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1. 发明授权

US07329882B2 Ion implantation beam angle calibration 有权
标题翻译：离子注入束角校准
公开(公告)号：US07329882B2
公开(公告)日：2008-02-12
申请号：US11288908
申请日：2005-11-29
申请人： Robert D. Rathmell , Dennis E. Kamenitsa
发明人： Robert D. Rathmell , Dennis E. Kamenitsa
IPC分类号： H01J37/304 , H01J37/317
CPC分类号： H01J37/3171 , H01J2237/1501 , H01J2237/24528 , H01J2237/24578
摘要： One or more aspects of the present invention pertain to determining a relative orientation between an ion beam and lattice structure of a workpiece into which ions are to be selectively implanted by the ion beam, and calibrating an ion implantation system in view of the relative orientation. The beam to lattice structure orientation is determined, at least in part, by directing a divergent ion beam at the workpiece and finding the angle of the aspect of the divergent beam that implants ions substantially parallel to crystal planes of the workpiece, and thus causes a small amount of damage to the lattice structure.
摘要翻译：本发明的一个或多个方面涉及确定离子束和工件的晶格结构之间的相对取向，离子将被离子束选择性地注入到其中，并且考虑到相对取向校准离子注入系统。至少部分地通过将发散离子束引导到工件处并找到将基本上平行于工件的晶面的离子注入的发散光束的方面的角度来确定光束到晶格结构取向，并因此导致对晶格结构的损害小。

2. 发明申请

US20110299217A1 HEATED ELECTROSTATIC CHUCK INCLUDING MECHANICAL CLAMP CAPABILITY AT HIGH TEMPERATURE 有权
标题翻译：加热静电夹钳，包括机械夹紧能力在高温下
公开(公告)号：US20110299217A1
公开(公告)日：2011-12-08
申请号：US13152735
申请日：2011-06-03
申请人： Perry J.I. Justesen , Allan D. Weed , William Davis Lee , Ashwin M. Purohit , Robert D. Rathmell , Gary M. Cook
发明人： Perry J.I. Justesen , Allan D. Weed , William Davis Lee , Ashwin M. Purohit , Robert D. Rathmell , Gary M. Cook
IPC分类号： H01L21/687
CPC分类号： H01L21/68728 , H01L21/6831
摘要： An electrostatic clamp is provided, having a clamping plate, wherein a clamping surface of the clamping plate is configured to contact the workpiece. A voltage applied to one or more electrodes selectively electrostatically attracts the workpiece to the clamping surface. One or more auxiliary clamping members are further provided wherein the one or more auxiliary clamping members are configured to selectively secure at least a portion of the workpiece to the clamping surface. A temperature monitoring device configured to determine a temperature of the workpiece is provided, and a controller is configured to selectively clamp the workpiece to the clamping surface via a control of the voltage to the one or more electrodes and the one or more auxiliary clamping members, based, at least in part, on the temperature of the workpiece.
摘要翻译：提供了一种具有夹板的静电夹具，其中夹持板的夹紧表面构造成接触工件。施加到一个或多个电极的电压选择性地静电将工件吸引到夹紧表面。还提供了一个或多个辅助夹紧构件，其中一个或多个辅助夹紧构件构造成选择性地将至少一部分工件固定到夹紧表面。提供了一种被配置为确定工件的温度的温度监视装置，并且控制器被配置为经由对一个或多个电极和一个或多个辅助夹紧构件的电压的控制来选择性地将工件夹紧到夹紧表面，至少部分地基于工件的温度。

3. 发明授权

US06476399B1 System and method for removing contaminant particles relative to an ion beam 有权
标题翻译：相对于离子束去除污染物颗粒的系统和方法
公开(公告)号：US06476399B1
公开(公告)日：2002-11-05
申请号：US09654379
申请日：2000-09-01
申请人： Eric R. Harrington , Victor M. Benveniste , Michael A. Graf , Robert D. Rathmell
发明人： Eric R. Harrington , Victor M. Benveniste , Michael A. Graf , Robert D. Rathmell
IPC分类号： H01J3730
CPC分类号： H01J37/026 , H01J37/3002 , H01J37/3171 , H01J2237/004 , H01J2237/022 , H01J2237/31705
摘要： A system for inhibiting the transport of contaminant particles with an ion beam includes a particle charging system for charging particles within a region through which the ion beam travels. An electric field is generated downstream relative to the charged region so as to urge charged particles away from a direction of travel for the ion beam.
摘要翻译：用于抑制用离子束输送污染物颗粒的系统包括用于在离子束行进的区域内填充颗粒的颗粒装料系统。在相对于带电区域的下游产生电场，以便使带电粒子远离离子束的行进方向。

