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1. 发明申请

WO2012134663A2 METHOD AND APPARATUS UTILIZING A SINGLE LIFT MECHANISM FOR PROCESSING AND TRANSFER OF SUBSTRATES 审中-公开
标题翻译：使用单个提升机械的方法和装置，用于处理和转移基板
公开(公告)号：WO2012134663A2
公开(公告)日：2012-10-04
申请号：PCT/US2012/025960
申请日：2012-02-21
申请人： APPLIED MATERIALS, INC , OLGADO, Donald J.K. , NGUYEN, Tuan Anh
发明人： OLGADO, Donald J.K. , NGUYEN, Tuan Anh
CPC分类号： H01L21/67115 , C23C16/4584 , C23C16/54 , H01L21/68742
摘要： Embodiments of the present invention relate to apparatus and methods for loading substrates into processing chambers, processing the substrates in the processing chamber, and transferring the substrates out of the processing chamber using a single lift mechanism. One embodiment of the present invention provides an apparatus processing multiple substrates. The apparatus includes a chamber body having an internal sidewall, a liner assembly disposed on the internal sidewall defining a processing volume, and a plurality of chamber support features coupled to an interior surface of the liner assembly and extending into the processing volume. The apparatus also includes an edge ring disposed in the processing volume, the edge ring comprising an annular body, a shoulder portion defining an inside diameter of the annular body, and a plurality of tabs disposed on the shoulder portion in a circular pattern having a diameter that is less than the inside diameter of the annular body.
摘要翻译：本发明的实施例涉及将基板装载到处理室中的装置和方法，处理处理室中的基板，以及使用单个升降机构将基板转移到处理室外。本发明的一个实施例提供了一种处理多个基板的装置。该装置包括具有内部侧壁的室主体，设置在限定处理容积的内侧壁上的衬套组件，以及耦合到衬套组件的内表面并延伸到处理体积中的多个室支撑特征。该设备还包括设置在处理容积中的边缘环，边缘环包括环形体，限定环形体的内径的肩部和以圆形图案设置在肩部上的多个突片，其具有直径小于环形体的内径。

2. 发明申请

WO2012128789A1 MULTIPLE LEVEL SHOWERHEAD DESIGN 审中-公开
标题翻译：多层次淋浴设计
公开(公告)号：WO2012128789A1
公开(公告)日：2012-09-27
申请号：PCT/US2011/058222
申请日：2011-10-28
申请人： APPLIED MATERIALS, INC. , OLGADO, Donald J.K.
发明人： OLGADO, Donald J.K.
IPC分类号： H01L21/205 , C23C16/455
CPC分类号： C23C16/45565 , B05B1/005 , C23C16/45572 , C23C16/45574
摘要： Embodiments of the present invention generally provide a showerhead assembly made of multiple plates fastened together. The showerhead assembly includes a gas manifold defined by a top and middle plate and a diverter plate defined by the middle plate and a bottom, heat exchange plate. A first processing gas enters the gas manifold and is diverted by the diverter plate through the bottom plate. A second gas enters the gas manifold and is diverted by the diverter plate through the bottom plate such that the second and first gases do not mix prior to exiting the showerhead. In one embodiment, the first processing gas can be distributed through central and outer regions of the showerhead at different flow rates and/or pressures. In addition, the second processing gas can be distributed through the central and outer regions of the showerhead at different flow rates and/or pressures.
摘要翻译：本发明的实施例通常提供由多个板固定在一起的喷头组件。喷头组件包括由中间板和中间板限定的气体歧管和由中间板和底部热交换板限定的分流板。第一处理气体进入气体歧管并由分流板通过底板转向。第二气体进入气体歧管，并由转向板通过底板转向，使得第二和第一气体在离开喷头之前不混合。在一个实施例中，第一处理气体可以以不同的流速和/或压力分布在喷头的中心和外部区域。此外，第二处理气体可以以不同的流速和/或压力分布在喷头的中心和外部区域。

