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1. 发明申请

US20120159405A1 METHOD OF FORMING PHOTOMASK USING CALIBRATION PATTERN, AND PHOTOMASK HAVING CALIBRATION PATTERN 有权
标题翻译：使用校准图形成光电子的方法和具有校准图案的光电子
公开(公告)号：US20120159405A1
公开(公告)日：2012-06-21
申请号：US13240732
申请日：2011-09-22
申请人： Young-keun YOON , Hee-bom Kim , Myoung-soo Lee , Chan-uk Jeon , Hak-seung Han
发明人： Young-keun YOON , Hee-bom Kim , Myoung-soo Lee , Chan-uk Jeon , Hak-seung Han
IPC分类号： G06F17/50
CPC分类号： G03F1/70
摘要： A method of forming a photomask using a calibration pattern that may exactly transfer a desired pattern to a substrate. The method includes providing one-dimensional calibration design patterns each having first design measures and providing two-dimensional calibration design patterns each having second design measures; obtaining one-dimensional calibration measured patterns using the one-dimensional calibration design patterns and obtaining two-dimensional calibration measured patterns using the two-dimensional calibration design patterns; obtaining first measured measures of the one-dimensional calibration measured patterns and obtaining second measured measures of the two-dimensional calibration measured patterns; establishing a correlation between the first measured measures and the second measured measures; and converting a main measured measure of a main pattern into a corresponding one of the first measured measures using the correlation.
摘要翻译：使用可以将期望图案精确地转印到基板的校准图案形成光掩模的方法。该方法包括提供一维校准设计图案，每个具有第一设计措施并提供每个具有第二设计措施的二维校准设计图案; 使用一维校准设计图案获得一维校准测量图案，并使用二维校准设计图案获得二维校准测量图案; 获得一维校准测量图案的第一测量度量，并获得二维校准测量图案的第二测量度量; 建立第一测量措施与第二测量措施之间的相关性; 以及使用所述相关性将主模式的主测量度量转换为相应的第一测量度量。

2. 发明授权

US07763397B2 Photomask registration errors of which have been corrected and method of correcting registration errors of photomask 有权
标题翻译：已修正光掩模配准错误，修正光掩膜配准错误的方法
公开(公告)号：US07763397B2
公开(公告)日：2010-07-27
申请号：US11591152
申请日：2006-11-01
申请人： Myoung-Soo Lee , Suk-Jong Bae , Jung-Hoon Lee , Seong-Woo Choi , Byung-Gook Kim
发明人： Myoung-Soo Lee , Suk-Jong Bae , Jung-Hoon Lee , Seong-Woo Choi , Byung-Gook Kim
IPC分类号： G03F1/00
CPC分类号： G03F1/72 , G03F1/38 , G03F1/60
摘要： Provided are photomask registration errors of which have been corrected and a method of correcting the registration errors of a photomask. The photomask includes a photomask substrate, an optical pattern formed on one surface of the photomask substrate, and a plurality of stress generation portions formed in the photomask substrate. A method of correcting the registration errors of a photomask includes the steps of forming an optical pattern on a photomask substrate, measuring the registration errors of the optical pattern, and forming a plurality of stress generation portions in the photomask substrate so that the stress generation portions correspond to the measured registration errors.
摘要翻译：提供了其光掩模配准错误已被校正，以及校正光掩模的配准误差的方法。光掩模包括光掩模基板，形成在光掩模基板的一个表面上的光学图案，以及形成在光掩模基板中的多个应力产生部。校正光掩模的配准误差的方法包括以下步骤：在光掩模衬底上形成光学图案，测量光学图案的配准误差，以及在光掩模衬底中形成多个应力产生部分，使得应力产生部分对应于测量的注册错误。