4. 发明授权

US08797706B2 Heated annulus chuck 有权
标题翻译：加热环形卡盘
公开(公告)号：US08797706B2
公开(公告)日：2014-08-05
申请号：US13154836
申请日：2011-06-07
申请人： William Davis Lee , Gary M. Cook , Perry J. I. Justesen , Ashwin M. Purohit , Robert D. Rathmell , Allan D. Weed
发明人： William Davis Lee , Gary M. Cook , Perry J. I. Justesen , Ashwin M. Purohit , Robert D. Rathmell , Allan D. Weed
IPC分类号： H01L21/687
CPC分类号： H01L21/68728 , H01L21/6831
摘要： A clamping device and method is provided for securing first and second workpieces having different sizes to a clamping device and providing thermal conditioning thereto. An electrostatic clamping plate having a diameter associated with the first workpiece surrounds a central portion of the clamp. A non-electrostatic central portion provides a heater within the annulus, wherein the central portion has a diameter associated with the second workpiece. A workpiece carrier is provided, wherein the workpiece carrier is configured to hold the second workpiece above the heater, and wherein a diameter of the workpiece carrier is associated with the electrostatic clamping plate annulus. The annulus selectively electrostatically clamps the workpiece carrier or a circumferential portion of the first workpiece to its clamping surface, therein selectively maintaining a position of the first or second workpiece with respect to the annulus or non-electrostatic central portion.
摘要翻译：提供一种夹紧装置和方法，用于将具有不同尺寸的第一和第二工件固定到夹紧装置并且向其提供热调节。具有与第一工件相关联的直径的静电夹持板围绕夹具的中心部分。非静电中心部分在环形空间内提供加热器，其中中心部分具有与第二工件相关联的直径。提供了工件载体，其中工件载体构造成将第二工件保持在加热器上方，并且其中工件载体的直径与静电夹持板环相关联。环形空间选择性地将工件载体或第一工件的圆周部分夹持到其夹紧表面，其中选择性地保持第一或第二工件相对于环形或非静电中心部分的位置。

5. 发明申请

US20110299218A1 HEATED ANNULUS CHUCK 有权
标题翻译：加热肛门栓
公开(公告)号：US20110299218A1
公开(公告)日：2011-12-08
申请号：US13154836
申请日：2011-06-07
申请人： William Davis Lee , Gary M. Cook , Perry J.I. Justesen , Ashwin M. Purohit , Robert D. Rathmell , Allan D. Weed
发明人： William Davis Lee , Gary M. Cook , Perry J.I. Justesen , Ashwin M. Purohit , Robert D. Rathmell , Allan D. Weed
IPC分类号： H01L21/687
CPC分类号： H01L21/68728 , H01L21/6831
摘要： A clamping device and method is provided for securing first and second workpieces having different sizes to a clamping device and providing thermal conditioning thereto. An electrostatic clamping plate having a diameter associated with the first workpiece surrounds a central portion of the clamp. A non-electrostatic central portion provides a heater within the annulus, wherein the central portion has a diameter associated with the second workpiece. A workpiece carrier is provided, wherein the workpiece carrier is configured to hold the second workpiece above the heater, and wherein a diameter of the workpiece carrier is associated with the electrostatic clamping plate annulus. The annulus selectively electrostatically clamps the workpiece carrier or a circumferential portion of the first workpiece to its clamping surface, therein selectively maintaining a position of the first or second workpiece with respect to the annulus or non-electrostatic central portion.
摘要翻译：提供一种夹紧装置和方法，用于将具有不同尺寸的第一和第二工件固定到夹紧装置并且向其提供热调节。具有与第一工件相关联的直径的静电夹持板围绕夹具的中心部分。非静电中心部分在环形空间内提供加热器，其中中心部分具有与第二工件相关联的直径。提供了工件载体，其中工件载体构造成将第二工件保持在加热器上方，并且其中工件载体的直径与静电夹持板环相关联。环形空间选择性地将工件载体或第一工件的圆周部分夹持到其夹紧表面，其中选择性地保持第一或第二工件相对于环形或非静电中心部分的位置。

