina , Thomas Nowak , Juan Carlos Rocha-Alvarez , Scott Hendrickson
发明人： Yao-Hung Yang , Abhijit Kangude , Sanjeev Baluja , Michael Martinelli , Liliya Krivulina , Thomas Nowak , Juan Carlos Rocha-Alvarez , Scott Hendrickson
IPC分类号： H01L21/336 , H01L21/76
CPC分类号： H05B41/3921 , H01L21/67115 , H05B41/3922
摘要： The present invention generally relates to methods of controlling UV lamp output to increase irradiance uniformity. The methods generally include determining a baseline irradiance within a chamber, determining the relative irradiance on a substrate corresponding to a first lamp and a second lamp, and determining correction or compensation factors based on the relative irradiances and the baseline irradiance. The lamps are then adjusted via closed loop control using the correction or compensation factors to individually adjust the lamps to the desired output. The lamps may optionally be adjusted to equal irradiances prior to adjusting the lamps to the desired output. The closed loop control ensures process uniformity from substrate to substrate. The irradiance measurement and the correction or compensation factors allow for adjustment of lamp set points due to chamber component degradation, chamber component replacement, or chamber cleaning.
摘要翻译：本发明一般涉及控制UV灯输出以增加辐照度均匀性的方法。方法通常包括确定室内的基线辐照度，确定对应于第一灯和第二灯的衬底上的相对辐照度，以及基于相对辐照度和基线辐照度确定校正或补偿因子。然后通过使用校正或补偿因子的闭环控制来调节灯，以将灯单独调节到期望的输出。在将灯调节到期望的输出之前，灯可以可选地被调整为相等的辐照度。闭环控制确保从基板到基板的工艺均匀性。辐照度测量和校正或补偿因素允许由于室部件劣化，腔室部件更换或腔室清洁而调节灯具设定点。

3. 发明授权

US08841629B2 Microwave excursion detection for semiconductor processing 有权
标题翻译：微波偏移检测用于半导体处理
公开(公告)号：US08841629B2
公开(公告)日：2014-09-23
申请号：US13534575
申请日：2012-06-27
申请人： Scott A. Hendrickson , Liliya Krivulina , Juan Carlos Rocha , Sanjeev Baluja
发明人： Scott A. Hendrickson , Liliya Krivulina , Juan Carlos Rocha , Sanjeev Baluja
IPC分类号： G01J1/42
CPC分类号： H05B3/0047
摘要： Devices and methods are provided for monitoring low-level microwave excursions from a UV curing system to determine if equipment is damaged, such as screen tears or improper assembly of UV lampheads. A radio frequency (RF) detector may be used to detect microwaves in a range of about 0.2-5 mW/cm2, wherein the RF detector comprises an antenna with a hoop shaped portion, a circuit board having a diode detector and an amplifier circuit, a housing, and a bracket coupled to the housing that is suitable for coupling the RF detector to the UV curing system. An alarm threshold may also be set, which can be correlated to microwave levels at or below levels that could cause damage to semiconductor devices being processed. A substrate processing system comprising an RF detector is also provided.
摘要翻译：提供的装置和方法用于监测来自UV固化系统的低水平微波偏移，以确定设备是否损坏，如屏幕撕裂或UV灯头的组装不当。可以使用射频（RF）检测器来检测约0.2-5mW / cm 2范围内的微波，其中RF检测器包括具有环形部分的天线，具有二极管检测器和放大器电路的电路板，壳体和联接到壳体的支架，其适于将RF检测器耦合到UV固化系统。还可以设置警报阈值，其可以与可能对正被处理的半导体器件造成损坏的等于或低于水平的微波水平相关。还提供了包括RF检测器的衬底处理系统。

