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1. 发明专利

IL231730A Exposure apparatus and method for producing device 未知
公开(公告)号：IL231730A
公开(公告)日：2016-05-31
申请号：IL23173014
申请日：2014-03-26
申请人： NIKON CORP , HISASHI NISHINAGA , IKUO HIKIMA , MITSUNORI TOYODA , MASAHIRO NAKAGAWA , TSUNEYUKI HAGIWARA , YASUSHI MIZUNO , NAONORI KITA , OSAMU TANITSU , NOZOMU EMURA
发明人： HISASHI NISHINAGA , IKUO HIKIMA , MITSUNORI TOYODA , MASAHIRO NAKAGAWA , TSUNEYUKI HAGIWARA , YASUSHI MIZUNO , NAONORI KITA , OSAMU TANITSU , NOZOMU EMURA
IPC分类号： G03F7/20 , H01L20060101 , H01L21/027
摘要： A part of exposure beam through a liquid(LQ) via a projection optical system(PL) enters a light-transmitting section(44), enters an optical member(41) without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

2. 发明专利

IL235090D0 Exposure apparatus, exposure method, and method for producing device 未知
公开(公告)号：IL235090D0
公开(公告)日：2015-01-29
申请号：IL23509014
申请日：2014-10-07
申请人： NIKON CORP , HISASHI NISHINAGA , IKUO HIKIMA , MITSUNORI TOYODA , MASAHIRO NAKAGAWA , TSUNEYUKI HAGIWARA , YASUSHI MIZUNO , NAONORI KITA , OSAMU TANITSU , NOZOMU EMURA
IPC分类号： G03F20060101 , G03F7/20 , H01L20060101 , H01L21/027
摘要： A part of exposure beam through a liquid(LQ) via a projection optical system(PL) enters a light-transmitting section(44), enters an optical member(41) without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

3. 发明专利

IL235090A Exposure apparatus, exposure method and method for producing a device 未知
公开(公告)号：IL235090A
公开(公告)日：2016-02-29
申请号：IL23509014
申请日：2014-10-07
申请人： NIKON CORP , HISASHI NISHINAGA , IKUO HIKIMA , MITSUNORI TOYODA , MASAHIRO NAKAGAWA , TSUNEYUKI HAGIWARA , YASUSHI MIZUNO , NAONORI KITA , OSAMU TANITSU , NOZOMU EMURA
发明人： HISASHI NISHINAGA , IKUO HIKIMA , MITSUNORI TOYODA , MASAHIRO NAKAGAWA , TSUNEYUKI HAGIWARA , YASUSHI MIZUNO , NAONORI KITA , OSAMU TANITSU , NOZOMU EMURA
IPC分类号： G03F7/20 , H01L20060101 , H01L21/027
摘要： A part of exposure beam through a liquid(LQ) via a projection optical system(PL) enters a light-transmitting section(44), enters an optical member(41) without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

4. 发明专利

IL231730D0 Exposure appartus, exposure method, and method for producing device 未知
公开(公告)号：IL231730D0
公开(公告)日：2014-05-28
申请号：IL23173014
申请日：2014-03-26
申请人： NIKON CORP , HISASHI NISHINAGA , IKUO HIKIMA , MITSUNORI TOYODA , MASAHIRO NAKAGAWA , TSUNEYUKI HAGIWARA , YASUSHI MIZUNO , NAONORI KITA , OSAMU TANITSU , NOZOMU EMURA
IPC分类号： G03F20060101 , G03F7/20 , H01L20060101 , H01L21/027
摘要： A part of exposure beam through a liquid(LQ) via a projection optical system(PL) enters a light-transmitting section(44), enters an optical member(41) without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

5. 发明专利

IL174296D0 EXPOSURE APPARTUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE 未知
公开(公告)号：IL174296D0
公开(公告)日：2006-08-01
申请号：IL17429606
申请日：2006-03-13
申请人： NIKON CORP , HISASHI NISHINAGA , IKUO HIKIMA , MITSUNORI TOYODA , MASAHIRO NAKAGAWA , TSUNEYUKI HAGIWARA , YASUSHI MIZUNO , NAONORI KITA , OSAMU TANITSU , NOZOMU EMURA
IPC分类号： G03F7/20 , H01L20100101 , H01L21/027
摘要： A part of exposure beam through a liquid(LQ) via a projection optical system(PL) enters a light-transmitting section(44), enters an optical member(41) without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