6. 发明授权

US07982195B2 Controlled dose ion implantation 有权
标题翻译：受控剂量离子注入
公开(公告)号：US07982195B2
公开(公告)日：2011-07-19
申请号：US10940263
申请日：2004-09-14
申请人： Aditya Agarwal , Robert D. Rathmell , David Hoglund
发明人： Aditya Agarwal , Robert D. Rathmell , David Hoglund
IPC分类号： G21K5/10
CPC分类号： H01J37/304 , H01J37/3171 , H01J2237/30472
摘要： An ion implanter for creating a ribbon or ribbon-like beam by having a scanning device that produces a side to side scanning of ions emitting by a source to provide a thin beam of ions moving into an implantation chamber. A workpiece support positions a workpiece within the implantation chamber and a drive moves the workpiece support up and down through the thin ribbon beam of ions perpendicular to the plane of the ribbon to achieve controlled beam processing of the workpiece. A control includes a first control output coupled to said scanning device to limit an extent of side to side scanning of the ion beam to less than a maximum amount and thereby limit ion processing of the workpiece to a specified region of the workpiece and a second control output coupled to the drive simultaneously limits an extent of up and down movement of the workpiece to less than a maximum amount and to cause the ion beam to impact a controlled portion of the workpiece.
摘要翻译：一种离子注入机，用于通过具有扫描装置来产生色带或带状光束，该扫描装置产生由源发射的离子的侧面扫描以提供移动到注入室中的薄的离子束。工件支撑件将工件定位在注入室内，并且驱动器通过垂直于带平面的离子的薄带离子将工件支撑件上下移动，以实现对工件的受控梁加工。控制器包括耦合到所述扫描装置的第一控制输出，以将离子束的侧向扫描的范围限制为小于最大量，从而限制工件到工件的指定区域的离子处理和第二控制耦合到驱动器的输出同时将工件的上下移动范围限制为小于最大量并且使离子束冲击工件的受控部分。

7. 发明授权

US07112809B2 Electrostatic lens for ion beams 有权
标题翻译：离子束静电透镜
公开(公告)号：US07112809B2
公开(公告)日：2006-09-26
申请号：US10894209
申请日：2004-07-19
申请人： Robert D. Rathmell , Victor M. Benveniste
发明人： Robert D. Rathmell , Victor M. Benveniste
IPC分类号： H01J37/317
CPC分类号： H01J37/12 , H01J37/3171
摘要： A lens structure for use with an ion beam implanter. The lens structure includes first and second electrodes spaced apart along a direction of ion movement. The lens structure extends across a width of the ion beam for deflecting ions entering the lens structure. The lens structure includes a first electrode for decelerating ions and a second electrode for accelerating the ions. A lens structure mode controller selectively activates either the accelerating or decelerating electrode to to cause ions entering the lens structure to exit said lens structure with a desired trajectory regardless of the trajectory ions enter the lens structure.
摘要翻译：用于离子束注入机的透镜结构。透镜结构包括沿离子运动方向间隔开的第一和第二电极。透镜结构横跨离子束的宽度延伸，用于偏离进入透镜结构的离子。透镜结构包括用于减速的第一电极和用于加速离子的第二电极。透镜结构模式控制器选择性地激活加速或减速电极以使离子进入透镜结构以期望的轨迹离开所述透镜结构，而不管轨迹离子进入透镜结构。

8. 发明授权

US08941968B2 Heated electrostatic chuck including mechanical clamp capability at high temperature 有权
标题翻译：加热静电卡盘包括高温下的机械夹紧能力
公开(公告)号：US08941968B2
公开(公告)日：2015-01-27
申请号：US13152735
申请日：2011-06-03
申请人： Perry J. I. Justesen , Allan D. Weed , William Davis Lee , Ashwin M. Purohit , Robert D. Rathmell , Gary M. Cook
发明人： Perry J. I. Justesen , Allan D. Weed , William Davis Lee , Ashwin M. Purohit , Robert D. Rathmell , Gary M. Cook
IPC分类号： H01L21/687 , H01L21/683
CPC分类号： H01L21/68728 , H01L21/6831
摘要： An electrostatic clamp is provided, having a clamping plate, wherein a clamping surface of the clamping plate is configured to contact the workpiece. A voltage applied to one or more electrodes selectively electrostatically attracts the workpiece to the clamping surface. One or more auxiliary clamping members are further provided wherein the one or more auxiliary clamping members are configured to selectively secure at least a portion of the workpiece to the clamping surface. A temperature monitoring device configured to determine a temperature of the workpiece is provided, and a controller is configured to selectively clamp the workpiece to the clamping surface via a control of the voltage to the one or more electrodes and the one or more auxiliary clamping members, based, at least in part, on the temperature of the workpiece.
摘要翻译：提供了一种具有夹板的静电夹具，其中夹持板的夹紧表面构造成接触工件。施加到一个或多个电极的电压选择性地静电将工件吸引到夹紧表面。还提供了一个或多个辅助夹紧构件，其中一个或多个辅助夹紧构件构造成选择性地将至少一部分工件固定到夹紧表面。提供了一种被配置为确定工件的温度的温度监视装置，并且控制器被配置为经由对一个或多个电极和一个或多个辅助夹紧构件的电压的控制来选择性地将工件夹紧到夹紧表面，至少部分地基于工件的温度。