3. 发明申请

US20090191475A1 Method of manufacturing photomask 有权
标题翻译：制造光掩模的方法
公开(公告)号：US20090191475A1
公开(公告)日：2009-07-30
申请号：US12383640
申请日：2009-03-26
申请人： Myoung-soo Lee , Young-su Sung , Hee-bom Kim , Min-kyung Lee , Dong-gun Lee
发明人： Myoung-soo Lee , Young-su Sung , Hee-bom Kim , Min-kyung Lee , Dong-gun Lee
IPC分类号： G03F1/00
CPC分类号： G21K1/062 , B82Y10/00 , G03F1/70 , G03F7/70625 , G21K2201/061
摘要： A method of manufacturing a photomask includes: providing a photomask; exposing the photomask to obtain an aerial image of the photomask and evaluating the photomask using the aerial image; and altering an optical parameter of the photomask associated with the aerial image according to the result of evaluation.
摘要翻译：制造光掩模的方法包括：提供光掩模; 曝光光掩模以获得光掩模的空间图像，并使用空中图像评估光掩模; 以及根据评估结果改变与空中图像相关联的光掩模的光学参数。

4. 发明授权

US07247412B2 Method of correcting deviations of critical dimensions of patterns formed on a wafer in a EUVL process 有权
标题翻译：校正在EUVL工艺中在晶片上形成的图案的临界尺寸偏差的方法
公开(公告)号：US07247412B2
公开(公告)日：2007-07-24
申请号：US11319245
申请日：2005-12-27
申请人： Myoung-Soo Lee
发明人： Myoung-Soo Lee
IPC分类号： G03C5/00 , G03F9/00
CPC分类号： G03F1/72 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/84 , G03F7/70625 , Y10S430/143
摘要： An embodiment includes a method of correcting deviations of critical dimensions of patterns formed on a wafer in an extreme ultraviolet lithography (EUVL) process. The embodiment includes preparing a reflection photo mask having a reflection layer and absorption patterns that are formed on the reflection layer to define reflection regions therebetween. An exposure process is performed using the reflection photo mask, thereby forming the patterns on the wafer. Critical dimensions of the patterns are measured. A reference critical dimension is set based on the measured critical dimensions of the patterns. Critical dimension deviations are determined by comparing the measured critical dimensions of the patterns with the reference critical dimension. Energy beams having energies corresponding to the critical dimension deviations are locally irradiated onto the reflection layer, thus locally varying the thickness of the reflection layer.
摘要翻译：实施例包括在极紫外光刻（EUVL）工艺中校正在晶片上形成的图案的临界尺寸的偏差的方法。该实施例包括制备具有反射层的反射光掩模和形成在反射层上的吸收图案，以在其间限定反射区域。使用反射光掩模进行曝光处理，从而在晶片上形成图案。测量图案的关键尺寸。基于模式的测量临界尺寸设置参考临界尺寸。通过将模型的测量临界尺寸与参考临界尺寸进行比较来确定关键尺寸偏差。具有对应于临界尺寸偏差的能量的能量束被局部照射到反射层上，从而局部地改变反射层的厚度。

5. 发明申请

US20070069152A1 Electrostatic chuck with temperature sensing unit, exposure equipment having the same, and method of detecting temperature from photomask 有权
标题翻译：具有温度检测单元的静电吸盘，具有相同的曝光设备以及从光掩模检测温度的方法
公开(公告)号：US20070069152A1
公开(公告)日：2007-03-29
申请号：US11526802
申请日：2006-09-26
申请人： Myoung-Soo Lee , Chan-Uk Jeon
发明人： Myoung-Soo Lee , Chan-Uk Jeon
IPC分类号： G21K5/10
CPC分类号： G03F7/70875 , B82Y10/00 , G03F7/707 , G03F7/70708 , G03F7/7085 , G21K2201/061 , G21K2201/067 , H01L21/6831 , H02N13/00
摘要： Disclosed is an electrostatic chuck with a temperature sensing unit, exposure equipment having the electrostatic chuck, and a method of detecting temperature on photomask surfaces. The temperature sensing unit and method of detecting temperature may include obtaining reflectance of a photomask using a multi-wavelength interferometer and determining a temperature on the photomask based on the reflectance.
摘要翻译：公开了具有温度感测单元的静电卡盘，具有静电卡盘的曝光设备以及检测光掩模表面温度的方法。温度检测单元和检测温度的方法可以包括使用多波长干涉仪获得光掩模的反射率，并且基于反射率确定光掩模上的温度。