4. 发明申请

US20140000515A1 MICROWAVE EXCURSION DETECTION FOR SEMICONDUCTOR PROCESSING 有权
标题翻译：用于半导体处理的微波检测
公开(公告)号：US20140000515A1
公开(公告)日：2014-01-02
申请号：US13534575
申请日：2012-06-27
申请人： SCOTT A. HENDRICKSON , Liliya Krivulina , Juan Carlos Rocha , Sanjeev Baluja
发明人： SCOTT A. HENDRICKSON , Liliya Krivulina , Juan Carlos Rocha , Sanjeev Baluja
IPC分类号： C23C16/52 , G01T1/00
CPC分类号： H05B3/0047
摘要： Devices and methods are provided for monitoring low-level microwave excursions from a UV curing system to determine if equipment is damaged, such as screen tears or improper assembly of UV lampheads. A radio frequency (RF) detector may be used to detect microwaves in a range of about 0.2-5 mW/cm2, wherein the RF detector comprises an antenna with a hoop shaped portion, a circuit board having a diode detector and an amplifier circuit, a housing, and a bracket coupled to the housing that is suitable for coupling the RF detector to the UV curing system. An alarm threshold may also be set, which can be correlated to microwave levels at or below levels that could cause damage to semiconductor devices being processed. A substrate processing system comprising an RF detector is also provided.
摘要翻译：提供的装置和方法用于监测来自UV固化系统的低水平微波偏移，以确定设备是否损坏，如屏幕撕裂或UV灯头的组装不当。可以使用射频（RF）检测器来检测约0.2-5mW / cm 2范围内的微波，其中RF检测器包括具有环形部分的天线，具有二极管检测器和放大器电路的电路板，壳体和联接到壳体的支架，其适于将RF检测器耦合到UV固化系统。还可以设置警报阈值，其可以与可能对正被处理的半导体器件造成损坏的等于或低于水平的微波水平相关。还提供了包括RF检测器的衬底处理系统。

5. 发明申请

US20130122611A1 DUAL-BULB LAMPHEAD CONTROL METHODOLOGY 审中-公开
标题翻译：双通道灯泡控制方法
公开(公告)号：US20130122611A1
公开(公告)日：2013-05-16
申请号：US13669113
申请日：2012-11-05
申请人： YAO-HUNG YANG , Abhijit Kangude , Sanjeev Baluja , Michael Martinelli , Liliya Krivulina , Thomas Nowak , Juan Carlos Rocha-Alvarez , Scott A. Hendrickson
发明人： YAO-HUNG YANG , Abhijit Kangude , Sanjeev Baluja , Michael Martinelli , Liliya Krivulina , Thomas Nowak , Juan Carlos Rocha-Alvarez , Scott A. Hendrickson
IPC分类号： H05B37/02 , H01L21/26 , H01L21/66
CPC分类号： H05B41/3921 , H01L21/67115 , H05B41/3922
摘要： The present invention generally relates to methods of controlling UV lamp output to increase irradiance uniformity. The methods generally include determining a baseline irradiance within a chamber, determining the relative irradiance on a substrate corresponding to a first lamp and a second lamp, and determining correction or compensation factors based on the relative irradiances and the baseline irradiance. The lamps are then adjusted via closed loop control using the correction or compensation factors to individually adjust the lamps to the desired output. The lamps may optionally be adjusted to equal irradiances prior to adjusting the lamps to the desired output. The closed loop control ensures process uniformity from substrate to substrate. The irradiance measurement and the correction or compensation factors allow for adjustment of lamp set points due to chamber component degradation, chamber component replacement, or chamber cleaning.
摘要翻译：本发明一般涉及控制UV灯输出以增加辐照度均匀性的方法。方法通常包括确定室内的基线辐照度，确定对应于第一灯和第二灯的衬底上的相对辐照度，以及基于相对辐照度和基线辐照度确定校正或补偿因子。然后通过使用校正或补偿因子的闭环控制来调节灯，以将灯单独调节到期望的输出。在将灯调节到期望的输出之前，灯可以可选地被调整为相等的辐照度。闭环控制确保从基板到基板的工艺均匀性。辐照度测量和校正或补偿因素允许由于室部件劣化，腔室部件更换或腔室清洁而调节灯具设定点。

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