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    • 3. 发明授权
    • Biased electrostatic deflector
    • 偏置静电导流板
    • US07022984B1
    • 2006-04-04
    • US11047238
    • 2005-01-31
    • Robert D. RathmellBo H. VanderbergYoungzhang Huang
    • Robert D. RathmellBo H. VanderbergYoungzhang Huang
    • H01J40/00H01J47/00G21G51/00
    • H01J37/3171H01J37/05H01J2237/053H01J2237/303H01J2237/31705
    • Angular electrostatic filters and methods of filtering that remove energy contaminants from a ribbon shaped ion beam are disclosed. An angular electrostatic filter comprises a top deflection plate and a bottom deflection plate extending from an entrance side to an exit side of the filter. The bottom deflection plate is substantially parallel to the top deflection plate and includes an angle portion. An entrance focus electrode is positioned on the entrance side of the filter and an exit focus electrode is positioned on the exit side of the filter and both serve to focus the ion beam. Edge electrodes are positioned between the top and bottom deflection plates and at sides of the filter to mitigate edge effects. A negative bias is also applied to the top and bottom plates to mitigate space charge by elevating the beam energy.
    • 公开了角膜静电过滤器和从带状离子束去除能量污染物的过滤方法。 角度静电过滤器包括顶部偏转板和从过滤器的入口侧到出口侧延伸的底部偏转板。 底部偏转板基本上平行于顶部偏转板并且包括角部分。 入口聚焦电极位于过滤器的入口侧,出射聚焦电极位于过滤器的出口侧,并且两者都用于聚焦离子束。 边缘电极位于顶部和底部偏转板之间以及位于过滤器侧面以减轻边缘效应。 顶板和底板也施加负偏压,以通过提升光束能量来减轻空间电荷。
    • 6. 发明授权
    • Apparatus and method for uniform ion dose control
    • 用于均匀离子剂量控制的装置和方法
    • US4816693A
    • 1989-03-28
    • US88138
    • 1987-08-21
    • Robert D. Rathmell
    • Robert D. Rathmell
    • H01J37/317
    • H01J37/3171
    • A uniform ion implantation dose control apparatus controls the implantation of ion particles onto at least one wafer mounted on a rotating disk in the pathway of the ion particle beam. A grounded scanning wire is repeatedly moved across the beam to produce an emission of secondary electrons which is linearly proportional to the beam particle current. The secondary electrons emitted are collected and formed into a current I.sub.s by a collector electrode. Portions of the current I.sub.s on the collector electrode are sampled. While the vacuum conditions within the beamline are good, the beams electrical current I.sub.FC is measured and the collector current I.sub.s sample is calibrated therewith so that when the beamline vacuum becomes a high pressure vacuum, additional collector current I.sub.s samples may be utilized to determine a theoretical beam current I which is a function of the beam particle current I.sub.p =I/q. This theoretical beam current I is utilized to move the rotating disk along a radial pathway perpendicular to the beam pathway at a velocity V which is proportional to the theoretical beam current I.
    • 均匀的离子注入剂量控制装置控制离子粒子束在离子粒子束通路中安装在旋转盘上的至少一个晶片上的离子粒子的注入。 接地的扫描线重复地移动穿过光束,以产生与束粒子电流成线性比例的二次电子的发射。 发射的二次电子通过集电极收集并形成电流Is。 对集电极上的电流部分进行采样。 虽然光束线内的真空条件良好,但是测量了光束电流IFC,并且利用其校准集电极电流Is采样,使得当光束线真空变为高压真空时,可以使用附加的集电极电流Is样本来确定理论 光束电流I是光束粒子电流Ip = I / q的函数。 该理论射束电流I被用来沿与垂直于光束通路的径向路径以与理论射束电流I成比例的速度V移动旋转盘。
    • 9. 发明授权
    • Heated annulus chuck
    • 加热环形卡盘
    • US08797706B2
    • 2014-08-05
    • US13154836
    • 2011-06-07
    • William Davis LeeGary M. CookPerry J. I. JustesenAshwin M. PurohitRobert D. RathmellAllan D. Weed
    • William Davis LeeGary M. CookPerry J. I. JustesenAshwin M. PurohitRobert D. RathmellAllan D. Weed
    • H01L21/687
    • H01L21/68728H01L21/6831
    • A clamping device and method is provided for securing first and second workpieces having different sizes to a clamping device and providing thermal conditioning thereto. An electrostatic clamping plate having a diameter associated with the first workpiece surrounds a central portion of the clamp. A non-electrostatic central portion provides a heater within the annulus, wherein the central portion has a diameter associated with the second workpiece. A workpiece carrier is provided, wherein the workpiece carrier is configured to hold the second workpiece above the heater, and wherein a diameter of the workpiece carrier is associated with the electrostatic clamping plate annulus. The annulus selectively electrostatically clamps the workpiece carrier or a circumferential portion of the first workpiece to its clamping surface, therein selectively maintaining a position of the first or second workpiece with respect to the annulus or non-electrostatic central portion.
    • 提供一种夹紧装置和方法,用于将具有不同尺寸的第一和第二工件固定到夹紧装置并且向其提供热调节。 具有与第一工件相关联的直径的静电夹持板围绕夹具的中心部分。 非静电中心部分在环形空间内提供加热器,其中中心部分具有与第二工件相关联的直径。 提供了工件载体,其中工件载体构造成将第二工件保持在加热器上方,并且其中工件载体的直径与静电夹持板环相关联。 环形空间选择性地将工件载体或第一工件的圆周部分夹持到其夹紧表面,其中选择性地保持第一或第二工件相对于环形或非静电中心部分的位置。
    • 10. 发明申请
    • HEATED ANNULUS CHUCK
    • 加热肛门栓
    • US20110299218A1
    • 2011-12-08
    • US13154836
    • 2011-06-07
    • William Davis LeeGary M. CookPerry J.I. JustesenAshwin M. PurohitRobert D. RathmellAllan D. Weed
    • William Davis LeeGary M. CookPerry J.I. JustesenAshwin M. PurohitRobert D. RathmellAllan D. Weed
    • H01L21/687
    • H01L21/68728H01L21/6831
    • A clamping device and method is provided for securing first and second workpieces having different sizes to a clamping device and providing thermal conditioning thereto. An electrostatic clamping plate having a diameter associated with the first workpiece surrounds a central portion of the clamp. A non-electrostatic central portion provides a heater within the annulus, wherein the central portion has a diameter associated with the second workpiece. A workpiece carrier is provided, wherein the workpiece carrier is configured to hold the second workpiece above the heater, and wherein a diameter of the workpiece carrier is associated with the electrostatic clamping plate annulus. The annulus selectively electrostatically clamps the workpiece carrier or a circumferential portion of the first workpiece to its clamping surface, therein selectively maintaining a position of the first or second workpiece with respect to the annulus or non-electrostatic central portion.
    • 提供一种夹紧装置和方法,用于将具有不同尺寸的第一和第二工件固定到夹紧装置并且向其提供热调节。 具有与第一工件相关联的直径的静电夹持板围绕夹具的中心部分。 非静电中心部分在环形空间内提供加热器,其中中心部分具有与第二工件相关联的直径。 提供了工件载体,其中工件载体构造成将第二工件保持在加热器上方,并且其中工件载体的直径与静电夹持板环相关联。 环形空间选择性地将工件载体或第一工件的圆周部分夹持到其夹紧表面,其中选择性地保持第一或第二工件相对于环形或非静电中心部分的位置。