3. 发明申请

WO2012125275A3 APPARATUS FOR MONITORING AND CONTROLLING SUBSTRATE TEMPERATURE 审中-公开
公开(公告)号：WO2012125275A3
公开(公告)日：2012-09-20
申请号：PCT/US2012/026715
申请日：2012-02-27
申请人： APPLIED MATERIALS, INC. , OZGUN, Omer , FLORIN, Didier P. , OLGADO, Donald J.K.
发明人： OZGUN, Omer , FLORIN, Didier P. , OLGADO, Donald J.K.
IPC分类号： H01L21/66
摘要： A system and methods for heating substrates during high temperature processing is provided. The system uses multiple temperature inputs of the backside of a substrate carrier and known parameters within the processing chamber to estimate the temperature of substrates being processed on the substrate carrier. Temperature readings of the substrate carrier taken from above the processing volume may be used to correct any drift that may occur with respect to temperature readings taken from below the substrate carrier. Temperature readings of heat exchanging fluid flowing through a showerhead assembly may be used to estimate the temperature of the surface of the showerhead, which may be used in the estimation of the temperature of the substrates being processed. The system then uses the estimated temperature to control the amount of power supplied to a plurality of heat sources configured to heat the substrates from below the substrate carrier.

4. 发明申请

WO2012024033A2 SHOWERHEAD ASSEMBLY WITH GAS INJECTION DISTRIBUTION DEVICES 审中-公开
标题翻译：带喷气分配装置的喷头组件
公开(公告)号：WO2012024033A2
公开(公告)日：2012-02-23
申请号：PCT/US2011/043577
申请日：2011-07-11
申请人： APPLIED MATERIALS, INC. , TAM, Alexander , CHANG, Anzhong , ACHARYA, Sumedh , OLGADO, Donald, J.K.
发明人： TAM, Alexander , CHANG, Anzhong , ACHARYA, Sumedh , OLGADO, Donald, J.K.
IPC分类号： H01L21/205
CPC分类号： C23C16/45565 , C23C16/45574 , C23C16/45576
摘要： A method and apparatus that may be utilized for chemical vapor deposition and/or hydride vapor phase epitaxial (HVPE) deposition are provided. The apparatus includes a showerhead assembly with separate inlets and manifolds for delivering separate processing gases into a processing volume of the chamber without mixing the gases prior to entering the processing volume. The showerhead includes a plurality of gas distribution devices disposed within a plurality of gas inlets for injecting one of the processing gases into and distributing it across a manifold for uniform delivery into the processing volume of the chamber. Each of the gas distribution devices preferably has a nozzle configured to evenly distribute the processing gas flowing therethrough while minimizing recirculation of the processing gas within the manifold. As a result, improved deposition uniformity is achieved on a plurality of substrates positioned in the processing volume of the processing chamber.
摘要翻译：提供了可用于化学气相沉积和/或氢化物气相外延（HVPE）沉积的方法和设备。该设备包括具有分开的入口和歧管的喷头组件，用于将分开的处理气体输送到腔室的处理容积中，而不会在进入处理容积之前混合气体。喷头包括多个气体分配装置，这些气体分配装置设置在多个气体入口内，用于将处理气体之一喷射到歧管中并将其分配到歧管上，以均匀地输送到腔室的处理容积中。每个气体分配装置优选地具有喷嘴，该喷嘴被配置为均匀地分配流过其中的处理气体，同时最小化歧管内的处理气体的再循环。结果，在位于处理室的处理空间中的多个基板上实现了改善的沉积均匀性。

5. 发明申请

WO2012021321A2 COMPOSITE SUBSTRATES FOR DIRECT HEATING AND INCREASED TEMPERATURE UNIFORMITY 审中-公开
标题翻译：用于直接加热和增加温度均匀性的复合材料
公开(公告)号：WO2012021321A2
公开(公告)日：2012-02-16
申请号：PCT/US2011/046116
申请日：2011-08-01
申请人： APPLIED MATERIALS, INC. , SU, Jie , OLGADO, Donald J.K. , KUTNEY, Michael C.
发明人： SU, Jie , OLGADO, Donald J.K. , KUTNEY, Michael C.
IPC分类号： H01L21/205 , H01L21/683
CPC分类号： F27B17/0025 , C23C16/4586 , C23C16/46 , C30B23/063 , C30B25/105 , H01L21/67115 , H01L21/68764 , H01L21/68771 , H01L21/68785
摘要： Embodiments of the present invention generally relate to apparatus and methods for uniformly heating substrates. The apparatus include a transferable puck having at least one electrode and a dielectric coating. The transferable puck can be biased with a biasing assembly relative to a substrate, and transferred independently of the biasing assembly during a fabrication process while maintaining the bias relative to the substrate. The puck absorbs radiant heat from a heat source and uniformly conducts the heat to a substrate coupled to the puck. The puck has high emissivity and high thermal conductivity for absorbing and transferring the radiant heat to the substrate. The high thermal conductivity allows for a uniform temperature profile across the substrate, thereby increasing deposition uniformity. The method includes disposing a light-absorbing material on an optically transparent substrate, and radiating the light-absorbing material with a radiant heat source to heat the optically transparent substrate.
摘要翻译：本发明的实施例总体涉及用于均匀地加热衬底的装置和方法。该设备包括具有至少一个电极和电介质涂层的可转移圆盘。可转移圆盘可以用偏置组件相对于衬底偏置，并且在制造过程期间独立于偏置组件而转移，同时相对于衬底保持偏置。冰球吸收来自热源的辐射热并将热量均匀地传导至与冰球连接的基板。该圆盘具有高发射率和高导热性，用于吸收辐射热量并将辐射热量传递给基板。高导热率允许横跨衬底的均匀温度分布，由此增加沉积均匀性。该方法包括将光吸收材料设置在光学透明衬底上，并用辐射热源辐射光吸收材料以加热光学透明衬底。

