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    • 4. 发明申请
    • METHOD AND APPARATUS FOR PLASMA DEPOSITION OF CHEMICALLY REACTIVE GROUPS ON SUBSTRATES CHEMICALLY REACTIVE SUBSTRATES OBTAINABLE BY THE METHOD AND USE THEREOF
    • 用于等离子体沉积在基板上的化学反应性基团的方法和装置可通过其方法和使用获得化学反应性基板
    • WO2003090939A1
    • 2003-11-06
    • PCT/DK2003/000272
    • 2003-04-25
    • NKT RESEARCH & INNOVATION A/SCHRISTENSEN, Søren, FlygenringPETERSEN, Steen, Guldager
    • CHRISTENSEN, Søren, FlygenringPETERSEN, Steen, Guldager
    • B05D7/24
    • H01J37/32082B05D1/62C03C17/3405C23C16/30
    • The present invention relates to a method and apparatus for plasma deposition of a chemically reactive group (Y-Z) on a substrate, chemically reactive substrates, and use thereof, e.g. for immobilisation of biomolecules; the method comprising: (a) providing at least one precursor (A-X (Y)) for the chemically reactive group; (b) providing at least one donor (D(Z)), said at least one donor comprising at least one addition group (Z), optionally said at least one addition group (Z) being comprised in said precursor (A-X (Y)) and optionally said at least one donor (D(Z)) is not being provided; (c) providing a substrate (M); (d) providing a gas plasma, said gas plasma having a pressure and an energy to form at least one activated carrier group (B); and (e) reacting said substrate (M), said at least one precursor (A-X (Y)), said at least one donor (D(Z)) in said gas plasma so that said chemically reactive group (Y-Z) is bound to said substrate, either directly (M-Y-Z) or via said at least one activated carrier group (M-B-Y-Z), and so that when exposed to a substance which chemically reacts with said chemically reactive group, said substance binds thereto.
    • 本发明涉及用于在衬底上等离子体沉积化学反应性基团(Y-Z)的方法和装置,化学反应性底物及其用途,例如, 用于固定生物分子; 该方法包括:(a)为化学反应性基团提供至少一种前体(A-X(Y)); (B)提供至少一个供体(D(Z)),所述至少一个供体包含至少一个加成基团(Z),任选地所述至少一种加成基团(Z)包含在所述前体(AX(Y) )和任选地所述至少一个供体(D(Z))); (c)提供衬底(M); (d)提供气体等离子体,所述气体等离子体具有压力和能量以形成至少一个活化载体组(B); 和(e)使所述底物(M),所述至少一种前体(AX(Y)),所述至少一种供体(D(Z))在所述气体等离子体中反应,使得所述化学反应性基团(YZ) 所述底物直接(MYZ)或通过所述至少一种活化的载体基团(MBYZ),并且当暴露于与所述化学反应性基团发生化学反应的物质时,所述物质与其结合。