6. 发明申请

US20060269118A1 Method of inspecting defects in photomask having a plurality of dies with different transmittances 审中-公开
标题翻译：检查具有不同透射率的多个管芯的光掩模中的缺陷的方法
公开(公告)号：US20060269118A1
公开(公告)日：2006-11-30
申请号：US11369576
申请日：2006-03-07
申请人： Myoung-Soo Lee , Seong-Woon Choi
发明人： Myoung-Soo Lee , Seong-Woon Choi
IPC分类号： G06K9/00
CPC分类号： G03F1/84
摘要： Provided is a method of inspecting defects in a photomask having dies with different transmittances from each other due to correction treatments. A method of inspecting defects corrects light signals transmitted through the dies or source light irradiating the dies by using transmittance maps of the dies.
摘要翻译：提供了通过校正处理来检查具有彼此具有不同透射率的管芯的光掩模中的缺陷的方法。检查缺陷的方法通过使用模具的透射率图来校正通过模具传输的光信号或照射模具的源光。

7. 发明授权

US08213722B2 Method for inspecting critical dimension uniformity at high speed measurement 有权
标题翻译：在高速测量时检查临界尺寸均匀度的方法
公开(公告)号：US08213722B2
公开(公告)日：2012-07-03
申请号：US12607238
申请日：2009-10-28
申请人： Hee-Bom Kim , Myoung-Soo Lee , Young-Su Sung
发明人： Hee-Bom Kim , Myoung-Soo Lee , Young-Su Sung
IPC分类号： G06K9/68
CPC分类号： G06T7/0006 , G03F1/86 , G03F7/70625 , G06T2207/30148
摘要： A method for inspecting a uniformity of CD (CD) of a photo mask pattern increases a production yield. The method obtains a CD by precisely measuring a photo mask by using, an electron microscope. Then, a measurement image having, a plurality of patterns formed in the photo mask is obtained by photographing the photo mask at a high speed through an optical microscope. A gray level based on the CD is calculated by capturing just a pattern area in the measurement image, and an estimated value and a correlation coefficient is obtained, when an open density of the measurement image is relatively low. Accordingly, a uniformity of CD can be confirmed more clearly in a measurement of high speed for a measurement image having a relatively low open density.
摘要翻译：用于检查光掩模图案的CD（CD）的均匀性的方法提高了产量。该方法通过使用电子显微镜精确测量光掩模来获得CD。然后，通过光学显微镜以高速拍摄光掩模，获得具有形成在光掩模中的多个图案的测量图像。当测量图像的开放密度相对较低时，通过仅捕获测量图像中的图案区域来计算基于CD的灰度级，并且获得估计值和相关系数。因此，对于具有较低开放密度的测量图像的高速测量，可以更清楚地确认CD的均匀性。

8. 发明授权

US07935552B2 Ink composition and method of fabricating liquid crystal display device using the same 有权
标题翻译：制造使用其的液晶显示装置的油墨组成和方法
公开(公告)号：US07935552B2
公开(公告)日：2011-05-03
申请号：US12613961
申请日：2009-11-06
申请人： Sung-Hee Kim , Soon-Sung Yoo , Jin-Wuk Kim , Byung-Geol Kim , Byung-Uk Kim , Ki-Beom Lee , Byong-Hoo Kim , Seung-Hyup Shin , Jun-Youg Song , Myoung-Soo Lee
发明人： Sung-Hee Kim , Soon-Sung Yoo , Jin-Wuk Kim , Byung-Geol Kim , Byung-Uk Kim , Ki-Beom Lee , Byong-Hoo Kim , Seung-Hyup Shin , Jun-Youg Song , Myoung-Soo Lee
IPC分类号： H01L21/00 , H01L21/78
CPC分类号： C09D11/02 , B82Y10/00 , B82Y40/00 , C09D11/033 , G03F7/0002
摘要： Disclosed are an ink composition and a method for fabricating a liquid crystal display (LCD) device using the same, wherein in forming patterns of the LCD device using an imprint lithography and a roll printing, an ink composition with high thermal resistance, consisting of polymer resin and additive both endurable even at a high temperature is used to form fine patterns with constantly maintaining pattern linewidths and line intervals, the ink composition consisting of 5-45% by weight of polymer resin, 5-45% by weight of additive added to retain thermal stability, and 50-90% by weight of organic solvent, wherein the ink composition is endurable even at a high temperature of 90-250° C.
摘要翻译：公开了一种使用其制造液晶显示（LCD）装置的油墨组合物和方法，其中在使用压印光刻和辊印刷形成LCD装置的图案时，具有由聚合物组成的高耐热性的油墨组合物即使在高温下也能耐久的树脂和添加剂被用于形成精细图案，并且不断地保持图案线宽和线间隔，油墨组合物由5-45重量％的聚合物树脂组成，5-45重量％的添加剂添加到保持热稳定性和50-90重量％的有机溶剂，其中油墨组合物即使在90-250℃的高温下也是耐久的。