6. 发明申请

WO2011109043A1 INTEGRATED COMPOSITE SEPARATOR FOR LITHIUM-ION BATTERIES 审中-公开
标题翻译：用于锂离子电池的集成复合分离器
公开(公告)号：WO2011109043A1
公开(公告)日：2011-09-09
申请号：PCT/US2010/051328
申请日：2010-10-04
申请人： APPLIED MATERIALS, INC. , WANG, Connie P. , BACHRACH, Robert Z. , LOPATIN, Sergey D. , OLGADO, Donald J.K. , KUTNEY, Michael , WANG, Zheng
发明人： WANG, Connie P. , BACHRACH, Robert Z. , LOPATIN, Sergey D. , OLGADO, Donald J.K. , KUTNEY, Michael , WANG, Zheng
IPC分类号： H01M10/0525 , H01M2/16 , C04B35/01 , B32B37/00 , H01M4/48
CPC分类号： B32B37/02 , B32B38/0008 , B32B38/145 , B32B38/164 , B32B39/00 , B32B2037/243 , B32B2309/10 , B32B2310/14 , B32B2457/10 , C04B35/44 , C04B2235/3203 , C04B2235/3262 , C04B2235/3279 , H01M2/145 , H01M2/162 , H01M2/1673 , H01M2/1686 , H01M2/348 , H01M10/052 , H01M10/0565 , H01M2300/0094
摘要： Embodiments of the present invention relate generally to lithium-ion batteries, and more specifically, to batteries having integrated separators and methods of fabricating such batteries. In one embodiment, a lithium-ion battery having an electrode structure is provided. The lithium-ion battery comprises an anode stack, a cathode stack, and an integrated separator formed between the anode stack and the cathode stack. The anode stack comprises an anodic current collector and an anode structure formed over a first surface of the anodic current collector. The cathode stack comprises a cathodic current collector and a cathode structure formed over a first surface of the cathodic current collector. The integrated separator comprises a first ceramic layer, a second ceramic layer, and a polymer material layer deposited between the first ceramic layer and the second ceramic layer.
摘要翻译：本发明的实施方案一般涉及锂离子电池，更具体地，涉及具有集成分离器的电池和制造这种电池的方法。在一个实施例中，提供具有电极结构的锂离子电池。锂离子电池包括阳极堆叠，阴极堆叠和形成在阳极堆叠和阴极堆叠之间的集成隔板。阳极堆叠包括阳极集电器和形成在阳极集电器的第一表面上的阳极结构。阴极堆叠包括在阴极集电器的第一表面上形成的阴极集电器和阴极结构。集成分离器包括第一陶瓷层，第二陶瓷层和沉积在第一陶瓷层和第二陶瓷层之间的聚合物材料层。

