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1. 发明专利

IL231730A Exposure apparatus and method for producing device 未知
公开(公告)号：IL231730A
公开(公告)日：2016-05-31
申请号：IL23173014
申请日：2014-03-26
申请人： NIKON CORP , HISASHI NISHINAGA , IKUO HIKIMA , MITSUNORI TOYODA , MASAHIRO NAKAGAWA , TSUNEYUKI HAGIWARA , YASUSHI MIZUNO , NAONORI KITA , OSAMU TANITSU , NOZOMU EMURA
发明人： HISASHI NISHINAGA , IKUO HIKIMA , MITSUNORI TOYODA , MASAHIRO NAKAGAWA , TSUNEYUKI HAGIWARA , YASUSHI MIZUNO , NAONORI KITA , OSAMU TANITSU , NOZOMU EMURA
IPC分类号： G03F7/20 , H01L20060101 , H01L21/027
摘要： A part of exposure beam through a liquid(LQ) via a projection optical system(PL) enters a light-transmitting section(44), enters an optical member(41) without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

2. 发明专利

IL235090D0 Exposure apparatus, exposure method, and method for producing device 未知
公开(公告)号：IL235090D0
公开(公告)日：2015-01-29
申请号：IL23509014
申请日：2014-10-07
申请人： NIKON CORP , HISASHI NISHINAGA , IKUO HIKIMA , MITSUNORI TOYODA , MASAHIRO NAKAGAWA , TSUNEYUKI HAGIWARA , YASUSHI MIZUNO , NAONORI KITA , OSAMU TANITSU , NOZOMU EMURA
IPC分类号： G03F20060101 , G03F7/20 , H01L20060101 , H01L21/027
摘要： A part of exposure beam through a liquid(LQ) via a projection optical system(PL) enters a light-transmitting section(44), enters an optical member(41) without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

3. 发明专利

IL182064D0 METHOD OF ADJUSTING LIGHTING OPTICAL DEVICE, LIGHTING OPTICAL DEVICE, EXPOSURE SYSTEM AND EXPOSURE METHOD 未知
公开(公告)号：IL182064D0
公开(公告)日：2007-07-24
申请号：IL18206407
申请日：2007-03-20
申请人： NIKON CORP , OSAMU TANITSU , KOJI SHIGEMATSU , HIROTA HIROYUKI , KURITA SHINICHI
IPC分类号： H01L20100101
摘要： An illumination optical apparatus is arranged to illuminate a surface to be illuminated, with light in a desired polarization state, without substantive influence of manufacturing error of an optical member functioning as a wave plate. The illumination optical apparatus illuminates the surface to be illuminated (M, W) on the basis of light from a light source (1). The illumination optical apparatus is provided with a polarization converting element (12) disposed on or near an illumination pupil plane and adapted for converting a polarization state of incident light into a predetermined polarization state. The polarization converting element has a plurality of variable optical rotating members for variably yielding an angle of rotation to incident linearly polarized light. Each variable optical rotating member has two deviation prisms which are made of an optical material with an optical rotatory power and which are movable relative to each other along a direction intersecting with the optical axis (AX).

4. 发明专利

IL235090A Exposure apparatus, exposure method and method for producing a device 未知
公开(公告)号：IL235090A
公开(公告)日：2016-02-29
申请号：IL23509014
申请日：2014-10-07
申请人： NIKON CORP , HISASHI NISHINAGA , IKUO HIKIMA , MITSUNORI TOYODA , MASAHIRO NAKAGAWA , TSUNEYUKI HAGIWARA , YASUSHI MIZUNO , NAONORI KITA , OSAMU TANITSU , NOZOMU EMURA
发明人： HISASHI NISHINAGA , IKUO HIKIMA , MITSUNORI TOYODA , MASAHIRO NAKAGAWA , TSUNEYUKI HAGIWARA , YASUSHI MIZUNO , NAONORI KITA , OSAMU TANITSU , NOZOMU EMURA
IPC分类号： G03F7/20 , H01L20060101 , H01L21/027
摘要： A part of exposure beam through a liquid(LQ) via a projection optical system(PL) enters a light-transmitting section(44), enters an optical member(41) without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

5. 发明专利

IL231730D0 Exposure appartus, exposure method, and method for producing device 未知
公开(公告)号：IL231730D0
公开(公告)日：2014-05-28
申请号：IL23173014
申请日：2014-03-26
申请人： NIKON CORP , HISASHI NISHINAGA , IKUO HIKIMA , MITSUNORI TOYODA , MASAHIRO NAKAGAWA , TSUNEYUKI HAGIWARA , YASUSHI MIZUNO , NAONORI KITA , OSAMU TANITSU , NOZOMU EMURA
IPC分类号： G03F20060101 , G03F7/20 , H01L20060101 , H01L21/027
摘要： A part of exposure beam through a liquid(LQ) via a projection optical system(PL) enters a light-transmitting section(44), enters an optical member(41) without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