9. 发明授权

US07812929B2 Electrostatic chuck with temperature sensing unit, exposure equipment having the same, and method of detecting temperature from photomask 有权
标题翻译：具有温度检测单元的静电吸盘，具有相同的曝光设备以及从光掩模检测温度的方法
公开(公告)号：US07812929B2
公开(公告)日：2010-10-12
申请号：US11526802
申请日：2006-09-26
申请人： Myoung-Soo Lee , Chan-Uk Jeon
发明人： Myoung-Soo Lee , Chan-Uk Jeon
IPC分类号： G21K5/10
CPC分类号： G03F7/70875 , B82Y10/00 , G03F7/707 , G03F7/70708 , G03F7/7085 , G21K2201/061 , G21K2201/067 , H01L21/6831 , H02N13/00
摘要： Disclosed is an electrostatic chuck with a temperature sensing unit, exposure equipment having the electrostatic chuck, and a method of detecting temperature on photomask surfaces. The temperature sensing unit and method of detecting temperature may include obtaining reflectance of a photomask using a multi-wavelength interferometer and determining a temperature on the photomask based on the reflectance.
摘要翻译：公开了具有温度感测单元的静电卡盘，具有静电卡盘的曝光设备以及检测光掩模表面温度的方法。温度检测单元和检测温度的方法可以包括使用多波长干涉仪获得光掩模的反射率，并且基于反射率确定光掩模上的温度。

10. 发明申请

US20100123269A1 PHOTOSENSITIVE RESIN COMPOSITION FOR IMPRINTING PROCESS AND METHOD FOR FORMING ORGANIC LAYER OVER SUBSTRATE 有权
标题翻译：用于印刷工艺的感光性树脂组合物和用于在基材上形成有机层的方法
公开(公告)号：US20100123269A1
公开(公告)日：2010-05-20
申请号：US12617108
申请日：2009-11-12
申请人： Yeon Heui NAM , Jin Wuk Kim , Tae Joon Song , Seong Pil Cho , Byung Uk Kim , Seung Hyup Shin , Jun Yong Song , Myoung Soo Lee
发明人： Yeon Heui NAM , Jin Wuk Kim , Tae Joon Song , Seong Pil Cho , Byung Uk Kim , Seung Hyup Shin , Jun Yong Song , Myoung Soo Lee
IPC分类号： B28B1/14 , C07C69/67 , C08F2/46
CPC分类号： C08F2/48 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/027
摘要： A photosensitive resin composition and a method for forming an organic film on a substrate are provided. Because the photosensitive resin composition for imprinting includes an erythrotol-based monomer or oligomer, an organic film formed by the photosensitive resin composition for imprinting has improved restoring force. Therefore, the photosensitive resin composition is appropriate for imprinting processes.
摘要翻译：提供感光性树脂组合物和在基材上形成有机膜的方法。由于用于印记的感光性树脂组合物包含基于红酵母的单体或低聚物，所以通过用于印记的感光性树脂组合物形成的有机膜具有提高的恢复力。因此，感光性树脂组合物适用于印刷工序。

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