7. 发明申请

WO2011068685A2 COMPRESSED POWDER 3D BATTERY ELECTRODE MANUFACTURING 审中-公开
标题翻译：压缩粉末3D电池电极制造
公开(公告)号：WO2011068685A2
公开(公告)日：2011-06-09
申请号：PCT/US2010/057063
申请日：2010-11-17
申请人： APPLIED MATERIALS, INC. , BACHRACH, Robert Z. , LOPATIN, Sergey D. , WANG, Connie P. , OLGADO, Donald J.K.
发明人： BACHRACH, Robert Z. , LOPATIN, Sergey D. , WANG, Connie P. , OLGADO, Donald J.K.
IPC分类号： H01M4/02 , H01M4/64 , H01M4/04 , H01G9/04 , H01M10/0525
CPC分类号： H01M4/70 , H01M4/134 , H01M4/139 , H01M4/485 , H01M4/505 , H01M4/525 , H01M4/5825 , H01M4/587 , H01M4/661
摘要： Embodiments of the invention contemplate forming an electrochemical device and device components, such as a battery cell or supercapacitor, using thin-film or layer deposition processes and other related methods for forming the same. In one embodiment, a battery bi-layer cell is provided. The battery bi-layer cell comprises an anode structure comprising a conductive collector substrate, a plurality of pockets formed on the conductive collector substrate by conductive microstructures comprising a plurality of columnar projections, and an anodically active powder deposited in and over the plurality of pockets, an insulative separator layer formed over the plurality of pockets, and a cathode structure joined over the insulative separator.
摘要翻译：本发明的实施例考虑使用薄膜或层沉积工艺以及其它相关方法来形成电化学装置和器件部件，例如电池单元或超级电容器。在一个实施例中，提供了电池双层电池。电池双层电池包括阳极结构，其包括导电收集器基板，通过包括多个柱状突起的导电微结构形成在导电收集器基板上的多个凹穴以及沉积在多个凹穴中和之上的阳极活性粉末，形成在所述多个凹穴上的绝缘隔离层，以及连接在所述绝缘隔板上的阴极结构。

8. 发明申请

WO2011159615A2 METHOD AND APPARATUS FOR INDUCING TURBULENT FLOW OF A PROCESSING CHAMBER CLEANING GAS 审中-公开
标题翻译：用于诱导加工室清洁气体的涡流的方法和装置
公开(公告)号：WO2011159615A2
公开(公告)日：2011-12-22
申请号：PCT/US2011/040197
申请日：2011-06-13
申请人： APPLIED MATERIALS, INC. , CHUNG, Hua , DONG, Xizi , MAUNG, Kyawwin , HANAWA, Hiroji , KANG, Sang Won , QUACH, David H. , OLGADO, Donald J.K. , BOUR, David , HSU, Wei-Yung , TAM, Alexander , CHANG, Anzhong , ACHARYA, Sumedh
发明人： CHUNG, Hua , DONG, Xizi , MAUNG, Kyawwin , HANAWA, Hiroji , KANG, Sang Won , QUACH, David H. , OLGADO, Donald J.K. , BOUR, David , HSU, Wei-Yung , TAM, Alexander , CHANG, Anzhong , ACHARYA, Sumedh
IPC分类号： H01L21/205 , H01L21/302
CPC分类号： B08B5/00 , C23C16/4405 , C23C16/45506 , C23C16/45591 , H01L21/02041 , H01L21/67115 , Y10S438/905
摘要： Embodiments of the invention generally relate to apparatus and methods for cleaning chamber components using a cleaning plate. The cleaning plate is adapted to be positioned on a substrate support during a cleaning process, and includes a plurality of turbulence-inducing structures. The turbulence-inducing structures induce a turbulent flow of cleaning gas while the cleaning plate is rotated during a cleaning process. The cleaning plate increases the retention time of the cleaning gas near the showerhead during cleaning. Additionally, the cleaning plate reduces concentration gradients within the cleaning plate to provide a more effective clean. The method includes positioning a cleaning plate adjacent to a showerhead, and introducing cleaning gas to the space between the showerhead and the cleaning plate. A material deposited on the surface of the showerhead is then heated and vaporized in the presence of the cleaning gas, and then exhausted from the processing chamber.
摘要翻译：本发明的实施例一般涉及使用清洁板清洁腔室部件的装置和方法。清洁板适于在清洁过程期间定位在基板支撑件上，并且包括多个湍流诱导结构。湍流诱导结构在清洁过程中清洁板旋转时引起清洁气体的湍流。在清洁过程中，清洁板增加了喷头附近清洁气体的停留时间。此外，清洁板减少清洁板内的浓度梯度以提供更有效的清洁。该方法包括将清洁板定位在与喷头相邻的位置，并将清洁气体引入到喷头和清洁板之间的空间。然后将沉积在喷头表面上的材料在清洁气体的存在下加热和蒸发，然后从处理室中排出。