9. 发明申请

US20080067436A1 System for magnetic scanning and correction of an ion beam 有权
标题翻译：用于磁扫描和离子束校正的系统
公开(公告)号：US20080067436A1
公开(公告)日：2008-03-20
申请号：US11523148
申请日：2006-09-19
申请人： Bo H. Vanderberg , Robert D. Rathmell , Edward C. Eisner
发明人： Bo H. Vanderberg , Robert D. Rathmell , Edward C. Eisner
IPC分类号： H01J37/08
CPC分类号： H01J37/026 , H01J37/1475 , H01J37/3171 , H01J2237/004 , H01J2237/0041 , H01J2237/055
摘要： A magnetic scanner employs constant magnetic fields to mitigate zero field effects. The scanner includes an upper pole piece and a lower pole piece that generate an oscillatory time varying magnetic field across a path of an ion beam and deflect the ion beam in a scan direction. A set of entrance magnets are positioned about an entrance of the scanner and generate a constant entrance magnetic field across the path of the ion beam. A set of exit magnets are positioned about an exit of the scanner and generate a constant exit magnetic field across the path of the ion beam.
摘要翻译：磁扫描仪采用恒定磁场来减轻零场效应。该扫描器包括上极片和下极片，其在离子束的路径上产生振荡时变磁场并使扫描方向偏转离子束。一组入口磁体围绕扫描器的入口定位，并且在离子束的路径上产生恒定的入射磁场。一组出口磁体围绕扫描器的出口定位，并在离子束的路径上产生恒定的出射磁场。

10. 发明授权

US07022984B1 Biased electrostatic deflector 有权
标题翻译：偏置静电导流板
公开(公告)号：US07022984B1
公开(公告)日：2006-04-04
申请号：US11047238
申请日：2005-01-31
申请人： Robert D. Rathmell , Bo H. Vanderberg , Youngzhang Huang
发明人： Robert D. Rathmell , Bo H. Vanderberg , Youngzhang Huang
IPC分类号： H01J40/00 , H01J47/00 , G21G51/00
CPC分类号： H01J37/3171 , H01J37/05 , H01J2237/053 , H01J2237/303 , H01J2237/31705
摘要： Angular electrostatic filters and methods of filtering that remove energy contaminants from a ribbon shaped ion beam are disclosed. An angular electrostatic filter comprises a top deflection plate and a bottom deflection plate extending from an entrance side to an exit side of the filter. The bottom deflection plate is substantially parallel to the top deflection plate and includes an angle portion. An entrance focus electrode is positioned on the entrance side of the filter and an exit focus electrode is positioned on the exit side of the filter and both serve to focus the ion beam. Edge electrodes are positioned between the top and bottom deflection plates and at sides of the filter to mitigate edge effects. A negative bias is also applied to the top and bottom plates to mitigate space charge by elevating the beam energy.
摘要翻译：公开了角膜静电过滤器和从带状离子束去除能量污染物的过滤方法。角度静电过滤器包括顶部偏转板和从过滤器的入口侧到出口侧延伸的底部偏转板。底部偏转板基本上平行于顶部偏转板并且包括角部分。入口聚焦电极位于过滤器的入口侧，出射聚焦电极位于过滤器的出口侧，并且两者都用于聚焦离子束。边缘电极位于顶部和底部偏转板之间以及位于过滤器侧面以减轻边缘效应。顶板和底板也施加负偏压，以通过提升光束能量来减轻空间电荷。

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