6. 发明专利

IL216818D0 METHOD OF ADJUSTING LIGHTING OPTICAL DEVICE, LIGHTING OPTICAL DEVICE, EXPOSURE SYSTEM AND EXPOSURE METHOD 未知
公开(公告)号：IL216818D0
公开(公告)日：2012-01-31
申请号：IL21681811
申请日：2011-12-07
申请人： NIKON CORP , OSAMU TANITSU , KOJI SHIGEMATSU , HIROYUKI HIROTA , SHINICHI KURITA
IPC分类号： H01L20060101
摘要： An illumination optical apparatus is arranged to illuminate a surface to be illuminated, with light in a desired polarization state, without substantive influence of manufacturing error of an optical member functioning as a wave plate. The illumination optical apparatus illuminates the surface to be illuminated (M, W) on the basis of light from a light source (1). The illumination optical apparatus is provided with a polarization converting element (12) disposed on or near an illumination pupil plane and adapted for converting a polarization state of incident light into a predetermined polarization state. The polarization converting element has a plurality of variable optical rotating members for variably yielding an angle of rotation to incident linearly polarized light. Each variable optical rotating member has two deviation prisms which are made of an optical material with an optical rotatory power and which are movable relative to each other along a direction intersecting with the optical axis (AX).

7. 发明专利

IL174296D0 EXPOSURE APPARTUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE 未知
公开(公告)号：IL174296D0
公开(公告)日：2006-08-01
申请号：IL17429606
申请日：2006-03-13
申请人： NIKON CORP , HISASHI NISHINAGA , IKUO HIKIMA , MITSUNORI TOYODA , MASAHIRO NAKAGAWA , TSUNEYUKI HAGIWARA , YASUSHI MIZUNO , NAONORI KITA , OSAMU TANITSU , NOZOMU EMURA
IPC分类号： G03F7/20 , H01L20100101 , H01L21/027
摘要： A part of exposure beam through a liquid(LQ) via a projection optical system(PL) enters a light-transmitting section(44), enters an optical member(41) without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

8. 发明授权

US09081189B2 Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method 有权
公开(公告)号：US09081189B2
公开(公告)日：2015-07-14
申请号：US12256055
申请日：2008-10-22
申请人： Osamu Tanitsu
发明人： Osamu Tanitsu
IPC分类号： G03B27/54 , G03B27/72 , G02B26/08 , G02B27/09 , G03F7/20
摘要： To optionally forming a multilevel light intensity distribution on an illumination pupil plane, the illumination apparatus implements Köhler illumination on an illumination target surface, using as a light source the light intensity distribution formed on the illumination pupil plane on the basis of light from a light source. The illumination apparatus has a spatial light modulator, a condensing optical system, and a control unit. The spatial light modulator has a plurality of reflecting surfaces which are two-dimensionally arranged and postures of which can be controlled independently of each other. The condensing optical system condenses light from the reflecting surfaces to form a predetermined light intensity distribution on the illumination pupil plane. The control unit controls the number of reflecting surfaces contributing to arriving light, for each of points on the illumination pupil plane forming the light intensity distribution, according to a light intensity distribution to be formed on the illumination pupil plane.

9. 发明授权

US09019474B2 Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method 有权
公开(公告)号：US09019474B2
公开(公告)日：2015-04-28
申请号：US13449115
申请日：2012-04-17
申请人： Osamu Tanitsu
发明人： Osamu Tanitsu
IPC分类号： G03B27/54 , G03B27/72 , G02B27/09 , G03F7/20 , G02B27/28
摘要： An illumination optical apparatus has an optical unit. The optical unit has a light splitter to split an incident beam into two beams; a first spatial light modulator which can be arranged in an optical path of a first beam; a second spatial light modulator which can be arranged in an optical path of a second beam; and a light combiner which combines a beam having passed via the first spatial light modulator, with a beam having passed via the second spatial light modulator; each of the first spatial light modulator and the second spatial light modulator has a plurality of optical elements arranged two-dimensionally and controlled individually.

10. 发明授权

US08913227B2 Illumination optical system, aligner, and process for fabricating device 有权
标题翻译：照明光学系统，对准器和制造装置的工艺
公开(公告)号：US08913227B2
公开(公告)日：2014-12-16
申请号：US12929944
申请日：2011-02-25
申请人： Osamu Tanitsu
发明人： Osamu Tanitsu
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/70108
摘要： According to one embodiment, an illumination optical system configured to illuminate an illumination target surface on the basis of light from a light source comprises a distribution forming optical system and a correction unit. The distribution forming optical system forms a pupil intensity distribution on an illumination pupil of the illumination optical system. The correction unit changes an emission direction of a beam according to an incidence position of the beam, in order to correct the pupil intensity distribution. The correction unit is arranged at or near a position of the illumination pupil, or, arranged at or near a position optically conjugate with the illumination pupil.
摘要翻译：根据一个实施例，被配置为基于来自光源的光来照射照明目标表面的照明光学系统包括分布形成光学系统和校正单元。分布形成光学系统在照明光学系统的照明光瞳上形成光瞳强度分布。校正单元根据光束的入射位置改变光束的发射方向，以便校正光瞳强度分布。校正单元布置在照明光瞳的位置处或附近，或者布置在与照明瞳孔光学共轭的位置处或附近。

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