6. 发明授权

US08638420B2 Optical integrator, illuminating optical device, exposure apparatus and device manufacturing method 有权
标题翻译：光学积分器，照明光学装置，曝光装置和装置的制造方法
公开(公告)号：US08638420B2
公开(公告)日：2014-01-28
申请号：US12529614
申请日：2008-03-11
申请人： Naonori Kita
发明人： Naonori Kita
IPC分类号： G03B27/54
CPC分类号： G02B27/0905 , G02B27/0966 , G03F7/70075 , G03F7/70566
摘要： An optical integrator has a plurality of wavefront dividing elements two-dimensionally arrayed, and is so configured that a ray group obliquely incident to an optical-axis center of an entrance face of each wavefront dividing element is emitted in parallel with the optical axis from the wavefront dividing element. In each of a required number of wavefront dividing elements out of the plurality of wavefront dividing elements, at least one curved optical face of the wavefront dividing element is formed as inclined around an axis along a predetermined direction passing an optical-axis center of an entrance face of the wavefront dividing element and being perpendicular to the optical axis AXe.
摘要翻译：光学积分器具有二维排列的多个波阵面分割元件，并且被配置为使得倾斜入射到每个波阵面元素的入射面的光轴中心的射线组从光轴平行地发射波前分割元素。在多个波阵面分割元件中的所需数量的波前分割元件中的每一个中，波前分割元件的至少一个弯曲光学面形成为沿着通过入口的光轴中心的预定方向的轴线倾斜并且垂直于光轴ax。

7. 发明授权

US08139198B2 Exposure apparatus, exposure method, and method for producing device 有权
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US08139198B2
公开(公告)日：2012-03-20
申请号：US11403922
申请日：2006-04-14
申请人： Hisashi Nishinaga , Ikuo Hikima , Mitsunori Toyoda , Masahiro Nakagawa , Tsuneyuki Hagiwara , Yasushi Mizuno , Naonori Kita , Osamu Tanitsu , Nozomu Emura
发明人： Hisashi Nishinaga , Ikuo Hikima , Mitsunori Toyoda , Masahiro Nakagawa , Tsuneyuki Hagiwara , Yasushi Mizuno , Naonori Kita , Osamu Tanitsu , Nozomu Emura
IPC分类号： G03B27/42 , G03B27/58
CPC分类号： G03F7/7015 , G03F7/70058 , G03F7/70341 , G03F7/706 , G03F7/7085
摘要： A part of exposure beam through a liquid via a projection optical system enters a light-transmitting section, enters an optical member without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.
摘要翻译：通过投影光学系统通过液体的曝光束的一部分进入透光部分，而不通过气体进入光学部件并被聚焦。即使投影光学系统的数值孔径增加，曝光装置接收来自投影光学系统的曝光光也进行各种测量。

8. 发明授权

US07706072B2 Optical integrator, illumination optical device, photolithograph, photolithography, and method for fabricating device 有权
标题翻译：光学积分器，照明光学装置，光刻，光刻及其制造方法
公开(公告)号：US07706072B2
公开(公告)日：2010-04-27
申请号：US11793448
申请日：2005-12-09
申请人： Naonori Kita
发明人： Naonori Kita
IPC分类号： G02B27/10
CPC分类号： G02B27/0927 , G02B27/0961 , G03F7/70075
摘要： An optical integrator has characteristics to suppress influence of relative positioning error of a pair of optical members on an illuminance distribution and on a shape of an illumination field. The optical integrator is a wavefront splitting type optical integrator having a first optical member and a second optical member in order from the entrance side of light. The first optical member has first entrance surfaces having a refractive power in a first direction and substantially no refractive power in a second direction, and first exit surfaces having a refractive power in the first direction and substantially no refractive power in the second direction. The second optical member has second entrance surfaces having a refractive power in the second direction and substantially no refractive power in the first direction, and second exit surfaces having a refractive power in the second direction and substantially no refractive power in the first direction.
摘要翻译：光学积分器具有抑制一对光学构件的相对定位误差对照度分布和照明场的形状的影响的特性。光学积分器是从光入射侧起依次具有第一光学构件和第二光学构件的波前分割型光学积分器。第一光学构件具有在第一方向上具有折射力并且在第二方向上基本上不具有折光力的第一入射表面，以及在第一方向上具有折射力并且在第二方向上基本上没有折射光焦度的第一出射表面。第二光学构件具有在第二方向上具有屈光力并且在第一方向上基本上没有折光力的第二入射表面，并且第二出射表面在第二方向上具有折射光焦度，并且在第一方向上基本上没有折射光焦度。