9. 发明申请

WO2013033428A2 IN SITU PROCESS KIT CLEAN FOR MOCVD CHAMBERS 审中-公开
标题翻译：在MOCVD CHAMBERS的现场工艺套件清洁
公开(公告)号：WO2013033428A2
公开(公告)日：2013-03-07
申请号：PCT/US2012/053186
申请日：2012-08-30
申请人： APPLIED MATERIALS, INC. , LU, Jiang , CHUNG, Hua , WANG, Yan , SHEN, Kuan Chien Keris , DONG, Xizi , DUBOUST, Alain , HSU, Wei-Yung , GRIFFIN, Kevin S. , OLGADO, Donald J.K.
发明人： LU, Jiang , CHUNG, Hua , WANG, Yan , SHEN, Kuan Chien Keris , DONG, Xizi , DUBOUST, Alain , HSU, Wei-Yung , GRIFFIN, Kevin S. , OLGADO, Donald J.K.
IPC分类号： H01L21/205 , H01L21/302 , H01L21/02
CPC分类号： H01L21/67115 , C23C16/4405
摘要： Embodiments of the invention include methods of in situ cleaning of deposited materials from the surfaces of processing chambers, e.g., MOCVD processing chambers. The cleaning process increases the time between preventative maintenance cleanings and reduces chamber down-time by targeting the removal of the layers deposited on the interior surfaces of the chamber body and/or liner, as well as the process kit components. The cleaning process occurs while shielding the showerhead and a carrier plate from at least some of the cleaning gases used during the cleaning process. To prevent chemical attack of the layers already deposited on the surface of the showerhead, and to prevent poisoning of the layers deposited after performing the cleaning process, the showerhead and the carrier plate are shielded from the cleaning gas by delivering an inert gas through the showerhead and across the surface of the carrier plate and/or cleaning plate during the cleaning.
摘要翻译：本发明的实施例包括从处理室的表面例如MOCVD处理室原位清洁沉积材料的方法。清洁过程增加了预防性维护清洁之间的时间，并且通过靶向沉积在室主体和/或衬套的内表面上的层以及处理套件组件来去除沉积物来减少室停机时间。清洁过程发生在屏蔽淋浴喷头和承载板与清洁过程中使用的至少一些清洁气体时。为了防止已经沉积在喷头表面上的层的化学侵蚀，并且为了防止在执行清洁处理之后沉积的层中毒，喷淋头和承载板通过将惰性气体通过喷头并且在清洁期间穿过承载板和/或清洁板的表面。

10. 发明申请

WO2012036856A2 MULTIPLE SECTION SHOWERHEAD ASSEMBLY 审中-公开
标题翻译：多段式喷头组件
公开(公告)号：WO2012036856A2
公开(公告)日：2012-03-22
申请号：PCT/US2011/048975
申请日：2011-08-24
申请人： APPLIED MATERIALS, INC. , OLGADO, Donald J.K.
发明人： OLGADO, Donald J.K.
IPC分类号： H01L21/205
CPC分类号： C23C16/45565 , C23C16/45574 , C23C16/45576
摘要： Embodiments of the present invention generally provide a method and apparatus that may be utilized for deposition of Group III-nitride films using MOCVD and/or HVPE hardware. In one embodiment, the apparatus is a showerhead assembly made of multiple sections that are isolated from one another and attached to a top plate. Each showerhead section has separate inlets and passages for delivering separate processing gases into a processing volume of a processing chamber without mixing the gases prior to entering the processing volume. In one embodiment, each showerhead section includes a temperature control manifold for flowing a cooling fluid through the respective showerhead section. By providing multiple, isolated showerhead sections, manufacturing complexity and costs are significantly reduced as compared to conventionally manufacturing the entire showerhead from a single block or stack of plates.
摘要翻译：本发明的实施例一般提供可用于使用MOCVD和/或HVPE硬件沉积III族氮化物膜的方法和设备。在一个实施例中，该设备是由多个部分制成的喷头组件，所述多个部分彼此隔离并附接至顶板。每个喷头部分具有分离的入口和通道，用于将单独的处理气体输送到处理室的处理空间中，而不会在进入处理空间之前混合气体。在一个实施例中，每个喷头部分包括用于使冷却流体流过相应喷头部分的温度控制歧管。通过提供多个独立的喷头部分，与通常从单块或多块板材制造整个喷头相比，制造复杂性和成本显着降低。

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