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1. 发明申请

US20120133915A1 LIGHT SOURCE OPTIMIZING METHOD, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, EXPOSURE APPARATUS, LITHOGRAPHY SYSTEM, LIGHT SOURCE EVALUATION METHOD, AND LIGHT SOURCE MODULATION METHOD 有权
标题翻译：光源优化方法，曝光方法，器件制造方法，程序，曝光装置，光刻系统，光源评估方法和光源调制方法
公开(公告)号：US20120133915A1
公开(公告)日：2012-05-31
申请号：US13366829
申请日：2012-02-06
申请人： Tomoyuki MATSUYAMA , Naonori KITA
发明人： Tomoyuki MATSUYAMA , Naonori KITA
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03F7/70116 , G03F7/70125 , G03F7/705 , G03F7/70625
摘要： Disclosed is a light source optimizing method wherein: a light source shape obtained as the result of SMO is set as a target, the SMO being an optimizing calculation method for optimizing a mask pattern and illumination light source, a spatial light modulator is controlled such that a deviation from the target is within an acceptable range, and the shape of the illumination light source is set; the image of the pattern obtained as the results of the SMO is formed on a wafer, using illumination light emitted from the illumination light source having the set light source shape, an OPE is evaluated as image-forming performance using the detection results obtained by detecting the image of the pattern thus formed; and the light source shape is optimized.
摘要翻译：公开了一种光源优化方法，其中将作为SMO的结果获得的光源形状设置为目标，SMO是用于优化掩模图案和照明光源的优化计算方法，空间光调制器被控制为使得与目标的偏差在可接受的范围内，照明光源的形状被设定，使用从具有设定光源形状的照明光源发射的照明光，在晶片上形成作为SMO的结果获得的图案的图像，使用通过检测获得的检测结果将OPE评价为图像形成性能由此形成的图案的图像; 光源形状优化。

2. 发明申请

US20120028197A1 TRANSMISSION OPTICAL SYSTEM, ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：传输光学系统，照明光学系统，曝光装置和装置制造方法
公开(公告)号：US20120028197A1
公开(公告)日：2012-02-02
申请号：US13196535
申请日：2011-08-02
申请人： Naonori KITA
发明人： Naonori KITA
IPC分类号： G03F7/20 , G02B19/00 , G02F1/00 , G03B27/72 , G02B27/10 , G02B27/09
CPC分类号： G03F7/70158 , G03F7/70058
摘要： According to one embodiment, a transmission optical system which guides light in a nearly parallel beam state emitted from an optical outlet port of a light source, to an optical inlet port of an exposure apparatus body and which injects the light in the nearly parallel beam state into the optical inlet port is provided with a condensing optical system which keeps the optical outlet port and the optical inlet port in an optical Fourier transform relation, and an angle distribution providing element which is arranged in an optical path between the optical outlet port and the condensing optical system and which provides an emergent beam with an angle distribution in a range larger than a range of an angle distribution of an incident beam.
摘要翻译：根据一个实施例，一种传输光学系统，其将从光源的光学出口端射出的几乎平行的光束状态的光引导到曝光装置主体的光学入口端口，并将光以几乎平行的光束状态光入口具有将光输出口和光入口保持为光学傅里叶变换关系的聚光系统，以及角度分布提供元件，其设置在光出口和光入口之间的光路中并且其提供在大于入射光束的角度分布的范围的范围内的角度分布的紧急光束。

3. 发明申请

US20110205514A1 MEASURING METHOD AND MEASURING APPARATUS OF PUPIL TRANSMITTANCE DISTRIBUTION, EXPOSURE METHOD AND EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：测量方法和测量装置的发射分布，曝光方法和曝光装置，以及装置制造方法
公开(公告)号：US20110205514A1
公开(公告)日：2011-08-25
申请号：US13011320
申请日：2011-01-21
申请人： Naonori KITA
发明人： Naonori KITA
IPC分类号： G03B27/54 , G01M11/00
CPC分类号： G03F7/70941 , G01M11/02 , G03F7/70133 , G03F7/70591 , G03F7/706
摘要： A measuring apparatus for measuring a pupil transmittance distribution of an optical system to be examined has a diffraction grating mounted on a first surface in an optical Fourier transform relation with a pupil of the optical system, an illumination optical system which makes a beam inclined relative to the optical axis, incident to a predetermined position on the first surface so that a +first-order diffracted beam, generated through the diffraction grating, passes through a first pupil partial region in an effective region of the pupil and so that a −first-order diffracted beam, generated through the diffraction grating, passes through a second pupil partial region, and a measuring unit which measures an intensity of the +first-order diffracted beam, and an intensity of the −first-order diffracted beam, and the measuring apparatus determines a ratio of a pupil transmittance in the first and second pupil partial regions.
摘要翻译：用于测量待检光学系统的光瞳透射率分布的测量装置具有安装在与光学系统的光瞳的光学傅立叶变换关系的第一表面上的衍射光栅，照明光学系统，其使光束相对于光轴入射到第一表面上的预定位置，使得通过衍射光栅产生的+一级衍射光束通过瞳孔的有效区域中的第一光瞳部分区域，并且使得第一 - 通过衍射光栅产生的三阶衍射光束通过第二光瞳部分区域，测量单位测量+一级衍射光束的强度和一级衍射光束的强度，以及测量设备确定第一和第二光瞳部分区域中的光瞳透射率的比率。

4. 发明申请

US20100316943A1 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：照明光学系统，曝光装置和装置制造方法
公开(公告)号：US20100316943A1
公开(公告)日：2010-12-16
申请号：US12817271
申请日：2010-06-17
申请人： Osamu TANITSU , Naonori KITA
发明人： Osamu TANITSU , Naonori KITA
IPC分类号： G03F7/20 , G02B26/00 , G03B27/54
CPC分类号： G03F7/70116 , G02B17/0892 , G02B26/0833
摘要： There is disclosed an illumination optical system which illuminates an illumination target surface on the basis of light from a light source, said illumination optical system comprising, a spatial light modulator having a plurality of optical elements arrayed two-dimensionally and being individually controllable, a distribution forming optical system which forms a predetermined light intensity distribution on an illumination pupil of the illumination optical system on the basis of light having traveled via the spatial light modulator, and a control unit which integrally controls postures of a group of optical elements according to a shape of the predetermined light intensity distribution formed on the illumination pupil, out of the plurality of optical elements.
摘要翻译：公开了一种照明光学系统，其基于来自光源的光照射照明目标表面，所述照明光学系统包括：空间光调制器，具有二维排列并且可单独控制的多个光学元件，分布基于经由所述空间光调制器行进的光，在所述照明光学系统的照明光瞳上形成预定的光强度分布的光学系统，以及根据形状一体地控制一组光学元件的姿势的控制单元在所述多个光学元件中形成在所述照明光瞳上的预定光强度分布。

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