9. 发明申请

US20120133915A1 LIGHT SOURCE OPTIMIZING METHOD, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, EXPOSURE APPARATUS, LITHOGRAPHY SYSTEM, LIGHT SOURCE EVALUATION METHOD, AND LIGHT SOURCE MODULATION METHOD 有权
标题翻译：光源优化方法，曝光方法，器件制造方法，程序，曝光装置，光刻系统，光源评估方法和光源调制方法
公开(公告)号：US20120133915A1
公开(公告)日：2012-05-31
申请号：US13366829
申请日：2012-02-06
申请人： Tomoyuki MATSUYAMA , Naonori KITA
发明人： Tomoyuki MATSUYAMA , Naonori KITA
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03F7/70116 , G03F7/70125 , G03F7/705 , G03F7/70625
摘要： Disclosed is a light source optimizing method wherein: a light source shape obtained as the result of SMO is set as a target, the SMO being an optimizing calculation method for optimizing a mask pattern and illumination light source, a spatial light modulator is controlled such that a deviation from the target is within an acceptable range, and the shape of the illumination light source is set; the image of the pattern obtained as the results of the SMO is formed on a wafer, using illumination light emitted from the illumination light source having the set light source shape, an OPE is evaluated as image-forming performance using the detection results obtained by detecting the image of the pattern thus formed; and the light source shape is optimized.
摘要翻译：公开了一种光源优化方法，其中将作为SMO的结果获得的光源形状设置为目标，SMO是用于优化掩模图案和照明光源的优化计算方法，空间光调制器被控制为使得与目标的偏差在可接受的范围内，照明光源的形状被设定，使用从具有设定光源形状的照明光源发射的照明光，在晶片上形成作为SMO的结果获得的图案的图像，使用通过检测获得的检测结果将OPE评价为图像形成性能由此形成的图案的图像; 光源形状优化。

10. 发明申请

US20120028197A1 TRANSMISSION OPTICAL SYSTEM, ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：传输光学系统，照明光学系统，曝光装置和装置制造方法
公开(公告)号：US20120028197A1
公开(公告)日：2012-02-02
申请号：US13196535
申请日：2011-08-02
申请人： Naonori KITA
发明人： Naonori KITA
IPC分类号： G03F7/20 , G02B19/00 , G02F1/00 , G03B27/72 , G02B27/10 , G02B27/09
CPC分类号： G03F7/70158 , G03F7/70058
摘要： According to one embodiment, a transmission optical system which guides light in a nearly parallel beam state emitted from an optical outlet port of a light source, to an optical inlet port of an exposure apparatus body and which injects the light in the nearly parallel beam state into the optical inlet port is provided with a condensing optical system which keeps the optical outlet port and the optical inlet port in an optical Fourier transform relation, and an angle distribution providing element which is arranged in an optical path between the optical outlet port and the condensing optical system and which provides an emergent beam with an angle distribution in a range larger than a range of an angle distribution of an incident beam.
摘要翻译：根据一个实施例，一种传输光学系统，其将从光源的光学出口端射出的几乎平行的光束状态的光引导到曝光装置主体的光学入口端口，并将光以几乎平行的光束状态光入口具有将光输出口和光入口保持为光学傅里叶变换关系的聚光系统，以及角度分布提供元件，其设置在光出口和光入口之间的光路中并且其提供在大于入射光束的角度分布的范围的范围内的角度分布的紧急光束。

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